EP1675971B1 - Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles - Google Patents

Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles Download PDF

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Publication number
EP1675971B1
EP1675971B1 EP04786991A EP04786991A EP1675971B1 EP 1675971 B1 EP1675971 B1 EP 1675971B1 EP 04786991 A EP04786991 A EP 04786991A EP 04786991 A EP04786991 A EP 04786991A EP 1675971 B1 EP1675971 B1 EP 1675971B1
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EP
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Prior art keywords
plasma
powder
fine granular
nozzle
substrate surface
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Revoked
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EP04786991A
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German (de)
English (en)
French (fr)
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EP1675971A1 (de
Inventor
Michael Dvorak
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Individual
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Priority to PL04786991T priority Critical patent/PL1675971T3/pl
Publication of EP1675971A1 publication Critical patent/EP1675971A1/de
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
    • C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
    • C23C4/134—Plasma spraying

Definitions

  • the invention relates to a method for coating a substrate surface using a plasma jet according to the preamble of claim 1 and to an application of the method according to claim 12.
  • refractory layers to a substrate surface by means of a plasma jet
  • suitable substances e.g. Tungsten or oxide ceramics are supplied in powder form in a plasma free jet.
  • thermal plasmas in which temperatures of up to 20,000 ° C. prevail in the core of the exiting free plasma jet.
  • the plasma stabilization takes place here by high currents (> 200 A) and easy to ionizing gases.
  • Such a plasma causes a high temperature load of the component to be coated. If the coating process takes place under atmosphere, metallic coating materials also partly oxidize. Therefore, the range of use is very narrow.
  • the coating and / or processing of low-melting materials is possible, if at all, only by extremely complex process control and the use of strong cooling.
  • WO 01/32949 describes a method for coating surfaces, in which a precursor material is reacted by means of a plasma and the reaction product is then deposited on the surface to be coated.
  • This precursor material be it liquid and / or solid, is fed separately from the working gas into the plasma jet. As soon as a reaction of the introduced material is to take place, sufficient heating of the recurser material must be achieved.
  • the present invention has for its object to provide a method of the type mentioned, by means of which well adhering layers can be applied to metal, glass, plastic or other substrate surfaces.
  • the powder applied to the substrate surface by the free plasma jet is applied with good adhesion without the substrate temperature rising inadmissibly. Nevertheless, an excellent adhesion of the applied layer is achieved even under air atmosphere by this microscopic plasma process.
  • Metallic layers are also characterized by their extremely low oxygen content.
  • Fig.1 shows a known per se plasma nozzle 1 for generating a free plasma jet 2, which emerges from a lower nozzle opening 3 of the Plasmatrons 1 and is directed to a substrate surface 4.
  • the plasmatron 1 usually has an elongated, tubular housing 5, which tapers conically in the lower region 6 to the already mentioned nozzle opening 3.
  • the metal housing 5 is grounded and forms with the nozzle tip, for example, an outer electrode.
  • a primary imbalance plasma with low electrical power ( ⁇ 5 kW) is indicated within the plasmatron 5 - with box 11 - by high frequency alternating current (> 10 kHz), for example via a magnetron, an RF plasma, a direct high voltage discharge, a Coronabarriereentladung or similar generated.
  • a plasma or working gas is introduced from above through a supply line 7 so fluidly that thereby stabilizes the primary plasma (gas-stabilized plasmatron and, for example, vortex-stabilized plasmatron).
  • plasma or working gas preferably air or steam is used (cost).
  • the air can still be added as needed.
  • Nitrogen, carbon dioxide, methane or noble gases are added.
  • these other gases can also be used in pure form or in mixtures.
  • vapors of other liquids in pure form or in mixtures are to be used as plasma gases.
  • the emerging atmospheric plasma jet 2 is characterized in particular by a low temperature (in the core region ⁇ 500 ° C.) and low geometric expansion (diameter typically ⁇ 5 mm).
  • the free plasma jet 2 is then added as a fluidized, fine-grained powder in exactly metered amount, which is intended to form the intended coating on the substrate surface. There it is due to the interaction with the plasma up or even melted and accelerated in the direction of the surface to be coated, where it ultimately settles.
  • the powder material is delivered from a container 15 by means of a powder conveyor 16 and optionally introduced into the secondary plasma or primary plasma.
  • the low-temperature plasma is characterized in that after formation of an electrically or electromagnetically generated primary imbalance plasma (non-thermal plasma) in a partially closed plasma generator, the directed by suitable measures primary plasma jet by means of an annular nozzle at the transition to the environment (outlet 3) strong is accelerated and consequently after the nozzle forms a secondary plasma at ambient pressure. If the substrate surface is electrically conductive, a further voltage (so-called transferred arc or also direct plasmatron) can also be applied between the nozzle and the substrate.
  • the temperature of the plasma measured with a thermocouple type NiCr / Ni, tip diameter 4 mm, at 10 mm distance from the nozzle outlet is less than 900 ° C in the core of the secondary plasma jet (2) at ambient pressure.
  • a powder conveyor 16 is preferably one of the PCT patent application no. PCT / EP02 / 10709 known device for supplying metered quantities of fine-grained bulk material used, which has at least two alternately fillable and emptying metering chambers, wherein the metering chambers each by connection to a suction or. Vacuum line filled with the powder and emptied by connection to a compressed gas line while the powder is fluidized by the pressurized gas and pneumatically conveyed on.
  • Such a device as a powder conveyor 16 allows a highly precise metering and both a pulsed and a continuous, agglomeration-free supply of the finest powder whose grain size in the nanometer range to micrometer range (1 nm to 100 microns).
  • the possible embodiments of such a powder conveyor for electronically controllable promotion can be found in the aforementioned patent application and are therefore not described here in detail in detail.
  • the fluidized, fine-grained powder is introduced via a line 20 into the plasmatron 1 and there into the secondary plasma and / or introduced via a line 21 directly into the emerging from the nozzle opening 3 plasma jet 2.
  • a further possibility is to supply the powder via a likewise indicated by dashed lines 23 directly through the primary plasma in the flow direction of the plasma jet to the nozzle opening 3.
  • the amount of compressed gas required for the pneumatic delivery of the powder material is preferably 2 to 20% of the plasma gas amount.
  • the plasma gas consumption is about 100 to 5000 nl / h).
  • the powder applied to the substrate surface 4 by the plasma jet 2 is applied with good adhesion without the substrate temperature rising inadmissibly.
  • the temperature of the plasma measured with a thermocouple type NiCr / Ni, tip diameter 3 mm, at a distance of 10 mm from the nozzle outlet is less than 900 ° C in the core of the secondary plasma free jet at ambient pressure.
  • the substrate temperature increase during and after the coating process is well below 100 ° C., preferably below 50 ° C. Nevertheless, excellent adhesion of the coated layer is achieved by this microscopic atmospheric plasma process.
  • An advantage of the method according to the invention is that the substrate surface 4 to be coated requires no special preparation.
  • a surface cleaning can be carried out by the plasma process itself.
  • initially one or more times the plasma jet is directed without powder additive on the surface to be coated before the actual coating takes place.
  • This process is used primarily for tempering the surface and for its micro- or nanostructuring.
  • the inventive method is excellent for example for applying a zinc layer on welding or soldering of galvanized metal parts or sheets, which are used in particular in the auto industry. It is known that the zinc layer of the conventionally galvanized metal parts or sheets is removed during welding or soldering, whereby there is a risk of corrosion at such locations.
  • a plasma jet having a precisely defined width can be directed onto the site to be treated, for example a weld, and a zinc layer having a corresponding width (eg 2 to 3 ⁇ m / s) can be directed through a relative feed substrate / plasma nozzle (eg 0.3 m / s) 8 mm) can be applied exactly.
  • the powder feed is in the range of about 0.5 to 10 g / min.
  • the achievable layer thicknesses are typically 0.1 to 100 microns per overflow.
  • the device can be applied directly after the welding process (in-line process).
  • the method can also be used for medical purposes and serve, for example, for applying biologically active layers to skin substitutes or bone implants, with the aim of faster and improved integration of the implant into the human tissue.
  • the method can also be used for the metered or selective pretreating or metallization of plastics, paper, semiconductors or nonconductors, for example for the production of electrically conductive layers of Zn, Cu or Ag on Si wafers.
  • the method can be used for the decomposition-free application of well-adhering layers of plastics, such as polyamide, or high-performance plastics, such as PEEK with or without addition of inorganic nanometer to some micrometer-sized particles on plastics, wood, paper or metals.
  • plastics such as polyamide
  • high-performance plastics such as PEEK
  • powders with a specifically chemically and / or physically modified surface result. These powders can then serve as an improved or new precursor for other processes (eg, changing the hydrophobic behavior of soot into a hydrophilic behavior).

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  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Coating By Spraying Or Casting (AREA)
  • Photoreceptors In Electrophotography (AREA)
  • Plasma Technology (AREA)
  • Other Surface Treatments For Metallic Materials (AREA)
  • Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
  • Percussion Or Vibration Massage (AREA)
  • Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
EP04786991A 2003-09-26 2004-09-23 Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles Revoked EP1675971B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
PL04786991T PL1675971T3 (pl) 2003-09-26 2004-09-23 Metoda powlekania powierzchni przedmiotów przy użyciu strumienia plazmy

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
CH01639/03A CH696811A5 (de) 2003-09-26 2003-09-26 Verfahren zur Beschichtung einer Substratoberfläche unter Verwendung eines Plasmastrahles.
PCT/EP2004/010675 WO2005031026A1 (de) 2003-09-26 2004-09-23 Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles

Publications (2)

Publication Number Publication Date
EP1675971A1 EP1675971A1 (de) 2006-07-05
EP1675971B1 true EP1675971B1 (de) 2010-05-19

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EP04786991A Revoked EP1675971B1 (de) 2003-09-26 2004-09-23 Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles

Country Status (8)

Country Link
EP (1) EP1675971B1 (pl)
JP (1) JP2007521395A (pl)
AT (1) ATE468418T1 (pl)
CH (1) CH696811A5 (pl)
DE (1) DE502004011185D1 (pl)
ES (1) ES2345986T3 (pl)
PL (1) PL1675971T3 (pl)
WO (1) WO2005031026A1 (pl)

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012065704A1 (de) 2010-11-15 2012-05-24 Michael Dvorak Verfahren zur herstellung von beschichtungen aus feinkörnigen pulvern
WO2012123530A1 (de) 2011-03-16 2012-09-20 Reinhausen Plasma Gmbh Beschichtung sowie verfahren und vorrichtung zum beschichten
DE102011052118A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zum Aufbringen einer Beschichtung auf einem Substrat, Beschichtung und Verwendung von Partikeln
DE102011052120A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verwendung speziell belegter, pulverförmiger Beschichtungsmaterialien und Beschichtungsverfahren unter Einsatz derartiger Beschichtungsmaterialien
WO2013014214A2 (de) 2011-07-25 2013-01-31 Eckart Gmbh Beschichtungsverfahren nutzend spezielle pulverförmige beschichtungsmaterialien und verwendung derartiger beschichtungsmaterialien
WO2013014213A2 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zur substratbeschichtung und verwendung additivversehener, pulverförmiger beschichtungsmaterialien in derartigen verfahren
DE102011052119A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zur Substratbeschichtung und Verwendung additivversehener, pulverförmiger Beschichtungsmaterialien in derartigen Verfahren
DE202012011217U1 (de) 2012-11-21 2014-02-27 Leoni Bordnetz-Systeme Gmbh Vorrichtung zur Aufteilung eines Stoffstromes in einer Oberflächenbeschichtungsanlage sowie eine solche Beschichtungsanlage
WO2015055486A1 (de) 2013-10-14 2015-04-23 Plasma Innovations GmbH Herstellungsverfahren für einen plasmabeschichteten formkörper und bauteil
EP2959992A1 (de) 2014-06-26 2015-12-30 Eckart GmbH Verfahren zur Herstellung eines partikelhaltigen Aerosols

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JP2008534290A (ja) * 2005-03-22 2008-08-28 エルプスロー・アルミニウム・ゲゼルシヤフト・ミツト・ベシユレンクテル・ハフツング ろう付け用表面の部分的又は完全な被覆を持つアルミニウムから成る部材及び被覆を製造する方法
DE102006061435A1 (de) 2006-12-23 2008-06-26 Leoni Ag Verfahren und Vorrichtung zum Aufspritzen insbesondere einer Leiterbahn, elektrisches Bauteil mit einer Leiterbahn sowie Dosiervorrichtung
CA2696081A1 (en) * 2007-08-14 2009-02-19 Universite Libre De Bruxelles Method for depositing nanoparticles on a support
WO2010118896A2 (en) * 2009-04-17 2010-10-21 Bayer International Sa Method and system of feeding a carbon nano tubes (cnts) to a fluid for forming a composite material
WO2010118881A2 (de) * 2009-04-17 2010-10-21 Michael Dvorak Verfahren zum pulverbesschichten bzw. zur herstellung von verbundwerkstoffen, vorzugsweise bei der verarbeitung von kunststoffen oder beim sprühkompaktieren von metallen
FR2947814B1 (fr) * 2009-07-13 2011-10-14 Serigne Dioum Produit de depollution d'un fluide et procede d'obtention
DE102010014552A1 (de) 2010-03-22 2011-09-22 Timo Brummer Verfahren zur Plasmabeschichtung einer Substratoberfläche mit Beschichtungsflüssigkeit
DE102010032187A1 (de) * 2010-07-23 2012-01-26 Reinhausen Plasma Gmbh Verfahren zur Herstellung einer Solarzelle und Solarzelle
DE202010016599U1 (de) * 2010-12-15 2012-03-16 Leoni Bordnetz-Systeme Gmbh Vorrichtung zum Aufspritzen einer Struktur aus leitfähigem Material auf ein Substrat
DE102010056325B3 (de) * 2010-12-27 2012-02-16 Maschinenfabrik Reinhausen Gmbh Verfahren zur Herstellung einer Abschirmung
DE202012011219U1 (de) 2012-11-21 2014-02-24 Leoni Bordnetz-Systeme Gmbh Vorrichtung zur Auflösung von Agglomerationen von Feststoffpartikeln in einem Stoffstrom, insbesondere Gasstrom in einer Oberflächenbeschichtungsanlage
CN103074569A (zh) * 2013-01-29 2013-05-01 电子科技大学 大气辉光放电低温等离子体镀膜装置
DE102013103693A1 (de) 2013-04-12 2014-10-16 Reinhausen Plasma Gmbh Verfahren und Vorrichtung zum Aufbau einer Struktur auf einem Substrat
DE102013010126B4 (de) * 2013-06-18 2015-12-31 Häuser & Co. GmbH Plasmapulverspritzverfahren und Vorrichtung zur Beschichtung von Paneelen für Kesselwände in Verbindung mit einem Laserstrahlgerät
DE202013007063U1 (de) 2013-08-07 2013-09-03 Marco De Paolis Elektrode zur Verwendung in Plasmaspritzdüsen
DE102014219756A1 (de) * 2014-09-30 2016-03-31 Evonik Degussa Gmbh Plasma-Beschichten von thermoelektrischem Aktivmaterial mit Nickel und Zinn
PL3196951T3 (pl) 2016-01-21 2019-07-31 Evonik Degussa Gmbh Racjonalny sposób wytwarzania elementów termoelektrycznych za pomocą metalurgii proszkowej
EP3327165A1 (en) * 2016-11-24 2018-05-30 Valeo Iluminacion Method for creating a conductive track
DE102020212302A1 (de) 2020-09-29 2022-03-31 Contitech Techno-Chemie Gmbh Kunststoffrohrleitung mit integriertem Anschluss

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JP2772971B2 (ja) * 1989-04-18 1998-07-09 松下電器産業株式会社 表面処理鋼板の溶接接合方法
JPH09143667A (ja) * 1995-11-21 1997-06-03 Mitsubishi Heavy Ind Ltd Ｒｅ製高温部材の製造方法
JP2995250B2 (ja) * 1997-07-22 1999-12-27 哲二 平野 酸化チタン粉末の基材へのプラズマ溶射方法及びプラズマ溶射皮膜を有する製品。
DE19807086A1 (de) * 1998-02-20 1999-08-26 Fraunhofer Ges Forschung Verfahren zum Beschichten von Oberflächen eines Substrates, Vorrichtung zur Durchführung des Verfahrens, Schichtsystem sowie beschichtetes Substrat
DE19856307C1 (de) * 1998-12-07 2000-01-13 Bosch Gmbh Robert Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles
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JP2002121024A (ja) * 2000-10-12 2002-04-23 Seiko Epson Corp 酸化チタン膜の製造方法、酸化チタン膜および太陽電池
JP4216453B2 (ja) * 2000-11-15 2009-01-28 株式会社東芝 コーティング部材の製造方法
WO2003029762A1 (de) * 2001-09-29 2003-04-10 Michael Dvorak Verfahren und vorrichtung zur zuführung dosierter mengen eines feinkörnigen schüttguts

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2012065704A1 (de) 2010-11-15 2012-05-24 Michael Dvorak Verfahren zur herstellung von beschichtungen aus feinkörnigen pulvern
WO2012123530A1 (de) 2011-03-16 2012-09-20 Reinhausen Plasma Gmbh Beschichtung sowie verfahren und vorrichtung zum beschichten
WO2013014212A2 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zum aufbringen einer beschichtung auf einem substrat, beschichtung und verwendung von partikeln
DE102011052120A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verwendung speziell belegter, pulverförmiger Beschichtungsmaterialien und Beschichtungsverfahren unter Einsatz derartiger Beschichtungsmaterialien
WO2013014214A2 (de) 2011-07-25 2013-01-31 Eckart Gmbh Beschichtungsverfahren nutzend spezielle pulverförmige beschichtungsmaterialien und verwendung derartiger beschichtungsmaterialien
WO2013014213A2 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zur substratbeschichtung und verwendung additivversehener, pulverförmiger beschichtungsmaterialien in derartigen verfahren
DE102011052118A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zum Aufbringen einer Beschichtung auf einem Substrat, Beschichtung und Verwendung von Partikeln
DE102011052119A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verfahren zur Substratbeschichtung und Verwendung additivversehener, pulverförmiger Beschichtungsmaterialien in derartigen Verfahren
DE102011052121A1 (de) 2011-07-25 2013-01-31 Eckart Gmbh Beschichtungsverfahren nutzend spezielle pulverförmige Beschichtungsmaterialien und Verwendung derartiger Beschichtungsmaterialien
WO2013014211A2 (de) 2011-07-25 2013-01-31 Eckart Gmbh Verwendung speziell belegter, pulverförmiger beschichtungsmaterialien und beschichtungsverfahren unter einsatz derartiger beschichtungsmaterialien
US9580787B2 (en) 2011-07-25 2017-02-28 Eckart Gmbh Coating method using special powdered coating materials and use of such coating materials
DE202012011217U1 (de) 2012-11-21 2014-02-27 Leoni Bordnetz-Systeme Gmbh Vorrichtung zur Aufteilung eines Stoffstromes in einer Oberflächenbeschichtungsanlage sowie eine solche Beschichtungsanlage
WO2015055486A1 (de) 2013-10-14 2015-04-23 Plasma Innovations GmbH Herstellungsverfahren für einen plasmabeschichteten formkörper und bauteil
DE102013111306A1 (de) 2013-10-14 2015-04-30 Ensinger Gmbh Herstellungsverfahren für einen plasmabeschichteten Formkörper und Bauteil
EP2959992A1 (de) 2014-06-26 2015-12-30 Eckart GmbH Verfahren zur Herstellung eines partikelhaltigen Aerosols

Also Published As

Publication number Publication date
DE502004011185D1 (de) 2010-07-01
WO2005031026A1 (de) 2005-04-07
CH696811A5 (de) 2007-12-14
PL1675971T3 (pl) 2010-10-29
ES2345986T3 (es) 2010-10-07
ATE468418T1 (de) 2010-06-15
JP2007521395A (ja) 2007-08-02
EP1675971A1 (de) 2006-07-05

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