EP1251403A4 - METHOD AND DEVICE FOR DEVELOPING PHOTO-SENSITIVE RELIEF RESIN PLATES - Google Patents

METHOD AND DEVICE FOR DEVELOPING PHOTO-SENSITIVE RELIEF RESIN PLATES

Info

Publication number
EP1251403A4
EP1251403A4 EP01974743A EP01974743A EP1251403A4 EP 1251403 A4 EP1251403 A4 EP 1251403A4 EP 01974743 A EP01974743 A EP 01974743A EP 01974743 A EP01974743 A EP 01974743A EP 1251403 A4 EP1251403 A4 EP 1251403A4
Authority
EP
European Patent Office
Prior art keywords
printing plate
photosensitive resin
liquid
developing liquid
developing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP01974743A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1251403A1 (en
Inventor
Hirotatsu Fujii
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Original Assignee
Asahi Kasei Corp
Asahi Chemical Industry Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Asahi Kasei Corp, Asahi Chemical Industry Co Ltd filed Critical Asahi Kasei Corp
Publication of EP1251403A1 publication Critical patent/EP1251403A1/en
Publication of EP1251403A4 publication Critical patent/EP1251403A4/en
Withdrawn legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3085—Imagewise removal using liquid means from plates or webs transported vertically; from plates suspended or immersed vertically in the processing unit

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP01974743A 2000-10-13 2001-10-09 METHOD AND DEVICE FOR DEVELOPING PHOTO-SENSITIVE RELIEF RESIN PLATES Withdrawn EP1251403A4 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2000314201 2000-10-13
JP2000314201 2000-10-13
PCT/JP2001/008856 WO2002033490A1 (fr) 2000-10-13 2001-10-09 Procede et appareil permettant de developper une plaque d"impression en relief en resine photosensible

Publications (2)

Publication Number Publication Date
EP1251403A1 EP1251403A1 (en) 2002-10-23
EP1251403A4 true EP1251403A4 (en) 2004-03-24

Family

ID=18793497

Family Applications (1)

Application Number Title Priority Date Filing Date
EP01974743A Withdrawn EP1251403A4 (en) 2000-10-13 2001-10-09 METHOD AND DEVICE FOR DEVELOPING PHOTO-SENSITIVE RELIEF RESIN PLATES

Country Status (7)

Country Link
US (1) US6727045B2 (zh)
EP (1) EP1251403A4 (zh)
JP (1) JP3933576B2 (zh)
KR (1) KR100552881B1 (zh)
CN (1) CN1211710C (zh)
AU (1) AU765766B2 (zh)
WO (1) WO2002033490A1 (zh)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4563623B2 (ja) * 2001-08-13 2010-10-13 旭化成イーマテリアルズ株式会社 感光性樹脂版の現像方法、及び現像装置
US6855487B2 (en) 2001-10-26 2005-02-15 Kodak Polychrome Graphics, Llc Method and apparatus for refreshment and reuse of loaded developer
WO2004095141A1 (en) * 2003-04-24 2004-11-04 Kodak Polychrome Graphics Gmbh Method and apparatus for refreshment and reuse of loaded developer
US8445180B2 (en) * 2003-12-26 2013-05-21 Asahi Kasei Chemicals Corporation Water-developable photopolymer plate for letterpress printing
JP2006019575A (ja) * 2004-07-02 2006-01-19 Sharp Corp フォトレジストの現像方法及び現像装置
JP2006252787A (ja) * 2005-03-08 2006-09-21 Toppan Printing Co Ltd 有機ｅｌ素子製造方法および有機ｅｌ素子
WO2007004431A1 (ja) * 2005-07-04 2007-01-11 Elfo-Tec Co., Ltd. 高精細パターンの形成方法及び装置
US8133658B2 (en) * 2005-07-29 2012-03-13 Anocoil Corporation Non-chemical development of printing plates
US7816065B2 (en) 2005-07-29 2010-10-19 Anocoil Corporation Imageable printing plate for on-press development
US8343707B2 (en) 2005-07-29 2013-01-01 Anocoil Corporation Lithographic printing plate for in-solidus development on press
US8377630B2 (en) * 2005-07-29 2013-02-19 Anocoil Corporation On-press plate development without contamination of fountain fluid
US8137897B2 (en) * 2005-07-29 2012-03-20 Anocoil Corporation Processless development of printing plate
JP5050518B2 (ja) * 2006-12-13 2012-10-17 凸版印刷株式会社 樹脂凸版の製造方法及び現像装置並びに印刷物の製造方法及び有機ｅｌ素子の製造方法
JP2009020507A (ja) * 2007-06-15 2009-01-29 Asahi Kasei Chemicals Corp 液状版感光性樹脂凸版の製版装置及びこれを用いた製版方法
WO2008153017A1 (ja) * 2007-06-15 2008-12-18 Asahi Kasei E-Materials Corporation 液状版感光性樹脂凸版の製版装置、これを用いた製版方法、並びに製版装置を構成する乾燥装置、後露光装置、版保持具、及び樹脂回収装置
JP4853537B2 (ja) * 2009-03-13 2012-01-11 東京エレクトロン株式会社 現像装置、現像方法及び記憶媒体
CN102486618A (zh) * 2010-12-02 2012-06-06 中芯国际集成电路制造(北京)有限公司 无抗水表面涂层的浸没式光刻胶的显影方法
CN102633321A (zh) * 2012-04-16 2012-08-15 成都新图新材料股份有限公司 一种平版印刷版材的碱性显影冲版废水处理方法、平版印刷版材的显影处理方法
CN103438926A (zh) * 2013-09-16 2013-12-11 无锡德贝尔光电材料有限公司 一种pcb用感光湿膜显影点测试装置
CN108196424A (zh) * 2017-12-28 2018-06-22 江苏乐彩印刷材料有限公司 一种固体感光树脂版的制版工艺

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3727536A (en) * 1973-01-03 1973-04-17 Dyna Flex Corp Exposed printing plate washer
EP0276092A2 (en) * 1987-01-17 1988-07-27 Nippon Paint Co., Ltd. Water-developable photosensitive resin composition, and resin or printing plate therefrom
US5230987A (en) * 1989-05-26 1993-07-27 Nippon Paint Co. Ltd. Water developable photosensitive resin composition
EP0559153A1 (en) * 1992-03-03 1993-09-08 Fuji Photo Film Co., Ltd. Plate-making method of dry lithographic plate and plate-making apparatus
JP2000029227A (ja) * 1998-05-07 2000-01-28 Kansai Shingijutsu Kenkyusho:Kk パターン形成方法および感光性樹脂組成物

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4042386A (en) * 1976-06-07 1977-08-16 Napp Systems Photosensitive compositions
JPS53143669A (en) 1977-05-23 1978-12-14 Asahi Chem Ind Co Ltd Elimination of surface tuckiness of radically-polymerizable resin cured product
US4233391A (en) * 1978-09-11 1980-11-11 Napp Systems (Usa) Inc. Water developable photopolymerizable compositions containing phosphine activators and saponified polyvinyl acetate
US4540649A (en) * 1984-09-12 1985-09-10 Napp Systems (Usa) Inc. Water developable photopolymerizable composition and printing plate element containing same
DE68927733T2 (de) 1988-05-31 1997-06-12 Napp Systems Inc Vorrichtung und verfahren zur behandlung von druckplatten
JPH04285962A (ja) 1991-03-14 1992-10-12 Konica Corp 湿し水不要感光性平版印刷版の処理方法
JPH07333860A (ja) 1994-06-14 1995-12-22 Toyobo Co Ltd 感光性樹脂版の洗い出し液の処理方法および処理装置
JP3586990B2 (ja) 1996-02-20 2004-11-10 旭化成ケミカルズ株式会社 感光性樹脂印刷版用現像液及び感光性樹脂印刷版の製造方法
JP2000221693A (ja) 1999-01-27 2000-08-11 Nippon Denshi Seiki Kk 水現像感光性フレキソ版溶出装置に用いるスカム除去方法および装置

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3727536A (en) * 1973-01-03 1973-04-17 Dyna Flex Corp Exposed printing plate washer
EP0276092A2 (en) * 1987-01-17 1988-07-27 Nippon Paint Co., Ltd. Water-developable photosensitive resin composition, and resin or printing plate therefrom
US5230987A (en) * 1989-05-26 1993-07-27 Nippon Paint Co. Ltd. Water developable photosensitive resin composition
EP0559153A1 (en) * 1992-03-03 1993-09-08 Fuji Photo Film Co., Ltd. Plate-making method of dry lithographic plate and plate-making apparatus
JP2000029227A (ja) * 1998-05-07 2000-01-28 Kansai Shingijutsu Kenkyusho:Kk パターン形成方法および感光性樹脂組成物

Non-Patent Citations (2)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 2000, no. 04 31 August 2000 (2000-08-31) *
See also references of WO0233490A1 *

Also Published As

Publication number Publication date
JPWO2002033490A1 (ja) 2004-02-26
WO2002033490A1 (fr) 2002-04-25
CN1392972A (zh) 2003-01-22
EP1251403A1 (en) 2002-10-23
KR100552881B1 (ko) 2006-02-20
AU9420601A (en) 2002-04-29
CN1211710C (zh) 2005-07-20
US20020182543A1 (en) 2002-12-05
US6727045B2 (en) 2004-04-27
JP3933576B2 (ja) 2007-06-20
KR20030023607A (ko) 2003-03-19
AU765766B2 (en) 2003-09-25

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