EP1675971A1 - Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles - Google Patents
Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahlesInfo
- Publication number
- EP1675971A1 EP1675971A1 EP04786991A EP04786991A EP1675971A1 EP 1675971 A1 EP1675971 A1 EP 1675971A1 EP 04786991 A EP04786991 A EP 04786991A EP 04786991 A EP04786991 A EP 04786991A EP 1675971 A1 EP1675971 A1 EP 1675971A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- plasma
- powder
- fine
- nozzle
- substrate surface
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C4/00—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge
- C23C4/12—Coating by spraying the coating material in the molten state, e.g. by flame, plasma or electric discharge characterised by the method of spraying
- C23C4/134—Plasma spraying
Definitions
- the invention relates to a method for coating a substrate surface using a plasma jet according to the preamble of claim 1 and to an application of the method according to claim 12.
- the present invention has for its object to provide a method of the type mentioned, by means of which well adhering layers can be applied to metal, glass, plastic or other substrate surfaces.
- the inventive method for applying a zinc layer on welding or soldering of galvanized metal parts or sheets ideally directly after the welding or soldering process in which the Plasmatron is tracked behind the welding process and utilizes the process heat of the previous joining process in order to achieve improved bonding of the zinc layer to the component.
- the powder applied to the substrate surface by the free plasma jet is applied with good adhesion without the substrate temperature rising inadmissibly. Nevertheless, an excellent adhesion of the applied layer is achieved even under air atmosphere by this microscopic plasma process.
- Metallic layers are also characterized by their extremely low oxygen content.
- Fig. 1 shows schematically a principle of the inventive method.
- FIG. 1 shows a known plasma nozzle 1 for producing a free plasma jet 2, which emerges from a lower nozzle opening 3 of the plasmatron 1 and is directed onto a substrate surface 4.
- the plasmatron 1 usually has an elongated, tubular housing 5, which tapers conically in the lower region 6 to the already mentioned nozzle opening 3.
- the metal housing 5 is grounded and forms with the nozzle tip, for example, an outer electrode.
- a primary imbalance plasma with low electrical power ( ⁇ 5 kW) is indicated within the plasmatron 5 - with box 11 - by high-frequency alternating current (> 10 kHz), for example via a magnetron, an RF plasma, a direct high-voltage discharge, a Coronabarriereentladung or similar generated.
- a plasma or working gas is introduced from above through a supply line 7 so fluidly that thereby stabilizes the primary plasma (gas-stabilized plasmatron and, for example, vortex-stabilized plasmatron).
- plasma or working gas preferably air or steam is used (cost).
- the air can still be added as needed.
- Nitrogen, carbon dioxide, methane or noble gases are added.
- these other gases can also be used in pure form or in mixtures.
- vapors of other liquids in pure form or in mixtures are to be used as plasma gases.
- the emerging atmospheric plasma jet 2 is characterized in particular by a low temperature (in the core region ⁇ 500 ° C.) and low geometric expansion (diameter typically ⁇ 5 mm).
- the free plasma jet 2 is then added as a fluidized, fine-grained powder in exactly metered amount, which is intended to form the intended coating on the substrate surface. There it is due to the interaction with the plasma up or even melted and accelerated in the direction of the surface to be coated, where it ultimately settles.
- the powder material is delivered from a container 15 by means of a powder conveyor 16 and optionally introduced into the secondary plasma or primary plasma.
- the low-temperature plasma is characterized in that after formation of an electrically or electromagnetically generated primary imbalance plasma (non-thermal plasma) in a partially closed plasma generator, the directed by suitable measures primary plasma jet by means of an annular nozzle at the transition to the environment (outlet 3) strong is accelerated and follows after the nozzle forms a secondary plasma at ambient pressure. If the substrate surface is electrically conductive, a further voltage (so-called transferred arc or also direct plasmatron) can also be applied between the nozzle and the substrate.
- the temperature of the plasma measured with a thermocouple type NiCr / Ni, tip diameter 4 mm, at 10 mm distance from the nozzle outlet is less than 900 ° C in the core of the secondary plasma jet (2) at ambient pressure.
- a powder conveyor 16 is preferably a device known from PCT patent application no. PCT / EP02 / 10709 for supplying metered quantities of a fine-grained bulk material, which has at least two metering chambers which can be filled and emptied alternately, the metering chambers each being connected to a suction chamber. or vacuum line filled with the powder and emptied by connection to a compressed gas line while the powder is fluidized by the pressurized gas and pneumatically conveyed on.
- the switching on and off of the suction connection as well as the switching on and off of the compressed gas connection takes place via pneumatically and / or hydraulically controlled valves.
- a device as a powder conveyor 16 allows a highly precise metering and both a pulsed and a continuous, agglomeration-free supply of the finest powder whose grain size in the nanometer range to micrometer range (1 nm to 100 microns).
- the possible embodiments of such a powder conveyor for electronically controllable promotion can be found in the aforementioned patent application and are therefore not described here in detail in detail.
- the fluidized, fine-grained powder is introduced via a line 20 into the plasmatron 1 and there into the secondary plasma and / or introduced via a line 21 directly into the emerging from the nozzle opening 3 plasma jet 2.
- a powder feed in the area 6 of the plasma rim 1 tapering towards the nozzle opening 3 (or into the nozzle opening 3 itself) via a line 22 indicated by dashed lines in FIG. 1 is also advantageous. Another possibility is to dash the powder over a likewise dashed line indicated line 23 directly through the primary plasma in the flow direction of the plasma jet to the nozzle opening 3 supply.
- the amount of compressed gas required for the pneumatic delivery of the powder material is preferably 2 to 20% of the plasma gas amount.
- the plasma gas consumption is about 100 to 5000 ⁇ l /).
- the powder applied to the substrate surface 4 by the plasma jet 2 is applied with good adhesion without the substrate temperature rising inadmissibly.
- the temperature of the plasma measured with a thermocouple type NiCr / Ni, tip diameter 3 mm, at a distance of 10 mm from the nozzle outlet is less than 900 ° C in the core of the secondary plasma free jet at ambient pressure.
- the substrate temperature increase during and after the coating process is well below 100 ° C., preferably below 50 ° C. Nevertheless, excellent adhesion of the coated layer is achieved by this microscopic atmospheric plasma process.
- An advantage of the method according to the invention is that the substrate surface 4 to be coated requires no special preparation.
- a surface cleaning can be carried out by the plasma process itself.
- initially one or more times the plasma jet is directed without powder additive on the surface to be coated before the actual coating takes place. This process is used primarily for tempering the surface and for its micro- or nanostructuring.
- the inventive method is excellent for example for applying a zinc layer on welding or soldering of galvanized metal parts or sheets, which are used in particular in the auto industry. It is known that the zinc layer of the conventionally galvanized metal parts or sheets is removed during welding or soldering, whereby there is a risk of corrosion at such locations.
- a plasma jet having a precisely defined width can be directed onto the site to be treated, for example a weld, and a zinc layer with a corresponding width (for example 2 to 3) can be directed through a relative feed substrate / plasma nozzle (eg 0.3 m / s) 8 mm) can be applied exactly.
- a relative feed substrate / plasma nozzle eg 0.3 m / s 8 mm
- the powder feed is in the range of about 0.5 to 10 g / min.
- the achievable layer thicknesses are typically 0.1 to 100 microns per overflow.
- the device can be applied directly after the welding process (in-line process).
- the method can also be used for medical purposes and serve, for example, for applying biologically active layers to skin substitutes or bone implants, with the aim of faster and improved integration of the implant into the human tissue.
- the method can also be used for the metered or selective pretreating or metallization of plastics, paper, semiconductors or nonconductors, for example for the production of electrically conductive layers of Zn, Cu or Ag on Si wafers.
- the method can be used for the decomposition-free application of well-adhering layers of plastics, such as polyamide, or high-performance plastics, such as PEEK with or without addition of inorganic nanometer to some micrometer-sized particles on plastics, wood, paper or metals.
- plastics such as polyamide
- high-performance plastics such as PEEK
- powders with a specifically chemically and / or physically modified surface result. These powders can then serve as an improved or new precursor for other processes (eg, changing the hydrophobic behavior of soot into a hydrophilic behavior).
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Physics & Mathematics (AREA)
- Plasma & Fusion (AREA)
- Organic Chemistry (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
- Coating By Spraying Or Casting (AREA)
- Percussion Or Vibration Massage (AREA)
- Pharmaceuticals Containing Other Organic And Inorganic Compounds (AREA)
- Acyclic And Carbocyclic Compounds In Medicinal Compositions (AREA)
- Photoreceptors In Electrophotography (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
- Plasma Technology (AREA)
Description
Claims
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
PL04786991T PL1675971T3 (pl) | 2003-09-26 | 2004-09-23 | Metoda powlekania powierzchni przedmiotów przy użyciu strumienia plazmy |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CH01639/03A CH696811A5 (de) | 2003-09-26 | 2003-09-26 | Verfahren zur Beschichtung einer Substratoberfläche unter Verwendung eines Plasmastrahles. |
PCT/EP2004/010675 WO2005031026A1 (de) | 2003-09-26 | 2004-09-23 | Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1675971A1 true EP1675971A1 (de) | 2006-07-05 |
EP1675971B1 EP1675971B1 (de) | 2010-05-19 |
Family
ID=34383946
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04786991A Revoked EP1675971B1 (de) | 2003-09-26 | 2004-09-23 | Verfahren zur beschichtung einer substratoberfläche unter verwendung eines plasmastrahles |
Country Status (8)
Country | Link |
---|---|
EP (1) | EP1675971B1 (de) |
JP (1) | JP2007521395A (de) |
AT (1) | ATE468418T1 (de) |
CH (1) | CH696811A5 (de) |
DE (1) | DE502004011185D1 (de) |
ES (1) | ES2345986T3 (de) |
PL (1) | PL1675971T3 (de) |
WO (1) | WO2005031026A1 (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202013007063U1 (de) | 2013-08-07 | 2013-09-03 | Marco De Paolis | Elektrode zur Verwendung in Plasmaspritzdüsen |
DE202012011219U1 (de) | 2012-11-21 | 2014-02-24 | Leoni Bordnetz-Systeme Gmbh | Vorrichtung zur Auflösung von Agglomerationen von Feststoffpartikeln in einem Stoffstrom, insbesondere Gasstrom in einer Oberflächenbeschichtungsanlage |
Families Citing this family (27)
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DK1871921T3 (da) * | 2005-03-22 | 2021-07-19 | Erbsloeh Aluminium Gmbh | Fremgangsmåde til delvis eller fuldstændig coating af overfladerne af komponenter af aluminiummateriale |
DE102006061435A1 (de) | 2006-12-23 | 2008-06-26 | Leoni Ag | Verfahren und Vorrichtung zum Aufspritzen insbesondere einer Leiterbahn, elektrisches Bauteil mit einer Leiterbahn sowie Dosiervorrichtung |
JP2010535624A (ja) * | 2007-08-14 | 2010-11-25 | ユニヴェルシテ リブル ドゥ ブリュッセル | 支持体上にナノ粒子を付着するための方法 |
KR20120030338A (ko) * | 2009-04-17 | 2012-03-28 | 바이엘 인터네셔날 에스에이 | 복합 재료를 형성하기 위해 유체에 탄소 나노 튜브 (cnt)를 공급하는 방법 및 시스템 |
WO2010118881A2 (de) * | 2009-04-17 | 2010-10-21 | Michael Dvorak | Verfahren zum pulverbesschichten bzw. zur herstellung von verbundwerkstoffen, vorzugsweise bei der verarbeitung von kunststoffen oder beim sprühkompaktieren von metallen |
FR2947814B1 (fr) * | 2009-07-13 | 2011-10-14 | Serigne Dioum | Produit de depollution d'un fluide et procede d'obtention |
DE102010014552A1 (de) | 2010-03-22 | 2011-09-22 | Timo Brummer | Verfahren zur Plasmabeschichtung einer Substratoberfläche mit Beschichtungsflüssigkeit |
DE102010032187A1 (de) * | 2010-07-23 | 2012-01-26 | Reinhausen Plasma Gmbh | Verfahren zur Herstellung einer Solarzelle und Solarzelle |
CH704074B1 (de) | 2010-11-15 | 2015-12-31 | Michael Dr Dvorak | Verfahren zur Herstellung von Beschichtungen aus feinkörnigen Pulvern. |
DE202010016599U1 (de) * | 2010-12-15 | 2012-03-16 | Leoni Bordnetz-Systeme Gmbh | Vorrichtung zum Aufspritzen einer Struktur aus leitfähigem Material auf ein Substrat |
DE102010056325B3 (de) * | 2010-12-27 | 2012-02-16 | Maschinenfabrik Reinhausen Gmbh | Verfahren zur Herstellung einer Abschirmung |
EP2686460A1 (de) | 2011-03-16 | 2014-01-22 | Reinhausen Plasma GmbH | Beschichtung sowie verfahren und vorrichtung zum beschichten |
DE102011052118A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verfahren zum Aufbringen einer Beschichtung auf einem Substrat, Beschichtung und Verwendung von Partikeln |
DE102011052121A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Beschichtungsverfahren nutzend spezielle pulverförmige Beschichtungsmaterialien und Verwendung derartiger Beschichtungsmaterialien |
JP2014527575A (ja) | 2011-07-25 | 2014-10-16 | エッカルト ゲゼルシャフト ミット ベシュレンクテル ハフツングEckart GmbH | 基材コーティングのための方法、およびそのような方法における添加剤含有粉末化コーティング物質の使用 |
DE102011052119A1 (de) | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verfahren zur Substratbeschichtung und Verwendung additivversehener, pulverförmiger Beschichtungsmaterialien in derartigen Verfahren |
DE102011052120A1 (de) * | 2011-07-25 | 2013-01-31 | Eckart Gmbh | Verwendung speziell belegter, pulverförmiger Beschichtungsmaterialien und Beschichtungsverfahren unter Einsatz derartiger Beschichtungsmaterialien |
DE202012011217U1 (de) | 2012-11-21 | 2014-02-27 | Leoni Bordnetz-Systeme Gmbh | Vorrichtung zur Aufteilung eines Stoffstromes in einer Oberflächenbeschichtungsanlage sowie eine solche Beschichtungsanlage |
CN103074569A (zh) * | 2013-01-29 | 2013-05-01 | 电子科技大学 | 大气辉光放电低温等离子体镀膜装置 |
DE102013103693A1 (de) * | 2013-04-12 | 2014-10-16 | Reinhausen Plasma Gmbh | Verfahren und Vorrichtung zum Aufbau einer Struktur auf einem Substrat |
DE102013010126B4 (de) * | 2013-06-18 | 2015-12-31 | Häuser & Co. GmbH | Plasmapulverspritzverfahren und Vorrichtung zur Beschichtung von Paneelen für Kesselwände in Verbindung mit einem Laserstrahlgerät |
DE102013111306B4 (de) | 2013-10-14 | 2016-04-14 | Ensinger Gmbh | Herstellungsverfahren für einen plasmabeschichteten Formkörper und Bauteil |
EP2959992A1 (de) | 2014-06-26 | 2015-12-30 | Eckart GmbH | Verfahren zur Herstellung eines partikelhaltigen Aerosols |
DE102014219756A1 (de) * | 2014-09-30 | 2016-03-31 | Evonik Degussa Gmbh | Plasma-Beschichten von thermoelektrischem Aktivmaterial mit Nickel und Zinn |
PL3196951T3 (pl) | 2016-01-21 | 2019-07-31 | Evonik Degussa Gmbh | Racjonalny sposób wytwarzania elementów termoelektrycznych za pomocą metalurgii proszkowej |
EP3327165A1 (de) * | 2016-11-24 | 2018-05-30 | Valeo Iluminacion | Verfahren zur erstellung einer leiterbahn |
DE102020212302A1 (de) | 2020-09-29 | 2022-03-31 | Contitech Techno-Chemie Gmbh | Kunststoffrohrleitung mit integriertem Anschluss |
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JPS6452053A (en) * | 1987-08-19 | 1989-02-28 | Oki Electric Ind Co Ltd | Production of superconducting ceramic body |
JP2772971B2 (ja) * | 1989-04-18 | 1998-07-09 | 松下電器産業株式会社 | 表面処理鋼板の溶接接合方法 |
JPH09143667A (ja) * | 1995-11-21 | 1997-06-03 | Mitsubishi Heavy Ind Ltd | Re製高温部材の製造方法 |
JP2995250B2 (ja) * | 1997-07-22 | 1999-12-27 | 哲二 平野 | 酸化チタン粉末の基材へのプラズマ溶射方法及びプラズマ溶射皮膜を有する製品。 |
DE19807086A1 (de) * | 1998-02-20 | 1999-08-26 | Fraunhofer Ges Forschung | Verfahren zum Beschichten von Oberflächen eines Substrates, Vorrichtung zur Durchführung des Verfahrens, Schichtsystem sowie beschichtetes Substrat |
DE19856307C1 (de) * | 1998-12-07 | 2000-01-13 | Bosch Gmbh Robert | Vorrichtung zur Erzeugung eines freien kalten Plasmastrahles |
DE29919142U1 (de) * | 1999-10-30 | 2001-03-08 | Agrodyn Hochspannungstechnik G | Plasmadüse |
JP2002121024A (ja) * | 2000-10-12 | 2002-04-23 | Seiko Epson Corp | 酸化チタン膜の製造方法、酸化チタン膜および太陽電池 |
JP4216453B2 (ja) * | 2000-11-15 | 2009-01-28 | 株式会社東芝 | コーティング部材の製造方法 |
WO2003029762A1 (de) * | 2001-09-29 | 2003-04-10 | Michael Dvorak | Verfahren und vorrichtung zur zuführung dosierter mengen eines feinkörnigen schüttguts |
-
2003
- 2003-09-26 CH CH01639/03A patent/CH696811A5/de not_active IP Right Cessation
-
2004
- 2004-09-23 JP JP2006527345A patent/JP2007521395A/ja active Pending
- 2004-09-23 WO PCT/EP2004/010675 patent/WO2005031026A1/de active Application Filing
- 2004-09-23 EP EP04786991A patent/EP1675971B1/de not_active Revoked
- 2004-09-23 ES ES04786991T patent/ES2345986T3/es active Active
- 2004-09-23 PL PL04786991T patent/PL1675971T3/pl unknown
- 2004-09-23 DE DE502004011185T patent/DE502004011185D1/de active Active
- 2004-09-23 AT AT04786991T patent/ATE468418T1/de active
Non-Patent Citations (1)
Title |
---|
See references of WO2005031026A1 * |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE202012011219U1 (de) | 2012-11-21 | 2014-02-24 | Leoni Bordnetz-Systeme Gmbh | Vorrichtung zur Auflösung von Agglomerationen von Feststoffpartikeln in einem Stoffstrom, insbesondere Gasstrom in einer Oberflächenbeschichtungsanlage |
DE202013007063U1 (de) | 2013-08-07 | 2013-09-03 | Marco De Paolis | Elektrode zur Verwendung in Plasmaspritzdüsen |
Also Published As
Publication number | Publication date |
---|---|
ES2345986T3 (es) | 2010-10-07 |
WO2005031026A1 (de) | 2005-04-07 |
ATE468418T1 (de) | 2010-06-15 |
JP2007521395A (ja) | 2007-08-02 |
CH696811A5 (de) | 2007-12-14 |
PL1675971T3 (pl) | 2010-10-29 |
EP1675971B1 (de) | 2010-05-19 |
DE502004011185D1 (de) | 2010-07-01 |
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