EP1456432A1 - Ionic plasma deposition apparatus - Google Patents

Ionic plasma deposition apparatus

Info

Publication number
EP1456432A1
EP1456432A1 EP02803641A EP02803641A EP1456432A1 EP 1456432 A1 EP1456432 A1 EP 1456432A1 EP 02803641 A EP02803641 A EP 02803641A EP 02803641 A EP02803641 A EP 02803641A EP 1456432 A1 EP1456432 A1 EP 1456432A1
Authority
EP
European Patent Office
Prior art keywords
anode
cathode
substrate
particles
vacuum chamber
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP02803641A
Other languages
German (de)
English (en)
French (fr)
Inventor
John H. Ionic Fusion Corporation PETERSON
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ionic Fusion Corp
Original Assignee
Ionic Fusion Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ionic Fusion Corp filed Critical Ionic Fusion Corp
Publication of EP1456432A1 publication Critical patent/EP1456432A1/en
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32055—Arc discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating
    • C23C14/325—Electric arc evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
EP02803641A 2001-11-15 2002-11-15 Ionic plasma deposition apparatus Withdrawn EP1456432A1 (en)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
US33568901P 2001-11-15 2001-11-15
US335689P 2001-11-15
US37689302P 2002-05-01 2002-05-01
US376893P 2002-05-01
PCT/US2002/036788 WO2003044240A1 (en) 2001-11-15 2002-11-15 Ionic plasma deposition apparatus

Publications (1)

Publication Number Publication Date
EP1456432A1 true EP1456432A1 (en) 2004-09-15

Family

ID=26989841

Family Applications (1)

Application Number Title Priority Date Filing Date
EP02803641A Withdrawn EP1456432A1 (en) 2001-11-15 2002-11-15 Ionic plasma deposition apparatus

Country Status (5)

Country Link
EP (1) EP1456432A1 (ja)
JP (1) JP2005509752A (ja)
KR (1) KR20050044500A (ja)
AU (1) AU2002366086A1 (ja)
WO (1) WO2003044240A1 (ja)

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FR2894076B1 (fr) 2005-11-30 2014-07-11 Centre Nat Rech Scient Procede de fabrication, par depot sur un support, d'electrode pour pile a combustible
JP2007179963A (ja) * 2005-12-28 2007-07-12 Kasatani:Kk 燃料電池用触媒の製造方法及び触媒の担持方法
MX2008009511A (es) * 2006-01-27 2008-09-26 Chameleon Scient Corp Metodos de recubrimiento anti-microbiano.
US20070178222A1 (en) * 2006-01-30 2007-08-02 Storey Daniel M Radiopaque coatings for polymer substrates
US9422622B2 (en) 2006-01-30 2016-08-23 Surfatek Llc Flexible conductive single wire
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US8623446B2 (en) * 2006-02-25 2014-01-07 Metascape Llc Ultraviolet activated antimicrobial surfaces
US20070207310A1 (en) * 2006-03-03 2007-09-06 Storey Daniel M Chrome coated surfaces and deposition methods therefor
US20070259427A1 (en) * 2006-03-27 2007-11-08 Storey Daniel M Modified surfaces for attachment of biological materials
US20080160208A1 (en) * 2006-12-29 2008-07-03 Michael Patrick Maly System and method for restoring or regenerating an article
JP5017017B2 (ja) * 2007-08-16 2012-09-05 株式会社アルバック 同軸型真空アーク蒸着源を備えたナノ粒子担持装置およびナノ粒子坦持方法
KR101445743B1 (ko) 2008-04-04 2014-11-03 참엔지니어링(주) 플라즈마 처리 장치 및 플라즈마 처리 방법
ES2513866T3 (es) 2009-05-13 2014-10-27 Sio2 Medical Products, Inc. Revestimiento e inspección de recipientes
US9545360B2 (en) 2009-05-13 2017-01-17 Sio2 Medical Products, Inc. Saccharide protective coating for pharmaceutical package
US9458536B2 (en) 2009-07-02 2016-10-04 Sio2 Medical Products, Inc. PECVD coating methods for capped syringes, cartridges and other articles
FR2959610B1 (fr) 2010-04-30 2013-01-04 Dreux Agglomeration Procede de depot d'une couche catalytique pour pile a combustible
US11624115B2 (en) 2010-05-12 2023-04-11 Sio2 Medical Products, Inc. Syringe with PECVD lubrication
US9878101B2 (en) 2010-11-12 2018-01-30 Sio2 Medical Products, Inc. Cyclic olefin polymer vessels and vessel coating methods
US20120199070A1 (en) 2011-02-03 2012-08-09 Vapor Technologies, Inc. Filter for arc source
US9272095B2 (en) 2011-04-01 2016-03-01 Sio2 Medical Products, Inc. Vessels, contact surfaces, and coating and inspection apparatus and methods
JP6095678B2 (ja) 2011-11-11 2017-03-15 エスアイオーツー・メディカル・プロダクツ・インコーポレイテッド 薬剤パッケージ用の不動態化、ｐＨ保護又は滑性皮膜、被覆プロセス及び装置
US11116695B2 (en) 2011-11-11 2021-09-14 Sio2 Medical Products, Inc. Blood sample collection tube
KR101362860B1 (ko) 2012-10-04 2014-02-21 주식회사 알지비하이텍 평탄도 교정장치
WO2014071061A1 (en) 2012-11-01 2014-05-08 Sio2 Medical Products, Inc. Coating inspection method
EP2920567B1 (en) 2012-11-16 2020-08-19 SiO2 Medical Products, Inc. Method and apparatus for detecting rapid barrier coating integrity characteristics
US9764093B2 (en) 2012-11-30 2017-09-19 Sio2 Medical Products, Inc. Controlling the uniformity of PECVD deposition
EP2925903B1 (en) 2012-11-30 2022-04-13 Si02 Medical Products, Inc. Controlling the uniformity of pecvd deposition on medical syringes, cartridges, and the like
EP2961858B1 (en) 2013-03-01 2022-09-07 Si02 Medical Products, Inc. Coated syringe.
EP2971228B1 (en) 2013-03-11 2023-06-21 Si02 Medical Products, Inc. Coated packaging
US9937099B2 (en) 2013-03-11 2018-04-10 Sio2 Medical Products, Inc. Trilayer coated pharmaceutical packaging with low oxygen transmission rate
US9863042B2 (en) 2013-03-15 2018-01-09 Sio2 Medical Products, Inc. PECVD lubricity vessel coating, coating process and apparatus providing different power levels in two phases
EP3693493A1 (en) 2014-03-28 2020-08-12 SiO2 Medical Products, Inc. Antistatic coatings for plastic vessels
CN116982977A (zh) 2015-08-18 2023-11-03 Sio2医药产品公司 具有低氧气传输速率的药物和其他包装
DE102017213404A1 (de) 2017-08-02 2019-02-07 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Anordnung zur Beschichtung von Substratoberflächen mittels elektrischer Lichtbogenentladung
CN108330464B (zh) * 2018-02-26 2023-10-31 温州职业技术学院 一种线材类金刚石涂层加工装置
US10900117B2 (en) * 2018-10-24 2021-01-26 Vapor Technologies, Inc. Plasma corridor for high volume PE-CVD processing
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Title
See references of WO03044240A1 *

Also Published As

Publication number Publication date
WO2003044240A1 (en) 2003-05-30
JP2005509752A (ja) 2005-04-14
KR20050044500A (ko) 2005-05-12
AU2002366086A1 (en) 2003-06-10

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Inventor name: PETERSON, JOHN H.,IONIC FUSION CORPORATION

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