EP0877965A1 - Verfahren zur herstellung von optischen bauelementen und optisches bauelement - Google Patents
Verfahren zur herstellung von optischen bauelementen und optisches bauelementInfo
- Publication number
- EP0877965A1 EP0877965A1 EP97915270A EP97915270A EP0877965A1 EP 0877965 A1 EP0877965 A1 EP 0877965A1 EP 97915270 A EP97915270 A EP 97915270A EP 97915270 A EP97915270 A EP 97915270A EP 0877965 A1 EP0877965 A1 EP 0877965A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- optical waveguide
- substrate
- light
- waveguide structure
- exposure
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/122—Basic optical elements, e.g. light-guiding paths
- G02B6/1228—Tapered waveguides, e.g. integrated spot-size transformers
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/13—Integrated optical circuits characterised by the manufacturing method
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B2006/12166—Manufacturing methods
- G02B2006/12195—Tapering
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/30—Optical coupling means for use between fibre and thin-film device
- G02B6/305—Optical coupling means for use between fibre and thin-film device and having an integrated mode-size expanding section, e.g. tapered waveguide
Definitions
- the invention relates to a method for producing optical components, in which at least one three-dimensional optical waveguide structure is produced in a light-sensitive substrate by subjecting the substrate to exposure in some areas, so that a refractive index difference between the substrate and the at least one a light waveguide structure is created, and an optical component.
- optical components with integrated optical waveguide structures are known. These optical waveguide structures have a refractive index difference with respect to the substrate surrounding them, so that they are suitable for guiding optical waves.
- a known method is described, for example, in US Pat. No. 5,136,677, in which chalcogenide glasses are subjected to exposure in some areas to produce the optical waveguide structure. In this case, exposure takes place in relatively thin substrates in the light wave transmission direction of the later optical waveguide. Structures. From US Pat. No. 5,136,677 it is also known that by means of two different light sources, crossing optical waveguide structures can be created in a substrate, the optical properties of the optical waveguide structures being able to be influenced by interference phenomena.
- the optical waveguide structures produced enable the guidance of electromagnetic waves, for example light waves, which typically have a refractive index that is a few percent higher than the substrate surrounding the optical waveguide structure. Furthermore, a dimensioning of the optical waveguide structures lying perpendicular to the direction of light wave propagation is to be selected such that it is in the order of magnitude of the wavelength of the light to be guided, typically from 1 to 10 ⁇ m.
- the number of modes of the light waves to be transmitted, which are guided at a certain wavelength can be set via the refractive index difference of the optical waveguide structure from the substrate and the dimensioning of the optical waveguide structures.
- optical waveguide structures are usually produced in integrated optical components which are used, for example, as amplifiers, splitters, couplers,
- optical fibers for example glass fibers
- the problem here is that the glass fiber cross section must be coupled to the optical waveguide cross section.
- the effective cross-section for common glass fibers is 5 to 10 ⁇ m.
- the numerical aperture is to be observed, which describes the angular range from which an optical waveguide can receive incident light. Light that falls below a larger limit than the numerical aperture cannot be guided and is lost.
- the small cross section of the optical waveguide structures in the integrated optical components inevitably leads to an increase in the numerical aperture, so that light signals emitted by the integrated optical components can only be partially transferred into the coupled glass fiber.
- Optical waveguide structures and the glass fibers provide a so-called taper as a transition structure. This is intended to bring about a constant transition of the effective cross sections of the glass fibers and of the optical waveguide structures as well as of the numerical aperture.
- optical waveguide structures in which optical waveguide structures are produced, for example, in glass, polymer or Ormocer substrates or in cover layers of silicon wafers by means of ion exchange, a local change in the stoichiometry of oxides or oxynitrides or a local filling of etched or embossed trench structures, the taper can only be incompletely formed.
- a cross-sectional adjustment can only be made by widening the waveguide cross-section while maintaining the same depth.
- the refractive index is often determined by the material properties and is therefore constant throughout the taper. This can lead to the taper becoming multimode in whole or in part, that is to say that directions of propagation are possible in it which the subsequent optical waveguide or the glass fiber cannot accommodate.
- the method according to the invention with the features mentioned in claim 1 offers the advantage that high-precision optical waveguide structures, in particular transition structures designed as taper, can be created using simple technical means. With a coupling of optical waveguide structures and glass fibers possible with little loss. As a result of the fact that an at least two-fold exposure takes place at different angles of incidence of the light perpendicular to the direction of light wave propagation of the optical waveguide structures, as a result of which the substrate surrounding the later optical waveguide structure undergoes a refractive index depression, the definition of the optical waveguide structure being done by marking, which is preferably having a width which changes in the direction of light wave propagation, three-dimensional optical fiber structures can be achieved which, in addition to widening the optical fiber cross section, have an increasing depth. As a result, cross sections of optical waveguide structures in the coupling region to glass fibers can be created very advantageously, by means of which an adaptation of the effective cross sections of the optical waveguide structures and the glass fibers is possible.
- the angles of incidence of the exposure can be adjusted variably in the direction of light wave propagation.
- the cross-sectional adaptation can be further optimized via the taper, for example, from the optical waveguide structure in the direction of the glass fiber, which has a cross-section which is triangular in cross-section and widens like a trumpet.
- the masking outside of the optical waveguide structure has a light transmittance that is variable in the direction of light wave propagation.
- angles of incidence of the exposure are set in such a way that buried optical waveguide structures result.
- additional capping of the optical waveguide structure produced to prevent external influences is no longer necessary. This simplifies the entire manufacturing process of the optical components with the optical waveguide structures.
- the exposure takes place at different angles of incidence with alternating masking in order to produce buried optical waveguide structures.
- a further optimization of the cross section of the optical waveguide structure is achieved at the coupling point between the optical waveguide structure and a glass fiber. It is possible to achieve rome-like (diamond-like) cross sections of the optical waveguide structures with cross sections increasing in the direction of light wave propagation. This enables a further optimized adaptation of the effective cross sections between the optical waveguide structure and a glass fiber.
- FIG. 2 shows a schematic perspective view of an optical component with an optical waveguide structure
- FIG. 3 shows a schematic plan view of a mask for producing an optical waveguide structure
- FIG. 5a method steps for producing a and 5b buried optical waveguide structure in a second embodiment variant.
- FIGS. 1 a and 1 b each show a schematic sectional illustration of an optical component 10, on the basis of which the method according to the invention for producing an optical waveguide structure 12 is to be explained.
- the method according to the invention the simplest construction of an optical component, namely the existence of only one optical waveguide structure 12, is assumed.
- a multiplicity of optical waveguide structures 12 with different dimensions can be produced simultaneously by means of the method according to the invention.
- the optical component 10 consists of a chalcogenide glass 14.
- Chalcogenide glasses are generally understood to be glass-like products made from amorphous, non-stoichiometric compounds of the chalcogens.
- the sulfides and selinides of arsenic (As), antimone (Sb), germanium (Ge), gallium (Ga), indium (In), bismuth (Bi), lanthanum (La) and mixtures thereof are preferred, provided that they form glass phases.
- the glass used, in the exemplary embodiment chalcogenide glass 14, is provided with a mask 16, which consists of an opaque material.
- the dimensions of the mask 16 are adapted to the optical waveguide structure 12 to be created in a manner which will be explained below.
- the mask 16 can be applied to the chalcogenide glass 14 by means of generally known methods, for example by screen printing.
- a first method step (FIG. 1 a), the chalcogenide glass 14 provided with the mask 16 is exposed, - from a source not shown, first a light 20 incident at an angle of incidence ⁇ to the surface of the chalcogenide glass 14 (exposure 20 ) is produced.
- the photo energies of the light 20 used lie in the absorbing region of the chalcogenide glass 14.
- the wavelength of the light 20 is therefore usually in the visible region or in the near ultraviolet region.
- the wavelengths of the light 20 can be, for example, between 200 nm to 600 nm.
- the light 20 incident at the angle of incidence ⁇ strikes the chalcogenide glass 14 except in an area 26 shaded by the mask 16 and leads there — with the exception of the shaded area 26 - a lowering of the refractive index of the chalcogenide glass 14.
- the shaded region 26 thus has a higher refractive index than the rest of the substrate of the chalcogenide glass 14.
- a degree of lowering the refractive index can be set via an exposure duration and / or an exposure intensity and / or via the wavelength of the light 20.
- the exposure intensity of the light 20 is, for example, a few 1 to 100 J / cm 2 .
- the exposure by means of the light 20 is usually carried out at room temperature and normal atmosphere, so that no additional outlay on equipment is required to maintain certain necessary process conditions.
- an exposure is carried out with the light 20 at an angle of incidence ⁇ , so that the chalcogenide glass 14 is exposed with the exception of an area 28 shaded by the mask 16. Due to the fact that the angle of incidence ⁇ deviates from the angle of incidence ⁇ , the area 26 shaded according to FIG. 1 a is partially exposed, so that the refractive index is also lowered here.
- the respectively unexposed area shaded during the two exposure steps according to FIGS. 1 a and 1 b leads to the formation of the optical waveguide structure 12, since this has a higher refractive index than the environment, that is to say the substrate of the chalcogenide glass 14.
- the dimensioning of the fiber optic Structure 12, in particular its depth can be varied by choosing the angle of incidence ⁇ or ⁇ .
- a further dimensioning of the optical waveguide structure 12, in particular its width and length, can be set by dimensioning the mask 16.
- an optical waveguide structure 12 with any defined dimensioning and any dimensioned change in refractive index compared to that Base substrate of the chalcogenide glass 14 are generated.
- FIG. 2 shows a schematic perspective view of a component 10 which has an integrated optical waveguide 12.
- the light waveguide 12 has a channel-shaped section 22 and an end region 18 facing a transition region, hereinafter called taper 24.
- the taper 24 has a triangular cross-section on the end face 18, which becomes continuously smaller in the section 22.
- the section 22 can also have a triangular cross-section if it was produced, for example, by means of the method explained with reference to FIGS. 1 a and 1 b.
- a funnel-shaped widening of the cross section of the entire optical waveguide structure 12 to the end face thus takes place quasi via the taper 24 18.
- the taper 24 can be achieved by a corresponding shape of the mask 16 and a corresponding incidence of the light 20 during the exposure.
- the mask 16 viewed in plan view — has a contour that widens trapezoidally or triangularly in the direction of the end face 18, so that a shaded area corresponding to the later taper 24 is created during the exposure 20 (FIGS. 1 a, 1 b).
- the angle of incidence ⁇ or ⁇ of the exposure 20 can either be determined by a correspondingly movably mounted light source or a corresponding movement of the chalcogenide glass 14 with a uniformly aligned exposure 20.
- a rotation into or out of the image plane can take place, so that optimally adapted taper 24 can be achieved.
- the taper 24 is used to adapt the effective cross sections of the optical waveguide structure 12, in particular its section 22 and a glass fiber (not shown).
- the taper 24 results in a constant transition — in the direction of light wave transmission indicated by an arrow 30 in FIG. 2 — both of the cross section of the light wave guide structure 12 and of the numerical aperture.
- the arrow 30 is marked as a double arrow, since the optical waveguide structure 12 shown both for receiving an optical signal and can also be used to send an optical signal from component 10.
- FIG. 3 shows a schematic plan view of a chalcogenide glass 14 provided with the mask 16.
- the mask 16 defines, on the one hand, the channel-shaped section 22 and the taper 24 of the later optical waveguide structure 12.
- the optical waveguide structure 12 is produced by exposing the chalcogenide glass 14 in such a way that the light waves - Leader structure 12 forming, unexposed area remains.
- FIGS. 4 and 5 show the production of buried optical waveguide structures 12 by means of the exposure 20 at different angles of incidence ⁇ and ⁇ .
- the production of buried optical waveguide structures eliminates the need to cover the optical waveguide structures later in order to protect them from external influences.
- the following figures each show a schematic plan view of the end face 18 of a component 10, it being clear that both the channel-shaped section 22 and the taper 24 of the optical waveguide structure 12 can be achieved by the corresponding design of the mask 16 already explained.
- a layer of the chalcogenide glass 14 is applied to a carrier substrate 32.
- a mask 16 is applied to the chalcogen glass 14 in such a way that a mask opening 34 remains in the region of the later optical waveguide structure 12.
- the exposure 20 takes place at the angle of incidence ⁇ , so that due to the oblique incidence there is a through the Chalcogenide glass 14 to the support substrate 32 extending tunnel-shaped portion 36 results in a refractive index reduced by the exposure.
- the exposure 20 takes place at the angle of incidence ⁇ through the mask opening 34, so that a likewise tunnel-shaped section 38 with a refractive index likewise reduced by the exposure results.
- the tunnel-shaped sections 36 and 38 enclose a — viewed in cross-section — a triangular section which results in the optical waveguide structure 12, since the refractive index was not lowered in this area, so that it has an increased refractive index compared to the tunnel-shaped sections 36 and 38.
- an area 40 which belongs to both the section 36 and the section 38, is obtained above the optical waveguide structure 12 and has even been reduced in the refractive index by the double exposure here.
- the optical waveguide structure 12 is thereby buried in the chalcogenide glass 14 applied to the carrier substrate 32 and is delimited by the carrier substrate 32 and the sections 36 and 38.
- FIGS. 5a and 5b A further possibility of achieving a buried optical waveguide structure 12 is shown in FIGS. 5a and 5b.
- FIG. 5a in a manner analogous to FIG. 4, an unexposed area which is triangular in cross-section is produced and which is laterally delimited by the exposed tunnel-shaped sections 36 and 38.
- FIG. 5b the mask 16 according to FIG. 5a is removed in a suitable manner and a mask 16 'is applied, which covers the area of the chalcogenide glass 14 which was initially exposed through the mask opening 34. The subsequent exposure at the angles of incidence .alpha. Or .beta. Exposes further parts of the chalcogenide glass 14.
- the cross-sectional widening of the taper 24 in the direction of the end face 18 then extends not only laterally and in depth, but also in the direction of the surface of the chalcogenide glass 14. This enables the cross-section of the taper 14 to be even closer to a circular cross section of a glass fiber.
Abstract
Description
Claims
Applications Claiming Priority (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19603936 | 1996-02-03 | ||
DE19603936 | 1996-02-03 | ||
DE19702969A DE19702969A1 (de) | 1996-02-03 | 1997-01-28 | Verfahren zur Herstellung von optischen Bauelementen und optisches Bauelement |
DE19702969 | 1997-01-28 | ||
PCT/DE1997/000184 WO1997028473A1 (de) | 1996-02-03 | 1997-01-31 | Verfahren zur herstellung von optischen bauelementen und optisches bauelement |
Publications (1)
Publication Number | Publication Date |
---|---|
EP0877965A1 true EP0877965A1 (de) | 1998-11-18 |
Family
ID=26022608
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP97915270A Withdrawn EP0877965A1 (de) | 1996-02-03 | 1997-01-31 | Verfahren zur herstellung von optischen bauelementen und optisches bauelement |
Country Status (4)
Country | Link |
---|---|
US (1) | US6178281B1 (de) |
EP (1) | EP0877965A1 (de) |
JP (1) | JP2000504121A (de) |
WO (1) | WO1997028473A1 (de) |
Families Citing this family (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6796148B1 (en) * | 1999-09-30 | 2004-09-28 | Corning Incorporated | Deep UV laser internally induced densification in silica glasses |
US6415083B1 (en) * | 2001-03-13 | 2002-07-02 | Lockheed Martin Corporation | Traveling wave electro-optic modulator based on an organic electro-optic crystal |
US6760529B2 (en) | 2001-12-11 | 2004-07-06 | Intel Corporation | Three-dimensional tapered optical waveguides and methods of manufacture thereof |
US6816648B2 (en) | 2002-05-01 | 2004-11-09 | Intel Corporation | Integrated waveguide gratings by ion implantation |
US6670210B2 (en) | 2002-05-01 | 2003-12-30 | Intel Corporation | Optical waveguide with layered core and methods of manufacture thereof |
US7143609B2 (en) * | 2002-10-29 | 2006-12-05 | Corning Incorporated | Low-temperature fabrication of glass optical components |
EP1473576A1 (de) * | 2003-05-02 | 2004-11-03 | ThreeFive Photonics B.V. | Integrierte optische Wellenleiter |
US6984598B1 (en) | 2003-07-02 | 2006-01-10 | Amorphous Materials, Inc. | Infrared chalcogenide glass |
KR102396005B1 (ko) * | 2013-10-21 | 2022-05-10 | 닛산 가가쿠 가부시키가이샤 | 광도파로의 제조방법 |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2426922A1 (fr) * | 1978-05-26 | 1979-12-21 | Thomson Csf | Structure optique compacte a source integree |
JPS58171005A (ja) | 1982-03-31 | 1983-10-07 | Matsushita Electric Works Ltd | 導光路板の製法 |
CA1211868A (en) * | 1982-04-16 | 1986-09-23 | Yoshikazu Nishiwaki | Method of forming diffraction gratings and optical branching filter elements produced thereby |
US5285517A (en) * | 1983-06-24 | 1994-02-08 | Canyon Materials, Inc. | High energy beam sensitive glasses |
JPS607405A (ja) | 1983-06-28 | 1985-01-16 | Omron Tateisi Electronics Co | 光導波路の製造方法 |
JPS60175010A (ja) | 1984-02-20 | 1985-09-09 | Omron Tateisi Electronics Co | 光導波路の作製方法 |
JPS61236506A (ja) | 1985-04-12 | 1986-10-21 | Mitsubishi Cable Ind Ltd | 高分子導光路の製造方法 |
DE3641285A1 (de) * | 1986-12-03 | 1988-06-09 | Schott Glaswerke | Verfahren zur messung von (alpha) und ss-strahlen geringer intensitaet |
US5136677A (en) | 1989-12-21 | 1992-08-04 | Galileo Electro-Optics Corporation | Photorefractive effect in bulk chalcogenide glass and devices made therefrom |
US5310623A (en) * | 1992-11-27 | 1994-05-10 | Lockheed Missiles & Space Company, Inc. | Method for fabricating microlenses |
JPH07333450A (ja) * | 1994-06-08 | 1995-12-22 | Hoechst Japan Ltd | 光結合用導波路の形成方法及び光結合用導波路を有する光導波路素子 |
WO1996009563A1 (en) * | 1994-09-23 | 1996-03-28 | British Telecommunications Public Limited Company | Planar waveguides |
-
1997
- 1997-01-31 JP JP9527240A patent/JP2000504121A/ja active Pending
- 1997-01-31 WO PCT/DE1997/000184 patent/WO1997028473A1/de not_active Application Discontinuation
- 1997-01-31 EP EP97915270A patent/EP0877965A1/de not_active Withdrawn
- 1997-01-31 US US09/117,597 patent/US6178281B1/en not_active Expired - Fee Related
Non-Patent Citations (1)
Title |
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See references of WO9728473A1 * |
Also Published As
Publication number | Publication date |
---|---|
US6178281B1 (en) | 2001-01-23 |
WO1997028473A1 (de) | 1997-08-07 |
JP2000504121A (ja) | 2000-04-04 |
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