DE69917927D1 - Pumpensteuergerät für hochpräzisionsdosierpumpe - Google Patents

Pumpensteuergerät für hochpräzisionsdosierpumpe

Info

Publication number
DE69917927D1
DE69917927D1 DE69917927T DE69917927T DE69917927D1 DE 69917927 D1 DE69917927 D1 DE 69917927D1 DE 69917927 T DE69917927 T DE 69917927T DE 69917927 T DE69917927 T DE 69917927T DE 69917927 D1 DE69917927 D1 DE 69917927D1
Authority
DE
Germany
Prior art keywords
pump
control unit
high precision
precision dosing
pump control
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69917927T
Other languages
English (en)
Other versions
DE69917927T2 (de
Inventor
A Zagar
F Mcloughlin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Entegris Inc
Original Assignee
Mykrolis Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mykrolis Corp filed Critical Mykrolis Corp
Application granted granted Critical
Publication of DE69917927D1 publication Critical patent/DE69917927D1/de
Publication of DE69917927T2 publication Critical patent/DE69917927T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B13/00—Pumps specially modified to deliver fixed or variable measured quantities
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/06—Control using electricity
    • F04B49/065—Control using electricity and making use of computers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B7/00—Piston machines or pumps characterised by having positively-driven valving
    • F04B7/0076—Piston machines or pumps characterised by having positively-driven valving the members being actuated by electro-magnetic means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/02—Piston parameters
    • F04B2201/0201—Position of the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/06—Valve parameters
    • F04B2201/0601—Opening times
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2205/00—Fluid parameters
    • F04B2205/03—Pressure in the compression chamber
DE69917927T 1998-11-23 1999-11-23 Pumpensteuergerät für hochpräzisionsdosierpumpe Expired - Fee Related DE69917927T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US10956898P 1998-11-23 1998-11-23
US109568P 1998-11-23
PCT/US1999/028002 WO2000031416A1 (en) 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus

Publications (2)

Publication Number Publication Date
DE69917927D1 true DE69917927D1 (de) 2004-07-15
DE69917927T2 DE69917927T2 (de) 2005-06-23

Family

ID=22328367

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69917927T Expired - Fee Related DE69917927T2 (de) 1998-11-23 1999-11-23 Pumpensteuergerät für hochpräzisionsdosierpumpe

Country Status (6)

Country Link
EP (1) EP1133639B1 (de)
CN (2) CN1590761A (de)
AT (1) ATE268867T1 (de)
DE (1) DE69917927T2 (de)
TW (1) TW593888B (de)
WO (1) WO2000031416A1 (de)

Families Citing this family (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US6325932B1 (en) 1999-11-30 2001-12-04 Mykrolis Corporation Apparatus and method for pumping high viscosity fluid
CN101109470A (zh) * 2002-07-19 2008-01-23 诚实公司 液体流动控制器和精密分配设备及系统
CN101155992B (zh) * 2004-11-23 2013-02-20 恩特格里公司 用于可变原位置分配系统的系统和方法
WO2007061956A2 (en) 2005-11-21 2007-05-31 Entegris, Inc. System and method for a pump with reduced form factor
KR101283259B1 (ko) * 2005-11-21 2013-07-11 엔테그리스, 아이엔씨. 펌프에 있어서 기계식 피스톤의 위치 제어를 위한 시스템 및 방법
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US7850431B2 (en) 2005-12-02 2010-12-14 Entegris, Inc. System and method for control of fluid pressure
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
CN102705213A (zh) * 2005-12-02 2012-10-03 恩特格里公司 使用电机校正压力变化的系统和方法
KR101364385B1 (ko) 2005-12-02 2014-02-17 엔테그리스, 아이엔씨. 펌프 제어기를 인터페이스시키는 ｉ/ｏ 시스템, 방법 및디바이스
WO2007067342A2 (en) * 2005-12-02 2007-06-14 Entegris, Inc. System and method for valve sequencing in a pump
CN101356372B (zh) 2005-12-02 2012-07-04 恩特格里公司 用于在泵中进行压力补偿的系统和方法
US7878765B2 (en) * 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
US7897196B2 (en) 2005-12-05 2011-03-01 Entegris, Inc. Error volume system and method for a pump
TWI402423B (zh) * 2006-02-28 2013-07-21 Entegris Inc 用於一幫浦操作之系統及方法
US7494265B2 (en) 2006-03-01 2009-02-24 Entegris, Inc. System and method for controlled mixing of fluids via temperature
US7684446B2 (en) 2006-03-01 2010-03-23 Entegris, Inc. System and method for multiplexing setpoints
EP2024640A2 (de) * 2006-06-02 2009-02-18 Nomet Management Services B.V. Einen antriebsmechanismus umfassende volumetrische pumpe
CN101936276B (zh) * 2008-11-20 2013-08-21 张家口百通环保科技有限公司 内燃机尾气净化的后处理系统过程中用于还原剂溶液抽取、计量并释放的计量泵
DE202010002145U1 (de) 2010-02-09 2011-09-07 Vacuubrand Gmbh + Co Kg Membranvakuumpumpe
US9656197B2 (en) * 2012-11-12 2017-05-23 Pall Corporation Systems and methods for conditioning a filter assembly
US9421498B2 (en) * 2012-11-12 2016-08-23 Pall Corporation Systems and methods for conditioning a filter assembly
US9719504B2 (en) * 2013-03-15 2017-08-01 Integrated Designs, L.P. Pump having an automated gas removal and fluid recovery system and method
SG11201609910XA (en) * 2014-05-28 2016-12-29 Entegris Inc Anti-backlash mechanism for motor-driven components in precision systems and applications

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59177929A (ja) * 1983-03-28 1984-10-08 Canon Inc サツクバツクポンプ
JP2803859B2 (ja) * 1989-09-29 1998-09-24 株式会社日立製作所 流動体供給装置およびその制御方法
JPH0727150U (ja) * 1993-10-07 1995-05-19 大日本スクリーン製造株式会社 シリカ系被膜形成用塗布液吐出装置
DE69814710T2 (de) * 1997-03-03 2004-03-18 Tokyo Electron Ltd. Beschichtungs-Vorrichtung und Verfahren
JP3940854B2 (ja) * 1997-03-25 2007-07-04 Ｓｍｃ株式会社 サックバックバルブ

Also Published As

Publication number Publication date
DE69917927T2 (de) 2005-06-23
EP1133639A1 (de) 2001-09-19
EP1133639B1 (de) 2004-06-09
TW593888B (en) 2004-06-21
CN1590761A (zh) 2005-03-09
CN1175182C (zh) 2004-11-10
WO2000031416A1 (en) 2000-06-02
ATE268867T1 (de) 2004-06-15
CN1331783A (zh) 2002-01-16

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Legal Events

Date Code Title Description
8364 No opposition during term of opposition
8327 Change in the person/name/address of the patent owner

Owner name: ENTEGRIS,INC.(N.D.GES.D.STAATES DELAWARE), CHA, US

8327 Change in the person/name/address of the patent owner

Owner name: ENTEGRIS,INC. (N.D.GES.D.STAATES DELAWARE), BI, US

8339 Ceased/non-payment of the annual fee