EP1367620A1 - Emittierende Kathodenstruktur für eine Vorratskathode einer Elektronenröhre - Google Patents
Emittierende Kathodenstruktur für eine Vorratskathode einer Elektronenröhre Download PDFInfo
- Publication number
- EP1367620A1 EP1367620A1 EP03101521A EP03101521A EP1367620A1 EP 1367620 A1 EP1367620 A1 EP 1367620A1 EP 03101521 A EP03101521 A EP 03101521A EP 03101521 A EP03101521 A EP 03101521A EP 1367620 A1 EP1367620 A1 EP 1367620A1
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- EP
- European Patent Office
- Prior art keywords
- cathode
- emissive
- faces
- electron
- impregnated
- Prior art date
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- 239000000463 material Substances 0.000 claims abstract description 37
- 239000011159 matrix material Substances 0.000 claims abstract description 29
- 238000005498 polishing Methods 0.000 claims description 28
- 239000011148 porous material Substances 0.000 claims description 21
- 238000004381 surface treatment Methods 0.000 claims description 20
- 238000000034 method Methods 0.000 claims description 15
- 238000005470 impregnation Methods 0.000 claims description 13
- 229910052788 barium Inorganic materials 0.000 claims description 11
- DSAJWYNOEDNPEQ-UHFFFAOYSA-N barium atom Chemical compound [Ba] DSAJWYNOEDNPEQ-UHFFFAOYSA-N 0.000 claims description 11
- 229910052751 metal Inorganic materials 0.000 claims description 9
- 239000002184 metal Substances 0.000 claims description 9
- 230000008569 process Effects 0.000 claims description 8
- 230000002093 peripheral effect Effects 0.000 claims description 7
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims description 7
- 229910052721 tungsten Inorganic materials 0.000 claims description 7
- 239000010937 tungsten Substances 0.000 claims description 7
- 238000010438 heat treatment Methods 0.000 claims description 5
- 238000004519 manufacturing process Methods 0.000 claims description 5
- 239000008188 pellet Substances 0.000 description 39
- 238000001000 micrograph Methods 0.000 description 7
- 230000008020 evaporation Effects 0.000 description 6
- 238000001704 evaporation Methods 0.000 description 6
- 230000009467 reduction Effects 0.000 description 6
- 230000000694 effects Effects 0.000 description 5
- 229910052762 osmium Inorganic materials 0.000 description 5
- SYQBFIAQOQZEGI-UHFFFAOYSA-N osmium atom Chemical compound [Os] SYQBFIAQOQZEGI-UHFFFAOYSA-N 0.000 description 5
- 238000000227 grinding Methods 0.000 description 4
- 230000006872 improvement Effects 0.000 description 4
- 239000000203 mixture Substances 0.000 description 4
- 208000035874 Excoriation Diseases 0.000 description 3
- 238000005299 abrasion Methods 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 230000008901 benefit Effects 0.000 description 3
- 238000009826 distribution Methods 0.000 description 3
- 239000000725 suspension Substances 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- VTYYLEPIZMXCLO-UHFFFAOYSA-L Calcium carbonate Chemical compound [Ca+2].[O-]C([O-])=O VTYYLEPIZMXCLO-UHFFFAOYSA-L 0.000 description 2
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 2
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 2
- 238000007796 conventional method Methods 0.000 description 2
- 238000000151 deposition Methods 0.000 description 2
- 239000010408 film Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 229910052741 iridium Inorganic materials 0.000 description 2
- GKOZUEZYRPOHIO-UHFFFAOYSA-N iridium atom Chemical compound [Ir] GKOZUEZYRPOHIO-UHFFFAOYSA-N 0.000 description 2
- 229910052750 molybdenum Inorganic materials 0.000 description 2
- 239000011733 molybdenum Substances 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 239000003870 refractory metal Substances 0.000 description 2
- 238000005245 sintering Methods 0.000 description 2
- 238000005507 spraying Methods 0.000 description 2
- OYPRJOBELJOOCE-UHFFFAOYSA-N Calcium Chemical compound [Ca] OYPRJOBELJOOCE-UHFFFAOYSA-N 0.000 description 1
- UDHXJZHVNHGCEC-UHFFFAOYSA-N Chlorophacinone Chemical compound C1=CC(Cl)=CC=C1C(C=1C=CC=CC=1)C(=O)C1C(=O)C2=CC=CC=C2C1=O UDHXJZHVNHGCEC-UHFFFAOYSA-N 0.000 description 1
- KJTLSVCANCCWHF-UHFFFAOYSA-N Ruthenium Chemical compound [Ru] KJTLSVCANCCWHF-UHFFFAOYSA-N 0.000 description 1
- 229910045601 alloy Inorganic materials 0.000 description 1
- 239000000956 alloy Substances 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 238000004458 analytical method Methods 0.000 description 1
- AYJRCSIUFZENHW-DEQYMQKBSA-L barium(2+);oxomethanediolate Chemical compound [Ba+2].[O-][14C]([O-])=O AYJRCSIUFZENHW-DEQYMQKBSA-L 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- 229910052791 calcium Inorganic materials 0.000 description 1
- 239000011575 calcium Substances 0.000 description 1
- 229910000019 calcium carbonate Inorganic materials 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000004140 cleaning Methods 0.000 description 1
- 238000000576 coating method Methods 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- 238000005265 energy consumption Methods 0.000 description 1
- 229910052739 hydrogen Inorganic materials 0.000 description 1
- 239000001257 hydrogen Substances 0.000 description 1
- 125000004435 hydrogen atom Chemical class [H]* 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 238000007689 inspection Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000005304 joining Methods 0.000 description 1
- 239000010410 layer Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 238000000691 measurement method Methods 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- MGRWKWACZDFZJT-UHFFFAOYSA-N molybdenum tungsten Chemical compound [Mo].[W] MGRWKWACZDFZJT-UHFFFAOYSA-N 0.000 description 1
- 229910052759 nickel Inorganic materials 0.000 description 1
- 239000002245 particle Substances 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 229910052702 rhenium Inorganic materials 0.000 description 1
- WUAPFZMCVAUBPE-UHFFFAOYSA-N rhenium atom Chemical compound [Re] WUAPFZMCVAUBPE-UHFFFAOYSA-N 0.000 description 1
- 229910052707 ruthenium Inorganic materials 0.000 description 1
- 229910052706 scandium Inorganic materials 0.000 description 1
- SIXSYDAISGFNSX-UHFFFAOYSA-N scandium atom Chemical compound [Sc] SIXSYDAISGFNSX-UHFFFAOYSA-N 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910052712 strontium Inorganic materials 0.000 description 1
- CIOAGBVUUVVLOB-UHFFFAOYSA-N strontium atom Chemical compound [Sr] CIOAGBVUUVVLOB-UHFFFAOYSA-N 0.000 description 1
- 238000000859 sublimation Methods 0.000 description 1
- 230000008022 sublimation Effects 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 239000002344 surface layer Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052715 tantalum Inorganic materials 0.000 description 1
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/02—Electrodes; Screens; Mounting, supporting, spacing or insulating thereof
- H01J29/04—Cathodes
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J1/00—Details of electrodes, of magnetic control means, of screens, or of the mounting or spacing thereof, common to two or more basic types of discharge tubes or lamps
- H01J1/02—Main electrodes
- H01J1/13—Solid thermionic cathodes
- H01J1/20—Cathodes heated indirectly by an electric current; Cathodes heated by electron or ion bombardment
- H01J1/28—Dispenser-type cathodes, e.g. L-cathode
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J9/00—Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
- H01J9/02—Manufacture of electrodes or electrode systems
- H01J9/04—Manufacture of electrodes or electrode systems of thermionic cathodes
- H01J9/042—Manufacture, activation of the emissive part
- H01J9/047—Cathodes having impregnated bodies
Definitions
- the invention relates to an "impregnated"-type cathode for an electron gun, that can be used in electron tubes, such as klystrons or gyrotrons, and more especially in cathode ray tubes for displaying images.
- a cathode of the "impregnated"-type for an electron gun comprises:
- That surface of the porous cathode emissive body which is on the opposite side from that in contact with the bottom of the dish forms the emissive surface of the cathode.
- Such impregnated cathodes are used as electron sources in image display cathode ray tubes of the monitor type or in television tubes and high-definition tubes (HDTV, CDT, CRT), in microwave electron tubes of the klystron type or gyrotron type, or in other types of electron tubes for lasers, magnetron radar, amplifiers and power supplies, and ion generators and propulsion units (for satellites).
- HDTV high-definition tubes
- CDT high-definition tubes
- microwave electron tubes of the klystron type or gyrotron type or in other types of electron tubes for lasers, magnetron radar, amplifiers and power supplies, and ion generators and propulsion units (for satellites).
- the cathode emissive body of an impregnated cathode for a display cathode ray tube has a small thickness, which limits the amount of electron-emitting material available and thus limits the lifetime of the cathode; it has been established that the lifetime characteristics of such an impregnated cathode depend on the rate of evaporation of the main component of the electron-emitting material, which is generally barium; moreover the evaporated barium recondenses on other parts of the tube that are cooler, especially the counterelectrodes of the cathode, from where it emits parasitic electrons that impair the operation of the tube; furthermore, the emitting surface of the cathode may deteriorate over the course of operation by the impact of ions, which impair the uniformity of the surface electron emission distribution.
- EP 0890972 discloses an impregnated cathode whose cathode emissive body has a lower porosity near the emissive surface than in the core or through the depth.
- the document EP 0831512 provides, conversely, a higher porosity near the emissive surface than in the core or through the depth.
- documents JP60-017831 and JP05-114352 disclose processes for manufacturing cathode emissive bodies for an impregnated cathode, comprising a step in which, after impregnation with the electron-emitting material, the emissive surface of these bodies is abraded, especially by polishing, essentially for the purpose of cleaning this emissive surface and of removing any particles of the impregnation material from the surface; cathode emissive bodies are therefore obtained in which only the emissive surface has a low roughness, for example between 0.2 ⁇ m and 3.2 ⁇ m; no indication is given about the porosity of the surface layer immediately beneath the emissive surface, with respect to the porosity in the core of the cathode emissive body.
- the document JP06-103885 (TOSHIBA) teaches that, by polishing the emissive surface so as to lower its roughness, it is possible to limit the evaporation of electron-emitting material during operation of the cathode and thus improve the operation and the lifetime.
- the document US 5 990 608 recommends a roughness of the emissive surface of less than 10 ⁇ m in order to increase the emittance of this surface (cf. fig. 12 of that document).
- the document EP1 063 668 teaches the polishing of this surface until a roughness of less than or equal to 3 ⁇ m, or even 1 ⁇ m, is obtained.
- the document GB 1 522 387 teaches the polishing of the emissive surface in order to remove therefrom the film of barium scandate which would be formed thereon.
- the object of the invention is to further improve the operation of impregnated cathodes and their lifetime by a particularly inexpensive method.
- the subject of the invention is a cathode emissive body for an impregnated cathode of an electron tube, formed from a porous matrix impregnated with an electron-emitting material, defined by external faces comprising an emissive surface, wherein said external faces including the lateral surface have a roughness of less than 0.2 ⁇ m.
- the emissive surface polished so as to have a roughness of less than 0.2 ⁇ m, but also at least the lateral surface, that is to say the sides, of the cathode emissive body; preferably, all the external faces of the emissive body are surface-treated, preferably polished, so as to have this low roughness.
- the roughness of the faces is measured by a conventional method, which comprises a profilometer measurement perpendicular to these faces; the measured profile may be represented by the distribution of its depth relative to a given reference line; according to the French standard AFNOR E 05.015/017/052, this reference line (Ox) is the straight line taken parallel to the general direction of the profile and passing through its upper points; plotted on the ordinate axis (Oz) perpendicular to (Ox) are the measured depths of the profile; the deviation of the roughness profiles from this reference line Ox may be regarded as a variable having a certain statistical distribution; the position of the mean line of the profile is thus calculated; the arithmetic mean deviation of the depth relative to this mean line corresponds to the desired roughness value Ra.
- the operation and the lifetime of the impregnated cathodes provided with such cathode emissive bodies in electron tubes, especially image display cathode ray tubes, is more greatly improved than in the prior art; without wishing to be tied down to any definitive explanation, it seems that the evaporation of cathode emissive material during operation of this type of cathode, especially the evaporation of barium, takes place not only at the emissive surface but also at all the external faces of the cathode emissive body; in the prior art, only the emissive surface of the cathode emissive body was treated in order to limit the evaporation of cathode emissive material, which does not prevent "leakage" of this material via the other faces; the invention proposes, to limit any "leakage" from where it arises, to treat all of the external faces of the ca
- said external faces defining the cathode emissive body have a roughness of less than or equal to 0.1 ⁇ m.
- a roughness as low as this is preferably obtained by a step of abrading, and even more especially of polishing, the cathode emissive bodies after impregnation; this abrasion treatment may be carried out dry by spraying a very fine abrasive or polishing grit onto all the faces of the cathode emissive body, or carried out wet by spraying a suspension of abrasive grit; it may be carried out by the friction of these faces against a polishing felt charged with a very fine abrasive or polishing grit, or a suspension of this grit; it may also be carried out by grinding with a grinding disk.
- a bulk abrasion or polishing technique is used; in such a technique, a batch of cathode emissive bodies already impregnated with electron-emissive material is placed pêleidente, in a container mounted on a rotation shaft, with the very fine abrasive or polishing grit, or a suspension of this grit, and then the container is rotated for a time suitable for obtaining the desired roughness; the advantage of such a method is that a low roughness is obtained on all the faces of the cathode emissive bodies directly and very inexpensively.
- the ratio of the area of the pores of the matrix that are open to said external faces of the cathode emissive body to the area of these faces is less than or equal to one half of the average volume porosity in the core of said matrix.
- the ratio of the area of the pores of this body that are open to the external faces to the total area of these faces is, for example, around 9% or less than this value; the volume porosity is measured by conventional methods of calculating the density/volume ratio of the cathode emissive body before impregnation; the area of the pores is measured by automatic analysis of several images representative of the various external faces of the cathode emissive body.
- This condition means that the surface porosity is less than the porosity through the depth, not only on the emissive surface, as in the prior art, but also on all the external faces of the cathode emissive body.
- the abrasion or polishing surface treatment has the effect not only of lowering the roughness of the various faces, but also of partly closing the pores that are open to these surfaces, which results in a reduction in the surface porosity; this is in particular the case with chemical-mechanical polishing operations; the partial closure of the pores of all the faces of the cathode emissive body makes it possible to limit even further the losses by evaporation of electron-emitting material, especially barium.
- the ratio of the area of the pores of the matrix that are open to the external faces of the cathode emissive body to the area of these faces is between 4% and 9%.
- the average volume porosity in the core of the matrix in the cathode emissive body is between 16% and 22%; it is therefore the porosity of the cathode emissive body before impregnation.
- the porous matrix is based on tungsten and its tungsten content is greater than or equal to 50 wt% and the electron-emitting material is based on barium and its barium content is greater than 50 mol%.
- the porous matrix may be a tungsten-molybdenum mixture.
- the subject of the invention is also an "impregnated"-type cathode for an electron gun, comprising :
- the subject of the invention is also an electron gun which is provided with at least one cathode according to the invention; in the conventional case of three-color guns of "color" cathode ray tubes, the electron gun has three cathodes, one for each primary color.
- a counterelectrode G1 is arranged facing the emissive surface of said cathode emissive body and is provided with a hole approximately centered on said surface, with the width of the peripheral region of the emissive surface facing the perimeter of said hole having a minimum value L min of less than or equal to 200 ⁇ m.
- the subject of the invention is also a cathode ray tube provided with a gun according to the invention.
- the subject of the invention is also a process for manufacturing a cathode emissive body according to the invention, which comprises an operation of treating the surface of said external faces in order to lower its roughness and, optionally, the surface porosity, that is to say the ratio of the area of the pores that are open to these faces to the area of these faces.
- said surface treatment operation is a polishing operation.
- said surface treatment operation is carried out in bulk.
- the process also includes an operation of impregnating the matrix with the electron-emitting material, said surface treatment operation being carried out after said impregnation operation.
- said external faces of the cathode emissive body refer to all of the external faces of this body.
- a cathode emissive body for an impregnated cathode will firstly be described, this being formed from a porous matrix impregnated with an electron-emitting material, which here has the form of a pellet shown in figure 1; the external faces of this pellet consist here of an emissive upper face 11, a lower face 12, opposite the emissive face and intended to come into contact with the bottom of the dish 2 of the cathode, and a circular side face 13 joining the upper face to the lower face.
- the porous matrix may, to take a specific example, be based on nickel or may be obtained by pressing and sintering a ceramic or refractory metal powder; the material of the porous matrix of the cathode emissive body is preferably chosen from the group comprising tungsten, molybdenum, rhenium, osmium, iridium, and alloys thereof, and alumina; as an example, a tungsten-based material is chosen here; the pressing pressure and the sintering conditions, especially the temperature and time, are tailored in a manner known per se in order to obtain a solid body having, before impregnation, a volume porosity of preferably between 15% and 30%; this porosity is intended to serve as a reservoir for the cathode emissive materials; for a higher porosity, the pellet would not have sufficient mechanical strength; for a lower porosity, the reservoir of cathode emissive material would be insufficient to obtain an acceptable lifetime.
- the matrix is then impregnated with the cathode emissive material;
- the electron-emitting material is preferably chosen from the group comprising barium, strontium, calcium, aluminum, scandium and osmium, or a mixture of one or more of these elements; as an example, a so-called "4/1/1" mixture is used as impregnation material, this being well known in impregnated cathodes, consisting at the start of a mixture of four moles of barium carbonate, 1 mole of calcium carbonate and 1 mole of alumina; the operating characteristics of a cathode emissive body of an impregnated- or reservoir-type cathode depend in particular on the pore volume of its matrix or on the volume of the reservoir, on the nature of the cathode emissive material that fills the pores and on the operating temperature of the cathode; in the case of a cathode ray tube, the ca
- the material of the matrix and of the cathode emissive material are sintered simultaneously.
- the means a) aims to reduce the roughness of the various external faces of the pellet; the arithmetic roughness R a of a "green" pellet is generally around 0.3 ⁇ m; after treatment according to the invention, the aim is to have a roughness of less than 0.2 ⁇ m, preferably less than or equal to 0.1 ⁇ m, on all the faces of the pellet.
- a conventional measurement method using a "laser” profilometer or a needle sensor is used, for example of the “SURFTEST” type from Mitutuyo; in the latter case, the tip of the needle used has a diameter of around 0.02 mm, the run speed of the sensor is around 2 mm/s and the cut-off of the sensor is set at about 0.8 mm.
- the means b) and/or c) are aimed at reducing what will be called the "surface porosity"; it has been found that the surface porosity of a "green" pellet is identical to or even higher than its mean porosity; this surface porosity is characterized, for example, by the mean diameter and the mean surface density of the pores that are open to the surface of the pellet, on all its external faces; the above means b) aims to reduce the mean diameter, while the means c) aims to reduce the surface density of the pores.
- the surface porosity by the ratio of the total area of the pores open to all the external faces of the pellet to the developed area of these faces; after treatment according to the invention, the aim is preferably to have, for this ratio, a value of less than or equal to one half of the overall volume porosity of the matrix, especially a value of between 4% and 9%, on all the faces of the pellet.
- micrographs of the surface are used, these being taken, at the center and at one third from the edges of the pellet, using a scanning microscope with a magnification of around 2000 and a software treatment for the image analysis of these micrographs, for example of the "Leica” type; for example, digital micrographs having a magnification of 2000 and a resolution of 512 by 512 pixels, with 256 gray levels, are used; the analysis software is tailored according to the surface to be analyzed, the photographic equipment and the "illumination" of the surface.
- the surface treatment applied to the green impregnated pellet in order to obtain an impregnated pellet according to the invention, consists of a chemical or chemical-mechanical operation to grind, hone or polish all of the faces of the pellet.
- a polishing operation which it is found advantageously gives the above effects a), b) and c) simultaneously is carried out; preferably bulk polishing is carried out, which allows the surface of a large number of pellets to be simultaneously treated on all their faces.
- the surface treatment, especially polishing, conditions are adapted so as to obtain pellets having a roughness of less than or equal to 0.1 ⁇ m and a surface porosity, measured by the ratio described above, of between 4% and 9% on all their faces; thus, for a matrix pore volume of around 18%, a surface porosity of around 6% is conventionally obtained.
- Figures 3 and 4 show, schematically in the case of 3A and 4A and micrographically in the case of 3B and 4B, sectional views of a portion of the surface region representative of one of the faces of the pellets, before treatment in the case of figure 3 and after treatment in the case of figure 4; these figures very clearly illustrate the reduction in surface roughness specific to the invention: the polishing abrades the grains G s , planarizing the entire surface S and lowering the roughness to a level of less than or equal to 0.1 ⁇ m.
- the polishing also has the effect of reducing the open area of the pores on all the external faces of the pellet; this is without doubt a chemical-mechanical effect, conventional in the polishing field; the surface porosity is reduced by a factor of two or even of three, by this operation.
- an impregnated cathode emissive pellet ready for use is then obtained; as shown in figure 2, this pellet is mounted in a dish 2, itself supported by a metal sleeve 3 provided with a heating filament 4; the impregnated cathode according to the invention is then obtained.
- the loss of cathode emissive material during 90 weeks of operation of this cathode under standard conditions, or even greatly accelerated conditions compared with the same cathode in which the pellet has not undergone a polishing surface treatment is found to be reduced by a factor of two; compared with a cathode whose pellet has undergone this polishing surface treatment only on its emission upper face 11, as for example in the prior art, it is also found that there is a considerable reduction in the loss of cathode emissive material and a substantial increase, by a factor of around 2, in the lifetime; this is because, since the law expressing the depletion of the function of lifetime goes as the
- the improvement in performance is particularly evident on small pellets, used in particular in cathode ray tubes with low energy consumption; this is because the depletion or loss of cathode emissive material has the following edge effect on the emissive surface: over the entire periphery of the emissive surface 11 of the pellet 1, over the lifetime of the cathode, the porous matrix becomes depleted in cathode emissive material so that the emissive surface has a depleted peripheral region of increasing width; the smaller the diameter of the pellets, the greater is the part of the emissive surface represented by this depleted region; since, by virtue of the invention, all the faces of the pellet, especially its lateral face 12, are polished, this depleted peripheral region increases less quickly in width than in the prior art; the lifetime of small-diameter pellets, especially those of a diameter of less than or equal to 1.1 mm, is therefore substantially improved.
- the width of the depleted peripheral region of the cathode emissive body may be up to 200 ⁇ m, which corresponds to a reduction in diameter of the effective emissive area of 400 ⁇ m; since the diameter D T of the hole in the first counterelectrode or grid G1 is generally around 500 ⁇ m, if the diameter Dp of the pellet is less than or equal to 1.1 mm and if account is taken of the inevitable errors in centering the hole in the gate with respect to the cathode, generally of around 200 ⁇ m, it may be seen that the peripheral region of the emissive surface of the pellet 1 facing the perimeter of the hole in the grid G1 may, in certain parts of the perimeter, have a width L min of less than or equal to 200 ⁇ m and that there is a risk of the depleted peripheral region encroaching on the hole in the grid, with the risk of seriously disrupting the operation of the electron tube in which this cathode is placed; thanks to the invention and the polishing of
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- Manufacturing & Machinery (AREA)
- Solid Thermionic Cathode (AREA)
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Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR0206673A FR2840450A1 (fr) | 2002-05-31 | 2002-05-31 | Corps cathodo-emissif pour cathode impregnee de tube electronique |
FR0206673 | 2002-05-31 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1367620A1 true EP1367620A1 (de) | 2003-12-03 |
EP1367620B1 EP1367620B1 (de) | 2008-02-27 |
Family
ID=29415161
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP03101521A Expired - Lifetime EP1367620B1 (de) | 2002-05-31 | 2003-05-26 | Emittierende Kathodenstruktur für eine Vorratskathode einer Elektronenröhre |
Country Status (9)
Country | Link |
---|---|
US (1) | US6979942B2 (de) |
EP (1) | EP1367620B1 (de) |
JP (1) | JP2004103553A (de) |
KR (1) | KR20030093967A (de) |
CN (1) | CN100353476C (de) |
DE (1) | DE60319301T2 (de) |
FR (1) | FR2840450A1 (de) |
MX (1) | MXPA03004425A (de) |
MY (1) | MY131138A (de) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1746632A1 (de) * | 2004-05-10 | 2007-01-24 | Kabushiki Kaisha Toshiba | Gesinterte elektrode zur verwendung in kaltkathodenröhren, mit dieser gesinterten elektrode zur verwendung in kaltkathodenröhren ausgestattete kaltkathodenröhre und flüssigkristall-display-einheit |
FR2900500A1 (fr) * | 2006-04-26 | 2007-11-02 | Thomson Licensing Sas | Procede de fabrication de cathode pour tube a rayons cathodiques |
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US20090218235A1 (en) * | 2007-12-26 | 2009-09-03 | Mcdonald Robert C | Gas sensor |
DE102011076912B4 (de) * | 2011-06-03 | 2015-08-20 | Siemens Aktiengesellschaft | Röntgengerät umfassend eine Multi-Fokus-Röntgenröhre |
RU2494489C1 (ru) * | 2012-02-10 | 2013-09-27 | Общество с ограниченной ответственностью "Плутон Инвест" | Магнетрон с безнакальным запуском со специальным активированием автоэлектронных катодов |
CN112403105B (zh) * | 2020-10-30 | 2022-04-29 | 西北有色金属研究院 | 一种低粗糙度小孔径不锈钢多孔片及其制备方法 |
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GB1522387A (en) * | 1975-01-09 | 1978-08-23 | Philips Electronic Associated | Method of manufacturing a dispenser cathode and dispenser cathode manufactured according to said method |
JPS6017831A (ja) * | 1983-07-09 | 1985-01-29 | New Japan Radio Co Ltd | 含浸型陰極 |
JPH05114352A (ja) * | 1991-10-24 | 1993-05-07 | Toshiba Corp | 含浸型陰極構体及びその製造方法 |
JPH06103885A (ja) * | 1992-09-18 | 1994-04-15 | Toshiba Corp | 多孔質焼結基体、その製造法および多孔質材料の気孔率評価法 |
EP0890972A1 (de) * | 1997-07-09 | 1999-01-13 | Matsushita Electronics Corporation | Imprägnierte Kathode und Verfahren zu ihrer Herstellung |
US5990608A (en) * | 1997-02-07 | 1999-11-23 | Mitsubishi Denki Kabushiki Kaisha | Electron gun having a cathode with limited electron discharge region |
EP1063668A2 (de) * | 1999-06-22 | 2000-12-27 | Nec Corporation | Kathodenbaugruppe und Farbkathodenstrahlröhre mit solcher Baugruppe |
-
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- 2002-05-31 FR FR0206673A patent/FR2840450A1/fr active Pending
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2003
- 2003-05-19 JP JP2003140912A patent/JP2004103553A/ja not_active Withdrawn
- 2003-05-20 MX MXPA03004425A patent/MXPA03004425A/es active IP Right Grant
- 2003-05-23 US US10/444,832 patent/US6979942B2/en not_active Expired - Fee Related
- 2003-05-23 KR KR10-2003-0032777A patent/KR20030093967A/ko not_active Application Discontinuation
- 2003-05-26 EP EP03101521A patent/EP1367620B1/de not_active Expired - Lifetime
- 2003-05-26 DE DE60319301T patent/DE60319301T2/de not_active Expired - Fee Related
- 2003-05-27 CN CNB03138112XA patent/CN100353476C/zh not_active Expired - Fee Related
- 2003-05-29 MY MYPI20031988A patent/MY131138A/en unknown
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GB1522387A (en) * | 1975-01-09 | 1978-08-23 | Philips Electronic Associated | Method of manufacturing a dispenser cathode and dispenser cathode manufactured according to said method |
JPS6017831A (ja) * | 1983-07-09 | 1985-01-29 | New Japan Radio Co Ltd | 含浸型陰極 |
JPH05114352A (ja) * | 1991-10-24 | 1993-05-07 | Toshiba Corp | 含浸型陰極構体及びその製造方法 |
JPH06103885A (ja) * | 1992-09-18 | 1994-04-15 | Toshiba Corp | 多孔質焼結基体、その製造法および多孔質材料の気孔率評価法 |
US5990608A (en) * | 1997-02-07 | 1999-11-23 | Mitsubishi Denki Kabushiki Kaisha | Electron gun having a cathode with limited electron discharge region |
EP0890972A1 (de) * | 1997-07-09 | 1999-01-13 | Matsushita Electronics Corporation | Imprägnierte Kathode und Verfahren zu ihrer Herstellung |
EP1063668A2 (de) * | 1999-06-22 | 2000-12-27 | Nec Corporation | Kathodenbaugruppe und Farbkathodenstrahlröhre mit solcher Baugruppe |
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PATENT ABSTRACTS OF JAPAN vol. 018, no. 369 (E - 1576) 12 July 1994 (1994-07-12) * |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP1746632A1 (de) * | 2004-05-10 | 2007-01-24 | Kabushiki Kaisha Toshiba | Gesinterte elektrode zur verwendung in kaltkathodenröhren, mit dieser gesinterten elektrode zur verwendung in kaltkathodenröhren ausgestattete kaltkathodenröhre und flüssigkristall-display-einheit |
EP1746632A4 (de) * | 2004-05-10 | 2011-01-05 | Toshiba Kk | Gesinterte elektrode zur verwendung in kaltkathodenröhren, mit dieser gesinterten elektrode zur verwendung in kaltkathodenröhren ausgestattete kaltkathodenröhre und flüssigkristall-display-einheit |
FR2900500A1 (fr) * | 2006-04-26 | 2007-11-02 | Thomson Licensing Sas | Procede de fabrication de cathode pour tube a rayons cathodiques |
EP1868221A2 (de) * | 2006-04-26 | 2007-12-19 | Thomson Licensing | Verfahren zur Herstellung einer Kathode für Kathodenstrahlröhren |
EP1868221A3 (de) * | 2006-04-26 | 2008-03-05 | Thomson Licensing | Verfahren zur Herstellung einer Kathode für Kathodenstrahlröhren |
Also Published As
Publication number | Publication date |
---|---|
KR20030093967A (ko) | 2003-12-11 |
US20040032195A1 (en) | 2004-02-19 |
MXPA03004425A (es) | 2005-07-13 |
US6979942B2 (en) | 2005-12-27 |
CN1462051A (zh) | 2003-12-17 |
MY131138A (en) | 2007-07-31 |
CN100353476C (zh) | 2007-12-05 |
FR2840450A1 (fr) | 2003-12-05 |
DE60319301T2 (de) | 2009-03-19 |
EP1367620B1 (de) | 2008-02-27 |
JP2004103553A (ja) | 2004-04-02 |
DE60319301D1 (de) | 2008-04-10 |
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