WO2000031416A1 - Pump controller for precision pumping apparatus - Google Patents

Pump controller for precision pumping apparatus Download PDF

Info

Publication number
WO2000031416A1
WO2000031416A1 PCT/US1999/028002 US9928002W WO0031416A1 WO 2000031416 A1 WO2000031416 A1 WO 2000031416A1 US 9928002 W US9928002 W US 9928002W WO 0031416 A1 WO0031416 A1 WO 0031416A1
Authority
WO
WIPO (PCT)
Prior art keywords
fluid
chamber
dispensation
pump
feed
Prior art date
Application number
PCT/US1999/028002
Other languages
English (en)
French (fr)
Inventor
Raymond A. Zagar
Robert F. Mcloughlin
Original Assignee
Millipore Corporation
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Millipore Corporation filed Critical Millipore Corporation
Priority to DE69917927T priority Critical patent/DE69917927T2/de
Priority to AT99965911T priority patent/ATE268867T1/de
Priority to EP99965911A priority patent/EP1133639B1/en
Publication of WO2000031416A1 publication Critical patent/WO2000031416A1/en

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B13/00—Pumps specially modified to deliver fixed or variable measured quantities
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B43/00—Machines, pumps, or pumping installations having flexible working members
    • F04B43/02—Machines, pumps, or pumping installations having flexible working members having plate-like flexible members, e.g. diaphragms
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B49/00—Control, e.g. of pump delivery, or pump pressure of, or safety measures for, machines, pumps, or pumping installations, not otherwise provided for, or of interest apart from, groups F04B1/00 - F04B47/00
    • F04B49/06—Control using electricity
    • F04B49/065—Control using electricity and making use of computers
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B7/00—Piston machines or pumps characterised by having positively-driven valving
    • F04B7/0076—Piston machines or pumps characterised by having positively-driven valving the members being actuated by electro-magnetic means
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/02—Piston parameters
    • F04B2201/0201—Position of the piston
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2201/00—Pump parameters
    • F04B2201/06—Valve parameters
    • F04B2201/0601—Opening times
    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F04—POSITIVE - DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS FOR LIQUIDS OR ELASTIC FLUIDS
    • F04B—POSITIVE-DISPLACEMENT MACHINES FOR LIQUIDS; PUMPS
    • F04B2205/00—Fluid parameters
    • F04B2205/03—Pressure in the compression chamber

Definitions

  • This invention relates generally to precision pumping apparatus and, more
  • semiconductor wafers during processing typically require a flatness across the surface
  • centrifugal force to the edges of the wafer has to be controlled in order to ensure that
  • the processing liquid is applied uniformly. It is also critical to control the rate and
  • pumping apparatus may also contribute to the problem of the double or stuttered
  • the pumping apparatus precisely controls the dispensing amount and/or rate
  • controller may precisely control the timing of the control valves with respect to each
  • the pump controller in accordance with
  • FIG. 1 is a block diagram illustrating a pumping apparatus including a pump controller in accordance with the invention
  • Figure 2 is a block diagram illustrating a two-stage pumping apparatus
  • Figure 3 is a timing diagram illustrating the conventional sequence for dispensing fluids
  • Figure 4 is a timing diagram illustrating a sequence for dispensing fluids in accordance with the invention.
  • Figure 5 is a flowchart illustrating a method for controlling a pumping apparatus to dispense low viscosity fluids in accordance with the invention.
  • the invention is particularly applicable to a pumping apparatus which
  • FIG. 1 is a block diagram illustrating a pumping apparatus 10 including a
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • the pumping apparatus 10 may be any pump controller in accordance with the invention.
  • a low viscosity fluid which may have a viscosity of less than 5 centipoire
  • (cPs) may be dispensed at a low flow rate of about 0.5 milliliters per second, but the
  • invention is not limited to dispensing low viscosity fluids or low flow rate fluids.
  • pump 12 is a two-stage pump since the dispensing of the fluid includes a first feed and
  • memory in the computer 16 may be executed by a processor (not shown) in the
  • the operation of the pump may also be controlled by a software application
  • the software application 20 may control, for example, the opening and closing
  • the pump 12 may draw fluid from the reservoir 14 into
  • the fluid may then be filtered through a filter and
  • the fluid may be dispensed through a filter 22 onto the wafer 18 in precise
  • stage pump 12 will be described in order to better understand the invention.
  • FIG. 2 is a block diagram illustrating more details of the two-stage pump 12
  • the two-stage pump 12 may be employed.
  • the two-stage pump 12 may be employed.
  • the two-stage pump 12 may be employed.
  • the feed and filtration stage 30 include a feed and filtration stage 30 and a dispensing stage 32.
  • the feed and filtration stage 30 includes a feed and filtration stage 30 and a dispensing stage 32.
  • stage 30 may include a feed chamber 34 which may draw fluid from a fluid supply
  • the inlet valve 36 is closed.
  • a feed valve 38 controls whether a vacuum, a positive feed pressure
  • diaphragm is pulled against a wall of the feed chamber and pulls fluid into the feed
  • a feed pressure may be applied to
  • a vent valve 42 may be opened as
  • isolation valve 44 and a barrier valve 50 are opened to permit the fluid to flow through
  • the isolation valve 44 to isolate the feed and filtration stage from the dispensing stage, the isolation valve 44
  • barrier valve 50 may be closed. To vent unwanted air from the system or
  • the filter 46 may include a vent valve 48. As the fluid is
  • the fluid then flows through a barrier valve 50 into a dispensing chamber 52 in
  • barrier valve 50 is closed, a purge valve 54 is opened and the fluid in the dispensing
  • the dispensing diaphragm may be between the dispensing chamber and a hydraulic fluid
  • the hydraulic fluid may be pressurized or de-
  • a dispensing pump 60 which may include a piston 62, a lead screw 64
  • stepper motor is engaged which engages the lead screw and pressurizes the
  • the hydraulic fluid in turn pushes the dispensing diaphragm into the
  • dispensing chamber 52 which pressurizes the fluid in the dispensing chamber 52 or
  • valve 68 are opened. If the outlet valve 68 is open, then an accurate amount of the
  • Figure 3 is a timing diagram illustrating the conventional sequence for
  • the dispensing process may include a sequence of
  • stages i.e., steps such as a ready stage 70, a dispense stage 72, a suckback stage 74, a
  • the barrier and isolate valves are opened while the
  • outlet valve is shut to bring the system and feed chamber to an equilibrium pressure
  • barrier valves close, the outlet valve is opened and the motor in the dispensing pump is started. Due to the relative incompressibility of the fluid being dispensed and the
  • outlet valve is open.
  • the closure of the barrier valve may increase the pressure in the
  • dispensing chamber by a predetermined amount, which may be about 2 - 3 psi.
  • fluid may be dispensed onto the wafer.
  • the inlet valve is closed, the isolate valve is opened, the
  • the isolate valve may
  • the isolate valve is opened, the barrier valve
  • the purge stage the isolate valve is closed, the feed pump does not apply pressure or a
  • dispense pump is moved forward to remove air bubbles from the dispensing chamber.
  • valve remains open to continue the removal of air from the dispensing chamber.
  • stuttered dispensing may occur since the outlet valve takes more time to open than the starting of the motor and therefore the motor may be initially pushing the fluid through
  • Figure 4 is a timing diagram illustrating a method for dispensing fluids in
  • the method changes the manner of controlling of the valves and
  • the barrier valve is not closed at the
  • barrier valve is closed at the beginning of the vent stage and kept closed during the
  • the dispense motor may be reversed to back out the piston 62 some predetermined distance to
  • each step of the stepper motor may reduce the pressure by about 0J psi.
  • the closure of the barrier valve increases the pressure by 2 psi, then the motor may be
  • the pressure decrease caused by each step of the motor may be
  • the fluid onto the wafer may occur.
  • the motor may be further reversed a predetermined additional distance so that
  • the motor may be moved forward just prior to dispensing to adjust the dispense
  • valve and the start of the motor are changed to avoid the stuttering dispense problem.
  • valve is a mechanical device that requires a finite period of time to
  • the motor may start more quickly than the outlet valve may
  • valve is completely open when the motor is started which achieves a good dispense.
  • the predetermined period of time may be, for example, between 50 and 75 mS and
  • This predetermined period of time may also be
  • the dispense motor is no
  • controlled amount of fluid may be dispensed onto the wafer.
  • valves and motors in the pumping apparatus are identical to the valves and motors in the pumping apparatus.
  • Figure 5 is a flowchart illustrating a method 100 for controlling the dispensing
  • the barrier valve is closed at the end of the filtering stage which increases
  • step 104 during the static purge stage, the
  • dispense motor is reversed a predetermined distance to compensate for the pressure
  • step 106 the motor may
  • step 108 the pump is now ready for dispensing.
  • step 110 the outlet valve is
  • step 112 the dispense motor is started some predetermined period of
  • step 114 The method is then completed.

Landscapes

  • Engineering & Computer Science (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Reciprocating Pumps (AREA)
  • Control Of Positive-Displacement Pumps (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
  • Details Of Reciprocating Pumps (AREA)
  • Control Of Non-Positive-Displacement Pumps (AREA)
PCT/US1999/028002 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus WO2000031416A1 (en)

Priority Applications (3)

Application Number Priority Date Filing Date Title
DE69917927T DE69917927T2 (de) 1998-11-23 1999-11-23 Pumpensteuergerät für hochpräzisionsdosierpumpe
AT99965911T ATE268867T1 (de) 1998-11-23 1999-11-23 Pumpensteuergerät für hochpräzisionsdosierpumpe
EP99965911A EP1133639B1 (en) 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US10956898P 1998-11-23 1998-11-23
US60/109,568 1998-11-23

Publications (1)

Publication Number Publication Date
WO2000031416A1 true WO2000031416A1 (en) 2000-06-02

Family

ID=22328367

Family Applications (1)

Application Number Title Priority Date Filing Date
PCT/US1999/028002 WO2000031416A1 (en) 1998-11-23 1999-11-23 Pump controller for precision pumping apparatus

Country Status (6)

Country Link
EP (1) EP1133639B1 (zh)
CN (2) CN1175182C (zh)
AT (1) ATE268867T1 (zh)
DE (1) DE69917927T2 (zh)
TW (1) TW593888B (zh)
WO (1) WO2000031416A1 (zh)

Cited By (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2006057957A2 (en) * 2004-11-23 2006-06-01 Entegris, Inc. System and method for a variable home position dispense system
CN100374768C (zh) * 2002-07-19 2008-03-12 诚实公司 液体流动控制设备及方法
US7383967B2 (en) 1999-11-30 2008-06-10 Entegris, Inc. Apparatus and methods for pumping high viscosity fluids
US7684446B2 (en) 2006-03-01 2010-03-23 Entegris, Inc. System and method for multiplexing setpoints
US7850431B2 (en) 2005-12-02 2010-12-14 Entegris, Inc. System and method for control of fluid pressure
US7878765B2 (en) 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
US7897196B2 (en) 2005-12-05 2011-03-01 Entegris, Inc. Error volume system and method for a pump
US7940664B2 (en) 2005-12-02 2011-05-10 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US7946751B2 (en) 2006-03-01 2011-05-24 Entegris, Inc. Method for controlled mixing of fluids via temperature
US8025486B2 (en) 2005-12-02 2011-09-27 Entegris, Inc. System and method for valve sequencing in a pump
US8029247B2 (en) 2005-12-02 2011-10-04 Entegris, Inc. System and method for pressure compensation in a pump
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US8087429B2 (en) 2005-11-21 2012-01-03 Entegris, Inc. System and method for a pump with reduced form factor
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US9631611B2 (en) 2006-11-30 2017-04-25 Entegris, Inc. System and method for operation of a pump

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2007061957A2 (en) * 2005-11-21 2007-05-31 Entegris, Inc. System and method for position control of a mechanical piston in a pump
JP5355091B2 (ja) * 2005-12-02 2013-11-27 インテグリス・インコーポレーテッド モータを用いて圧力変動を補正するためのシステムおよび方法
JP5224476B2 (ja) * 2006-06-02 2013-07-03 ノーメット マネージメント サービス ビイ．ヴイ． 駆動機構を具えた定量ポンプ
CN101936276B (zh) * 2008-11-20 2013-08-21 张家口百通环保科技有限公司 内燃机尾气净化的后处理系统过程中用于还原剂溶液抽取、计量并释放的计量泵
DE202010002145U1 (de) 2010-02-09 2011-09-07 Vacuubrand Gmbh + Co Kg Membranvakuumpumpe
US9421498B2 (en) * 2012-11-12 2016-08-23 Pall Corporation Systems and methods for conditioning a filter assembly
US9656197B2 (en) * 2012-11-12 2017-05-23 Pall Corporation Systems and methods for conditioning a filter assembly
US10132309B2 (en) * 2013-03-15 2018-11-20 Integrated Designs, L.P. Apparatus and method for the remote monitoring, viewing and control of a semiconductor process tool
WO2015184057A1 (en) * 2014-05-28 2015-12-03 Entegris, Inc. System and method for operation of a pump with feed and dispense sensors, filtration and dispense confirmation, and reduced pressure priming of filter

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4597719A (en) * 1983-03-28 1986-07-01 Canon Kabushiki Kaisha Suck-back pump
US5134962A (en) * 1989-09-29 1992-08-04 Hitachi, Ltd. Spin coating apparatus
US5599394A (en) * 1993-10-07 1997-02-04 Dainippon Screen Mfg., Co., Ltd. Apparatus for delivering a silica film forming solution
EP0863538A2 (en) * 1997-03-03 1998-09-09 Tokyo Electron Limited Coating apparatus and coating method
EP0867649A2 (en) * 1997-03-25 1998-09-30 SMC Kabushiki Kaisha Suck back valve

Patent Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4597719A (en) * 1983-03-28 1986-07-01 Canon Kabushiki Kaisha Suck-back pump
US5134962A (en) * 1989-09-29 1992-08-04 Hitachi, Ltd. Spin coating apparatus
US5599394A (en) * 1993-10-07 1997-02-04 Dainippon Screen Mfg., Co., Ltd. Apparatus for delivering a silica film forming solution
EP0863538A2 (en) * 1997-03-03 1998-09-09 Tokyo Electron Limited Coating apparatus and coating method
EP0867649A2 (en) * 1997-03-25 1998-09-30 SMC Kabushiki Kaisha Suck back valve

Cited By (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8172546B2 (en) 1998-11-23 2012-05-08 Entegris, Inc. System and method for correcting for pressure variations using a motor
US7383967B2 (en) 1999-11-30 2008-06-10 Entegris, Inc. Apparatus and methods for pumping high viscosity fluids
CN100374768C (zh) * 2002-07-19 2008-03-12 诚实公司 液体流动控制设备及方法
KR101212824B1 (ko) * 2004-11-23 2012-12-14 엔테그리스, 아이엔씨. 가변 홈 위치 토출 장치용 시스템 및 방법
WO2006057957A3 (en) * 2004-11-23 2007-11-15 Entegris Inc System and method for a variable home position dispense system
JP2008520908A (ja) * 2004-11-23 2008-06-19 エンテグリース，インコーポレイテッド 可変定位置ディスペンスシステムのためのシステムおよび方法
US9617988B2 (en) 2004-11-23 2017-04-11 Entegris, Inc. System and method for variable dispense position
WO2006057957A2 (en) * 2004-11-23 2006-06-01 Entegris, Inc. System and method for a variable home position dispense system
US8814536B2 (en) 2004-11-23 2014-08-26 Entegris, Inc. System and method for a variable home position dispense system
US8292598B2 (en) 2004-11-23 2012-10-23 Entegris, Inc. System and method for a variable home position dispense system
US9399989B2 (en) 2005-11-21 2016-07-26 Entegris, Inc. System and method for a pump with onboard electronics
US8651823B2 (en) 2005-11-21 2014-02-18 Entegris, Inc. System and method for a pump with reduced form factor
US8753097B2 (en) 2005-11-21 2014-06-17 Entegris, Inc. Method and system for high viscosity pump
US8087429B2 (en) 2005-11-21 2012-01-03 Entegris, Inc. System and method for a pump with reduced form factor
US8870548B2 (en) 2005-12-02 2014-10-28 Entegris, Inc. System and method for pressure compensation in a pump
US8678775B2 (en) 2005-12-02 2014-03-25 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US8029247B2 (en) 2005-12-02 2011-10-04 Entegris, Inc. System and method for pressure compensation in a pump
US8025486B2 (en) 2005-12-02 2011-09-27 Entegris, Inc. System and method for valve sequencing in a pump
US8382444B2 (en) 2005-12-02 2013-02-26 Entegris, Inc. System and method for monitoring operation of a pump
US9816502B2 (en) 2005-12-02 2017-11-14 Entegris, Inc. System and method for pressure compensation in a pump
US8662859B2 (en) 2005-12-02 2014-03-04 Entegris, Inc. System and method for monitoring operation of a pump
US7850431B2 (en) 2005-12-02 2010-12-14 Entegris, Inc. System and method for control of fluid pressure
US7940664B2 (en) 2005-12-02 2011-05-10 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US8083498B2 (en) 2005-12-02 2011-12-27 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US7878765B2 (en) 2005-12-02 2011-02-01 Entegris, Inc. System and method for monitoring operation of a pump
US9025454B2 (en) 2005-12-02 2015-05-05 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US9262361B2 (en) 2005-12-02 2016-02-16 Entegris, Inc. I/O systems, methods and devices for interfacing a pump controller
US9309872B2 (en) 2005-12-02 2016-04-12 Entegris, Inc. System and method for position control of a mechanical piston in a pump
US7897196B2 (en) 2005-12-05 2011-03-01 Entegris, Inc. Error volume system and method for a pump
US7684446B2 (en) 2006-03-01 2010-03-23 Entegris, Inc. System and method for multiplexing setpoints
US7946751B2 (en) 2006-03-01 2011-05-24 Entegris, Inc. Method for controlled mixing of fluids via temperature
US9631611B2 (en) 2006-11-30 2017-04-25 Entegris, Inc. System and method for operation of a pump

Also Published As

Publication number Publication date
CN1175182C (zh) 2004-11-10
EP1133639A1 (en) 2001-09-19
CN1331783A (zh) 2002-01-16
EP1133639B1 (en) 2004-06-09
DE69917927T2 (de) 2005-06-23
DE69917927D1 (de) 2004-07-15
TW593888B (en) 2004-06-21
ATE268867T1 (de) 2004-06-15
CN1590761A (zh) 2005-03-09

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