EP1133639B1 - Pump controller for precision pumping apparatus - Google Patents

Pump controller for precision pumping apparatus Download PDF

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Publication number
EP1133639B1
EP1133639B1 EP99965911A EP99965911A EP1133639B1 EP 1133639 B1 EP1133639 B1 EP 1133639B1 EP 99965911 A EP99965911 A EP 99965911A EP 99965911 A EP99965911 A EP 99965911A EP 1133639 B1 EP1133639 B1 EP 1133639B1
Authority
EP
European Patent Office
Prior art keywords
fluid
chamber
dispensation
pump
feed
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP99965911A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP1133639A1 (en
Inventor
Raymond A. Zagar
Robert F. Mcloughlin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
Original Assignee
Mykrolis Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mykrolis Corp filed Critical Mykrolis Corp
Publication of EP1133639A1 publication Critical patent/EP1133639A1/en
Application granted granted Critical
Publication of EP1133639B1 publication Critical patent/EP1133639B1/en
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B13/00—Pumps specially modified to deliver fixed or variable measured quantities
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/06—Control using electricity
    • F04B49/065—Control using electricity and making use of computers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B7/00—Piston machines or pumps characterised by having positively-driven valving
    • F04B7/0076—Piston machines or pumps characterised by having positively-driven valving the members being actuated by electro-magnetic means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/02—Piston parameters
    • F04B2201/0201—Position of the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/06—Valve parameters
    • F04B2201/0601—Opening times
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2205/00—Fluid parameters
    • F04B2205/03—Pressure in the compression chamber

Definitions

  • This invention relates generally to precision pumping apparatus and, more particularly to a pump controller for accurately controlling the amount of fluid dispensed from the precision pumping apparatus.
  • timing of the control valves operation and the dispense system dynamics, such as tubing length, tubing diameter and nozzle size, in a conventional pumping apparatus may also contribute to the problem of the double or stuttered dispense of low viscosity, low dispense rate fluids.
  • the invention provides a low dispense rate precision dispensing pumping apparatus and mothod, which enable precise and repeatable control of dispense rate and volume of low viscosity fluids, and which overcomes the foregoing and other disadvantages of conventional dispensing pumping apparatus and method.
  • the pumping apparatus precisely controls the dispensing amount and/or rate of low viscosity fluids by precisely controlling the operation of several different portions of the pumping apparatus during the dispense cycle.
  • a pump controller may precisely control the timing of the control valves with respect to each other, the motion of the dispensing motor, and the timing of the control valves with respect to the movement of the dispensing motor.
  • the pump controller in accordance with the invention accurately controls a pumping apparatus to avoid the double dispense or stuttered dispense problems associated with conventional pumping apparatus.
  • the invention is particularly applicable to a pumping apparatus which accurately dispenses precise amounts of low viscosity fluids and it is in this context that the invention will be described. It will be appreciated, however, that the apparatus and process in accordance with the invention has greater utility, such as to accurately dispensing precise amounts of other fluids which may not be low viscosity fluids.
  • FIG. 1 is a block diagram illustrating a pumping apparatus 10 including a pump controller in accordance with the invention.
  • the pumping apparatus 10 may include a two-stage pump 12, a fluid reservoir 14 and a computer 16 which operate together to dispense a precise amount of fluid onto a wafer 18.
  • a low viscosity fluid which may have a viscosity of less than 5 centipoire (cPs)
  • CCPs centipoire
  • the invention is not limited to dispensing low viscosity fluids or low flow rate fluids.
  • the pump 12 is a two-stage pump since the dispensing of the fluid includes a first feed and filtration stage and then a second separate dispensing stage as described below so that the dispense performance does not change over the lifetime of the filter.
  • the operation of the various portions of the pump 12 may be controlled by a software application 20, i.e., a computer program comprising pieces of software code which may be stored in a memory in the computer 16 and may be executed by a processor (not shown) in the computer.
  • the operation of the pump may also be controlled by a software application or pieces of software code which are being executed by a processor located inside the pump. The location of the processor executing the instructions to control the operation of the pump is not critical to the invention.
  • the software application 20 may control, for example, the opening and closing of the various control valves in the pump and the movement of the motors or actuators which drive the pump in order to accurately dispense a precise amount of fluid onto the wafer 18.
  • the method implemented by the software application for controlling the pump 12 to dispense low viscosity, low flow rate fluids in accordance with the invention will be described below with reference to Figure 5.
  • the pump 12 may draw fluid from the reservoir 14 into a feed chamber as described below.
  • the fluid may then be filtered through a filter and fed into a separate dispensing chamber as described below.
  • the fluid may be dispensed through a filter 22 onto the wafer 18 in precise amounts even for low viscosity, low rate fluids.
  • the actual cycles of the pump 12 will be described below with reference to Figures 3 and 4. Now, the details of the two-stage pump 12 will be described in order to better understand the invention.
  • FIG. 2 is a block diagram illustrating more details of the two-stage pump 12 with which the invention may be employed.
  • the two-stage pump 12 may include a feed and filtration stage 30 and a dispensing stage 32.
  • the feed and filtration stage 30 may include a feed chamber 34 which may draw fluid from a fluid supply reservoir through an open inlet valve 36 as more fluid is needed.
  • the inlet valve 36 is closed.
  • a feed valve 38 controls whether a vacuum, a positive feed pressure or the atmosphere is applied to a feed diaphragm 40 in the feed chamber.
  • a vacuum is applied to the diaphragm 40 so that the diaphragm is pulled against a wall of the feed chamber and pulls fluid into the feed chamber.
  • a feed pressure may be applied to the diaphragm.
  • a vent valve 42 may be opened as needed.
  • the inlet valve 36 is shut and the isolation valve 44 and a barrier valve 50 are opened to permit the fluid to flow through a filter 46 into the dispensing stage 32.
  • the isolation valve 44 and the barrier valve 50 may be closed.
  • the filter 46 may include a vent valve 48. As the fluid is pushed through the filter 46, unwanted impurities and the like are removed from the fluid. The fluid then flows through a barrier valve 50 into a dispensing chamber 52 in the second or dispensing stage of the pump, and the pump begins a dispense cycle as will now be described.
  • a purge valve 54 is opened and the fluid in the dispensing chamber 52 is pushed by a dispense diaphragm 56 to eliminate any bubbles in the fluid in the dispensing chamber 52.
  • the dispensing diaphragm may be between the dispensing chamber and a hydraulic fluid chamber 58 filled with hydraulic fluid.
  • the hydraulic fluid may be pressurized or depressurized by a dispensing pump 60 which may include a piston 62, a lead screw 64 and a stepper motor 66.
  • the stepper motor is engaged which engages the lead screw and pressurizes the hydraulic fluid.
  • the hydraulic fluid in turn pushes the dispensing diaphragm into the dispensing chamber 52 which pressurizes the fluid in the dispensing chamber 52 or pushes the fluid out of the dispensing chamber 52 if the purge valve 54 or an outlet valve 68 are opened. If the outlet valve 68 is open, then an accurate amount of the fluid is dispensed onto the wafer. Now, the typical process for dispensing fluid will be described.
  • FIG 3 is a timing diagram illustrating the conventional sequence for controlling a two-stage pump of the type shown in Figure 2 to dispense fluids.
  • the dispensing process may include a sequence of stages, i.e., steps such as a ready stage 70, a dispense stage 72, a suckback stage 74, a fill stage 76, a filter stage 78, a vent stage 80, a purge stage 82, a static purge stage 84.
  • steps such as a ready stage 70, a dispense stage 72, a suckback stage 74, a fill stage 76, a filter stage 78, a vent stage 80, a purge stage 82, a static purge stage 84.
  • the barrier and isolate valves are opened while the outlet valve is shut to bring the system and feed chamber to an equilibrium pressure state so that fluid may be dispensed.
  • the isolate and barrier valves close, the outlet valve is opened and the motor in the dispensing pump is started. Due to the relative incompressibility of the fluid being dispensed and the "stiffness" of the pump, the closing of the barrier valve pushes fluid out of the valve as it closes which pressurizes the fluid in the dispensing chamber and may cause the typical double dispense or stuttered dispense problem as described above since the outlet valve is open.
  • the closure of the barrier valve may increase the pressure in the dispensing chamber by a predetermined amount, which may be about 2-3 psi.
  • the actual pressure increase depends on the characteristics of the barrier valve being used.
  • an uneven dispensing of fluid or stuttered dispensing
  • the motor since the outlet valve takes more time to open than the starting of the motor and therefore the motor may be initially pushing the fluid through an outlet valve which is not quite completely open. This may cause an initial "spitting" of a small amount of fluid.
  • fluid may be dispensed onto the wafer.
  • the motor is stopped and reversed or an external stop/suckback valve (not shown) may be opened to suck any fluid remaining in the nozzle back into the dispensing chamber to ensure that no drips occur at the end of the fluid dispensing.
  • an external stop/suckback valve (not shown) may be opened to suck any fluid remaining in the nozzle back into the dispensing chamber to ensure that no drips occur at the end of the fluid dispensing.
  • the outlet valve is closed and the motor is stopped.
  • the inlet valve is opened and a vacuum is applied to the feed diaphragm to draw fluid into the feed chamber from the reservoir.
  • the inlet valve is closed, the isolate valve is opened, the feed motor applies positive pressure to the fluid in the feed chamber, the barrier valve is opened and the dispense motor is reversed to push fluid through the filter into the dispense chamber.- Once the fluid has exited the feed chamber, the isolate valve may be closed.
  • the isolate valve is opened, the barrier valve is closed, the vent valve is opened, the dispense motor is stopped and pressure is applied to the feed diaphram to remove air bubbles from the filter.
  • the isolate valve is closed, the feed pump does not apply pressure or a vacuum to the feed chamber, the vent valve is closed, the purge valve is opened and the dispense pump is moved forward to remove air bubbles from the dispensing chamber.
  • the dispense motor is stopped but the purge valve remains open to continue the removal of air from the dispensing chamber.
  • the isolate and barrier valves are opened and the purge is closed so that the feed pump and the system reaches ambient pressure and the pump is ready to dispense fluid.
  • this conventional dispensing process suffers from double dispense or stuttered dispense problems.
  • the closure of the barrier valve prior to dispensing pushes fluid out of the valve as it closes which pressurizes the fluid in the dispensing chamber. This may cause a small amount of unwanted fluid to dispense onto the wafer since the outlet valve is open.
  • the motor since the motor is started at the same time as the outlet valve is opened, an uneven dispensing of fluid (or stuttered dispensing) may occur since the outlet valve takes more time to open than the starting of the motor and therefore the motor may be initially pushing the fluid through an outlet valve which is not quite completely open.
  • Figure 4 is a timing diagram illustrating a method for dispensing fluids in accordance with the invention.
  • the dispensing process shown in Figure 4 has the same stages, i.e., steps, 70 - 84 as the conventional process.
  • much of the controlling of the valves and motors is similar to the conventional method above, and only the changes in the controlling of the valves and motors in accordance with the invention will be described here.
  • the method changes the manner of controlling of the valves and motors.
  • the barrier valve is not closed at the beginning of the dispense stage as it done in the conventional process. Rather, the barrier valve is closed at the beginning of the vent stage and kept closed during the dispense stage. This avoids the sudden rise in pressure in the dispense chamber and, therefore, fluid does not leak out of the outlet valve due to the sudden rise in pressure. Since the barrier valve does not open and close prior to the beginning of the dispense stage, but does close at the beginning of the vent stage, the pressure in the dispense chamber does increase after the vent and purge states and this additional pressure must be released.
  • the dispense motor may be reversed to back out the piston 62 some predetermined distance to compensate for any pressure increase caused by the closure of the barrier valve.
  • each step of the stepper motor may reduce the pressure by about 0.1 psi. If the closure of the barrier valve increases the pressure by 2 psi, then the motor may be reversed 20 steps to reduce the pressure in the dispense chamber by this amount to compensate for the closure of the barrier valve.
  • the actual pressure decrease depends on the characteristics of the particular stepper motor, lead screw and piston being used.
  • the pressure decrease caused by each step of the motor may be determined by a pressure sensor which is located inside the dispensing chamber. In accordance with the invention, since the outlet valve is not open when the additional pressure is added into the dispensing chamber during the vent stage, no "spitting" of the fluid onto the wafer may occur.
  • the motor may be further reversed a predetermined additional distance so that the motor may be moved forward just prior to dispensing to adjust the dispense pressure to zero and avoid any backlash which normally occurs when the motor is moved backwards before the dispensing of fluid.
  • the last motion prior to a dispense operation is normally forward to avoid the fact that, as the piston changes direction, there is some backlash.
  • the problem of the additional pressure caused by the closure of the barrier valve is avoided.
  • the valve is a mechanical device that requires a finite period of time to open.
  • the motor may start more quickly than the outlet valve may open. Therefore, starting the motor and opening the outlet valve simultaneously will cause a rise in pressure of the dispense fluid which in turn causes the stuttered dispensing.
  • the outlet valve is opened and then, some predetermined period of time, T, later, the dispense motor is started so that the outlet valve is completely open when the motor is started which achieves a good dispense.
  • the predetermined period of time depends on the characteristics of the outlet valve and dispense motor being used, but, if the outlet valve takes approximately 50 ms to open, then the predetermined period of time may be, for example, between 50 and 75 mS and preferably approximately 75 mS. This predetermined period of time may also be referred to as a delay.
  • the dispense motor is no longer pushing fluid through a partially open outlet valve so that an accurate, controlled amount of fluid may be dispensed onto the wafer.
  • the problems caused by the closure of the barrier valve and the simultaneously opening of the outlet valve and starting of the dispense motor are avoided to provide more accurate dispensing of fluids, such as low viscosity fluids.
  • valves and motors in the pumping apparatus are controlled by a software application so that the above changes in the dispensing process may be applied to any two-stage pumping apparatus since no hardware changes are needed.
  • the process in accordance with the invention may be easily adapted.
  • FIG. 5 is a flowchart illustrating a method 100 for controlling the dispensing of low viscosity fluids from a pumping apparatus in accordance with the invention.
  • the barrier valve is closed at the end of the filtering stage which increases the pressure in the dispense chamber.
  • the dispense motor is reversed a predetermined distance to compensate for the pressure increase caused by the closure of the barrier valve.
  • the motor may be reversed an additional distance so that, in step 108, when the motor is moved forward to eliminate backlash, the pressure of the dispense chamber remains at zero.
  • the pump is now ready for dispensing.
  • the outlet valve is opened.
  • the dispense motor is started some predetermined period of time later and fluid is dispensed in step 114. The method is then completed.

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  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Reciprocating Pumps (AREA)
  • Control Of Positive-Displacement Pumps (AREA)
  • Details Of Reciprocating Pumps (AREA)
  • Control Of Non-Positive-Displacement Pumps (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
EP99965911A 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus Expired - Lifetime EP1133639B1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10956898P 1998-11-23 1998-11-23
US109568P 1998-11-23
PCT/US1999/028002 WO2000031416A1 (en) 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus

Publications (2)

Publication Number Publication Date
EP1133639A1 EP1133639A1 (en) 2001-09-19
EP1133639B1 true EP1133639B1 (en) 2004-06-09

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ID=22328367

Family Applications (1)

Application Number Title Priority Date Filing Date
EP99965911A Expired - Lifetime EP1133639B1 (en) 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus

Country Status (6)

Country Link
EP (1) EP1133639B1 (zh)
CN (2) CN1175182C (zh)
AT (1) ATE268867T1 (zh)
DE (1) DE69917927T2 (zh)
TW (1) TW593888B (zh)
WO (1) WO2000031416A1 (zh)

Cited By (15)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7383967B2 (en) 1999-11-30 2008-06-10 Entegris, Inc. Apparatus and methods for pumping high viscosity fluids
US7684446B2 (en) 2006-03-01 2010-03-23 Entegris, Inc. System and method for multiplexing setpoints
US7850431B2 (en) 2005-12-02 2010-12-14 Entegris, Inc. System and method for control of fluid pressure
US7878765B2 (en) 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
US7897196B2 (en) 2005-12-05 2011-03-01 Entegris, Inc. Error volume system and method for a pump
US7940664B2 (en) 2005-12-02 2011-05-10 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US7946751B2 (en) 2006-03-01 2011-05-24 Entegris, Inc. Method for controlled mixing of fluids via temperature
US8025486B2 (en) 2005-12-02 2011-09-27 Entegris, Inc. System and method for valve sequencing in a pump
US8029247B2 (en) 2005-12-02 2011-10-04 Entegris, Inc. System and method for pressure compensation in a pump
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US8087429B2 (en) 2005-11-21 2012-01-03 Entegris, Inc. System and method for a pump with reduced form factor
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US8292598B2 (en) 2004-11-23 2012-10-23 Entegris, Inc. System and method for a variable home position dispense system
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US9631611B2 (en) 2006-11-30 2017-04-25 Entegris, Inc. System and method for operation of a pump

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US7543596B2 (en) * 2002-07-19 2009-06-09 Entegris, Inc. Liquid flow controller and precision dispense apparatus and system
WO2007061957A2 (en) * 2005-11-21 2007-05-31 Entegris, Inc. System and method for position control of a mechanical piston in a pump
JP5355091B2 (ja) * 2005-12-02 2013-11-27 インテグリス・インコーポレーテッド モータを用いて圧力変動を補正するためのシステムおよび方法
JP5224476B2 (ja) * 2006-06-02 2013-07-03 ノーメット マネージメント サービス ビイ．ヴイ． 駆動機構を具えた定量ポンプ
CN101936276B (zh) * 2008-11-20 2013-08-21 张家口百通环保科技有限公司 内燃机尾气净化的后处理系统过程中用于还原剂溶液抽取、计量并释放的计量泵
DE202010002145U1 (de) 2010-02-09 2011-09-07 Vacuubrand Gmbh + Co Kg Membranvakuumpumpe
US9421498B2 (en) * 2012-11-12 2016-08-23 Pall Corporation Systems and methods for conditioning a filter assembly
US9656197B2 (en) * 2012-11-12 2017-05-23 Pall Corporation Systems and methods for conditioning a filter assembly
US10132309B2 (en) * 2013-03-15 2018-11-20 Integrated Designs, L.P. Apparatus and method for the remote monitoring, viewing and control of a semiconductor process tool
WO2015184057A1 (en) * 2014-05-28 2015-12-03 Entegris, Inc. System and method for operation of a pump with feed and dispense sensors, filtration and dispense confirmation, and reduced pressure priming of filter

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JPS59177929A (ja) * 1983-03-28 1984-10-08 Canon Inc サツクバツクポンプ
JP2803859B2 (ja) * 1989-09-29 1998-09-24 株式会社日立製作所 流動体供給装置およびその制御方法
JPH0727150U (ja) * 1993-10-07 1995-05-19 大日本スクリーン製造株式会社 シリカ系被膜形成用塗布液吐出装置
EP0863538B1 (en) * 1997-03-03 2003-05-21 Tokyo Electron Limited Coating apparatus and coating method
JP3940854B2 (ja) * 1997-03-25 2007-07-04 Ｓｍｃ株式会社 サックバックバルブ

Cited By (27)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US7383967B2 (en) 1999-11-30 2008-06-10 Entegris, Inc. Apparatus and methods for pumping high viscosity fluids
US8814536B2 (en) 2004-11-23 2014-08-26 Entegris, Inc. System and method for a variable home position dispense system
US9617988B2 (en) 2004-11-23 2017-04-11 Entegris, Inc. System and method for variable dispense position
US8292598B2 (en) 2004-11-23 2012-10-23 Entegris, Inc. System and method for a variable home position dispense system
US8087429B2 (en) 2005-11-21 2012-01-03 Entegris, Inc. System and method for a pump with reduced form factor
US8651823B2 (en) 2005-11-21 2014-02-18 Entegris, Inc. System and method for a pump with reduced form factor
US9399989B2 (en) 2005-11-21 2016-07-26 Entegris, Inc. System and method for a pump with onboard electronics
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US9262361B2 (en) 2005-12-02 2016-02-16 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US7850431B2 (en) 2005-12-02 2010-12-14 Entegris, Inc. System and method for control of fluid pressure
US8029247B2 (en) 2005-12-02 2011-10-04 Entegris, Inc. System and method for pressure compensation in a pump
US8382444B2 (en) 2005-12-02 2013-02-26 Entegris, Inc. System and method for monitoring operation of a pump
US8678775B2 (en) 2005-12-02 2014-03-25 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US9816502B2 (en) 2005-12-02 2017-11-14 Entegris, Inc. System and method for pressure compensation in a pump
US8662859B2 (en) 2005-12-02 2014-03-04 Entegris, Inc. System and method for monitoring operation of a pump
US8025486B2 (en) 2005-12-02 2011-09-27 Entegris, Inc. System and method for valve sequencing in a pump
US7940664B2 (en) 2005-12-02 2011-05-10 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US8870548B2 (en) 2005-12-02 2014-10-28 Entegris, Inc. System and method for pressure compensation in a pump
US9025454B2 (en) 2005-12-02 2015-05-05 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US7878765B2 (en) 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
US9309872B2 (en) 2005-12-02 2016-04-12 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US7897196B2 (en) 2005-12-05 2011-03-01 Entegris, Inc. Error volume system and method for a pump
US7684446B2 (en) 2006-03-01 2010-03-23 Entegris, Inc. System and method for multiplexing setpoints
US7946751B2 (en) 2006-03-01 2011-05-24 Entegris, Inc. Method for controlled mixing of fluids via temperature
US9631611B2 (en) 2006-11-30 2017-04-25 Entegris, Inc. System and method for operation of a pump

Also Published As

Publication number Publication date
CN1175182C (zh) 2004-11-10
WO2000031416A1 (en) 2000-06-02
EP1133639A1 (en) 2001-09-19
CN1331783A (zh) 2002-01-16
DE69917927T2 (de) 2005-06-23
DE69917927D1 (de) 2004-07-15
TW593888B (en) 2004-06-21
ATE268867T1 (de) 2004-06-15
CN1590761A (zh) 2005-03-09

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