EP1005888B1 - Dispositif de rinçage pour enlever des résidus - Google Patents
Dispositif de rinçage pour enlever des résidus Download PDFInfo
- Publication number
- EP1005888B1 EP1005888B1 EP99123942A EP99123942A EP1005888B1 EP 1005888 B1 EP1005888 B1 EP 1005888B1 EP 99123942 A EP99123942 A EP 99123942A EP 99123942 A EP99123942 A EP 99123942A EP 1005888 B1 EP1005888 B1 EP 1005888B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- outflow
- line
- vessel
- valve
- cleaning
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B9/00—Cleaning hollow articles by methods or apparatus specially adapted thereto
- B08B9/08—Cleaning containers, e.g. tanks
Definitions
- the invention relates to a flushing device for the removal of residues the sump drain of an evaporator and their use for the Distillative workup of saline solutions.
- Thin-film evaporation is used for continuous distillation, in particular for Evaporation of temperature-sensitive substances from high-boiling Residues, and for the concentration of temperature-labile substances used.
- the liquid is distributed by trickling (falling film evaporator), Influence of centrifugal force (special embodiment of a Rotary evaporator), specially designed wipers (Filmtruder) or others Techniques for thin layers (order of magnitude of the layer thickness usually approx. 0.1 mm) on the (usually) heated surfaces. thin Liquid layers allow rapid evaporation, so that the contained components only briefly the (usually) higher Temperatures are exposed in the evaporator.
- a typical thin-film evaporator has a vertical, from the outside heated tube on the inner surface of the product to be evaporated from a rotor is spread as a thin layer.
- the product occurs above the Heating zone in the evaporator and flows due to the mechanical distribution through the rotor as a liquid film over the heating surface.
- the low-boiling Components evaporate as the residue runs down.
- the Brüdendämpfe flow through a mist eliminator located in the head of the Evaporator is and will be in a separately arranged condenser condensed.
- For the mechanical fluid distribution is a rotor with fitted swinging suspended wiper blades made of metal. During operation the wiper blades are due to the centrifugal force against the evaporator wall pressed, resulting in even product distribution and intensive Fluid mixing of the liquid film causes.
- the dissolved residues for example, dissolved salts
- the dissolved residues include: The cause can be found in the fact that these residues are deposited in the sump. These are residues, which are usually before evaporation as dissolved components in the liquid and after evaporation of solvent as a solid.
- the evaporation salt solutions, with salt, after evaporation of Solvent, as a solid residue in the bottom of the evaporator accrues.
- soluble residues can in principle all Be solids that are removed with a dishwashing liquid - usually in one Solvent can be solved.
- the thin film evaporator described in the introduction is not only the complete Evaporation of vaporizable components from a residue - - Example, to ensure saline - solution, but also the residues as one provide pumpable mass from the sump.
- a Thin-film evaporator which operates on the principle described above, is this is not the case; because residues, such as salts, may be in the range Depositing the sump drain and form incrustations, so that the sump discharge due to blockages can not be easily removed.
- the Swamp drain is usually the tapered part - usually going down to a pipe tapering part - of the swamp, through which the sump product at discharge is passed through the evaporation apparatus.
- the continuous operation of the Thin film evaporation must be adjusted when such blockages occur so that appropriate cleaning work can be initiated. Also at the Use of other evaporation equipment, such as distillation columns, occur often the same problems.
- the object of the present invention was to provide a device with the dissolved residues containing liquids in an evaporator can be separated without the bottom outlet of the evaporation device clogged by the residues. There should be no cleaning necessary be that would interrupt a continuous evaporation. Both the bottoms product as well as the top product of the corresponding evaporation process be preserved in the gentlest possible way.
- the device should be effective and inexpensive work.
- the drainage container is via connecting lines directly with the drain valve, the flushing water valve, the tank drain valve, the purge valve and the vent valve connected.
- the drain tank is usually above the sump and below the Swamp arranged.
- the Spülablauf founded can open into the sump drain line, so that the drain line device a common outlet for detergent and bottom product having.
- the drain conduit means in the form of two lines, a Spülablauf für and a sump drain line, formed so that Sump and detergent separated, discharged through various outputs.
- Injecting gas for example nitrogen
- the ingress of air (and thus also of oxygen) in the apparatus to prevent In this way can be located in the top product or bottom product, oxidation-sensitive Protecting substances.
- the collecting container is preferably connected to a pump. With this can the contents of the collecting container are circulated so that it remains homogeneous and the deposition of residues is avoided.
- the evaporation device is a thin film evaporator.
- the flushing device according to the invention is especially for the distillative Working up saline solutions used. These are usually to solutions, in addition to the dissolved salts still value products (often oxidation-sensitive value products). Most are more Work-up steps necessary to obtain pure value products.
- the bottom outlet of the evaporation apparatus is using the inventive Rinsing device periodically rinsed.
- a rinsing agent is used, in the residues are dissolved.
- the flushing device according to the invention Accordingly, it is preferred to remove soluble residues. It can, however Also, mechanical rinsing effects to be effective because the detergent with a certain Speed can hit the corresponding residues. It is thus Not absolutely necessary that the residues completely soluble in the detergent are.
- the sump discharge of the evaporation apparatus can after rinsing and mixing with the detergent (water) pumped out and stored.
- the detergent water
- the resulting mixture can this burned, for example, in a residue combustion, in a biological wastewater treatment plant disposed of or (if value added products are still included) be further worked up.
- the operation of the device according to the invention is based on a preferred embodiment, the example of a salt-depositing Thin-film evaporator, are described.
- FIG. 1 is a thin film evaporator with an inventive Flushing device shown.
- This flushing device has drainage means (6, 16), in the form of two lines, a Spülablauf für (6) and a sump drain line (16) are formed.
- the bottom product is first in a drain tank 7, which gradually fills up. After reaching a certain Level, the drain valve 10 is closed and the vacuum in the drain tank 7 lifted by opening the container drain valve 12 to the sump 8 (The collection 8 is under normal pressure or slight overpressure). Subsequently the vent valve 14 is opened, and the contents of the drain container. 7 runs into the collecting container 8.
- the content of the collecting container 8 is expediently circulated by means of a pump 9 in order to keep it homogeneous and possible Prevent salt deposition.
- the content becomes temporary storage and more Recycling, for example, combustion, continuously or discontinuously dissipated.
- the drain tank 7 is rinsed. It is expedient to use water, prefers warm water or steam condensate.
- the container drain valve 12 are closed, the purge valve 13 and the Rinse water valve 11 is opened.
- the warm rinse water flowing through the inlet pipe for Rinsing agent 3 is supplied, now flows through the drain tank 7 and removed this way salt deposits.
- the rinsing process can (depending on the ingredients contained) For example, be fed to a biological treatment plant. Rinse duration and water flow are adjusted as needed so that the required amount of water so low as necessary. As a rule (depending on the load of the evaporator and salinity) a rinse time of 1 to 2 minutes is sufficient.
- this line is opened by opening the Container drain valve 12 (instead of Spülablaufventils 13) periodically flushed. Preferably this is done every 10 to 20 flush cycles.
- the Spülablaufventil 13 After expiration of a pre-purging the Spülablaufventil 13 is closed, and in the course of the rinsing phase, the water is flushed through the drain tank 7 and the drain line through the vent line and through the vent valve 14. Subsequently, the rinse water valve 11 is closed and to empty the drain tank, the purge valve 13 is opened. Remaining rinse water is allowed to drain by opening the container drain valve 12. Thereafter, all valves are closed again. By opening the drain valve 10, the drain tank is evacuated again and the drain cycle can begin again.
- the drain lines are to the sump and for flushing with inert gas flushes (usually nitrogen flushing) Mistake.
- inert gas flushes usually nitrogen flushing
- FIG. 1 opens between the run-up tank 7 and the drain valve 10, a first Inlet pipe 5 for introducing inert gas into the conduit 17 for transferring the Bottoms.
- the collecting container 8 is connected to the drain container 7 via a line, which is provided with the container drain valve 12 and into which a second inlet pipe 4 opens for the introduction of inert gas.
Landscapes
- Engineering & Computer Science (AREA)
- Mechanical Engineering (AREA)
- Vaporization, Distillation, Condensation, Sublimation, And Cold Traps (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning In General (AREA)
- Apparatuses And Processes For Manufacturing Resistors (AREA)
- Silver Salt Photography Or Processing Solution Therefor (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Heat Treatment Of Water, Waste Water Or Sewage (AREA)
- Pipeline Systems (AREA)
Claims (11)
- Dispositif de rinçage pour éliminer des résidus issus de la sortie de fond d'un dispositif d'évaporation produisant un produit de tête et un produit de fond et équipé d'une sortie de fond, comprenantun récipient de sortie (7), qui présente un conduit (17) pourvu d'une vanne de sortie (10) et destiné au transfert du produit de fond du dispositif d'évaporation, un autre conduit (5) pourvu d'une vanne de désaération (14) et destiné à l'aération et la désaération, en outre un tuyau d'introduction (3) pourvu d'une vanne à eau de rinçage (11) et destiné à l'introduction de produit de rinçage et en outre un premier agencement de conduit de sortie (6) pourvu d'une vanne de sortie de rinçage (13) et destiné à l'évacuation du produit de rinçage, etun récipient collecteur (8) pour recevoir le contenu du récipient de sortie, qui est relié par un autre conduit pourvu d'une vanne de sortie de récipient (12) au récipient de sortie (7) et par ailleurs à un deuxième agencement de conduit de sortie (16).
- Dispositif de rinçage suivant la revendication 1, caractérisé en ce que, entre le récipient de sortie (7) et la vanne de sortie (10), le conduit (5) pour l'aération et la désaération débouche dans le conduit (17) de transfert du produit de fond.
- Dispositif de rinçage suivant la revendication 1 ou 2, caractérisé en ce qu'un tuyau d'alimentation (4) pour alimenter du gaz inerte débouche dans le conduit par lequel le récipient collecteur (8) est relié au récipient de sortie (7), entre la vanne de sortie de récipient (12) et le récipient collecteur (8).
- Dispositif de rinçage suivant l'une des revendications 1 à 3, caractérisé en ce que les agencements de conduit de sortie (6, 16) sont réalisés sous la forme de deux conduits, un conduit de sortie de rinçage (6) qui présente la vanne de sortie de rinçage (13) et un conduit de sortie de fond (16) qui est relié au récipient collecteur (8), de sorte que les deux conduits présentent une sortie commune ou deux sorties séparées.
- Dispositif de rinçage suivant l'une des revendications 1 à 4, caractérisé en ce que des tuyaux d'alimentation pour alimenter du gaz inerte débouchent dans le récipient de sortie (7) et/ou le récipient collecteur (8).
- Dispositif de rinçage suivant l'une des revendications 4 et 5, caractérisé en ce que le conduit de sortie de fond (16) présente une pompe (9).
- Dispositif de rinçage suivant l'une des revendications 1 à 6, comportant par ailleurs un dispositif d'évaporation pour traiter par distillation des solutions salines, qui produit un produit de tête et un produit de fond et présente une sortie de fond qui est reliée au conduit (17) de transfert du produit de fond.
- Dispositif de rinçage suivant la revendication 7, caractérisé en ce que le récipient de sortie (7) est agencé au-dessus du récipient collecteur (8) et en dessous de la sortie de fond du dispositif d'évaporation.
- Dispositif de rinçage suivant la revendication 7 ou 8, caractérisé en ce que le dispositif d'évaporation est un évaporateur à couche mince.
- Dispositif de rinçage suivant l'une des revendications 7 à 9, caractérisé en ce que le dispositif d'évaporation peut être mis sous vide.
- Utilisation d'un dispositif de rinçage suivant l'une des revendications 1 à 10, pour le traitement par distillation de solutions salines.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19855910 | 1998-12-03 | ||
DE19855910A DE19855910A1 (de) | 1998-12-03 | 1998-12-03 | Spülvorrichtung zur Entfernung von Rückständen |
Publications (2)
Publication Number | Publication Date |
---|---|
EP1005888A1 EP1005888A1 (fr) | 2000-06-07 |
EP1005888B1 true EP1005888B1 (fr) | 2005-09-14 |
Family
ID=7889920
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP99123942A Expired - Lifetime EP1005888B1 (fr) | 1998-12-03 | 1999-12-03 | Dispositif de rinçage pour enlever des résidus |
Country Status (6)
Country | Link |
---|---|
US (1) | US6443170B1 (fr) |
EP (1) | EP1005888B1 (fr) |
JP (1) | JP2000197862A (fr) |
CN (1) | CN1216697C (fr) |
AT (1) | ATE304395T1 (fr) |
DE (2) | DE19855910A1 (fr) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013164308A1 (fr) | 2012-05-04 | 2013-11-07 | Bayer Materialscience Ag | Procédé brut de traitement d'un mélange de substances comprenant une amine aromatique, en particulier, de l'aniline brute |
Families Citing this family (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10361003B3 (de) * | 2003-12-23 | 2005-07-28 | Hte Ag The High Throughput Experimentation Company | Vorrichtung und Verfahren zur Druck- und Flusskontrolle in Parallelreaktoren |
DE102011109454A1 (de) * | 2011-08-04 | 2013-02-07 | Hte Aktiengesellschaft | Verfahren zur Behandlung von Produktfluidströmen |
CN104411681B (zh) | 2012-07-11 | 2017-03-29 | 科思创德国股份有限公司 | 后处理由制备异氰酸酯产生的蒸馏残渣的方法 |
JP6010457B2 (ja) * | 2012-12-28 | 2016-10-19 | 東京エレクトロン株式会社 | 液処理装置および薬液回収方法 |
US10345058B1 (en) | 2015-11-18 | 2019-07-09 | Gradiant Corporation | Scale removal in humidification-dehumidification systems |
US10513445B2 (en) | 2016-05-20 | 2019-12-24 | Gradiant Corporation | Control system and method for multiple parallel desalination systems |
CN115229187B (zh) * | 2021-10-29 | 2023-07-28 | 南京尚吉增材制造研究院有限公司 | 适用于制备多孔金属工艺中去除无机盐造孔剂的设备及去除方法 |
Family Cites Families (7)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3046163A (en) * | 1960-04-06 | 1962-07-24 | Detrex Chem Ind | Method and apparatus for interiorly cleaning tanks and the like |
US3185661A (en) * | 1963-06-03 | 1965-05-25 | Phillips Petroleum Co | Particle agitation system |
US4770196A (en) * | 1986-02-13 | 1988-09-13 | Osswald Hannes E | Chemical cleaning system |
US5061348A (en) | 1988-08-12 | 1991-10-29 | Alameda Instruments | Sulfuric acid reprocessor with continuous purge of second distillation vessel |
US5330624A (en) | 1991-12-27 | 1994-07-19 | Phillips Petroleum Company | Fractionator-reboiler sludge removal system and method |
US5603826A (en) * | 1996-02-15 | 1997-02-18 | V Q Corporation | Return pump system for use with clean-in-place system for use with vessels |
US5690151A (en) * | 1996-04-02 | 1997-11-25 | Packaging Systems, Inc. | Dual channel bag filling machine with a clean-in-place system that cleans one channel while the other continues to fill bags |
-
1998
- 1998-12-03 DE DE19855910A patent/DE19855910A1/de not_active Withdrawn
-
1999
- 1999-12-01 US US09/451,858 patent/US6443170B1/en not_active Expired - Lifetime
- 1999-12-02 JP JP11376206A patent/JP2000197862A/ja active Pending
- 1999-12-03 AT AT99123942T patent/ATE304395T1/de not_active IP Right Cessation
- 1999-12-03 CN CN991159950A patent/CN1216697C/zh not_active Expired - Lifetime
- 1999-12-03 DE DE59912551T patent/DE59912551D1/de not_active Expired - Lifetime
- 1999-12-03 EP EP99123942A patent/EP1005888B1/fr not_active Expired - Lifetime
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
WO2013164308A1 (fr) | 2012-05-04 | 2013-11-07 | Bayer Materialscience Ag | Procédé brut de traitement d'un mélange de substances comprenant une amine aromatique, en particulier, de l'aniline brute |
Also Published As
Publication number | Publication date |
---|---|
DE19855910A1 (de) | 2000-06-08 |
US6443170B1 (en) | 2002-09-03 |
CN1260248A (zh) | 2000-07-19 |
CN1216697C (zh) | 2005-08-31 |
ATE304395T1 (de) | 2005-09-15 |
DE59912551D1 (de) | 2005-10-20 |
JP2000197862A (ja) | 2000-07-18 |
EP1005888A1 (fr) | 2000-06-07 |
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