EP1023641A4 - Methode und system zur kontrolle von entwurfsregeln - Google Patents
Methode und system zur kontrolle von entwurfsregelnInfo
- Publication number
- EP1023641A4 EP1023641A4 EP98951922A EP98951922A EP1023641A4 EP 1023641 A4 EP1023641 A4 EP 1023641A4 EP 98951922 A EP98951922 A EP 98951922A EP 98951922 A EP98951922 A EP 98951922A EP 1023641 A4 EP1023641 A4 EP 1023641A4
- Authority
- EP
- European Patent Office
- Prior art keywords
- design rule
- checking system
- rule checking
- design
- rule
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/36—Masks having proximity correction features; Preparation thereof, e.g. optical proximity correction [OPC] design processes
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/68—Preparation processes not covered by groups G03F1/20 - G03F1/50
- G03F1/70—Adapting basic layout or design of masks to lithographic process requirements, e.g., second iteration correction of mask patterns for imaging
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70681—Metrology strategies
- G03F7/70683—Mark designs
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L27/00—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate
- H01L27/02—Devices consisting of a plurality of semiconductor or other solid-state components formed in or on a common substrate including semiconductor components specially adapted for rectifying, oscillating, amplifying or switching and having potential barriers; including integrated passive circuit elements having potential barriers
- H01L27/0203—Particular design considerations for integrated circuits
- H01L27/0207—Geometrical layout of the components, e.g. computer aided design; custom LSI, semi-custom LSI, standard cell technique
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Power Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
Applications Claiming Priority (13)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US5930697P | 1997-09-17 | 1997-09-17 | |
US59306P | 1997-09-17 | ||
US931921 | 1997-09-17 | ||
US08/931,921 US5858580A (en) | 1997-09-17 | 1997-09-17 | Phase shifting circuit manufacture method and apparatus |
US6954997P | 1997-12-12 | 1997-12-12 | |
US69549P | 1997-12-12 | ||
US09/130,996 US6757645B2 (en) | 1997-09-17 | 1998-08-07 | Visual inspection and verification system |
US130996 | 1998-08-07 | ||
US153783 | 1998-09-16 | ||
US09/153,783 US6470489B1 (en) | 1997-09-17 | 1998-09-16 | Design rule checking system and method |
US09/154,397 US6453452B1 (en) | 1997-12-12 | 1998-09-16 | Method and apparatus for data hierarchy maintenance in a system for mask description |
US154397 | 1998-09-16 | ||
PCT/US1998/019510 WO1999014638A1 (en) | 1997-09-17 | 1998-09-17 | Design rule checking system and method |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1023641A1 EP1023641A1 (de) | 2000-08-02 |
EP1023641A4 true EP1023641A4 (de) | 2009-04-22 |
Family
ID=27556793
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98947103A Withdrawn EP1023639A4 (de) | 1997-09-17 | 1998-09-17 | Methode und gerät zur strukturierung hierarchischer daten in einer masken-definition |
EP98951922A Withdrawn EP1023641A4 (de) | 1997-09-17 | 1998-09-17 | Methode und system zur kontrolle von entwurfsregeln |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98947103A Withdrawn EP1023639A4 (de) | 1997-09-17 | 1998-09-17 | Methode und gerät zur strukturierung hierarchischer daten in einer masken-definition |
Country Status (5)
Country | Link |
---|---|
EP (2) | EP1023639A4 (de) |
JP (2) | JP4624550B2 (de) |
KR (2) | KR20010024113A (de) |
AU (3) | AU9396098A (de) |
WO (1) | WO1999014638A1 (de) |
Families Citing this family (39)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6453452B1 (en) | 1997-12-12 | 2002-09-17 | Numerical Technologies, Inc. | Method and apparatus for data hierarchy maintenance in a system for mask description |
US7412676B2 (en) | 2000-06-13 | 2008-08-12 | Nicolas B Cobb | Integrated OPC verification tool |
JP2004503879A (ja) * | 2000-06-13 | 2004-02-05 | メンター グラフィックス コーポレイション | 集積化検証および製造適応ツール |
US6425113B1 (en) | 2000-06-13 | 2002-07-23 | Leigh C. Anderson | Integrated verification and manufacturability tool |
US6978436B2 (en) | 2000-07-05 | 2005-12-20 | Synopsys, Inc. | Design data format and hierarchy management for phase processing |
US6430737B1 (en) | 2000-07-10 | 2002-08-06 | Mentor Graphics Corp. | Convergence technique for model-based optical and process correction |
JP2002122977A (ja) * | 2000-10-17 | 2002-04-26 | Sony Corp | フォトマスクの作成法、フォトマスク、並びに露光方法 |
KR100649969B1 (ko) * | 2000-12-26 | 2006-11-27 | 주식회사 하이닉스반도체 | 마스크 제작방법 |
US6395438B1 (en) | 2001-01-08 | 2002-05-28 | International Business Machines Corporation | Method of etch bias proximity correction |
US6505327B2 (en) | 2001-04-13 | 2003-01-07 | Numerical Technologies, Inc. | Generating an instance-based representation of a design hierarchy |
JP3572053B2 (ja) * | 2001-05-31 | 2004-09-29 | 株式会社東芝 | 露光マスクの製造方法、マスク基板情報生成方法、半導体装置の製造方法およびサーバー |
US6560766B2 (en) | 2001-07-26 | 2003-05-06 | Numerical Technologies, Inc. | Method and apparatus for analyzing a layout using an instance-based representation |
US6721928B2 (en) | 2001-07-26 | 2004-04-13 | Numerical Technologies, Inc. | Verification utilizing instance-based hierarchy management |
US6738958B2 (en) | 2001-09-10 | 2004-05-18 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process composite gates |
US6735752B2 (en) | 2001-09-10 | 2004-05-11 | Numerical Technologies, Inc. | Modifying a hierarchical representation of a circuit to process features created by interactions between cells |
US6880135B2 (en) | 2001-11-07 | 2005-04-12 | Synopsys, Inc. | Method of incorporating lens aberration information into various process flows |
US7085698B2 (en) | 2001-12-18 | 2006-08-01 | Synopsys, Inc. | Method for providing flexible and dynamic reporting capability using simulation tools |
US7159197B2 (en) | 2001-12-31 | 2007-01-02 | Synopsys, Inc. | Shape-based geometry engine to perform smoothing and other layout beautification operations |
JP4138318B2 (ja) * | 2002-01-08 | 2008-08-27 | 株式会社ルネサステクノロジ | リソグラフィプロセスマージン評価装置、リソグラフィプロセスマージン評価方法およびリソグラフィプロセスマージン評価プログラム |
US7293249B2 (en) | 2002-01-31 | 2007-11-06 | Juan Andres Torres Robles | Contrast based resolution enhancement for photolithographic processing |
US7386433B2 (en) | 2002-03-15 | 2008-06-10 | Synopsys, Inc. | Using a suggested solution to speed up a process for simulating and correcting an integrated circuit layout |
US6944844B2 (en) | 2002-04-03 | 2005-09-13 | Synopsys, Inc. | System and method to determine impact of line end shortening |
US6931613B2 (en) | 2002-06-24 | 2005-08-16 | Thomas H. Kauth | Hierarchical feature extraction for electrical interaction calculations |
US6687895B2 (en) | 2002-07-03 | 2004-02-03 | Numerical Technologies Inc. | Method and apparatus for reducing optical proximity correction output file size |
US7069534B2 (en) | 2003-12-17 | 2006-06-27 | Sahouria Emile Y | Mask creation with hierarchy management using cover cells |
US7861207B2 (en) | 2004-02-25 | 2010-12-28 | Mentor Graphics Corporation | Fragmentation point and simulation site adjustment for resolution enhancement techniques |
US7448012B1 (en) | 2004-04-21 | 2008-11-04 | Qi-De Qian | Methods and system for improving integrated circuit layout |
EP1747520B1 (de) | 2004-05-07 | 2018-10-24 | Mentor Graphics Corporation | Layoutentwurfsmethodologie für integrierte schaltungen mit prozessvariationsbändern |
US7240305B2 (en) | 2004-06-02 | 2007-07-03 | Lippincott George P | OPC conflict identification and edge priority system |
JP4266189B2 (ja) | 2004-07-09 | 2009-05-20 | 株式会社東芝 | 半導体集積回路パターンの検証方法、フォトマスクの作成方法、半導体集積回路装置の製造方法、及び半導体集積回路パターンの検証方法を実現するためのプログラム |
JP4904034B2 (ja) * | 2004-09-14 | 2012-03-28 | ケーエルエー−テンカー コーポレイション | レチクル・レイアウト・データを評価するための方法、システム及び搬送媒体 |
US7617473B2 (en) * | 2005-01-21 | 2009-11-10 | International Business Machines Corporation | Differential alternating phase shift mask optimization |
US7506285B2 (en) | 2006-02-17 | 2009-03-17 | Mohamed Al-Imam | Multi-dimensional analysis for predicting RET model accuracy |
US7739650B2 (en) | 2007-02-09 | 2010-06-15 | Juan Andres Torres Robles | Pre-bias optical proximity correction |
US8230371B2 (en) | 2007-05-23 | 2012-07-24 | Nxp B.V. | Process-window aware detection and correction of lithographic printing issues at mask level |
US7805699B2 (en) | 2007-10-11 | 2010-09-28 | Mentor Graphics Corporation | Shape-based photolithographic model calibration |
JP5100405B2 (ja) | 2008-01-16 | 2012-12-19 | 株式会社東芝 | データベースの作成方法およびデータベース装置 |
US7975244B2 (en) | 2008-01-24 | 2011-07-05 | International Business Machines Corporation | Methodology and system for determining numerical errors in pixel-based imaging simulation in designing lithographic masks |
US10008422B2 (en) * | 2015-08-17 | 2018-06-26 | Qoniac Gmbh | Method for assessing the usability of an exposed and developed semiconductor wafer |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19609652A1 (de) * | 1995-03-13 | 1996-09-19 | Sony Corp | Verfahren und Vorrichtung zur Korrektur von Maskenmustern |
Family Cites Families (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0608657A1 (de) * | 1993-01-29 | 1994-08-03 | International Business Machines Corporation | Vorrichtung und Verfahren zur Verarbeitung von Formdaten zur Korrektur von Streveffekten |
GB2291219B (en) * | 1994-07-05 | 1998-07-01 | Nec Corp | Photo-mask fabrication and use |
JPH08297692A (ja) * | 1994-09-16 | 1996-11-12 | Mitsubishi Electric Corp | 光近接補正装置及び方法並びにパタン形成方法 |
US5682323A (en) * | 1995-03-06 | 1997-10-28 | Lsi Logic Corporation | System and method for performing optical proximity correction on macrocell libraries |
US5553273A (en) * | 1995-04-17 | 1996-09-03 | International Business Machines Corporation | Vertex minimization in a smart optical proximity correction system |
JP2917879B2 (ja) * | 1995-10-31 | 1999-07-12 | 日本電気株式会社 | フォトマスク及びその製造方法 |
US5705301A (en) * | 1996-02-27 | 1998-01-06 | Lsi Logic Corporation | Performing optical proximity correction with the aid of design rule checkers |
US5801954A (en) * | 1996-04-24 | 1998-09-01 | Micron Technology, Inc. | Process for designing and checking a mask layout |
US5707765A (en) * | 1996-05-28 | 1998-01-13 | Microunity Systems Engineering, Inc. | Photolithography mask using serifs and method thereof |
DE19818440C2 (de) * | 1998-04-24 | 2002-10-24 | Pdf Solutions Gmbh | Verfahren zur Erzeugung von Daten für die Herstellung einer durch Entwurfsdaten definierten Struktur |
-
1998
- 1998-09-17 EP EP98947103A patent/EP1023639A4/de not_active Withdrawn
- 1998-09-17 AU AU93960/98A patent/AU9396098A/en not_active Abandoned
- 1998-09-17 EP EP98951922A patent/EP1023641A4/de not_active Withdrawn
- 1998-09-17 WO PCT/US1998/019510 patent/WO1999014638A1/en not_active Application Discontinuation
- 1998-09-17 KR KR1020007002869A patent/KR20010024113A/ko not_active Application Discontinuation
- 1998-09-17 KR KR1020007002873A patent/KR20010024117A/ko not_active Application Discontinuation
- 1998-09-17 JP JP2000512110A patent/JP4624550B2/ja not_active Expired - Lifetime
- 1998-09-17 AU AU97751/98A patent/AU9775198A/en not_active Abandoned
- 1998-09-17 AU AU93961/98A patent/AU9396198A/en not_active Abandoned
- 1998-09-17 JP JP2000512112A patent/JP2003526110A/ja active Pending
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE19609652A1 (de) * | 1995-03-13 | 1996-09-19 | Sony Corp | Verfahren und Vorrichtung zur Korrektur von Maskenmustern |
Non-Patent Citations (2)
Title |
---|
NEWMARK D M ET AL: "Large area optical proximity correction using pattern based corrections", PROCEEDINGS OF THE SPIE - THE INTERNATIONAL SOCIETY FOR OPTICAL ENGINEERING USA, vol. 2322, 1994, pages 374 - 386, XP002518834, ISSN: 0277-786X * |
See also references of WO9914638A1 * |
Also Published As
Publication number | Publication date |
---|---|
JP4624550B2 (ja) | 2011-02-02 |
EP1023641A1 (de) | 2000-08-02 |
AU9775198A (en) | 1999-04-05 |
KR20010024117A (ko) | 2001-03-26 |
JP2003526110A (ja) | 2003-09-02 |
WO1999014638A1 (en) | 1999-03-25 |
JP2003523545A (ja) | 2003-08-05 |
AU9396098A (en) | 1999-04-05 |
EP1023639A4 (de) | 2009-04-29 |
AU9396198A (en) | 1999-04-05 |
KR20010024113A (ko) | 2001-03-26 |
EP1023639A1 (de) | 2000-08-02 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
17P | Request for examination filed |
Effective date: 20000403 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): DE FR GB IT |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: NUMERICAL TECHNOLOGIES, INC. |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SYNOPSYS MERGER HOLDINGS LLC |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: SYNOPSYS, INC. |
|
A4 | Supplementary search report drawn up and despatched |
Effective date: 20090323 |
|
RIC1 | Information provided on ipc code assigned before grant |
Ipc: G03F 1/14 20060101AFI20090313BHEP |
|
17Q | First examination report despatched |
Effective date: 20090925 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: THE APPLICATION IS DEEMED TO BE WITHDRAWN |
|
18D | Application deemed to be withdrawn |
Effective date: 20111020 |