EP0873565A2 - Systeme de condensateur-monochromateur pour rayonnement x - Google Patents

Systeme de condensateur-monochromateur pour rayonnement x

Info

Publication number
EP0873565A2
EP0873565A2 EP97906992A EP97906992A EP0873565A2 EP 0873565 A2 EP0873565 A2 EP 0873565A2 EP 97906992 A EP97906992 A EP 97906992A EP 97906992 A EP97906992 A EP 97906992A EP 0873565 A2 EP0873565 A2 EP 0873565A2
Authority
EP
European Patent Office
Prior art keywords
condenser
monochromator
zone plate
axis
arrangement
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP97906992A
Other languages
German (de)
English (en)
Other versions
EP0873565B1 (fr
Inventor
Bastian Niemann
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Vistec Electron Beam GmbH
Original Assignee
Individual
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Individual filed Critical Individual
Publication of EP0873565A2 publication Critical patent/EP0873565A2/fr
Application granted granted Critical
Publication of EP0873565B1 publication Critical patent/EP0873565B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
    • G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
    • G—PHYSICS
    • G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
    • G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
    • G21K7/00—Gamma- or X-ray microscopes

Definitions

  • the invention relates to a condenser-monochromator arrangement for X-rays according to the features in the preamble of claim 1.
  • X-ray microscopy done in the wavelength range of about 0.2 - 5 nm.
  • X-ray microscopes have been developed that operate on brilliant X-ray sources. These x-ray sources include electron storage rings, the deflecting magnets and undulators of which are sources of intense x-rays; there are no other X-ray sources of comparable brilliance. Until now, only the X-rays generated by deflection magnets have been used for transmission X-ray microscopes.
  • Microzone plates are rotationally symmetrical transmission circle gratings with decreasing lattice constants, typically have a diameter of up to 0.1 mm and a few hundred zones.
  • the numerical aperture of a zone plate is generally determined by the diffraction angle at which the outer and thus the finest zones are perpendicular
  • the condenser is smaller than that of the microscope objective, so there is a partially coherent image and the linear transformation between object intensity and image intensity is lost for the important high spatial frequencies that determine the resolution of the microscope
  • ring-shaped zone plates have been used as condensers for X-ray radiation. They focus the X-ray radiation on the object to be examined with the X-ray microscope.
  • the size of such a “condenser zone plate” is adapted to the beam diameter, which typically extends up to the end of the beam tube of a deflection magnet of an electron storage device Is 1 cm Condenser zone plate is ring-shaped, it collects about Vt of the radiation lying in this beam diameter.
  • a zone plate Since the focal length of a zone plate is reciprocal to the wavelength used, such a condenser zone plate together with a small so-called monochromator pinhole, which is located in the object plane around the object, also acts as a linear monochromator (Optics Communication 12, pp. 160-163, 1974, "Soft X-Ray Imaging Zone Plates with Large Zone Numbers for Microscopic and Spectroscopic Applications "(Niemann, Rudolph, Schmahl). Only a narrow spectral range of the incident polychromatic radiation from an electron storage ring is included in the
  • the relationship only applies if the image of the source - the so-called "critical illumination" - is not larger than the diameter d of the pinhole.
  • R is at least as large as the number of zones n on the microzone plate of the X-ray microscope, then it is chromatic aberration of the microzone plate is negligible and it only slightly deteriorates the quality of the X-ray image.
  • a condenser zone plate is always not used too small a diameter D, so that the permitted diameter d of the monochromator pinhole is larger than the image of the Source is.
  • Image scale with which the source is imaged in the object plane and the diameter of the illuminated object area decreases (in practice to a few ⁇ m diameter), which is disadvantageous. Only by other measures - for example, by making parallel movements of the condenser and monochromator pinhole - can it be ensured that a larger object area is illuminated homogeneously. In addition, the monochromator diaphragm and the condenser zone plate must remain precisely adjusted to one another during the movement.
  • Condenser zone plates are usually used in the first diffraction order, in which all previously implemented
  • Condenser zone plates have their highest diffraction efficiency. It is also difficult for another reason explained below to achieve the previously required adaptation of the numerical aperture of the condenser zone plate to that of the microzone plate without new difficulties.
  • the condenser zone plate In order to implement the adaptation, the condenser zone plate must have the same fine zones on the outside as the microzone plate itself.
  • the brightest built microzone plates now have zone widths of only 19 nm (corresponding to 38 nm period of the zone structures). So far, zone plates with such fine zone structures can only be used with methods of
  • Electron beam lithography in which the zones are generated one after the other. Holographic methods, which produce the pattern of a zone plate in one step “in parallel” and thus in a short time, are ruled out because a suitably short-wave UV holography does not exist. Accordingly, condenser zone plates with an adapted numerical aperture could only be used with methods of Electron beam lithography, which can be called a serial and therefore slow process, are produced. However, such condenser zone plates typically have many 10,000 zones because of their necessarily large diameter. The writing times with an electron beam lithography system are then in the order of weeks, which is unrealistic for practical reasons, which is why condenser zone plates have not yet been produced using methods of electron beam lithography.
  • Advantageous monochromator arrangement which delivers as much as possible all X-ray light made available by the beam tube in an annular hollow-cone aperture with a large aperture angle to the object.
  • Zone width of only 10 nm. This increases the apertures of the micro-zone plates and, accordingly, the numerical apertures of the condensers necessary to ensure incoherent object lighting, and the difficulties already mentioned are further increased.
  • Electron storage rings are under construction worldwide and some have been completed, which provide X-rays from undulators. These undulators provide approximately 10 to 100 times higher X-ray flux that can be fully used for X-ray microscopy.
  • the X-ray radiation is much better colimized, typically the beam at the end of a beam tube at the location of a microscope is only 1 - 2 mm in diameter and the "large" condenser zone plates previously used and whose aperture has not been adapted can no longer be fully illuminated Sufficiently monochromatize radiation, then either arrangements with the disadvantages discussed above - smaller condenser zone plates with shorter focal lengths and correspondingly smaller monochromator pin diaphragms - would have to be used, or large condenser zone plates have to be illuminated off-axis, ie in a peripheral area.
  • the invention is based on the finding that an incoherent image recording is obtained if an object to be imaged successively differs from one another during the exposure time of an image
  • a condenser-monochromator arrangement which consists of an off-axis zone plate, a plane mirror, a monochromator pinhole on the optical axis and a mechanical holder for the off-axis zone plate and the plane mirror.
  • the holder can be rotated around the optical axis of the microscope.
  • This rotation creates lighting from different directions.
  • the condenser-monochromator arrangement contains only a single diffractive optical element and this contains coarser and thus a lower total number of diffractive structures than in previously used optical elements, so that these can be exposed with the aid of electron beam lithography in significantly shorter times.
  • the illumination aperture of the condenser-monochromator arrangement can be set variably without the need to use a second diffractive optical element.
  • 1 shows a condenser monochromator consisting of an off-axis transmission zone plate and a downstream plane mirror.
  • Transmission zone plate an upstream and a downstream plane mirror.
  • FIG. 3 shows a condenser monochromator consisting of an off-axis transmission zone plate and two upstream plane mirrors.
  • Transmission zone plate and an upstream plane mirror are identical to Transmission zone plate and an upstream plane mirror.
  • FIG. 5 shows a condenser monochromator consisting of a condenser zone plate and two upstream plane mirrors.
  • FIG. 6 shows a condenser monochromator consisting of an off-axis reflection zone plate and a downstream plane mirror.
  • FIG. 7a shows a condenser monochromator consisting of a reflection plan grating and a downstream focusing mirror.
  • FIG. 7b shows a condenser monochromator consisting of a transmission plan grating and a downstream focusing mirror.
  • Fig. 8 shows a condenser monochromator consisting of an off-axis reflection zone plate and an upstream plane mirror.
  • Fig. 9 shows a condenser monochromator consisting of an off-axis reflection zone plate, an upstream and a downstream plane mirror.
  • FIG. 10 shows a condenser monochromator consisting of an off-axis reflection zone plate and two upstream plane mirrors.
  • Fig. 11 shows a condenser monochromator consisting of an off-axis transmission zone plate and two downstream plane mirrors.
  • Fig. 12. shows a condenser monochromator consisting of an off-axis transmission zone plate and three downstream plane mirrors.
  • Fig. 13 shows a condenser monochromator that has an off-axis
  • Transmission zone plate consisting of two segments of different focal points and two pairs of plane mirrors.
  • Fig. 14 shows a condenser monochromator that contains an off-axis transmission zone plate consisting of two segments of different focal points and two pairs of plane mirrors.
  • Fig. 15 shows a condenser monochromator consisting of a focuser with a ring focus and a downstream concave mirror.
  • Fig. 16 shows a condenser monochromator consisting of a focuser with a ring focus and two downstream concave mirrors.
  • the incident x-ray radiation 1 strikes a diffractive and at the same time imaging optical element 7 and is focused by it and diffracted in the direction of a plane mirror 2.
  • the plane mirror 2 stands a few cm in front of the focal point of the x-ray radiation and reflects it into the monochromator aperture 11 on the object 4, which is located on the optical axis 6 of the x-ray microscope 5.
  • the plane mirror 2 is grazing incidence with a few degrees of incidence so that total reflection occurs
  • the plane mirror 2 (Matter has a refractive index that is less than one for soft X-rays) and high reflectivity is achieved.
  • the surface quality of the plane mirror 2 does not have to be particularly demanding with regard to the angular tangent error (an angular tangent error of better than 10 arcseconds is sufficient), since the plane mirror 2 is only a few cm in front of the object 4 to be illuminated. As a result, the angular tangent error can only slightly expand the illuminated image field by scattering. Since the plane mirror 2 is relatively close to the focal point of the X-rays and the beam cross-section is already small here, the plane mirror 2 advantageously only needs to be a few cm long.
  • the two optical elements 2, 7 described form with the monochromator pinhole 11 a condenser-monochromator arrangement.
  • the optical elements 2, 7 are rotatably supported about the optical axis 6 of the X-ray microscope 5.
  • They can be fastened in a mechanical holder, not shown here.
  • the holder has an axis of rotation coinciding with the optical axis 6, about which it can rotate together with the optical elements 2, 7.
  • the optical axis 6 of the X-ray microscope 5 is aligned in the direction of propagation of the incident X-ray radiation 1.
  • the entire structure is located in a vacuum chamber due to the high absorption of the soft X-rays used.
  • the diffractive and imaging optical element 7 can be an off-axis zone plate.
  • An off-axis zone plate is understood here to mean a zone plate which consists only of a small, asymmetrical and there is a contiguous zone area located far from the center of the zone plate. For this reason, the structures within this zone area are generally not rotationally symmetrical.
  • the zone area is so large that it can capture an X-ray beam with a cross-sectional area of a few mm 2. It can be used in transmission as an off-axis transmission zone plate 7 according to FIG. 1, or in reflection as an off-axis reflection zone plate 3 according to FIG. 6 . Since an off-axis zone plate deflects the X-rays laterally, the plane mirror 2 is absolutely necessary in order to reflect the X-rays back onto the optical axis 6.
  • the mechanical holder with the optical elements 7, 2 (FIG. 1) is rotated exactly one revolution about the optical axis 6, then the illumination cone, which is incident obliquely on the object 4, describes 8 a hollow cone, which is the effective
  • the opening angle 10 of this hollow cone can be set via the reflection angle 9 of the plane mirror 2.
  • the distance between the plane mirror 2 and the optical axis 6 and the position of the off-axis transmission zone plate 7 (or the off-axis reflection zone plate 3 in FIG. 6) along the optical axis 6 must be readjusted so that the focus is exactly again lies on the optical axis 6 in object 4.
  • the position of the axis of rotation of the holder must remain stable down to a few ⁇ m, which can be achieved with spindle ball bearings or play-free ball guides.
  • the off-axis zone plate 7, 3 only has to generate an image of the X-ray source of a suitable size in the object plane and spectrally split the X-ray radiation. Because undulators have very small source sizes - they are significantly smaller than the source sizes in the deflection magnets used up to now -, a small scale scale and thus an off-axis zone plate 7.3 with typically at least twice the focal length than that of the condenser zone plates mentioned in the introduction can be used to so-called the object
  • An off-axis transmission zone plate 7 for X-rays with a wavelength of 2.4 nm has e.g. Germanium zones 50 nm wide and 300 nm high
  • An off-axis reflection zone plate 3 which is equivalent in terms of its optical properties and is used at angles of incidence of a few degrees, on the other hand, has zone widths which are about 10 to 50 times larger and at the same time significantly lower zone height. Therefore, the off-axis reflection zone plate 3 is technological n
  • an off-axis reflection zone plate 3 can be located on a stable, solid substrate. Because of the extremely oblique incidence of the X-rays, this substrate is thermally resilient and coolable
  • both the off-axis transmission zone plate 7 and the off-axis reflection zone plate 3 can be arranged in different ways, which is shown by way of example in FIGS. 2, 3 and 9-14
  • the incident x-ray radiation 1 is first deflected with a plane mirror 2 from its original direction towards an off-axis zone plate 7.3
  • Reflection zone plate 3 inserted.
  • the arrangement of both plane mirrors 2 and the off-axis zone plate 7.3 is rotated one revolution around the optical axis 6 during the exposure time for an X-ray image.
  • the illumination cone 8 incident obliquely on the object describes a hollow cone, which is the effective aperture of the illumination
  • the desired aperture adjustment takes place with the second plane mirror 2 arranged in the beam path behind the off-axis zone plate 7, 3, by suitably setting the reflection angle 9 22 PC17DE97 / 00033
  • the incident x-ray radiation 1 is first directed from its original direction with a plane mirror 2 and strikes a second plane mirror 2. From there it reaches an off-axis transmission zone plate 7 or, according to FIG off-axis
  • the off-axis zone plate 7.3 focuses the X-ray light into the object 4.
  • the described arrangement of the two plane mirrors 2 and the off-axis zone plate 7.3 is turned by one turn during the exposure time of the X-ray microscope 5 with the aid of a mechanical holder (not shown) the optical axis 6 rotated
  • the illumination cone 8, which falls obliquely onto the object 4, describes a hollow cone that determines the effective aperture of the illumination.
  • the desired aperture adjustment is carried out with a second plane mirror 2 arranged in the beam path just before the off-axis zone plate 7. 3, by suitably setting the reflection angle 9
  • the 4 shows a condenser-monochromator arrangement with an off-axis transmission zone plate 7 and an upstream plane mirror 2.
  • the off-axis transmission zone plate 7 focuses the X-ray light obliquely back to the object 4 on the optical axis 6.
  • the off-axis transmission zone plate 7 and the upstream plane mirror 2 are rotated one revolution around the optical axis 6 during the exposure time of the X-ray microscope 5.
  • the illumination cone 8, which falls obliquely onto the object, describes a hollow cone that determines the effective aperture of the illumination. However, with this arrangement, a flexible aperture adjustment is no longer possible
  • FIG. 5 shows an exemplary embodiment in which an annular condenser zone plate 14 described in the introduction is used as the diffractive element.
  • annular condenser zone plate 14 described in the introduction is used as the diffractive element.
  • the condenser zone plate 14 therefore does not need to be rotated.
  • the illumination cone 8 incident obliquely on the object 4 describes one
  • FIG. 6 shows a condenser-monochromator arrangement, in which the incident x-ray radiation 1 strikes an off-axis reflection zone plate 3, which diffracts and at the same time focuses the x-ray radiation 1 in reflection.
  • the plane mirror 2 directs the diffracted x-ray radiation onto the
  • FIG. 7a shows an exemplary embodiment in which a reflection plan grating 15a with variable line density is used as the diffractive element.
  • the line density of the reflection plan grating 15a varies in such a way that the X-ray radiation after diffraction at the reflection plan grating 15a has the same beam divergence as before the reflection plan grating 15a.
  • This technique is generally known and is already being used. According to the invention, there is also a focusing beam in the further beam path
  • the focusing mirror 16 focuses the X-ray radiation on the object 4, a hollow cone determining the aperture of the illumination being formed by the rotation
  • a transmission plan grating 15b is used as the diffractive optical element instead of the reflection plan grating 15a.
  • the transmission plan grating 15b diffracts the incident X-ray radiation 1 in transmission and maintains its parallelism even after the diffraction. Only the focusing one
  • the off-axis reflection zone plate 3 focuses the X-ray light obliquely back to the object 4 on the optical axis 6.
  • the off-axis reflection zone plate 3 and the upstream plane mirror 2 is rotated one revolution around the optical axis 6 during the exposure time of the X-ray microscope 5.
  • the illuminating cone 8, which falls obliquely onto the object, describes a hollow cone, which is the effective one
  • Light sources e.g. when illuminated with lasers.
  • Corresponding systems are referred to as systems with "dynamic coherent aperture". They embody the special case of strongly oblique and rotating lighting. For these it is known in the visible spectral range that the transfer function is significantly increased at high spatial frequencies compared to almost incoherent illumination with a condenser of circular pupil, so that an improved contrast transmission is achieved.
  • monochromatic laser radiation it is of course sufficient to deflect the steel only by means of mirrors, i.e. in FIG. 6 and in FIGS. 8-10, the monochromatizing properties of the off-axis reflection zone plate 3 can be dispensed with and these can be replaced by a focusing mirror.
  • the off-axis transmission zone plate 7 can then be replaced in FIG. 1-4 by a lens which is used in a section far from the center of the lens.
  • Fig.1 1 the e.g. Plane mirror 2 shown in FIG. 1 replaced by two successive individual plane mirrors 2. Both planar mirrors 2 deflect the X-rays in the same direction. However, it is also possible for the two plane mirrors 2 to deflect the X-rays in the opposite direction.
  • An arrangement with two successive plane mirrors 2 rotating about the optical axis 6 (as also shown in FIG. 3 and FIG. 10) always causes the image of the x-ray radiation source despite the rotating off-axis transmission zone plate 7 and the rotating plane mirror 2 is not rotated. This has the advantages discussed below
  • a condenser monochromator consisting of an off-axis transmission zone plate 7 and three downstream plane mirrors 17, 18, 19 is shown.
  • the off-axis transmission zone plate 7 and the plane mirror 19 can remain spatially fixed. This arrangement has the advantage that the image of the x-ray source generated by the off-axis transmission zone plate 7 is twice as large
  • Reflection on the rotating mirrors 17, 18 is not rotated.
  • an electron beam undulator used as the X-ray radiation source, it generally has a strongly elliptical source region, of which the off-axis transmission zone plate 7 produces an image.
  • the direction of dispersion of the off-axis transmission zone plate 7 can now be set so that it falls in the direction of the small axis of the ellipse.
  • the only slightly curved zones of the off-axis transmission zone plate 7 run essentially "parallel" to the large ellipse axis of the image.
  • FIG. 13 shows a condenser-monochromator arrangement with two off-axis transmission zone plate segments 20a, 20b and with two pairs downstream and oppositely deflecting plane mirror 2 shown.
  • the X-rays are captured by two off-axis transmission zone plate segments 20a, 20b of the same focal length.
  • the structure of the off-axis transmission zone plate segments 20a, 20b is identical, but rotated by 180 ° relative to one another, so that the two associated foci lie opposite one another, symmetrical to the optical axis 6.
  • the beams are reflected back onto the optical axis 6 with a pair of plane mirrors , so that the two focal points overlap in object 4.
  • This type of lighting is strictly mirror-symmetrical and leads to different imaging properties than that
  • Single sideband imaging with one-sided and extreme bright field oblique lighting.
  • this type of illumination can be used to operate dark field microscopy with a further increase in the illumination angle in the object plane.
  • Complementary diffracted rays are then always present in the image plane, which can interfere with one another. This is a necessary requirement if the limit resolution is to be achieved in the dark field.
  • FIG. 14 A condenser-monochromator arrangement is shown with an off-axis transmission zone plate 7 and with two pairs of plane mirrors 2, each deflecting in the same direction.
  • Transmission zone plate 7 like that according to FIG. 13, is composed of two segments 20a, 20b, which have the same focal length but with focal points opposite one another with respect to the optical axis 6. Because of the radiation-deflecting plane mirror 2, however, the otherwise separate focal points overlap in a focal point in object 4.
  • the basic mode of operation is the same as already described under FIG. 13.
  • the following mirror system consists of one or two concave concave mirrors 12 connected in series. It is placed at a suitable distance behind the
  • Focuser 13 and arranged in front of the ring focus. As a result, a point-like focus on the optical axis 6 is obtained instead of a ring focus. If a small pinhole 11 is placed around this “focal point”, the arrangement of the focuser 13, the hollow cone mirror 12 and the pinhole 11 acts as a monochromator. The aperture is adjusted by a suitable choice of the deflection angle of the hollow cone mirror system
  • Fig. 16 shows a condenser-monochromator arrangement with a focuser 13 with ring focus and two downstream hollow cone mirrors 12.
  • the advantage of a system with two hollow cone mirrors 12 is that in such a system the so-called "kink surface" of the radiation deflection is almost perpendicular to lies on the optical axis 6 (the kinked surface is the surface on which the reflected rays elongated in the beam direction and the reflected rays elongated to the rear intersect).
  • the aberrations which occur when the system is tilted - that is, for example, in the case of incorrect adjustment - are lower in optical systems than in systems whose kink surface runs almost parallel to the optical axis 6.
  • the latter is the case when using a system with only one concave cone mirror 12, for which the reflecting surface and the kinked surface have to match and which has to be adjusted much more precisely.
  • the apertures of all previously available microzone plates for brightfield, phase contrast and darkfield microscopy can be adapted.
  • the aperture of a ring pupil is obtained by rotating an oblique illumination through 360 °, the angle of the oblique illumination using a plane mirror
  • the plane mirror 2 can be set over a wide range.
  • the plane mirror 2 is very small, typically a few cm long and therefore inexpensive. A beam expansion is not necessary for operation on well-collimated beams from undulators.
  • the wavelength can be changed over a wide range.
  • the condenser-monochromator arrangement contains an off-axis zone plate 7.3 with zone widths which are significantly larger than that of the available micro zone plates which are used as an X-ray objective.
  • the wavelength can be changed over a wide range.
  • a ring pupil can also be generated by a focuser 13, a hollow cone mirror 12 then being used to focus the radiation onto the optical axis 6.

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • General Engineering & Computer Science (AREA)
  • High Energy & Nuclear Physics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
  • X-Ray Techniques (AREA)

Abstract

L'invention concerne des systèmes de condensateur-monochromateur à haute intensité qui assurent un éclairage quasi-monochromatique d'objets et une reconstitution incohérente d'images dans des microscopes à rayons X (5) et sont particulièrement indiqués pour des rayons de bonne collimation provenant d'onduleurs sur des anneaux accumulateurs d'électrons. Ces systèmes de condensateur-monochromateur comprennent pour élément optique diffractif une lentille zonée désaxée en transmission (7) ou en réflexion. Un diaphragme de monochromateur (11) se trouve dans le plan de l'objet. L'ouverture d'éclairage du système de condensateur-monochromateur peut être ajustée de manière variable avec des miroirs plans (2) simples. La lentille zonée (7) désaxée et au moins un miroir plan (2) tournent autour de l'axe optique (6) du microscope à rayons X (5) pendant l'exposition à la lumière d'une image. L'invention concerne en outre un système stabilisé comprenant un dispositif de focalisation muni d'un foyer annulaire et un système subséquent composé d'un ou de deux miroirs à cône creux.
EP97906992A 1996-01-10 1997-01-10 Systeme de condenseur-monochromateur pour rayonnement x Expired - Lifetime EP0873565B1 (fr)

Applications Claiming Priority (5)

Application Number Priority Date Filing Date Title
DE19600701 1996-01-10
DE19600701 1996-01-10
DE19633047 1996-08-18
DE19633047 1996-08-18
PCT/DE1997/000033 WO1997025722A2 (fr) 1996-01-10 1997-01-10 Systeme de condensateur-monochromateur pour rayonnement x

Publications (2)

Publication Number Publication Date
EP0873565A2 true EP0873565A2 (fr) 1998-10-28
EP0873565B1 EP0873565B1 (fr) 1999-10-20

Family

ID=26021979

Family Applications (1)

Application Number Title Priority Date Filing Date
EP97906992A Expired - Lifetime EP0873565B1 (fr) 1996-01-10 1997-01-10 Systeme de condenseur-monochromateur pour rayonnement x

Country Status (5)

Country Link
US (1) US6128364A (fr)
EP (1) EP0873565B1 (fr)
JP (1) JP3069131B2 (fr)
DE (2) DE19700615A1 (fr)
WO (1) WO1997025722A2 (fr)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1100092A2 (fr) * 1999-11-12 2001-05-16 Helmut Fischer GmbH & Co. Dispositif de guidage de rayons-x

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5326428A (en) 1993-09-03 1994-07-05 Micron Semiconductor, Inc. Method for testing semiconductor circuitry for operability and method of forming apparatus for testing semiconductor circuitry for operability
US6327335B1 (en) * 1999-04-13 2001-12-04 Vanderbilt University Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam
US6259764B1 (en) * 1999-07-16 2001-07-10 Agere Systems Guardian Corp. Zone plates for X-rays
EP1200879B1 (fr) * 1999-07-30 2007-06-20 Carl Zeiss SMT AG Réglage de la distribution d'illumination dans la pupille de sortie d'un système d'illumination pour l'ultraviolet extrême
US20050122509A1 (en) * 2002-07-18 2005-06-09 Leica Microsystems Semiconductor Gmbh Apparatus for wafer inspection
DE10242431A1 (de) * 2002-09-11 2004-03-25 Lutz Dr. Kipp Element zur Fokussierung von elektromagnetischen Strahlen oder Strahlen von Elementarteilchen
US7268945B2 (en) * 2002-10-10 2007-09-11 Xradia, Inc. Short wavelength metrology imaging system
US7170969B1 (en) * 2003-11-07 2007-01-30 Xradia, Inc. X-ray microscope capillary condenser system
US7486984B2 (en) * 2004-05-19 2009-02-03 Mxisystems, Inc. System and method for monochromatic x-ray beam therapy
DE102005056404B4 (de) * 2005-11-23 2013-04-25 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung
GB2441557B (en) * 2006-09-11 2010-03-17 Medway Nhs Trust Radiation device or signal
EP2370807A4 (fr) 2008-12-01 2015-11-11 Univ North Carolina Systèmes et procédés de détection d'une image d'un objet à l'aide d'une imagerie multifaisceaux à partir d'un faisceau de rayons x ayant une distribution polychromatique
DE112010001478B4 (de) * 2009-07-01 2016-05-04 Rigaku Corp. Verwendung einer Röntgenvorrichtung
US8294989B2 (en) * 2009-07-30 2012-10-23 The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration Apparatus and method for creating a photonic densely-accumulated ray-point
US10620118B2 (en) * 2012-02-27 2020-04-14 Steris Instrument Management Services, Inc. Systems and methods for identifying optical materials
DE102012013530B3 (de) * 2012-07-05 2013-08-29 Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh Vorrichtung zur Messung resonanter inelastischer Röntgenstreuung einer Probe
US10541102B2 (en) * 2016-09-14 2020-01-21 The Boeing Company X-ray back scattering for inspection of part
DE102017105275B4 (de) 2017-03-13 2019-02-14 Focus Gmbh Vorrichtung und Verfahren zur Generierung monochromatischer Strahlung einer Strahlungsquelle mit Linienspektrum
DE102020001448B3 (de) 2020-03-03 2021-04-22 Friedrich Grimm Hybridprisma als Bauelement für optische Systeme

Family Cites Families (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5199057A (en) * 1989-08-09 1993-03-30 Nikon Corporation Image formation-type soft X-ray microscopic apparatus
US5204887A (en) * 1990-06-01 1993-04-20 Canon Kabushiki Kaisha X-ray microscope
DE4027285A1 (de) * 1990-08-29 1992-03-05 Zeiss Carl Fa Roentgenmikroskop
JPH04353800A (ja) * 1991-05-31 1992-12-08 Olympus Optical Co Ltd 軟ｘ線顕微鏡
US5177774A (en) * 1991-08-23 1993-01-05 Trustees Of Princeton University Reflection soft X-ray microscope and method
US5361292A (en) * 1993-05-11 1994-11-01 The United States Of America As Represented By The Department Of Energy Condenser for illuminating a ring field
JP3167095B2 (ja) * 1995-07-04 2001-05-14 キヤノン株式会社 照明装置とこれを有する露光装置や顕微鏡装置、ならびにデバイス生産方法
US6023496A (en) * 1997-04-30 2000-02-08 Shimadzu Corporation X-ray fluorescence analyzing apparatus
US6028911A (en) * 1998-08-03 2000-02-22 Rigaku Industrial Corporation X-ray analyzing apparatus with enhanced radiation intensity

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO9725722A2 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1100092A2 (fr) * 1999-11-12 2001-05-16 Helmut Fischer GmbH & Co. Dispositif de guidage de rayons-x
EP1100092A3 (fr) * 1999-11-12 2003-03-26 Helmut Fischer GmbH & Co. Dispositif de guidage de rayons-x

Also Published As

Publication number Publication date
JP3069131B2 (ja) 2000-07-24
WO1997025722A2 (fr) 1997-07-17
DE59700582D1 (de) 1999-11-25
DE19700615A1 (de) 1997-07-17
JPH11508692A (ja) 1999-07-27
EP0873565B1 (fr) 1999-10-20
WO1997025722A3 (fr) 1997-09-04
US6128364A (en) 2000-10-03

Similar Documents

Publication Publication Date Title
EP0873565B1 (fr) Systeme de condenseur-monochromateur pour rayonnement x
EP1225481B1 (fr) Collecteur pour un système d'illumination
DE69122018T2 (de) Röntgenstrahllithographie mit ringförmigem Bildfeld
EP1288652B1 (fr) Diffractomètre à rayons X avec dispositifs optiques de rayons X pour la génération de plusieurs trajéctoires de rayons X
DE69121972T2 (de) Röntgenstrahlenmikroskop
EP1202101A2 (fr) Système d'illumination réglable
WO1995008174A1 (fr) Microscope a rayons x a contraste de phase
DE102011077223B4 (de) Messsystem
DE19700880A1 (de) Röntgenmikroskop mit Zonenplatten
DE60302383T2 (de) Röntgendiffraktometer
DE112011102900B4 (de) Abbildungssystem
DE102007023411A1 (de) Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik
DE102012213515A1 (de) Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage
CH634664A5 (de) Abtastvorrichtung zur kartesischen abtastung und weitergabe von bildfeldern.
DE102011076658A1 (de) Beleuchtungsoptik für die EUV-Projektionslithographie
EP1372012B1 (fr) Dispositif optique pour l'observation d'un échantillon ou d'un objet
DE102013200394A1 (de) Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung
DE102005037764B4 (de) Anordnung zur homogenen Beleuchtung eines Feldes
DE102018207410A1 (de) Facettenspiegel für eine Beleuchtungsoptik für die Projektionslithographie
EP1471539B1 (fr) Sytème d'imagerie pour un microscope à base de rayonnement extrême ultraviolet (EUV)
DE10214259A1 (de) Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm
DE102005056404B4 (de) Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung
EP1397671A2 (fr) Dispositif de mesure
DE2355136B2 (de) Vorrichtung zum Aufzeichnen vonüberlagerten Hologrammen
DE10229816A1 (de) Vorrichtung zur Erzeugung einer konvergenten Lichtwellenfront und System zur interferometrischen Linsenflächenvermessung

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

17P Request for examination filed

Effective date: 19980403

AK Designated contracting states

Kind code of ref document: A2

Designated state(s): CH DE DK FR GB IT LI SE

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAG Despatch of communication of intention to grant

Free format text: ORIGINAL CODE: EPIDOS AGRA

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

17Q First examination report despatched

Effective date: 19990311

GRAH Despatch of communication of intention to grant a patent

Free format text: ORIGINAL CODE: EPIDOS IGRA

GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Kind code of ref document: B1

Designated state(s): CH DE DK FR GB IT LI SE

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Free format text: THE PATENT HAS BEEN ANNULLED BY A DECISION OF A NATIONAL AUTHORITY

Effective date: 19991020

Ref country code: IT

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRE;WARNING: LAPSES OF ITALIAN PATENTS WITH EFFECTIVE DATE BEFORE 2007 MAY HAVE OCCURRED AT ANY TIME BEFORE 2007. THE CORRECT EFFECTIVE DATE MAY BE DIFFERENT FROM THE ONE RECORDED.SCRIBED TIME-LIMIT

Effective date: 19991020

REG Reference to a national code

Ref country code: CH

Ref legal event code: EP

GBT Gb: translation of ep patent filed (gb section 77(6)(a)/1977)

Effective date: 19991021

REF Corresponds to:

Ref document number: 59700582

Country of ref document: DE

Date of ref document: 19991125

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DK

Free format text: LAPSE BECAUSE OF FAILURE TO SUBMIT A TRANSLATION OF THE DESCRIPTION OR TO PAY THE FEE WITHIN THE PRESCRIBED TIME-LIMIT

Effective date: 20000120

ET Fr: translation filed
PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT

RAP2 Party data changed (patent owner data changed or rights of a patent transferred)

Owner name: LEICA MICROSYSTEMS LITHOGRAPHY GMBH

RIN2 Information on inventor provided after grant (corrected)

Free format text: NIEMANN, BASTIAN, DR.

26N No opposition filed
REG Reference to a national code

Ref country code: GB

Ref legal event code: IF02

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: DE

Payment date: 20060112

Year of fee payment: 10

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 20060113

Year of fee payment: 10

Ref country code: CH

Payment date: 20060113

Year of fee payment: 10

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: LI

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20070131

Ref country code: CH

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20070131

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: DE

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20070801

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

GBPC Gb: european patent ceased through non-payment of renewal fee

Effective date: 20070110

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

Effective date: 20070930

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20070110

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 20070131

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: GB

Payment date: 20060120

Year of fee payment: 10