EP1799876B1 - Bloc terminal plat comme support pour cible de pulverisation rotative - Google Patents
Bloc terminal plat comme support pour cible de pulverisation rotative Download PDFInfo
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- EP1799876B1 EP1799876B1 EP05857644A EP05857644A EP1799876B1 EP 1799876 B1 EP1799876 B1 EP 1799876B1 EP 05857644 A EP05857644 A EP 05857644A EP 05857644 A EP05857644 A EP 05857644A EP 1799876 B1 EP1799876 B1 EP 1799876B1
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- seal means
- bearing
- block
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- 238000005477 sputtering target Methods 0.000 title description 5
- 239000002826 coolant Substances 0.000 claims abstract description 89
- 238000004544 sputter deposition Methods 0.000 claims description 25
- 230000004323 axial length Effects 0.000 abstract description 3
- 238000001755 magnetron sputter deposition Methods 0.000 abstract description 3
- 230000002829 reductive effect Effects 0.000 abstract description 2
- 239000000758 substrate Substances 0.000 description 11
- 238000000576 coating method Methods 0.000 description 5
- 239000011248 coating agent Substances 0.000 description 4
- 238000004519 manufacturing process Methods 0.000 description 4
- 238000001816 cooling Methods 0.000 description 3
- 230000001419 dependent effect Effects 0.000 description 3
- 239000007789 gas Substances 0.000 description 3
- 238000002955 isolation Methods 0.000 description 3
- 230000005611 electricity Effects 0.000 description 2
- 230000003628 erosive effect Effects 0.000 description 2
- 238000009434 installation Methods 0.000 description 2
- 239000000463 material Substances 0.000 description 2
- 230000036961 partial effect Effects 0.000 description 2
- 230000003068 static effect Effects 0.000 description 2
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 238000010276 construction Methods 0.000 description 1
- 238000005137 deposition process Methods 0.000 description 1
- 239000005357 flat glass Substances 0.000 description 1
- 239000003574 free electron Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000002401 inhibitory effect Effects 0.000 description 1
- 150000002500 ions Chemical class 0.000 description 1
- WABPQHHGFIMREM-NJFSPNSNSA-N lead-209 Chemical compound [209Pb] WABPQHHGFIMREM-NJFSPNSNSA-N 0.000 description 1
- 239000004973 liquid crystal related substance Substances 0.000 description 1
- 239000000203 mixture Substances 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000000565 sealant Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 238000005549 size reduction Methods 0.000 description 1
- 239000013077 target material Substances 0.000 description 1
- UONOETXJSWQNOL-UHFFFAOYSA-N tungsten carbide Chemical group [W+]#[C-] UONOETXJSWQNOL-UHFFFAOYSA-N 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/3407—Cathode assembly for sputtering apparatus, e.g. Target
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
- H01J37/3411—Constructional aspects of the reactor
- H01J37/3435—Target holders (includes backing plates and endblocks)
Definitions
- the invention relates to an end-block that is used to rotatably carry a sputtering target in a sputtering apparatus. More in particular it relates to end-blocks that are relatively flat when considered along the symmetry axis of the target, while still housing inside all or some of the necessary means to energise, cool, seal, support and rotate the target.
- Sputtering material from a target to cover a substrate has become common practice in a wide range of technical fields such as integrated circuit manufacture, large area glass coating and nowadays more and more for the coating of flat panel displays.
- Such sputtering takes place under a reduced pressure atmosphere wherein sputtering or reactive gases or mixtures of both are admitted in a controlled way.
- Free electrons hopping in a magnetically confined racetrack ionise the gas atoms or molecules in the vicinity of the target surface. These ions are subsequently accelerated towards the target that is negatively biased, thereby dislodging the target atoms and giving them enough kinetic energy to reach the substrate and coat it.
- the shape of the racetrack is defined by a static magnetic array, close to that target surface that is opposite to the surface that is being sputtered. Such a deposition process is commonly called “magnetron sputtering" due to the presence of the magnetic array.
- the substrate to be coated is held under a slant angle (7° to 15°) out of the vertical and leans on a conveying system.
- the target must be parallel to the substrate in order to obtain a uniform coating, the target must be mounted under substantially the same angle.
- Stationary targets are easy to cool and energise (as they are static with respect to the apparatus), but they have the disadvantage that the target material is only eroded away beneath the racetrack. The useable lifetime of the target thus being limited to that point in time just before the target is first punctured.
- the problem of non-uniform erosion can be dealt with by introducing a magnet array that rotates relative to the target surface (such as e.g. introduced in US 4,995,958 for circular planar magnetrons) or that translates relative to the target surface (such as e.g. described in US 6,322,679 for elongated planar magnetrons).
- Such constructions although alleviating the uneven erosion problem to a great extent - make the system more complex.
- Rotating tubular targets are the ideal choice for that, as they can span large widths and can be used for a long period of time.
- the trade-off is that the target itself is rotating relative to the apparatus and hence a complex and space occupying 'end-block' is needed to bear, rotate, energise, cool and isolate (coolant, air and electricity) the rotating target while holding the magnet array fixed inside.
- a first aspect of the invention relates to the end-block with the combination of features of claim 1. Specific features for preferred embodiments of the inventive end-block are set out in the dependent claims 2 to 21.
- An end-block is claimed. Such an end-block links the sputtering target in the sputtering apparatus to the outside of the sputtering apparatus.
- Such an end-block is preferably mountable as a single unit on a sputtering apparatus, although a wall-integrated end-block could be envisaged as well.
- the pressure is higher than in the evacuable apparatus, preferably the pressure is atmospheric.
- Means that are removable with the target tube or the removable magnet bar assembly are considered as not to belong to the end-block.
- the primary function of the end-block is to carry and to revolve the target around an axis of rotation. As sputtering is performed under a low gas pressure, the end-block must be gastight at all times and surely when it is rotating.
- an end-block may comprise different means:
- the end-block will also have some means to hold the magnetic array - that is introduced into the target tube prior to mounting it on the end-block -- in a stationary position, while the target tube revolves around it.
- a bearing means usually holds the array centred with respect to the target tube.
- the inventive end-block comprises at least two of the above-identified five means (A, B, C, D and E).
- the inventive end-block may comprise a subset of those means as long as there are two or more of them in the subset while the other means or incorporated in another end-block (this adds up to exactly 14 technologically meaningful subsets).
- the set of all five means is also considered as a subset.
- the drive means (A), the electrical contact means (B) and coolant seal means (D) are combined in a single end-block (other means being implemented in e.g. the end-block at the other end of the target).
- the minimum means for having all interconnections (coolant, electricity, movement) through a single end-block are present. At least two of the mentioned means must overlap one another.
- a second preferred subset - claim 3 - comprises the drive means (A), bearing means (C) and vacuum seal means (E) in a single end-block (the other block must than accommodate for the remaining means).
- Such a block is described in US 2003/0136672 , fig. 3 . Again at least two means must overlap in order to have an end-block according the invention. More pairs of overlapping means are not excluded.
- the end-block houses the rotatable electrical contact means (B), the bearing means (C) and the vacuum seal means (E) compactly. At least two of the means must overlaps, more overlaps of course not being excluded.
- a fourth subset - claim 5 - incorporates the bearing means (C), the rotatable coolant seal means (D) and the rotatable vacuum seal means (E) in a single end-block (a combination depicted e.g. in US 5096562 , fig. 6, left block).
- the inventive concept requires that at least two, and possibly more, of them must pair wise overlap.
- a fifth subset - claim 6 - incorporates four means namely the drive means (A), the bearing means (C), the rotatable coolant seal means (D) and the rotatable vacuum seal means (E) into a single end-block (much like US 5096562 , fig. 2 , left block).
- the inventive end-block has at least two out of the four means in an overlapping position, more overlapping pairs of means being possible as well.
- a sixth subset - claim 7 - embodies a drive means (A), a rotatable electrical contact means (B), a bearing means (C) and a rotatable vacuum seal means (E) in a single end-block (cfr. US 5096562 , fig. 6, right block). Again in the inventive end-block, at least two of the means are mounted radial and overlapping. Likewise more pairs of overlapping means are possible.
- a seventh subset - claim 8 - comprises the rotatable electrical contact (B), the bearing means (C), the rotatable coolant seal (D) and the rotatable vacuum seal (E) in one end-block (as in US 2003/0136672 fig. 6).
- the inventive concept at least two out of the four means must be situated in an overlapping position. However, more pairs of overlapping means are equally well possible, the maximum being six.
- an eighth subset as claimed in claim 9 comprises all means - the drive means (A), the rotatable electrical contact means (B), the bearing means (C), the coolant seal means (D) and the vacuum seal means (E) - in a single end-block ( fig. 1 of US 5200049 ). It is not excluded that the other end is held by a bearing means. At least two means must be arranged radial according the inventive concept, but it applies equally well if more pairs of overlapping means are present.
- the end-block according the invention can be of the right-angled type (claim 20) wherein the axis of rotation of the target is parallel to the wall on which the end-block is mounted. Or it can be of the straight-through type (claim 21) i.e. wherein the axis of rotation of the target is perpendicular to the wall.
- a second aspect of the invention relates to the sputtering apparatus using the inventive end-block according the features of claim 22. Specific features for preferred mountings of the end-block in the sputtering apparatus are defined in the dependent claims 23 to 24.
- FIGURE 2 shows as schematic drawing of a first preferred embodiment of an end-block according the invention.
- the end-block 200 incorporates all means (A, B, C, D and E) inside a single housing 201. It is of the right-angled type and can be mounted to the wall or the door 202 of a coater holding the upper end of the target 220.
- the target 220 is able to rotate around its axis of rotation 222.
- the target 220 is connected to a holder ring 226 by means of connector 224.
- the target coolant tube 230 - carrying the not shown magnet bar - is connected through the coolant feed tube 228 through a connector 232.
- the coolant feed tube 228 is firmly and fixedly attached to the end-block housing 201.
- the coolant is fed through coolant feed 234 into coolant tube 228.
- the coolant is collected in a stationary coolant collector 229, coaxial to the coolant tube 228 and is extracted through tube 236.
- FIGURE 3 shows an engineering drawing incorporating the features of the inventive end-block.
- Such a detailed drawing enables the person skilled in the art to manufacture the end-block.
- parts of which the function is obvious will not be identified or denominated.
- a part like fixing means - such as screws, bolts or the like - or stationary sealing means - such as O-rings - will be readily recognised by the person skilled in the art on the drawing.
- the inventive end-block 300 carries a (partly shown) target 302 around an axis of rotation 304.
- the target 302 is removably fixed to the end- block through mounting ring 303.
- the mounting ring is attached to a rotatable intermediate piece 311.
- the end-block 300 is attached to the wall 306 of a sputtering installation.
- the end-block has cavities for feeding 305 and extracting coolant 307, the arrows indicating the flow direction of the coolant.
- the magnet bar (not shown) is held stationary through a connector 309 that tangentially locks into the inner tube 308 that is fixedly connected inside the end-block 300.
- the target 302 is driven by a crossed axis, conical gear pair 310-312 whereby gear 312 is actuated by an electrical motor (not shown) through axis 314.
- the main gear 310 is fixed to the target 302 through rotatable intermediate piece 311.
- Also attached to the intermediate piece 311 is a commutator ring 320 comprising six brushes 322 that are segment wise distributed over the circumference of the ring 320.
- the brushes 322 slide against the inside of the stationary contacting ring 324.
- the target 302 therefore receives its current from the current source (not shown) through leads (not shown), the contacting ring 324, the brushes 322, commutator ring 320 and intermediate piece 311.
- the target is rotatably carried by two bearings: a ball bearing 332 and a needle bearing 330.
- the coolant is held in the circuit by two rotary lip seals: the primary seal 342 and the secondary seal 340. Vacuum integrity of the end-block is ensured through two rotary lip seals 350 and 352.
- FIGURE 4 shows a third preferred embodiment of the invention.
- the end-block 400 is provided with a connector ring 403 to fixedly but removably connect the target tube (not shown) with the target receiving flange 401.
- the target tube (not shown) is rotated by the flange 401 around the axis of rotation 404.
- Coolant is fed to the target (not shown) through an electrically insulating inner body 408.
- the end of the inner body 408 is provided with a fitting 409 that matches with the magnet bar insert (not shown) that holds the magnet bar stationary with respect to the rotating target.
- the coolant follows the direction of the arrows.
- the end-block 400 is to be mounted on the wall 406 of the sputtering apparatus.
- a needle bearing 430 and a larger ball bearing 432 provide the necessary bearing means.
- a mechanical seal cassette 443 provides a first coolant seal. Such a cassette has two rings of equal diameter that are axially pressed against on another. The contacting faces are polished so precisely that no coolant can escape through the contacting faces 442. The one side of the mechanical seal cassette 443 is tangentially locked in position by means of the pins 441, 441'.
- the facing tungsten carbide ring 444 tightly fits the rotating intermediate piece 405 and is sealed from the coolant flow by means of two stationary O-rings.
- a secondary lip seal 440 further secures coolant circuit integrity. Vacuum integrity is ensured through primary vacuum lip seal 450' and secondary lip seal 450.
- the embodiments described above have all the necessary means incorporated in one single end-block.
- the other end of the end-block can thus be left free standing or held centred by means of a centring pin connected to the same wall as the wall the end-block is mounted on.
- end-blocks described are of right-angled type, i.e. the axis of rotation is parallel to the wall the end-block is mounted on.
- the person skilled in the art will have little trouble in converting these right-angled types to straight-through types i.e. end-blocks where the axis of rotation Is perpendicular to the wall the end-block is mounted on.
- the embodiment of FIGURE 4 can be readily adapted by elongating the intermediate piece 405 so that enough space is available to mount the end-block with the target oriented face to the wall of the sputtering apparatus (with the introduction of the necessary O-rings and fixing means).
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Claims (24)
- Bloc terminal pou r le support rotatif d'une cible autour d'un axe de rotation dans un appareil de pulvérisation pouvant être mis sous vide, ledit bloc terminal comprenant un sous-ensemble d'au moins deux des moyens suivantes :- un moyen d'entraînement couvrant une plage de moyen d'entraînement sur ledit axe, ladite plage de moyen d'entraînement étant définie comme la projection orthogonale dudit moyen d'entraînement sur ledit axe,- un moyen de contact électrique rotatif couvrant une plage de moyen de contact sur ledit axe, ladite plage de moyen de contact étant définie comme la projection orthogonale dudit moyen de contact sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité de réfrigérant rotatifs, lesdits moyens d'étanchéité de réfrigérant couvrant une plage de moyens d'étanchéité de réfrigérant sur ledit axe, ladite plage de moyens d'étanchéité de réfrigérant étant définie comme la projection orthogonale desdits moyens d'étanchéité de réfrigérant sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe,caractérisé en ce
qu'au moins deux moyens parmi ledit sous-ensemble de moyens sont agencés radialement l'un par rapport à l'autre, de sorte que les au moins deux plages correspondant auxdits au moins deux moyens se chevauchent sur ledit axe. - Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivants :- un moyen d'entraînement couvrant une plage de moyen d'entraînement sur ledit axe, ladite plage de moyen d'entraînement étant définie comme la projection orthogonale dudit moyen d'entraînement sur ledit axe,- un moyen de contact électrique rotatif couvrant une plage de moyen de contact sur ledit axe, ladite plage de moyen de contact étant définie comme 1a projection orthogonale dudit moyen de contact sur ledit axe,- un certain nombre de moyens d'étanchéité de réfrigérant rotatifs, lesdits moyens d'étanchéité de réfrigérant couvrant une plage de moyens d'étanchéité de réfrigérant sur ledit axe, ladite plage de moyens d'étanchéité de réfrigérant étant définie comme la projection orthogonale desdits moyens d'étanchéité de réfrigérant sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivants :- un moyen d'entraînement couvrant une plage de moyen d'entraînement sur ledit axe, ladite plage de moyen d'entraînement étant définie comme la projection orthogonale dudit moyen d'entraînement sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivantes :- un moyen de contact électrique rotatif couvrant une plage de moyen de contact sur ledit axe, ladite plage de moyen de contact étant définie comme la projection orthogonale dudit moyen de contact sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivants .- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité de réfrigérant rotatifs, lesdits moyens d'étanchéité de réfrigérant couvrant une plage de moyens d'étanchéité de réfrigérant sur ledit axe, ladite plage de moyens d'étanchéité de réfrigérant étant définie comme la projection orthogonale desdits moyens d'étanchéité de réfrigérant sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivants :- un moyen d'entraînement couvrant une plage de moyen d'entraînement sur ledit axe, ladite plage de moyen d'entraînement étant définie comme là projection orthogonale dudit moyen d'entraînement sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité de réfrigérant rotatifs, lesdits moyens d'étanchéité de réfrigérant couvrant une plage de moyens d'étanchéité de réfrigérant sur ledit axe, ladite plage de moyens d'étanchéité de réfrigérant étant définie comme la projection orthogonale desdits moyens d'étanchéité de réfrigérant sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivants :- un moyen d'entraînement couvrant une plage de moyen d'entraînement sur ledit axe, ladite plage de moyen d'entraînement étant définie comme la projection orthogonale dudit moyen d'entraînement sur ledit axe,- un moyen de contact électrique rotatif couvrant une plage de moyen de contact sur ledit axe, ladite plage de moyen de contact étant définie comme la projection orthogonale dudit moyen de contact sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivants :- un moyen de contact électrique rotatif couvrant une plage de moyen de contact sur ledit axe, ladite plage de moyen de contact étant définie comme la projection orthogonale dudit moyen de contact sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité de réfrigérant rotatifs, lesdits moyens d'étanchéité de réfrigérant couvrant une plage de moyens d'étanchéité de réfrigérant sur ledit axe, ladite plage de moyens d'étanchéité de réfrigérant étant définie comme la projection orthogonale desdits moyens d'étanchéité de réfrigérant sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon la revendication 1, dans lequel ledit sous-ensemble comprend les moyens suivantes :- un moyen d'entraînement couvrant une plage de moyen d'entraînement sur ledit axe, ladite plage de moyen d'entraînement étant définie comme la projection orthogonale dudit moyen d'entraînement sur ledit axe,- un moyen de contact électrique rotatif couvrant une plage de moyen de contact sur ledit axe, ladite plage de moyen de contact étant définie comme la projection orthogonale dudit moyen de contact sur ledit axe,- un certain nombre de moyens de support, lesdits moyens de support couvrant une plage de moyens de support sur ledit axe, ladite plage de moyens de support étant définie comme la projection orthogonale desdits moyens de support sur ledit axe,- un certain nombre de moyens d'étanchéité de réfrigérant rotatifs, lesdits moyens d'étanchéité de réfrigérant couvrant une plage de moyens d'étanchéité de réfrigérant sur ledit axe, ladite plage de moyens d'étanchéité de réfrigérant étant définie comme la projection orthogonale desdits moyens d'étanchéité de réfrigérant sur ledit axe,- un certain nombre de moyens d'étanchéité sous vide rotatifs, lesdits moyens d'étanchéité sous vide couvrant une plage de moyens d'étanchéité sous vide sur ledit axe, ladite plage de moyens d'étanchéité sous vide étant définie comme la projection orthogonale desdits moyens d'étanchéité sous vide sur ledit axe.
- Bloc terminal selon l'une quelconque des revendications 1, 2, 7 ou 9, dans lequel ladite plage de moyen d'entraînement chevauche ladite plage de moyen de contact.
- Bloc terminal selon l'une quelconque des - revendications 1, 3, 6, 7 ou 9, dans lequel ladite plage de moyen d'entraînement chevauche au moins l'une desdites plages de moyens de support.
- Bloc terminal selon l'une quelconque des revendications 1, 2, 6 ou 9, dans lequel ladite plage de moyen d'entraînement chevauche au moins l'une desdites plages de moyens d'étanchéité de réfrigérant.
- Bloc terminal selon l'une quelconque des revendications 1, 3, 6, 7 ou 9, dans lequel ladite plage de moyen d'entraînement chevauche au moins l'une desdites plages de moyens d'étanchéité sous vide.
- Bloc terminal selon l'une quelconque des revendications 1, 4, 7, 8 ou 9, dans lequel ladite plage de moyen de contact chevauche au moins l'une desdites plages de moyens de support.
- Bloc terminal selon l'une quelconque des revendications 1, 2, 8 ou 9, dans lequel ladite plage de moyen de contact chevauche au moins l'une desdites plages de moyens d'étanchéité de réfrigérant.
- Bloc terminal selon 1'une quelconque des revendications 1, 4, 7, 8 ou 9, dans lequel ladite plage de moyen de contact chevauche au moins l'une desdites plages de moyens d'étanchéité sous vide.
- Bloc terminal selon l'une quelconque des revendications 1, 5, 6, 8 ou 9, dans lequel au moins l'une desdites plages de moyens de support chevauche au moins l'une desdites plages de moyens d'étanchéité de réfrigérant.
- Bloc terminal selon l'une quelconque des revendications 1, 3, 4, 5, 6, 7, 8 ou 9, dans lequel au moins l'une desdites plages de moyens de support chevauche au moins l'une desdites plages de moyens d'étanchéité sous vide.
- Bloc terminal selon l'une quelconque des revendications 1, 3, 4, 5, 7 ou 8, dans lequel au moins l'une desdites plages de moyens d'étanchéité de réfrigérant chevauche au moins l'une desdites plages de moyens d'étanchéité sous vide.
- Bloc terminal selon l'une quelconque des revendications 1 à 19, ledit bloc terminal servant à porter de manière rotative une cible, ladite cible ayant un axe de rotation, ledit bloc terminal devant être monté sur une paroi d'un appareil de pulvérisation, ledit bloc terminal étant en outre caractérisé en ce que ledit axe de rotation est substantiellement parallèle à ladite paroi.
- Bloc terminal selon l'une quelconque des revendications 1 à 19, ledit bloc terminal servant à porter de manière rotative une cible, ladite cible ayant un axe de rotation, ledit bloc terminal devant être monté sur une paroi d'un appareil de pulvérisation, ledit bloc terminal étant en outre caractérisé en ce que ledit axe de rotation est substantiellement perpendiculaire à ladite paroi.
- Appareil de pulvérisation comprenant des parois pour fournir un espace pouvant être mis sous vide, ledit appareil comprenant en outre un bloc terminal pouvant être monté sur l'une desdites parois, ledit bloc terminal ayant les caractéristiques de l'une quelconque des revendications 1 à 21.
- Appareil de pulvérisation selon la revendication 22, dans lequel ladite paroi sur laquelle est monté ledit bloc terminal est amovible.
- Appareil de pulvérisation selon la revendication 23, dans lequel ladite paroi amovible est reliée par une articulation audit appareil.
Priority Applications (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP05857644A EP1799876B1 (fr) | 2004-10-18 | 2005-10-11 | Bloc terminal plat comme support pour cible de pulverisation rotative |
SI200530640T SI1799876T1 (sl) | 2004-10-18 | 2005-10-11 | Plosk končni blok zasučne tarče za napraševanje |
PL05857644T PL1799876T3 (pl) | 2004-10-18 | 2005-10-11 | Płaski blok końcowy do podtrzymywania obrotowego targetu do napylania |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP04105116 | 2004-10-18 | ||
EP05101905 | 2005-03-11 | ||
EP05857644A EP1799876B1 (fr) | 2004-10-18 | 2005-10-11 | Bloc terminal plat comme support pour cible de pulverisation rotative |
PCT/EP2005/055143 WO2006097152A1 (fr) | 2004-10-18 | 2005-10-11 | Bloc terminal plat comme support pour cible de pulverisation rotative |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1799876A1 EP1799876A1 (fr) | 2007-06-27 |
EP1799876B1 true EP1799876B1 (fr) | 2009-02-18 |
Family
ID=35809667
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP05857644A Active EP1799876B1 (fr) | 2004-10-18 | 2005-10-11 | Bloc terminal plat comme support pour cible de pulverisation rotative |
Country Status (12)
Country | Link |
---|---|
US (1) | US8562799B2 (fr) |
EP (1) | EP1799876B1 (fr) |
JP (2) | JP5582681B2 (fr) |
KR (1) | KR101358820B1 (fr) |
AT (1) | ATE423225T1 (fr) |
DE (1) | DE602005012850D1 (fr) |
DK (1) | DK1799876T3 (fr) |
ES (1) | ES2320366T3 (fr) |
PL (1) | PL1799876T3 (fr) |
PT (1) | PT1799876E (fr) |
SI (1) | SI1799876T1 (fr) |
WO (1) | WO2006097152A1 (fr) |
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PT1856303E (pt) * | 2005-03-11 | 2009-02-27 | Bekaert Advanced Coatings | Bloco de extremidade individual em ângulo recto |
US20120031755A1 (en) * | 2006-11-24 | 2012-02-09 | Guo George X | Deposition system capable of processing multiple roll-fed substrates |
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DE102008033904B4 (de) * | 2008-07-18 | 2012-01-19 | Von Ardenne Anlagentechnik Gmbh | Antriebsendblock für eine Magnetronanordnung mit einem rotierenden Target |
US8182662B2 (en) * | 2009-03-27 | 2012-05-22 | Sputtering Components, Inc. | Rotary cathode for magnetron sputtering apparatus |
WO2010115189A1 (fr) * | 2009-04-03 | 2010-10-07 | General Plasma, Inc. | Magnétron rotatif |
JP5497572B2 (ja) * | 2009-08-18 | 2014-05-21 | キヤノンアネルバ株式会社 | スパッタリング装置及び真空処理装置 |
DE102009056241B4 (de) * | 2009-12-01 | 2012-07-12 | Von Ardenne Anlagentechnik Gmbh | Stützeinrichtung für eine Magnetronanordnung mit einem rotierenden Target |
KR101155906B1 (ko) | 2009-12-11 | 2012-06-20 | 삼성모바일디스플레이주식회사 | 스퍼터링 장치 |
EP2371992B1 (fr) * | 2010-04-01 | 2013-06-05 | Applied Materials, Inc. | Bloc terminal et installation de pulvérisation |
EP2709138B1 (fr) * | 2010-05-11 | 2016-11-30 | Applied Materials, Inc. | Chambre pour dépôt physique en phase vapeur |
CN103814151B (zh) | 2011-06-27 | 2016-01-20 | 梭莱有限公司 | Pvd靶材及其铸造方法 |
BE1020564A5 (nl) * | 2013-04-04 | 2013-12-03 | Soleras Advanced Coatings Bvba | Spindel voor magnetron sputter inrichting. |
US9809876B2 (en) | 2014-01-13 | 2017-11-07 | Centre Luxembourgeois De Recherches Pour Le Verre Et La Ceramique (C.R.V.C.) Sarl | Endblock for rotatable target with electrical connection between collector and rotor at pressure less than atmospheric pressure |
WO2016033475A1 (fr) | 2014-08-29 | 2016-03-03 | Sputtering Components, Inc. | Cathode de pulvérisation rotative à double alimentation en puissance |
CN104640339A (zh) * | 2015-01-12 | 2015-05-20 | 广东韦达尔科技有限公司 | 一种等离子表面处理装置 |
BE1024754B9 (nl) * | 2016-11-29 | 2018-07-24 | Soleras Advanced Coatings Bvba | Een universeel monteerbaar eindblok |
JP2018131644A (ja) * | 2017-02-13 | 2018-08-23 | 株式会社アルバック | スパッタリング装置用の回転式カソードユニット |
CN113366605B (zh) * | 2019-02-05 | 2024-02-20 | 应用材料公司 | 沉积设备和用于监测沉积设备的方法 |
KR20210080770A (ko) | 2019-12-23 | 2021-07-01 | 주식회사 선익시스템 | 스퍼터용 회전형 타겟장치 및 상기 타겟장치를 구비한 스퍼터장치 |
KR20220139382A (ko) * | 2020-09-16 | 2022-10-14 | 가부시키가이샤 알박 | 회전식 캐소드 유닛용 구동 블록 |
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-
2005
- 2005-10-11 EP EP05857644A patent/EP1799876B1/fr active Active
- 2005-10-11 DE DE602005012850T patent/DE602005012850D1/de active Active
- 2005-10-11 ES ES05857644T patent/ES2320366T3/es active Active
- 2005-10-11 US US11/665,562 patent/US8562799B2/en active Active
- 2005-10-11 PT PT05857644T patent/PT1799876E/pt unknown
- 2005-10-11 SI SI200530640T patent/SI1799876T1/sl unknown
- 2005-10-11 JP JP2007536159A patent/JP5582681B2/ja active Active
- 2005-10-11 AT AT05857644T patent/ATE423225T1/de not_active IP Right Cessation
- 2005-10-11 DK DK05857644T patent/DK1799876T3/da active
- 2005-10-11 PL PL05857644T patent/PL1799876T3/pl unknown
- 2005-10-11 KR KR1020077008375A patent/KR101358820B1/ko active IP Right Grant
- 2005-10-11 WO PCT/EP2005/055143 patent/WO2006097152A1/fr active Application Filing
-
2014
- 2014-06-10 JP JP2014119516A patent/JP6034830B2/ja active Active
Also Published As
Publication number | Publication date |
---|---|
JP6034830B2 (ja) | 2016-11-30 |
US20080105543A1 (en) | 2008-05-08 |
WO2006097152A1 (fr) | 2006-09-21 |
ATE423225T1 (de) | 2009-03-15 |
KR101358820B1 (ko) | 2014-02-10 |
JP2008517150A (ja) | 2008-05-22 |
ES2320366T3 (es) | 2009-05-21 |
SI1799876T1 (sl) | 2009-06-30 |
DE602005012850D1 (de) | 2009-04-02 |
US8562799B2 (en) | 2013-10-22 |
JP2014194086A (ja) | 2014-10-09 |
EP1799876A1 (fr) | 2007-06-27 |
PL1799876T3 (pl) | 2009-07-31 |
PT1799876E (pt) | 2009-03-30 |
KR20070067139A (ko) | 2007-06-27 |
JP5582681B2 (ja) | 2014-09-03 |
DK1799876T3 (da) | 2009-04-20 |
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