EP1597614B1 - Hochpräziser spiegel und verfahren zu seiner herstellung - Google Patents
Hochpräziser spiegel und verfahren zu seiner herstellung Download PDFInfo
- Publication number
- EP1597614B1 EP1597614B1 EP04714156A EP04714156A EP1597614B1 EP 1597614 B1 EP1597614 B1 EP 1597614B1 EP 04714156 A EP04714156 A EP 04714156A EP 04714156 A EP04714156 A EP 04714156A EP 1597614 B1 EP1597614 B1 EP 1597614B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- mirror
- finish
- substrate
- thin
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 238000004519 manufacturing process Methods 0.000 title abstract description 10
- 239000000758 substrate Substances 0.000 claims abstract description 42
- 238000000034 method Methods 0.000 claims abstract description 32
- 239000010409 thin film Substances 0.000 claims abstract description 22
- 229910052710 silicon Inorganic materials 0.000 claims description 12
- 239000010703 silicon Substances 0.000 claims description 12
- 229910018487 Ni—Cr Inorganic materials 0.000 claims description 9
- VNNRSPGTAMTISX-UHFFFAOYSA-N chromium nickel Chemical compound [Cr].[Ni] VNNRSPGTAMTISX-UHFFFAOYSA-N 0.000 claims description 9
- 238000005452 bending Methods 0.000 claims description 5
- 238000007516 diamond turning Methods 0.000 claims description 3
- 230000006903 response to temperature Effects 0.000 claims description 2
- 238000005498 polishing Methods 0.000 abstract description 13
- 239000010410 layer Substances 0.000 description 88
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 15
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 15
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 10
- 239000000463 material Substances 0.000 description 10
- 230000005855 radiation Effects 0.000 description 10
- 229910052759 nickel Inorganic materials 0.000 description 9
- 238000007740 vapor deposition Methods 0.000 description 8
- 229910000755 6061-T6 aluminium alloy Inorganic materials 0.000 description 7
- 229910003460 diamond Inorganic materials 0.000 description 7
- 239000010432 diamond Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- 230000008901 benefit Effects 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 229910045601 alloy Inorganic materials 0.000 description 5
- 239000000956 alloy Substances 0.000 description 5
- 229910052751 metal Inorganic materials 0.000 description 5
- 239000002184 metal Substances 0.000 description 5
- 229910000838 Al alloy Inorganic materials 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- HCHKCACWOHOZIP-UHFFFAOYSA-N Zinc Chemical compound [Zn] HCHKCACWOHOZIP-UHFFFAOYSA-N 0.000 description 4
- 229910021417 amorphous silicon Inorganic materials 0.000 description 4
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical group [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 4
- 229910052737 gold Inorganic materials 0.000 description 4
- 239000010931 gold Substances 0.000 description 4
- 229910052725 zinc Inorganic materials 0.000 description 4
- 239000011701 zinc Substances 0.000 description 4
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 3
- 229910052804 chromium Inorganic materials 0.000 description 3
- 239000011651 chromium Substances 0.000 description 3
- 239000011247 coating layer Substances 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- 230000007547 defect Effects 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 230000003287 optical effect Effects 0.000 description 3
- 238000007747 plating Methods 0.000 description 3
- 238000007514 turning Methods 0.000 description 3
- 238000005520 cutting process Methods 0.000 description 2
- 230000000694 effects Effects 0.000 description 2
- 238000003754 machining Methods 0.000 description 2
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 229910052709 silver Inorganic materials 0.000 description 2
- 239000004332 silver Substances 0.000 description 2
- 239000007921 spray Substances 0.000 description 2
- 229910001928 zirconium oxide Inorganic materials 0.000 description 2
- PRPINYUDVPFIRX-UHFFFAOYSA-N 1-naphthaleneacetic acid Chemical compound C1=CC=C2C(CC(=O)O)=CC=CC2=C1 PRPINYUDVPFIRX-UHFFFAOYSA-N 0.000 description 1
- FYYHWMGAXLPEAU-UHFFFAOYSA-N Magnesium Chemical compound [Mg] FYYHWMGAXLPEAU-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- 239000000853 adhesive Substances 0.000 description 1
- 230000001070 adhesive effect Effects 0.000 description 1
- 230000004075 alteration Effects 0.000 description 1
- 230000015572 biosynthetic process Effects 0.000 description 1
- 238000000151 deposition Methods 0.000 description 1
- 230000008021 deposition Effects 0.000 description 1
- 238000005315 distribution function Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 229910052732 germanium Inorganic materials 0.000 description 1
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
- 230000006872 improvement Effects 0.000 description 1
- 239000012535 impurity Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 229910052749 magnesium Inorganic materials 0.000 description 1
- 239000011777 magnesium Substances 0.000 description 1
- 150000002815 nickel Chemical class 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- BPUBBGLMJRNUCC-UHFFFAOYSA-N oxygen(2-);tantalum(5+) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Ta+5].[Ta+5] BPUBBGLMJRNUCC-UHFFFAOYSA-N 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 239000011241 protective layer Substances 0.000 description 1
- 229910052594 sapphire Inorganic materials 0.000 description 1
- 239000010980 sapphire Substances 0.000 description 1
- 235000012239 silicon dioxide Nutrition 0.000 description 1
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical compound [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 description 1
- 238000004544 sputter deposition Methods 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 238000000233 ultraviolet lithography Methods 0.000 description 1
Images
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/08—Mirrors
- G02B5/0808—Mirrors having a single reflecting layer
Claims (9)
- Spiegel (10) mit:einem Substrat (12), das eine Präzisionsoberfläche (13) aufweist, die mittels Einpunkt-Diamantdrehtechnik gebildet ist;einer Dünnfilm-Abschlussschicht (16), die über der Präzisionsoberfläche (13) des Substrats (12) abgeschieden ist und an einer dem Substrat (12) gegenüberliegenden Seite eine Oberfläche (17) aufweist, die poliert ist, um eine Güte der Oberfläche (17) zu verbessern; undeiner reflektierenden Schicht (21), die äußerlich der Oberfläche (17) der Abschlussschicht (16) bereitgestellt ist.
- Spiegel (10) nach Anspruch 1, wobei die Abschlussschicht (16) ausreichend dünn ausgebildet ist, so dass der Spiegel (10) als Reaktion auf Temperaturänderungen im Wesentlichen frei von Biegung durch Unterschiede der thermischen Ausdehnungskoeffizienten des Substrates (12) und der Abschlussschicht (16) ist.
- Spiegel (10) nach Anspruch 1, wobei die Abschlussschicht (16), nachdem sie poliert worden ist, eine Dicke von ungefähr 4500 Ångström aufweist.
- Spiegel (10) nach Anspruch 1, wobei die Abschlussschicht (16) Silizium ist.
- Spiegel (10) nach Anspruch 1, wobei die Abschlussschicht (16) Nickel-Chrom ist.
- Spiegel (10) nach Anspruch 1 oder 5, ferner mit einer Dünnfilm-Zwischenschicht (76), die zwischen dem Substrat (12) und der Abschlussschicht (16) angeordnet ist.
- Spiegel (10) nach Anspruch 6, wobei die Zwischenschicht (76) Silizium ist.
- Spiegel (10) nach Anspruch 1, wobei die polierte Oberfläche (17) der Abschlussschicht (16) eine Oberflächengüte von ungefähr 10 bis 25 Ångström quadratische Rauheit (RMS) aufweist.
- Spiegel (10) nach Anspruch 1, wobei eine reflektierende Oberfläche der reflektierenden Schicht (21) eine Oberflächengüte von ungefähr 10 bis 25 Ångström quadratische Rauheit (RMS) aufweist.
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US373448 | 2003-02-24 | ||
US10/373,448 US6921177B2 (en) | 2003-02-24 | 2003-02-24 | High precision mirror, and a method of making it |
PCT/US2004/005494 WO2004077114A1 (en) | 2003-02-24 | 2004-02-24 | High precision mirror, and a method of making it |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1597614A1 EP1597614A1 (de) | 2005-11-23 |
EP1597614B1 true EP1597614B1 (de) | 2010-08-04 |
Family
ID=32868709
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP04714156A Expired - Lifetime EP1597614B1 (de) | 2003-02-24 | 2004-02-24 | Hochpräziser spiegel und verfahren zu seiner herstellung |
Country Status (11)
Country | Link |
---|---|
US (1) | US6921177B2 (de) |
EP (1) | EP1597614B1 (de) |
JP (1) | JP4664277B2 (de) |
KR (1) | KR100755582B1 (de) |
AT (1) | ATE476676T1 (de) |
AU (1) | AU2004214919B2 (de) |
CA (1) | CA2500309C (de) |
DE (1) | DE602004028443D1 (de) |
IL (1) | IL167673A (de) |
TW (1) | TWI288247B (de) |
WO (1) | WO2004077114A1 (de) |
Families Citing this family (26)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20070121104A1 (en) * | 2003-04-18 | 2007-05-31 | Hendrix James L | Techniques for reducing optical noise in metrology systems |
US8062096B2 (en) * | 2005-06-30 | 2011-11-22 | Cabot Microelectronics Corporation | Use of CMP for aluminum mirror and solar cell fabrication |
US7641350B2 (en) * | 2005-11-28 | 2010-01-05 | Jds Uniphase Corporation | Front surface mirror for providing white color uniformity for polarized systems with a large range of incidence angles |
DE102006011973B4 (de) * | 2006-03-15 | 2011-04-07 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Spiegel mit einer Silberschicht |
WO2009024181A1 (en) * | 2007-08-20 | 2009-02-26 | Optosic Ag | Method of manufacturing and processing silicon carbide scanning mirrors |
DE102009039400A1 (de) * | 2009-08-31 | 2011-03-03 | Carl Zeiss Laser Optics Gmbh | Reflektives optisches Element zur Verwendung in einem EUV-System |
DE102009040785A1 (de) * | 2009-09-09 | 2011-03-10 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Substrat aus einer Aluminium-Silizium-Legierung oder kristallinem Silizium, Metallspiegel, Verfahren zu dessen Herstellung sowie dessen Verwendung |
US8398251B2 (en) * | 2009-11-04 | 2013-03-19 | Raytheon Canada Limited | Method and apparatus for fabricating a precision optical surface |
DE102010039927A1 (de) * | 2010-08-30 | 2012-03-01 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
DE102011002953A1 (de) * | 2011-01-21 | 2012-07-26 | Carl Zeiss Smt Gmbh | Substrat für Spiegel für die EUV-Lithographie |
US9575223B2 (en) * | 2011-05-13 | 2017-02-21 | Raytheon Company | Magnesium mirrors and methods of manufacture thereof |
US9488760B2 (en) | 2013-02-28 | 2016-11-08 | Corning Incorporated | Enhanced, durable silver coating stacks for highly reflective mirrors |
US9971073B2 (en) | 2014-04-14 | 2018-05-15 | Corning Incorporated | Enhanced performance metallic based optical mirror substrates |
US20160097885A1 (en) | 2014-10-03 | 2016-04-07 | Corning Incorporated | Mirror substrates with highly finishable corrosion-resistant coating |
KR20160061548A (ko) * | 2014-11-21 | 2016-06-01 | 삼성디스플레이 주식회사 | 어레이 테스트 모듈레이터 및 이를 포함하는 박막트랜지스터 기판 검사 장치 |
DE102015218702A1 (de) * | 2015-09-29 | 2017-03-30 | Dr. Johannes Heidenhain Gmbh | Optisches Schichtsystem |
US20170269265A1 (en) * | 2016-03-18 | 2017-09-21 | Corning Incorporated | Graphite substrates for reflective optics |
US10816702B2 (en) * | 2016-03-18 | 2020-10-27 | Corning Incorporated | Reflective optical element with high stiffness substrate |
CN108468029B (zh) * | 2018-02-12 | 2020-01-21 | 中国科学院国家天文台南京天文光学技术研究所 | 用于碳化硅光学镜面改性与面形提升的磁控溅射扫描方法 |
WO2019215243A1 (de) | 2018-05-09 | 2019-11-14 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e. V. | Spiegelträger für einen optischen spiegel aus einem verbundwerkstoff und verfahren zu dessen herstellung |
US20200009701A1 (en) * | 2018-07-09 | 2020-01-09 | Arizona Board Of Regents On Behalf Of The University Of Arizona | Polishing protocol for zirconium diboride based ceramics to be implemented into optical systems |
US20200132894A1 (en) * | 2018-10-31 | 2020-04-30 | Corning Incorporated | Support for reflective optical element |
US11385383B2 (en) | 2018-11-13 | 2022-07-12 | Raytheon Company | Coating stress mitigation through front surface coating manipulation on ultra-high reflectors or other optical devices |
US11619764B2 (en) | 2020-03-27 | 2023-04-04 | Raytheon Company | High-performance optical surface |
US11698477B2 (en) * | 2020-07-15 | 2023-07-11 | Raytheon Company | Visible quality additive manufactured aluminum mirror finishing |
US20220019001A1 (en) * | 2020-07-15 | 2022-01-20 | Raytheon Company | Visible quality mirror finishing |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3947302A (en) * | 1973-08-29 | 1976-03-30 | Mcdonnell Douglas Corporation | Method of producing a spectral line rejection mirror |
US4865451A (en) * | 1986-12-22 | 1989-09-12 | Ahonen Robert G | Silicon substrate mirror assembly for lasers |
US4814232A (en) * | 1987-03-25 | 1989-03-21 | United Technologies Corporation | Method for depositing laser mirror coatings |
ZA912915B (en) | 1990-05-10 | 1992-04-29 | Boc Group Inc | Novel monolithic front surface mirror |
JPH07191207A (ja) * | 1993-11-17 | 1995-07-28 | Asahi Optical Co Ltd | 反射型複合光学素子 |
JPH07168008A (ja) * | 1993-12-13 | 1995-07-04 | Nikon Corp | Ag表面鏡 |
JPH0868897A (ja) * | 1994-08-29 | 1996-03-12 | Nikon Corp | 反射鏡およびその製造方法 |
ES2176655T3 (es) * | 1996-08-15 | 2002-12-01 | Alcan Tech & Man Ag | Reflector con superficie resistente. |
JPH10339799A (ja) * | 1997-06-06 | 1998-12-22 | Nikon Corp | 反射鏡及びその製造方法 |
US5912777A (en) * | 1997-06-26 | 1999-06-15 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | High temperature solar reflector, its preparation and use |
US5933278A (en) * | 1997-06-30 | 1999-08-03 | Polaroid Corporation | Monolithic multi-faceted mirror for combining multiple beams from different light sources by reflection |
JP2000019312A (ja) * | 1998-07-01 | 2000-01-21 | Konica Corp | 反射ミラー |
JP2000241612A (ja) * | 1999-02-23 | 2000-09-08 | Nikon Corp | 反射鏡 |
US6078425A (en) * | 1999-06-09 | 2000-06-20 | The Regents Of The University Of California | Durable silver coating for mirrors |
JP4482971B2 (ja) * | 1999-09-08 | 2010-06-16 | 株式会社ニコン | 反射鏡 |
US6587263B1 (en) * | 2000-03-31 | 2003-07-01 | Lockheed Martin Corporation | Optical solar reflectors |
CA2313438C (en) * | 2000-07-06 | 2003-03-11 | B-Con Engineering Inc. | High quality optical surface and method of producing same |
DE10125554C2 (de) * | 2001-05-23 | 2003-06-18 | Astrium Gmbh | Ultraleichter und ultrasteifer vollkeramischer Reflektor und Verfahren zur Herstellung sowie Verwendung eines solchen Reflektors |
JP2002357709A (ja) * | 2001-06-01 | 2002-12-13 | Canon Inc | 高反射性銀鏡及び反射型光学部品 |
US6598985B2 (en) * | 2001-06-11 | 2003-07-29 | Nanogear | Optical mirror system with multi-axis rotational control |
US6994444B2 (en) * | 2002-06-14 | 2006-02-07 | Asml Holding N.V. | Method and apparatus for managing actinic intensity transients in a lithography mirror |
-
2003
- 2003-02-24 US US10/373,448 patent/US6921177B2/en not_active Expired - Lifetime
-
2004
- 2004-02-24 KR KR1020057015523A patent/KR100755582B1/ko active IP Right Grant
- 2004-02-24 DE DE602004028443T patent/DE602004028443D1/de not_active Expired - Lifetime
- 2004-02-24 AU AU2004214919A patent/AU2004214919B2/en not_active Ceased
- 2004-02-24 TW TW093104709A patent/TWI288247B/zh not_active IP Right Cessation
- 2004-02-24 AT AT04714156T patent/ATE476676T1/de not_active IP Right Cessation
- 2004-02-24 JP JP2006503844A patent/JP4664277B2/ja not_active Expired - Lifetime
- 2004-02-24 WO PCT/US2004/005494 patent/WO2004077114A1/en active Application Filing
- 2004-02-24 EP EP04714156A patent/EP1597614B1/de not_active Expired - Lifetime
- 2004-02-24 CA CA2500309A patent/CA2500309C/en not_active Expired - Fee Related
-
2005
- 2005-03-24 IL IL167673A patent/IL167673A/en active IP Right Grant
Also Published As
Publication number | Publication date |
---|---|
CA2500309C (en) | 2010-08-24 |
US6921177B2 (en) | 2005-07-26 |
ATE476676T1 (de) | 2010-08-15 |
TW200428022A (en) | 2004-12-16 |
IL167673A (en) | 2009-12-24 |
EP1597614A1 (de) | 2005-11-23 |
AU2004214919B2 (en) | 2006-12-21 |
AU2004214919A1 (en) | 2004-09-10 |
CA2500309A1 (en) | 2004-09-10 |
DE602004028443D1 (de) | 2010-09-16 |
JP4664277B2 (ja) | 2011-04-06 |
KR20050110638A (ko) | 2005-11-23 |
JP2006518883A (ja) | 2006-08-17 |
WO2004077114A1 (en) | 2004-09-10 |
US20040165296A1 (en) | 2004-08-26 |
TWI288247B (en) | 2007-10-11 |
KR100755582B1 (ko) | 2007-09-06 |
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