EP1252802A1 - Dispositif de regulation d'une repartition de la densite de flux d'energie a micro-ondes dans un applicateur, et utilisation de ce dispositif - Google Patents
Dispositif de regulation d'une repartition de la densite de flux d'energie a micro-ondes dans un applicateur, et utilisation de ce dispositifInfo
- Publication number
- EP1252802A1 EP1252802A1 EP01911377A EP01911377A EP1252802A1 EP 1252802 A1 EP1252802 A1 EP 1252802A1 EP 01911377 A EP01911377 A EP 01911377A EP 01911377 A EP01911377 A EP 01911377A EP 1252802 A1 EP1252802 A1 EP 1252802A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- waveguide
- applicator
- coupling
- microwave
- coupling pins
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/72—Radiators or antennas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
- H05B6/705—Feed lines using microwave tuning
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B6/00—Heating by electric, magnetic or electromagnetic fields
- H05B6/64—Heating using microwaves
- H05B6/70—Feed lines
- H05B6/707—Feed lines using waveguides
Definitions
- the invention relates to a device for setting a microwave energy density distribution in an applicator forming a resonator chamber, in which the radiation generated by microwave generators is guided via waveguides to the applicator wall, and the use of this device.
- the microwave generator which can be a magnetron, for example, is arranged with its power supply separate from the applicator in which the microwave energy is to be effective.
- waveguides possibly along with other components, are used, via which the microwave energy is fed into the applicator cavity.
- the applicator In order to generate several modes with different phase positions in one applicator, with which a homogeneous field distribution is to be achieved, the applicator often has dimensions that are a multiple of the wavelength of the microwave that is fed in.
- the waveguide can be flanged to one side of a cuboid applicator.
- this has the disadvantage that, depending on the spatial extent of the sample groups located in the applicator, a sufficiently homogeneous field distribution can only be achieved in individual areas due to the field distribution. This is remedied by slotted graphite plates, via which microwaves are guided from a waveguide into the interior of the furnace; the waveguides are then located at the corners of the applicator space, the slots being arranged at different angles.
- the device according to claim 1 which is characterized in accordance with the invention in that a plurality of electrically conductive coupling pins are provided, each of which preferably protrudes vertically both into the waveguide space and into the applicator space.
- Such pin-shaped antennas allow a greater field homogeneity to be created in the resonator space, which is also still separated from the waveguide, so that gases generated in the resonator space cannot penetrate into the waveguide.
- This is particularly advantageous for the heat treatment of pre-pressed green compacts, which have been produced by powder metallurgy, for their dewaxing (debinding). The same applies to sintering processes that take place in a carburizing atmosphere.
- the coupling pins are arranged to be displaceable along their longitudinal axis, so that the desired field distribution can be set in the applicator loaded with the material to be heated.
- the desired field distribution can be set in the applicator loaded with the material to be heated.
- Field dependencies result both from the length of the coupling pin and here in particular the respective length fractions of the coupling pin that protrude into the waveguide and into the resonator space.
- the coupling pins can be inserted in the waveguide from both the wide and the narrow side.
- the waveguide and the coupling surface of the resonator chamber are preferably arranged with their longitudinal axes parallel to one another, so that a plurality of coupling pins arranged at equidistant distances from one another protrude with one end into the waveguide and with the other end into the resonator chamber.
- a dielectric is arranged around the wall bushing for the coupling pins.
- each of the coupling pins can be displaceably guided in a sleeve made of dielectric material and projecting through the wall of the waveguide and / or the applicator.
- the electrically conductive coupling pin is formed from a coupling rod and a sleeve surrounding it, in which the coupling rod is arranged so as to be longitudinally axially displaceable.
- the coupling pin at its end projecting into the waveguide can have a piece of a dielectric which extends this pin and which preferably projects through the waveguide diameter and is guided to the outside at a waveguide opening located at the opposite end.
- Graphite metal such as copper, aluminum, tungsten or molybdenum, metal alloys such as brass or steel or other alloys are suitable as the material for the coupling pin but must be correspondingly temperature-resistant, or an insulator with an electrical coating, which preferably consists of TiN.
- Boron nitride or a ceramic such as aluminum oxide, silicon nitride or quartz are selected as the material for the dielectric.
- the coupling pins each protrude in the area of the maxima of the microwave fed in there.
- the microwave can be coupled in capacitively or inductively.
- the geometry of the pin is cylindrical, the edges and corners of the pin preferably being rounded.
- the ratio of the opening diameter D in the waveguide through which the coupling pin is guided to the coupling pin diameter d is chosen so that the characteristic impedance is adapted.
- the piece goods to be treated by the microwave are arranged in the applicator resonance room on gratings which consist of rounded grating bars which are preferably oriented perpendicular to the electrical field of the microwave.
- the walls of the waveguide and the applicator which are adjacent or adjacent to one another are thermally insulated from one another.
- the device described can be used for the debinding of green compacts from a binder and one of the substances mentioned below and / or for the sintering of hard metals, cermets, steels produced by powder metallurgy or metallic or ceramic magnetic materials, in particular ferrites.
- Special application examples both with regard to the selection of the composite materials that can be produced by sintering in a microwave field and also procedural measures are given in WO 96/33830 and WO 97/26383.
- the device mentioned can also be used to generate a plasma, as is required, for example, in CVD coatings.
- FIG. 1 to 4 each show schematically differently arranged coupling pins and dielectrics and
- FIG. 5 shows a schematic view of the device according to the invention.
- a waveguide 10 with an upper wall 11 and a lower wall 12 are shown in cross section.
- the wall 21 of the applicator resonance chamber On the wall 12 of the waveguide 10 is the wall 21 of the applicator resonance chamber, of which the section shown is designated 20.
- the two walls 12 and 21 are each broken through at equidistant intervals a, the distances a corresponding to approximately half to a quarter of the wavelength of the microwave in the waveguide 10.
- a first variant (FIG. 1), the opening in the walls 12 and 21 is surrounded by a circular dielectric 30.
- the middle opening of the dielectric D, through which the electrically conductive coupling pin made of graphite 31 is passed, is selected relative to the diameter d of the cylindrical coupling pin so that the characteristic impedance is adapted.
- the coupling pin 31 protrudes with its two ends, on the one hand, into the resonator chamber 20 of the applicator and, on the other hand, into the waveguide interior 10.
- the coupling pin can be displaced axially in the direction of the double arrow 32.
- the coupling pin 33 can be displaced in the direction of the double arrow 34 in a sleeve 40 made of a dielectric.
- the sleeve 40 projects exclusively into the resonator chamber 20 of the applicator.
- the coupling pin 35 consists of a coupling rod 36 which can be displaced longitudinally and axially in the direction of the double arrow 37 in a sleeve 38 of electrically conductive material surrounding it in the direction of the double arrow 37.
- the coupling pin 39 is provided with an extension 41 made of a dielectric material at its end projecting into the waveguide 10.
- the one rod formed from parts 39 and 41 is axially displaceable along the donoel arrow 42.
- Graphite rods with a diameter d of 3 mm are arranged at a distance of 10 mm as electrically conductive coupling pins 31, 33, 36 and 39.
- FIG. 5 shows a schematic view of the structure of the device according to the invention, the essential parts of a short-circuit slide 49, a microwave generator 44, a waveguide 10 which is guided through an opening in the furnace wall 45 and the arrangement of the coupling pins 31 already described.
- the interior of the furnace, in which hard metal parts 48 are arranged on gratings, is shielded from the outside by thermal insulation 46.
Landscapes
- Physics & Mathematics (AREA)
- Electromagnetism (AREA)
- Plasma Technology (AREA)
- Constitution Of High-Frequency Heating (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Radiation-Therapy Devices (AREA)
- Electrotherapy Devices (AREA)
- Powder Metallurgy (AREA)
- Electron Sources, Ion Sources (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE10005146 | 2000-02-04 | ||
DE10005146A DE10005146A1 (de) | 2000-02-04 | 2000-02-04 | Vorrichtung zur Einstellung einer Mikrowellen-Energiedichteverteilung in einem Applikator und Verwendung dieser Vorrichtung |
PCT/DE2001/000259 WO2001058215A1 (fr) | 2000-02-04 | 2001-01-19 | Dispositif de regulation d'une repartition de la densite de flux d'energie a micro-ondes dans un applicateur, et utilisation de ce dispositif |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1252802A1 true EP1252802A1 (fr) | 2002-10-30 |
EP1252802B1 EP1252802B1 (fr) | 2007-03-14 |
Family
ID=7629967
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP01911377A Expired - Lifetime EP1252802B1 (fr) | 2000-02-04 | 2001-01-19 | Dispositif de regulation d'une repartition de la densite de flux d'energie a micro-ondes dans un applicateur, et utilisation de ce dispositif |
Country Status (6)
Country | Link |
---|---|
US (1) | US6630653B2 (fr) |
EP (1) | EP1252802B1 (fr) |
JP (1) | JP2003522392A (fr) |
AT (1) | ATE357124T1 (fr) |
DE (2) | DE10005146A1 (fr) |
WO (1) | WO2001058215A1 (fr) |
Families Citing this family (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7189940B2 (en) * | 2002-12-04 | 2007-03-13 | Btu International Inc. | Plasma-assisted melting |
DE10326964B3 (de) * | 2003-06-16 | 2004-12-09 | Nexpress Solutions Llc | Mikrowelleneinrichtung für das Befestigen von Toner an einem Bedruckstoff und dafür verwendbares Element |
DE102004021016B4 (de) * | 2004-04-29 | 2015-04-23 | Neue Materialien Bayreuth Gmbh | Vorrichtung zur Einspeisung von Mikrowellenstrahlung in heiße Prozessräume |
DE502006001026D1 (de) * | 2006-05-04 | 2008-08-14 | Topinox Sarl | Mikrowellenantennenkonfiguration, Zubehörteil mit solch einer Mikrowellenantennenkonfiguration und Gerät mit zumindest einem solchen Zubehörteil |
DE102006046422B4 (de) * | 2006-09-22 | 2021-01-14 | Wiesheu Gmbh | Ofen zur Wärmebehandlung von Lebensmitteln |
WO2008115226A2 (fr) * | 2007-03-15 | 2008-09-25 | Capital Technologies, Inc. | Appareil de traitement avec un lancement électromagnétique |
US7518092B2 (en) * | 2007-03-15 | 2009-04-14 | Capital Technologies, Inc. | Processing apparatus with an electromagnetic launch |
DE102007044764B4 (de) | 2007-09-19 | 2010-04-08 | Neue Materialien Bayreuth Gmbh | Hybridofen |
US8451437B2 (en) | 2011-02-17 | 2013-05-28 | Global Oled Technology Llc | Electroluminescent light output sensing for variation detection |
DE102014211575A1 (de) * | 2014-06-17 | 2015-12-17 | Hauni Maschinenbau Ag | Mikrowellenmessvorrichtung, Anordnung und Verfahren zur Überprüfung von stabförmigen Artikeln oder eines Materialstrangs der Tabak verarbeitenden Industrie sowie Maschine der Tabak verarbeitenden Industrie |
US20200205248A1 (en) * | 2017-08-15 | 2020-06-25 | Goji Limited | Controlling microwave heating by moving radiators |
Family Cites Families (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1615463C3 (de) * | 1967-11-16 | 1975-07-03 | Bowmar/Tic, Inc., Newbury Park, Calif. (V.St.A.) | Ofen mit Abstrahlung von Mikrowellenenergie und mit einem widerstandsbeheizten Metallelement |
JPS523142Y2 (fr) * | 1972-05-25 | 1977-01-24 | ||
US3993886A (en) * | 1974-08-30 | 1976-11-23 | U.S. Philips Corporation | Supply wave guide system in microwave ovens |
GB1543980A (en) * | 1975-05-19 | 1979-04-11 | Matsushita Electric Ind Co Ltd | Microwave heating apparatus |
JPS5211447A (en) * | 1975-07-18 | 1977-01-28 | Matsushita Electric Ind Co Ltd | High frequency heating apparatus |
JPS5472534A (en) * | 1977-11-18 | 1979-06-11 | Matsushita Electric Ind Co Ltd | High frequency heating device |
US4689459A (en) * | 1985-09-09 | 1987-08-25 | Gerling John E | Variable Q microwave applicator and method |
DE3641063A1 (de) * | 1986-12-01 | 1988-06-16 | Bosch Siemens Hausgeraete | Mikrowellenofen zum behandeln von speisen |
DE3811063A1 (de) * | 1988-03-31 | 1989-10-19 | Berstorff Gmbh Masch Hermann | Vorrichtung zum kontinuierlichen erwaermen, pasteurisieren oder sterilisieren von lebensmitteln oder dergleichen |
US4851630A (en) * | 1988-06-23 | 1989-07-25 | Applied Science & Technology, Inc. | Microwave reactive gas generator |
DE4235410C2 (de) | 1992-10-21 | 1995-06-14 | Troester Maschf Paul | Abgleichvorrichtung für die Mikrowellenübertragung in einem Hohlleiter |
JP2627730B2 (ja) | 1993-09-23 | 1997-07-09 | エルジー電子株式会社 | 電子レンジの自動整合装置 |
DE4340652C2 (de) * | 1993-11-30 | 2003-10-16 | Widia Gmbh | Verbundwerkstoff und Verfahren zu seiner Herstellung |
DE19601234A1 (de) | 1996-01-15 | 1997-07-17 | Widia Gmbh | Verbundkörper und Verfahren zu seiner Herstellung |
US5816445A (en) * | 1996-01-25 | 1998-10-06 | Stainless Steel Coatings, Inc. | Method of and apparatus for controlled dispensing of two-part bonding, casting and similar fluids and the like |
-
2000
- 2000-02-04 DE DE10005146A patent/DE10005146A1/de not_active Withdrawn
-
2001
- 2001-01-19 WO PCT/DE2001/000259 patent/WO2001058215A1/fr active IP Right Grant
- 2001-01-19 EP EP01911377A patent/EP1252802B1/fr not_active Expired - Lifetime
- 2001-01-19 US US10/168,786 patent/US6630653B2/en not_active Expired - Fee Related
- 2001-01-19 JP JP2001557337A patent/JP2003522392A/ja not_active Ceased
- 2001-01-19 AT AT01911377T patent/ATE357124T1/de active
- 2001-01-19 DE DE50112190T patent/DE50112190D1/de not_active Expired - Lifetime
Non-Patent Citations (1)
Title |
---|
See references of WO0158215A1 * |
Also Published As
Publication number | Publication date |
---|---|
DE50112190D1 (de) | 2007-04-26 |
ATE357124T1 (de) | 2007-04-15 |
WO2001058215A1 (fr) | 2001-08-09 |
EP1252802B1 (fr) | 2007-03-14 |
DE10005146A1 (de) | 2001-08-09 |
US20020190061A1 (en) | 2002-12-19 |
US6630653B2 (en) | 2003-10-07 |
JP2003522392A (ja) | 2003-07-22 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP1252802B1 (fr) | Dispositif de regulation d'une repartition de la densite de flux d'energie a micro-ondes dans un applicateur, et utilisation de ce dispositif | |
DE3905303C2 (de) | Vorrichtung zur Erzeugung eines Plasmas durch Mikrowellen | |
DE4241927C2 (de) | Zur Anordnung in einem Vakuumgefäß geeignete selbsttragende isolierte Elektrodenanordnung, insbesondere Antennenspule für einen Hochfrequenz-Plasmagenerator | |
WO1999042778A2 (fr) | Procede et dispositif pour le frittage hyperfrequence de combustible nucleaire | |
WO1999052332A1 (fr) | Chalumeau a plasma avec emetteur hyperfrequence | |
DE102006048816A1 (de) | Vorrichtung und Verfahren zur lokalen Erzeugung von Mikrowellenplasmen | |
DE19603685C1 (de) | Mikrowellengerät | |
DE102010027619B3 (de) | Mikrowellenplasmaquelle mit einer Vorrichtung zur Zuführung von Mikrowellenenergie | |
EP2348788B1 (fr) | Dispositif de chauffage électrique | |
EP2120508B1 (fr) | Dispositif de chauffage à induction et procédé de fabrication d'un dispositif de chauffage à induction | |
DE102007044764B4 (de) | Hybridofen | |
DE4230029A1 (de) | Becherfoermige endzufuehrungen fuer elektrodenlose hochfrequenzlampen | |
EP3636050A1 (fr) | Dispositif de génération d'un jet de plasma dans la plage des mhz ou des ghz avec modes tem et guide creux | |
DE10341239B4 (de) | ECR-Plasmaquelle mit linearer Plasmaaustrittsöffnung | |
DE102004021016B4 (de) | Vorrichtung zur Einspeisung von Mikrowellenstrahlung in heiße Prozessräume | |
DE19640898C2 (de) | Mikrowellen-Sinterofen | |
DE2928238A1 (de) | Hoechstfrequenzgeraet vom magnetrontyp | |
EP0169472A2 (fr) | Elément de guide d'ondes pour micro-ondes | |
DD300723A7 (de) | Mikrowellen - Plasmaquelle | |
DE10358329B4 (de) | Vorrichtung zur Erzeugung angeregter und/oder ionisierter Teilchen in einem Plasma und Verfahren zur Erzeugung ionisierter Teilchen | |
DE10040320C1 (de) | Innenleiter eines koaxialen Gyrotrons mit um den Umfang gleichverteilten axialen Korrugationen | |
DE4433064C1 (de) | Anordnung zur Impedanzanpassung für nichtreziproke Bauelemente | |
EP0851712A2 (fr) | Four pour le traitement à haute température | |
DE10244941B4 (de) | Mikrowellen-Applikator | |
DE102004050256A1 (de) | Verfahren zur Einspeisung hoher Mikrowellenleistungen in Sinteranlagen durch mehrere Mikrowellenquellen |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20020605 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
RIN1 | Information on inventor provided before grant (corrected) |
Inventor name: GERDES, THORSTEN Inventor name: ROEDIGER, KLAUS Inventor name: WILLERT-PORADA, MONIKA |
|
GRAP | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOSNIGR1 |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): AT BE CH CY DE DK ES FI FR GB GR IE IT LI LU MC NL PT SE TR |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FI Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 Ref country code: NL Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: EP |
|
REF | Corresponds to: |
Ref document number: 50112190 Country of ref document: DE Date of ref document: 20070426 Kind code of ref document: P |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FG4D Free format text: LANGUAGE OF EP DOCUMENT: GERMAN |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: ES Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070625 |
|
REG | Reference to a national code |
Ref country code: SE Ref legal event code: TRGR |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: PT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070814 |
|
ET | Fr: translation filed | ||
NLV1 | Nl: lapsed or annulled due to failure to fulfill the requirements of art. 29p and 29m of the patents act | ||
GBV | Gb: ep patent (uk) treated as always having been void in accordance with gb section 77(7)/1977 [no translation filed] |
Effective date: 20070314 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 |
|
REG | Reference to a national code |
Ref country code: IE Ref legal event code: FD4D |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DK Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 Ref country code: IE Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 |
|
26N | No opposition filed |
Effective date: 20071217 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070615 Ref country code: IT Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 |
|
BERE | Be: lapsed |
Owner name: WIDIA G.M.B.H. Effective date: 20080131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: MC Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080131 |
|
REG | Reference to a national code |
Ref country code: CH Ref legal event code: PL |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LI Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080131 Ref country code: CH Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: CY Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: LU Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20080119 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: TR Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT Effective date: 20070314 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: DE Payment date: 20100324 Year of fee payment: 10 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20110202 Year of fee payment: 11 Ref country code: AT Payment date: 20110113 Year of fee payment: 11 Ref country code: SE Payment date: 20110113 Year of fee payment: 11 |
|
REG | Reference to a national code |
Ref country code: DE Ref legal event code: R119 Ref document number: 50112190 Country of ref document: DE Effective date: 20110802 |
|
REG | Reference to a national code |
Ref country code: SE Ref legal event code: EUG |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20120928 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: SE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120120 |
|
REG | Reference to a national code |
Ref country code: AT Ref legal event code: MM01 Ref document number: 357124 Country of ref document: AT Kind code of ref document: T Effective date: 20120119 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120131 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: AT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20120119 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20110802 |