WO2008153017A1 - 液状版感光性樹脂凸版の製版装置、これを用いた製版方法、並びに製版装置を構成する乾燥装置、後露光装置、版保持具、及び樹脂回収装置 - Google Patents

液状版感光性樹脂凸版の製版装置、これを用いた製版方法、並びに製版装置を構成する乾燥装置、後露光装置、版保持具、及び樹脂回収装置 Download PDF

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Publication number
WO2008153017A1
WO2008153017A1 PCT/JP2008/060596 JP2008060596W WO2008153017A1 WO 2008153017 A1 WO2008153017 A1 WO 2008153017A1 JP 2008060596 W JP2008060596 W JP 2008060596W WO 2008153017 A1 WO2008153017 A1 WO 2008153017A1
Authority
WO
WIPO (PCT)
Prior art keywords
photoengraving
letterpress
post
resin
type photosensitive
Prior art date
Application number
PCT/JP2008/060596
Other languages
English (en)
French (fr)
Inventor
Hirotatsu Fujii
Original Assignee
Asahi Kasei E-Materials Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP2007158616A external-priority patent/JP2008310122A/ja
Priority claimed from JP2007158617A external-priority patent/JP2008307812A/ja
Priority claimed from JP2007158615A external-priority patent/JP2008310121A/ja
Application filed by Asahi Kasei E-Materials Corporation filed Critical Asahi Kasei E-Materials Corporation
Publication of WO2008153017A1 publication Critical patent/WO2008153017A1/ja

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3092—Recovery of material; Waste processing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2022—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure
    • G03F7/2024—Multi-step exposure, e.g. hybrid; backside exposure; blanket exposure, e.g. for image reversal; edge exposure, e.g. for edge bead removal; corrective exposure of the already developed image
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/3042—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations
    • G03F7/3064—Imagewise removal using liquid means from printing plates transported horizontally through the processing stations characterised by the transport means or means for confining the different units, e.g. to avoid the overflow

Abstract

　本発明は、液状版感光性樹脂凸版を吊り下げた状態で未硬化樹脂を除去する樹脂回収装置と、液状版感光性樹脂凸版を吊り下げた状態で洗浄する洗浄装置と、液状版感光性樹脂凸版を略水平状態で後露光する後露光装置と、を有する液状版感光性樹脂凸版の製版装置であって、前記樹脂回収装置と前記洗浄装置とが間隔を開けて対向配置されており前記間隔部分に前記後露光装置が配置されているか、又は、前記樹脂回収装置と前記洗浄装置と前記後露光装置とが並べて配置されており、前記樹脂回収装置と前記洗浄装置、前記洗浄装置と前記後露光装置とは、それぞれ液状版感光性樹脂凸版の搬送機構を介して連結されている液状版感光性樹脂凸版の製版装置を提供する。
PCT/JP2008/060596 2007-06-15 2008-06-10 液状版感光性樹脂凸版の製版装置、これを用いた製版方法、並びに製版装置を構成する乾燥装置、後露光装置、版保持具、及び樹脂回収装置 WO2008153017A1 (ja)

Applications Claiming Priority (8)

Application Number Priority Date Filing Date Title
JP2007-158614 2007-06-15
JP2007158616A JP2008310122A (ja) 2007-06-15 2007-06-15 液状版感光性樹脂凸版の乾燥装置
JP2007158614 2007-06-15
JP2007-158615 2007-06-15
JP2007-158617 2007-06-15
JP2007158617A JP2008307812A (ja) 2007-06-15 2007-06-15 版保持具
JP2007-158616 2007-06-15
JP2007158615A JP2008310121A (ja) 2007-06-15 2007-06-15 液状版感光性樹脂凸版の後露光装置

Publications (1)

Publication Number Publication Date
WO2008153017A1 true WO2008153017A1 (ja) 2008-12-18

Family

ID=40129622

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/JP2008/060596 WO2008153017A1 (ja) 2007-06-15 2008-06-10 液状版感光性樹脂凸版の製版装置、これを用いた製版方法、並びに製版装置を構成する乾燥装置、後露光装置、版保持具、及び樹脂回収装置

Country Status (1)

Country Link
WO (1) WO2008153017A1 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015501454A (ja) * 2011-11-02 2015-01-15 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 凸版印刷の印刷表面の熱処理の方法および装置

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62236743A (ja) * 1986-04-08 1987-10-16 Tomiya Yoshimatsu 印刷版洗浄装置への印刷版供給方法およびその装置
JPS6396660A (ja) * 1986-10-14 1988-04-27 Asahi Chem Ind Co Ltd 未硬化樹脂回収装置
JPH0580498A (ja) * 1991-09-19 1993-04-02 Toyobo Co Ltd 感光性樹脂版の連続製版装置
JP2001194773A (ja) * 2000-01-14 2001-07-19 Think Laboratory Co Ltd フレキソ製版工場
WO2002033490A1 (fr) * 2000-10-13 2002-04-25 Asahi Kasei Kabushiki Kaisha Procede et appareil permettant de developper une plaque d"impression en relief en resine photosensible
JP2004252093A (ja) * 2003-02-19 2004-09-09 Asahi Kasei Chemicals Corp 液状感光性樹脂凸版印刷版の製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS62236743A (ja) * 1986-04-08 1987-10-16 Tomiya Yoshimatsu 印刷版洗浄装置への印刷版供給方法およびその装置
JPS6396660A (ja) * 1986-10-14 1988-04-27 Asahi Chem Ind Co Ltd 未硬化樹脂回収装置
JPH0580498A (ja) * 1991-09-19 1993-04-02 Toyobo Co Ltd 感光性樹脂版の連続製版装置
JP2001194773A (ja) * 2000-01-14 2001-07-19 Think Laboratory Co Ltd フレキソ製版工場
WO2002033490A1 (fr) * 2000-10-13 2002-04-25 Asahi Kasei Kabushiki Kaisha Procede et appareil permettant de developper une plaque d"impression en relief en resine photosensible
JP2004252093A (ja) * 2003-02-19 2004-09-09 Asahi Kasei Chemicals Corp 液状感光性樹脂凸版印刷版の製造方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2015501454A (ja) * 2011-11-02 2015-01-15 イー・アイ・デュポン・ドウ・ヌムール・アンド・カンパニーＥ．Ｉ．Ｄｕ Ｐｏｎｔ Ｄｅ Ｎｅｍｏｕｒｓ Ａｎｄ Ｃｏｍｐａｎｙ 凸版印刷の印刷表面の熱処理の方法および装置

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