WO1997025722A2 - Kondensor-monochromator-anordnung für röntgenstrahlung - Google Patents
Kondensor-monochromator-anordnung für röntgenstrahlung Download PDFInfo
- Publication number
- WO1997025722A2 WO1997025722A2 PCT/DE1997/000033 DE9700033W WO9725722A2 WO 1997025722 A2 WO1997025722 A2 WO 1997025722A2 DE 9700033 W DE9700033 W DE 9700033W WO 9725722 A2 WO9725722 A2 WO 9725722A2
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- condenser
- monochromator
- zone plate
- axis
- arrangement
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K1/00—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating
- G21K1/06—Arrangements for handling particles or ionising radiation, e.g. focusing or moderating using diffraction, refraction or reflection, e.g. monochromators
-
- G—PHYSICS
- G21—NUCLEAR PHYSICS; NUCLEAR ENGINEERING
- G21K—TECHNIQUES FOR HANDLING PARTICLES OR IONISING RADIATION NOT OTHERWISE PROVIDED FOR; IRRADIATION DEVICES; GAMMA RAY OR X-RAY MICROSCOPES
- G21K7/00—Gamma- or X-ray microscopes
Definitions
- the invention relates to a condenser-monochromator arrangement for X-rays according to the features in the preamble of claim 1.
- X-ray microscopy done in the wavelength range of about 0.2 - 5 nm.
- X-ray microscopes have been developed that operate on brilliant X-ray sources. These x-ray sources include electron storage rings, the deflecting magnets and undulators of which are sources of intense x-rays; there are no other X-ray sources of comparable brilliance. Until now, only the X-rays generated by deflection magnets have been used for transmission X-ray microscopes.
- Microzone plates are rotationally symmetrical transmission circle gratings with decreasing lattice constants, typically have a diameter of up to 0.1 mm and a few hundred zones.
- the numerical aperture of a zone plate is generally determined by the diffraction angle at which the outer and thus the finest zones are perpendicular
- the condenser is smaller than that of the microscope objective, so there is a partially coherent image and the linear transformation between object intensity and image intensity is lost for the important high spatial frequencies that determine the resolution of the microscope
- ring-shaped zone plates have been used as condensers for X-ray radiation. They focus the X-ray radiation on the object to be examined with the X-ray microscope.
- the size of such a “condenser zone plate” is adapted to the beam diameter, which typically extends up to the end of the beam tube of a deflection magnet of an electron storage device Is 1 cm Condenser zone plate is ring-shaped, it collects about Vt of the radiation lying in this beam diameter.
- a zone plate Since the focal length of a zone plate is reciprocal to the wavelength used, such a condenser zone plate together with a small so-called monochromator pinhole, which is located in the object plane around the object, also acts as a linear monochromator (Optics Communication 12, pp. 160-163, 1974, "Soft X-Ray Imaging Zone Plates with Large Zone Numbers for Microscopic and Spectroscopic Applications "(Niemann, Rudolph, Schmahl). Only a narrow spectral range of the incident polychromatic radiation from an electron storage ring is included in the
- the relationship only applies if the image of the source - the so-called "critical illumination" - is not larger than the diameter d of the pinhole.
- R is at least as large as the number of zones n on the microzone plate of the X-ray microscope, then it is chromatic aberration of the microzone plate is negligible and it only slightly deteriorates the quality of the X-ray image.
- a condenser zone plate is always not used too small a diameter D, so that the permitted diameter d of the monochromator pinhole is larger than the image of the Source is.
- Image scale with which the source is imaged in the object plane and the diameter of the illuminated object area decreases (in practice to a few ⁇ m diameter), which is disadvantageous. Only by other measures - for example, by making parallel movements of the condenser and monochromator pinhole - can it be ensured that a larger object area is illuminated homogeneously. In addition, the monochromator diaphragm and the condenser zone plate must remain precisely adjusted to one another during the movement.
- Condenser zone plates are usually used in the first diffraction order, in which all previously implemented
- Condenser zone plates have their highest diffraction efficiency. It is also difficult for another reason explained below to achieve the previously required adaptation of the numerical aperture of the condenser zone plate to that of the microzone plate without new difficulties.
- the condenser zone plate In order to implement the adaptation, the condenser zone plate must have the same fine zones on the outside as the microzone plate itself.
- the brightest built microzone plates now have zone widths of only 19 nm (corresponding to 38 nm period of the zone structures). So far, zone plates with such fine zone structures can only be used with methods of
- Electron beam lithography in which the zones are generated one after the other. Holographic methods, which produce the pattern of a zone plate in one step “in parallel” and thus in a short time, are ruled out because a suitably short-wave UV holography does not exist. Accordingly, condenser zone plates with an adapted numerical aperture could only be used with methods of Electron beam lithography, which can be called a serial and therefore slow process, are produced. However, such condenser zone plates typically have many 10,000 zones because of their necessarily large diameter. The writing times with an electron beam lithography system are then in the order of weeks, which is unrealistic for practical reasons, which is why condenser zone plates have not yet been produced using methods of electron beam lithography.
- Advantageous monochromator arrangement which delivers as much as possible all X-ray light made available by the beam tube in an annular hollow-cone aperture with a large aperture angle to the object.
- Zone width of only 10 nm. This increases the apertures of the micro-zone plates and, accordingly, the numerical apertures of the condensers necessary to ensure incoherent object lighting, and the difficulties already mentioned are further increased.
- Electron storage rings are under construction worldwide and some have been completed, which provide X-rays from undulators. These undulators provide approximately 10 to 100 times higher X-ray flux that can be fully used for X-ray microscopy.
- the X-ray radiation is much better colimized, typically the beam at the end of a beam tube at the location of a microscope is only 1 - 2 mm in diameter and the "large" condenser zone plates previously used and whose aperture has not been adapted can no longer be fully illuminated Sufficiently monochromatize radiation, then either arrangements with the disadvantages discussed above - smaller condenser zone plates with shorter focal lengths and correspondingly smaller monochromator pin diaphragms - would have to be used, or large condenser zone plates have to be illuminated off-axis, ie in a peripheral area.
- the invention is based on the finding that an incoherent image recording is obtained if an object to be imaged successively differs from one another during the exposure time of an image
- a condenser-monochromator arrangement which consists of an off-axis zone plate, a plane mirror, a monochromator pinhole on the optical axis and a mechanical holder for the off-axis zone plate and the plane mirror.
- the holder can be rotated around the optical axis of the microscope.
- This rotation creates lighting from different directions.
- the condenser-monochromator arrangement contains only a single diffractive optical element and this contains coarser and thus a lower total number of diffractive structures than in previously used optical elements, so that these can be exposed with the aid of electron beam lithography in significantly shorter times.
- the illumination aperture of the condenser-monochromator arrangement can be set variably without the need to use a second diffractive optical element.
- 1 shows a condenser monochromator consisting of an off-axis transmission zone plate and a downstream plane mirror.
- Transmission zone plate an upstream and a downstream plane mirror.
- FIG. 3 shows a condenser monochromator consisting of an off-axis transmission zone plate and two upstream plane mirrors.
- Transmission zone plate and an upstream plane mirror are identical to Transmission zone plate and an upstream plane mirror.
- FIG. 5 shows a condenser monochromator consisting of a condenser zone plate and two upstream plane mirrors.
- FIG. 6 shows a condenser monochromator consisting of an off-axis reflection zone plate and a downstream plane mirror.
- FIG. 7a shows a condenser monochromator consisting of a reflection plan grating and a downstream focusing mirror.
- FIG. 7b shows a condenser monochromator consisting of a transmission plan grating and a downstream focusing mirror.
- Fig. 8 shows a condenser monochromator consisting of an off-axis reflection zone plate and an upstream plane mirror.
- Fig. 9 shows a condenser monochromator consisting of an off-axis reflection zone plate, an upstream and a downstream plane mirror.
- FIG. 10 shows a condenser monochromator consisting of an off-axis reflection zone plate and two upstream plane mirrors.
- Fig. 11 shows a condenser monochromator consisting of an off-axis transmission zone plate and two downstream plane mirrors.
- Fig. 12. shows a condenser monochromator consisting of an off-axis transmission zone plate and three downstream plane mirrors.
- Fig. 13 shows a condenser monochromator that has an off-axis
- Transmission zone plate consisting of two segments of different focal points and two pairs of plane mirrors.
- Fig. 14 shows a condenser monochromator that contains an off-axis transmission zone plate consisting of two segments of different focal points and two pairs of plane mirrors.
- Fig. 15 shows a condenser monochromator consisting of a focuser with a ring focus and a downstream concave mirror.
- Fig. 16 shows a condenser monochromator consisting of a focuser with a ring focus and two downstream concave mirrors.
- the incident x-ray radiation 1 strikes a diffractive and at the same time imaging optical element 7 and is focused by it and diffracted in the direction of a plane mirror 2.
- the plane mirror 2 stands a few cm in front of the focal point of the x-ray radiation and reflects it into the monochromator aperture 11 on the object 4, which is located on the optical axis 6 of the x-ray microscope 5.
- the plane mirror 2 is grazing incidence with a few degrees of incidence so that total reflection occurs
- the plane mirror 2 (Matter has a refractive index that is less than one for soft X-rays) and high reflectivity is achieved.
- the surface quality of the plane mirror 2 does not have to be particularly demanding with regard to the angular tangent error (an angular tangent error of better than 10 arcseconds is sufficient), since the plane mirror 2 is only a few cm in front of the object 4 to be illuminated. As a result, the angular tangent error can only slightly expand the illuminated image field by scattering. Since the plane mirror 2 is relatively close to the focal point of the X-rays and the beam cross-section is already small here, the plane mirror 2 advantageously only needs to be a few cm long.
- the two optical elements 2, 7 described form with the monochromator pinhole 11 a condenser-monochromator arrangement.
- the optical elements 2, 7 are rotatably supported about the optical axis 6 of the X-ray microscope 5.
- They can be fastened in a mechanical holder, not shown here.
- the holder has an axis of rotation coinciding with the optical axis 6, about which it can rotate together with the optical elements 2, 7.
- the optical axis 6 of the X-ray microscope 5 is aligned in the direction of propagation of the incident X-ray radiation 1.
- the entire structure is located in a vacuum chamber due to the high absorption of the soft X-rays used.
- the diffractive and imaging optical element 7 can be an off-axis zone plate.
- An off-axis zone plate is understood here to mean a zone plate which consists only of a small, asymmetrical and there is a contiguous zone area located far from the center of the zone plate. For this reason, the structures within this zone area are generally not rotationally symmetrical.
- the zone area is so large that it can capture an X-ray beam with a cross-sectional area of a few mm 2. It can be used in transmission as an off-axis transmission zone plate 7 according to FIG. 1, or in reflection as an off-axis reflection zone plate 3 according to FIG. 6 . Since an off-axis zone plate deflects the X-rays laterally, the plane mirror 2 is absolutely necessary in order to reflect the X-rays back onto the optical axis 6.
- the mechanical holder with the optical elements 7, 2 (FIG. 1) is rotated exactly one revolution about the optical axis 6, then the illumination cone, which is incident obliquely on the object 4, describes 8 a hollow cone, which is the effective
- the opening angle 10 of this hollow cone can be set via the reflection angle 9 of the plane mirror 2.
- the distance between the plane mirror 2 and the optical axis 6 and the position of the off-axis transmission zone plate 7 (or the off-axis reflection zone plate 3 in FIG. 6) along the optical axis 6 must be readjusted so that the focus is exactly again lies on the optical axis 6 in object 4.
- the position of the axis of rotation of the holder must remain stable down to a few ⁇ m, which can be achieved with spindle ball bearings or play-free ball guides.
- the off-axis zone plate 7, 3 only has to generate an image of the X-ray source of a suitable size in the object plane and spectrally split the X-ray radiation. Because undulators have very small source sizes - they are significantly smaller than the source sizes in the deflection magnets used up to now -, a small scale scale and thus an off-axis zone plate 7.3 with typically at least twice the focal length than that of the condenser zone plates mentioned in the introduction can be used to so-called the object
- An off-axis transmission zone plate 7 for X-rays with a wavelength of 2.4 nm has e.g. Germanium zones 50 nm wide and 300 nm high
- An off-axis reflection zone plate 3 which is equivalent in terms of its optical properties and is used at angles of incidence of a few degrees, on the other hand, has zone widths which are about 10 to 50 times larger and at the same time significantly lower zone height. Therefore, the off-axis reflection zone plate 3 is technological n
- an off-axis reflection zone plate 3 can be located on a stable, solid substrate. Because of the extremely oblique incidence of the X-rays, this substrate is thermally resilient and coolable
- both the off-axis transmission zone plate 7 and the off-axis reflection zone plate 3 can be arranged in different ways, which is shown by way of example in FIGS. 2, 3 and 9-14
- the incident x-ray radiation 1 is first deflected with a plane mirror 2 from its original direction towards an off-axis zone plate 7.3
- Reflection zone plate 3 inserted.
- the arrangement of both plane mirrors 2 and the off-axis zone plate 7.3 is rotated one revolution around the optical axis 6 during the exposure time for an X-ray image.
- the illumination cone 8 incident obliquely on the object describes a hollow cone, which is the effective aperture of the illumination
- the desired aperture adjustment takes place with the second plane mirror 2 arranged in the beam path behind the off-axis zone plate 7, 3, by suitably setting the reflection angle 9 22 PC17DE97 / 00033
- the incident x-ray radiation 1 is first directed from its original direction with a plane mirror 2 and strikes a second plane mirror 2. From there it reaches an off-axis transmission zone plate 7 or, according to FIG off-axis
- the off-axis zone plate 7.3 focuses the X-ray light into the object 4.
- the described arrangement of the two plane mirrors 2 and the off-axis zone plate 7.3 is turned by one turn during the exposure time of the X-ray microscope 5 with the aid of a mechanical holder (not shown) the optical axis 6 rotated
- the illumination cone 8, which falls obliquely onto the object 4, describes a hollow cone that determines the effective aperture of the illumination.
- the desired aperture adjustment is carried out with a second plane mirror 2 arranged in the beam path just before the off-axis zone plate 7. 3, by suitably setting the reflection angle 9
- the 4 shows a condenser-monochromator arrangement with an off-axis transmission zone plate 7 and an upstream plane mirror 2.
- the off-axis transmission zone plate 7 focuses the X-ray light obliquely back to the object 4 on the optical axis 6.
- the off-axis transmission zone plate 7 and the upstream plane mirror 2 are rotated one revolution around the optical axis 6 during the exposure time of the X-ray microscope 5.
- the illumination cone 8, which falls obliquely onto the object, describes a hollow cone that determines the effective aperture of the illumination. However, with this arrangement, a flexible aperture adjustment is no longer possible
- FIG. 5 shows an exemplary embodiment in which an annular condenser zone plate 14 described in the introduction is used as the diffractive element.
- annular condenser zone plate 14 described in the introduction is used as the diffractive element.
- the condenser zone plate 14 therefore does not need to be rotated.
- the illumination cone 8 incident obliquely on the object 4 describes one
- FIG. 6 shows a condenser-monochromator arrangement, in which the incident x-ray radiation 1 strikes an off-axis reflection zone plate 3, which diffracts and at the same time focuses the x-ray radiation 1 in reflection.
- the plane mirror 2 directs the diffracted x-ray radiation onto the
- FIG. 7a shows an exemplary embodiment in which a reflection plan grating 15a with variable line density is used as the diffractive element.
- the line density of the reflection plan grating 15a varies in such a way that the X-ray radiation after diffraction at the reflection plan grating 15a has the same beam divergence as before the reflection plan grating 15a.
- This technique is generally known and is already being used. According to the invention, there is also a focusing beam in the further beam path
- the focusing mirror 16 focuses the X-ray radiation on the object 4, a hollow cone determining the aperture of the illumination being formed by the rotation
- a transmission plan grating 15b is used as the diffractive optical element instead of the reflection plan grating 15a.
- the transmission plan grating 15b diffracts the incident X-ray radiation 1 in transmission and maintains its parallelism even after the diffraction. Only the focusing one
- the off-axis reflection zone plate 3 focuses the X-ray light obliquely back to the object 4 on the optical axis 6.
- the off-axis reflection zone plate 3 and the upstream plane mirror 2 is rotated one revolution around the optical axis 6 during the exposure time of the X-ray microscope 5.
- the illuminating cone 8, which falls obliquely onto the object, describes a hollow cone, which is the effective one
- Light sources e.g. when illuminated with lasers.
- Corresponding systems are referred to as systems with "dynamic coherent aperture". They embody the special case of strongly oblique and rotating lighting. For these it is known in the visible spectral range that the transfer function is significantly increased at high spatial frequencies compared to almost incoherent illumination with a condenser of circular pupil, so that an improved contrast transmission is achieved.
- monochromatic laser radiation it is of course sufficient to deflect the steel only by means of mirrors, i.e. in FIG. 6 and in FIGS. 8-10, the monochromatizing properties of the off-axis reflection zone plate 3 can be dispensed with and these can be replaced by a focusing mirror.
- the off-axis transmission zone plate 7 can then be replaced in FIG. 1-4 by a lens which is used in a section far from the center of the lens.
- Fig.1 1 the e.g. Plane mirror 2 shown in FIG. 1 replaced by two successive individual plane mirrors 2. Both planar mirrors 2 deflect the X-rays in the same direction. However, it is also possible for the two plane mirrors 2 to deflect the X-rays in the opposite direction.
- An arrangement with two successive plane mirrors 2 rotating about the optical axis 6 (as also shown in FIG. 3 and FIG. 10) always causes the image of the x-ray radiation source despite the rotating off-axis transmission zone plate 7 and the rotating plane mirror 2 is not rotated. This has the advantages discussed below
- a condenser monochromator consisting of an off-axis transmission zone plate 7 and three downstream plane mirrors 17, 18, 19 is shown.
- the off-axis transmission zone plate 7 and the plane mirror 19 can remain spatially fixed. This arrangement has the advantage that the image of the x-ray source generated by the off-axis transmission zone plate 7 is twice as large
- Reflection on the rotating mirrors 17, 18 is not rotated.
- an electron beam undulator used as the X-ray radiation source, it generally has a strongly elliptical source region, of which the off-axis transmission zone plate 7 produces an image.
- the direction of dispersion of the off-axis transmission zone plate 7 can now be set so that it falls in the direction of the small axis of the ellipse.
- the only slightly curved zones of the off-axis transmission zone plate 7 run essentially "parallel" to the large ellipse axis of the image.
- FIG. 13 shows a condenser-monochromator arrangement with two off-axis transmission zone plate segments 20a, 20b and with two pairs downstream and oppositely deflecting plane mirror 2 shown.
- the X-rays are captured by two off-axis transmission zone plate segments 20a, 20b of the same focal length.
- the structure of the off-axis transmission zone plate segments 20a, 20b is identical, but rotated by 180 ° relative to one another, so that the two associated foci lie opposite one another, symmetrical to the optical axis 6.
- the beams are reflected back onto the optical axis 6 with a pair of plane mirrors , so that the two focal points overlap in object 4.
- This type of lighting is strictly mirror-symmetrical and leads to different imaging properties than that
- Single sideband imaging with one-sided and extreme bright field oblique lighting.
- this type of illumination can be used to operate dark field microscopy with a further increase in the illumination angle in the object plane.
- Complementary diffracted rays are then always present in the image plane, which can interfere with one another. This is a necessary requirement if the limit resolution is to be achieved in the dark field.
- FIG. 14 A condenser-monochromator arrangement is shown with an off-axis transmission zone plate 7 and with two pairs of plane mirrors 2, each deflecting in the same direction.
- Transmission zone plate 7 like that according to FIG. 13, is composed of two segments 20a, 20b, which have the same focal length but with focal points opposite one another with respect to the optical axis 6. Because of the radiation-deflecting plane mirror 2, however, the otherwise separate focal points overlap in a focal point in object 4.
- the basic mode of operation is the same as already described under FIG. 13.
- the following mirror system consists of one or two concave concave mirrors 12 connected in series. It is placed at a suitable distance behind the
- Focuser 13 and arranged in front of the ring focus. As a result, a point-like focus on the optical axis 6 is obtained instead of a ring focus. If a small pinhole 11 is placed around this “focal point”, the arrangement of the focuser 13, the hollow cone mirror 12 and the pinhole 11 acts as a monochromator. The aperture is adjusted by a suitable choice of the deflection angle of the hollow cone mirror system
- Fig. 16 shows a condenser-monochromator arrangement with a focuser 13 with ring focus and two downstream hollow cone mirrors 12.
- the advantage of a system with two hollow cone mirrors 12 is that in such a system the so-called "kink surface" of the radiation deflection is almost perpendicular to lies on the optical axis 6 (the kinked surface is the surface on which the reflected rays elongated in the beam direction and the reflected rays elongated to the rear intersect).
- the aberrations which occur when the system is tilted - that is, for example, in the case of incorrect adjustment - are lower in optical systems than in systems whose kink surface runs almost parallel to the optical axis 6.
- the latter is the case when using a system with only one concave cone mirror 12, for which the reflecting surface and the kinked surface have to match and which has to be adjusted much more precisely.
- the apertures of all previously available microzone plates for brightfield, phase contrast and darkfield microscopy can be adapted.
- the aperture of a ring pupil is obtained by rotating an oblique illumination through 360 °, the angle of the oblique illumination using a plane mirror
- the plane mirror 2 can be set over a wide range.
- the plane mirror 2 is very small, typically a few cm long and therefore inexpensive. A beam expansion is not necessary for operation on well-collimated beams from undulators.
- the wavelength can be changed over a wide range.
- the condenser-monochromator arrangement contains an off-axis zone plate 7.3 with zone widths which are significantly larger than that of the available micro zone plates which are used as an X-ray objective.
- the wavelength can be changed over a wide range.
- a ring pupil can also be generated by a focuser 13, a hollow cone mirror 12 then being used to focus the radiation onto the optical axis 6.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- General Engineering & Computer Science (AREA)
- High Energy & Nuclear Physics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
- X-Ray Techniques (AREA)
Abstract
Description
Claims
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US09/101,468 US6128364A (en) | 1996-01-10 | 1997-01-10 | Condenser-monochromator arrangement for X-radiation |
EP97906992A EP0873565B1 (de) | 1996-01-10 | 1997-01-10 | Kondensor-monochromator-anordnung für röntgenstrahlung |
JP9524748A JP3069131B2 (ja) | 1996-01-10 | 1997-01-10 | X線ビーム用のコンデンサモノクロメータ装置 |
DE59700582T DE59700582D1 (de) | 1996-01-10 | 1997-01-10 | Kondensor-monochromator-anordnung für röntgenstrahlung |
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19600701 | 1996-01-10 | ||
DE19633047.5 | 1996-08-18 | ||
DE19633047 | 1996-08-18 | ||
DE19600701.1 | 1996-08-18 |
Publications (2)
Publication Number | Publication Date |
---|---|
WO1997025722A2 true WO1997025722A2 (de) | 1997-07-17 |
WO1997025722A3 WO1997025722A3 (de) | 1997-09-04 |
Family
ID=26021979
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/DE1997/000033 WO1997025722A2 (de) | 1996-01-10 | 1997-01-10 | Kondensor-monochromator-anordnung für röntgenstrahlung |
Country Status (5)
Country | Link |
---|---|
US (1) | US6128364A (de) |
EP (1) | EP0873565B1 (de) |
JP (1) | JP3069131B2 (de) |
DE (2) | DE19700615A1 (de) |
WO (1) | WO1997025722A2 (de) |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5326428A (en) | 1993-09-03 | 1994-07-05 | Micron Semiconductor, Inc. | Method for testing semiconductor circuitry for operability and method of forming apparatus for testing semiconductor circuitry for operability |
US6327335B1 (en) * | 1999-04-13 | 2001-12-04 | Vanderbilt University | Apparatus and method for three-dimensional imaging using a stationary monochromatic x-ray beam |
US6259764B1 (en) * | 1999-07-16 | 2001-07-10 | Agere Systems Guardian Corp. | Zone plates for X-rays |
EP1200879B1 (de) * | 1999-07-30 | 2007-06-20 | Carl Zeiss SMT AG | Steuerung der Beleuchtungsverteilung in der Austrittspupille eines EUV-Beleuchtungssystems |
DE19954520A1 (de) * | 1999-11-12 | 2001-05-17 | Helmut Fischer Gmbh & Co | Vorrichtung zur Führung von Röntgenstrahlen |
US20050122509A1 (en) * | 2002-07-18 | 2005-06-09 | Leica Microsystems Semiconductor Gmbh | Apparatus for wafer inspection |
DE10242431A1 (de) * | 2002-09-11 | 2004-03-25 | Lutz Dr. Kipp | Element zur Fokussierung von elektromagnetischen Strahlen oder Strahlen von Elementarteilchen |
US7268945B2 (en) * | 2002-10-10 | 2007-09-11 | Xradia, Inc. | Short wavelength metrology imaging system |
US7170969B1 (en) * | 2003-11-07 | 2007-01-30 | Xradia, Inc. | X-ray microscope capillary condenser system |
US7486984B2 (en) * | 2004-05-19 | 2009-02-03 | Mxisystems, Inc. | System and method for monochromatic x-ray beam therapy |
DE102005056404B4 (de) * | 2005-11-23 | 2013-04-25 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung |
GB2441557B (en) * | 2006-09-11 | 2010-03-17 | Medway Nhs Trust | Radiation device or signal |
EP2370807A4 (de) | 2008-12-01 | 2015-11-11 | Univ North Carolina | Systeme und verfahren zur bilderfassung eines objekts mittels mehrstrahlbildgebung aus einem röntgenstrahl mit polychromatischer verteilung |
DE112010001478B4 (de) * | 2009-07-01 | 2016-05-04 | Rigaku Corp. | Verwendung einer Röntgenvorrichtung |
US8294989B2 (en) * | 2009-07-30 | 2012-10-23 | The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration | Apparatus and method for creating a photonic densely-accumulated ray-point |
US10620118B2 (en) * | 2012-02-27 | 2020-04-14 | Steris Instrument Management Services, Inc. | Systems and methods for identifying optical materials |
DE102012013530B3 (de) * | 2012-07-05 | 2013-08-29 | Helmholtz-Zentrum Berlin Für Materialien Und Energie Gmbh | Vorrichtung zur Messung resonanter inelastischer Röntgenstreuung einer Probe |
US10541102B2 (en) * | 2016-09-14 | 2020-01-21 | The Boeing Company | X-ray back scattering for inspection of part |
DE102017105275B4 (de) | 2017-03-13 | 2019-02-14 | Focus Gmbh | Vorrichtung und Verfahren zur Generierung monochromatischer Strahlung einer Strahlungsquelle mit Linienspektrum |
DE102020001448B3 (de) | 2020-03-03 | 2021-04-22 | Friedrich Grimm | Hybridprisma als Bauelement für optische Systeme |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5199057A (en) * | 1989-08-09 | 1993-03-30 | Nikon Corporation | Image formation-type soft X-ray microscopic apparatus |
US5204887A (en) * | 1990-06-01 | 1993-04-20 | Canon Kabushiki Kaisha | X-ray microscope |
DE4027285A1 (de) * | 1990-08-29 | 1992-03-05 | Zeiss Carl Fa | Roentgenmikroskop |
JPH04353800A (ja) * | 1991-05-31 | 1992-12-08 | Olympus Optical Co Ltd | 軟x線顕微鏡 |
US5177774A (en) * | 1991-08-23 | 1993-01-05 | Trustees Of Princeton University | Reflection soft X-ray microscope and method |
JP3167095B2 (ja) * | 1995-07-04 | 2001-05-14 | キヤノン株式会社 | 照明装置とこれを有する露光装置や顕微鏡装置、ならびにデバイス生産方法 |
US6023496A (en) * | 1997-04-30 | 2000-02-08 | Shimadzu Corporation | X-ray fluorescence analyzing apparatus |
US6028911A (en) * | 1998-08-03 | 2000-02-22 | Rigaku Industrial Corporation | X-ray analyzing apparatus with enhanced radiation intensity |
-
1997
- 1997-01-10 DE DE19700615A patent/DE19700615A1/de not_active Withdrawn
- 1997-01-10 US US09/101,468 patent/US6128364A/en not_active Expired - Fee Related
- 1997-01-10 WO PCT/DE1997/000033 patent/WO1997025722A2/de active IP Right Grant
- 1997-01-10 EP EP97906992A patent/EP0873565B1/de not_active Expired - Lifetime
- 1997-01-10 DE DE59700582T patent/DE59700582D1/de not_active Expired - Fee Related
- 1997-01-10 JP JP9524748A patent/JP3069131B2/ja not_active Expired - Fee Related
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5361292A (en) * | 1993-05-11 | 1994-11-01 | The United States Of America As Represented By The Department Of Energy | Condenser for illuminating a ring field |
Non-Patent Citations (2)
Title |
---|
OPTICS COMMUNICATIONS., Bd. 12, Nr. 2, Oktober 1974, AMSTERDAM NL, Seiten 160-163, XP002033651 B. NIEMANN ET AL.: "Soft x-ray imaging zone plates with large zone numbers for microscopic and spectroscopic applications." in der Anmeldung erw{hnt * |
OPTIK, Bd. 93, Nr. 3, 1.Mai 1993, Seiten 95-102, XP000364882 SCHMAHL G ET AL: "Z-RAY MICROSCOPY STUDIES" * |
Also Published As
Publication number | Publication date |
---|---|
JP3069131B2 (ja) | 2000-07-24 |
EP0873565A2 (de) | 1998-10-28 |
DE59700582D1 (de) | 1999-11-25 |
DE19700615A1 (de) | 1997-07-17 |
JPH11508692A (ja) | 1999-07-27 |
EP0873565B1 (de) | 1999-10-20 |
WO1997025722A3 (de) | 1997-09-04 |
US6128364A (en) | 2000-10-03 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0873565B1 (de) | Kondensor-monochromator-anordnung für röntgenstrahlung | |
EP1225481B1 (de) | Kollektor für Beleuchtungssysteme | |
DE69122018T2 (de) | Röntgenstrahllithographie mit ringförmigem Bildfeld | |
EP1288652B1 (de) | Röntgenstrahlen-Diffraktometer mit röntgenoptischen Elementen zur Ausbildung mehrerer Strahlpfade | |
DE69121972T2 (de) | Röntgenstrahlenmikroskop | |
WO1995008174A1 (de) | Phasenkontrast-röntgenmikroskop | |
EP0144950A2 (de) | Objektiv mit Kegelschnittflächen für die Mikrozonenabbildung | |
DE102011077223B4 (de) | Messsystem | |
DE19700880A1 (de) | Röntgenmikroskop mit Zonenplatten | |
DE60302383T2 (de) | Röntgendiffraktometer | |
DE102007023411A1 (de) | Optisches Element, Beleuchtungsoptik für die Mikrolithographie mit mindestens einem derartigen optischen Element sowie Beleuchtungssystem mit einer derartigen Beleuchtungsoptik | |
DE112011102900B4 (de) | Abbildungssystem | |
DE102012213515A1 (de) | Verfahren zum Betreiben einer mikrolithographischen Projektionsbelichtungsanlage | |
CH634664A5 (de) | Abtastvorrichtung zur kartesischen abtastung und weitergabe von bildfeldern. | |
DE102011076658A1 (de) | Beleuchtungsoptik für die EUV-Projektionslithographie | |
EP1372012B1 (de) | Optische Anordnung zur Beobachtung einer Probe oder eines Objekts | |
DE102013200394A1 (de) | Polarisationsmessvorrichtung, Lithographieanlage, Messanordnung, und Verfahren zur Polarisationsmessung | |
DE102005037764B4 (de) | Anordnung zur homogenen Beleuchtung eines Feldes | |
DE102018207410A1 (de) | Facettenspiegel für eine Beleuchtungsoptik für die Projektionslithographie | |
EP1471539B1 (de) | Abbildungssystem für ein, auf extrem ultravioletter (EUV) Strahlung basierendem Mikroskop | |
DE10214259A1 (de) | Kollektoreinheit für Beleuchtungssysteme mit einer Wellenlänge <193 nm | |
DE102005056404B4 (de) | Röntgenmikroskop mit Kondensor-Monochromator-Anordnung hoher spektraler Auflösung | |
EP1397671A2 (de) | Messanordnung | |
DE2355136B2 (de) | Vorrichtung zum Aufzeichnen vonüberlagerten Hologrammen | |
DE10229816A1 (de) | Vorrichtung zur Erzeugung einer konvergenten Lichtwellenfront und System zur interferometrischen Linsenflächenvermessung |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): JP KR US |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): AT BE CH DE DK ES FI FR GB GR IE IT LU MC NL PT SE |
|
DFPE | Request for preliminary examination filed prior to expiration of 19th month from priority date (pct application filed before 20040101) | ||
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 1997906992 Country of ref document: EP |
|
ENP | Entry into the national phase |
Ref country code: JP Ref document number: 1997 524748 Kind code of ref document: A Format of ref document f/p: F |
|
WWE | Wipo information: entry into national phase |
Ref document number: 09101468 Country of ref document: US |
|
WWP | Wipo information: published in national office |
Ref document number: 1997906992 Country of ref document: EP |
|
WWG | Wipo information: grant in national office |
Ref document number: 1997906992 Country of ref document: EP |