EP0802047B1 - Pochoir à demi-tons et procédé et dispositif pour sa fabrication - Google Patents

Pochoir à demi-tons et procédé et dispositif pour sa fabrication Download PDF

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Publication number
EP0802047B1
EP0802047B1 EP96106203A EP96106203A EP0802047B1 EP 0802047 B1 EP0802047 B1 EP 0802047B1 EP 96106203 A EP96106203 A EP 96106203A EP 96106203 A EP96106203 A EP 96106203A EP 0802047 B1 EP0802047 B1 EP 0802047B1
Authority
EP
European Patent Office
Prior art keywords
permeability
reference hole
stencil
degree
hole structure
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
EP96106203A
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German (de)
English (en)
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EP0802047A1 (fr
Inventor
Heinz Mungenast
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Schablonentechnik Kufstein GmbH
Original Assignee
Schablonentechnik Kufstein GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to ES96106203T priority Critical patent/ES2119529T3/es
Application filed by Schablonentechnik Kufstein GmbH filed Critical Schablonentechnik Kufstein GmbH
Priority to DE59600276T priority patent/DE59600276D1/de
Priority to EP96106203A priority patent/EP0802047B1/fr
Priority to AT96106203T priority patent/ATE167111T1/de
Priority to US08/833,531 priority patent/US5740733A/en
Priority to JP9093965A priority patent/JP3040732B2/ja
Priority to CN97104203A priority patent/CN1115246C/zh
Publication of EP0802047A1 publication Critical patent/EP0802047A1/fr
Application granted granted Critical
Publication of EP0802047B1 publication Critical patent/EP0802047B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41C—PROCESSES FOR THE MANUFACTURE OR REPRODUCTION OF PRINTING SURFACES
    • B41C1/00—Forme preparation
    • B41C1/14—Forme preparation for stencil-printing or silk-screen printing
    • B41C1/145—Forme preparation for stencil-printing or silk-screen printing by perforation using an energetic radiation beam, e.g. a laser

Definitions

  • the invention relates to a method for producing a halftone template according to the preamble of claim 1, a device for performing of the method according to the preamble of claim 15 and a Halftone stencil produced by the process according to the preamble of Claim 22.
  • Such devices and such a method are e.g. known from document EP-A-0 679 510.
  • Templates for textile printing which, for example and due to the Apply different colors per unit area (Halftone printing) are generally known.
  • the invention has for its object to provide halftone templates or to specify a process for their manufacture, with which a halftone print can be carried out more accurately or true to color. It is the aim of the invention Furthermore, a device suitable for producing such halftone stencils to accomplish.
  • a method according to the invention is characterized in that in the template body several outside of the template pattern area uniform reference hole structures are engraved, each different Have permeability levels.
  • the reference hole structures can also be used as halftone marks or area marks be designated. These reference hole structures or surface marks can directly adjacent to each other, but can also be spaced apart or be separate.
  • the mentioned reference hole structures generated with which certain predetermined color intensities should be achieved when printing with the stencil.
  • These reference hole structures consist of small areas, e.g. B. squares, rectangles or Circles with different but predetermined permeability be engraved and with the nominally correct permeability and at correct setting of all parameters on the printing press during later Print with such a halftone stencil a defined and therefore verifiable Sequence of color intensity values from the intensity range from 0 to 100% surrender.
  • the old reference hole structures after its permeability with the target permeability was compared, eliminated.
  • This can eliminate the old reference hole structures be done before new ones are engraved.
  • the elimination is e.g. B. possible that the old reference hole structures simply from the template body be cut off. However, it is more advantageous to paint over them and new reference hole structures in the corresponding areas engrave.
  • the Degree of permeability of a respective reference hole structure is measured automatically.
  • the comparison between permeability and target permeability can be made of a respective reference hole structure, that is by the engraver.
  • an automated control is more useful because it can be done faster and more accurately.
  • the reference hole structures must be relatively extensive, that is the rectangles, squares or circles already mentioned at the beginning, for example be relatively large.
  • the respective reference hole structure then comprises a great many Stencil openings. However, if the permeability is measured automatically, this means that relatively fewer template openings can be used or smaller reference hole structures take up what time and space saves the template body.
  • a sieve can be used on which one Cover layer comes to rest, the screen openings to form a reference hole structure leaves free at least in some areas.
  • the covering layer can be a lacquer layer covering the sieve, with the help of a portion of a laser beam is burned away to expose the screen openings. It can also have polymerizable properties to pass through point exposure by means of z. B. to be cured by a laser beam. The unexposed are then exposed in a subsequent development process Areas of the varnish layer removed to expose the screen openings.
  • the cover layer However, if it has polymerizable properties, be covered at points with the help of liquid that is opaque is. This is followed by a large-scale exposure and curing of the covered layer areas and then a development process for Removal of the uncured layer areas.
  • the paint layer but also by spraying a liquid covering material onto it Sieve can be made using a nozzle. Wherever stencil openings are created the nozzle is switched off.
  • one with a closed one can also be used Surface is used, on which there is a covering layer, which leaves the surface areas free to form the reference hole structure.
  • the cover layer can be burned off by means of a laser beam, by spot exposure and subsequent development (if they are polymerizable is) or be prepared by liquid using a Nozzle is sprayed onto the surface of the template body.
  • the covering layer can initially be covered with liquid at certain points that is opaque. After that, a large area can be used Exposure takes place around those not covered by the liquid Harden layer areas. Then there is a development process for detaching of the uncured layer areas.
  • the cover layer with the corresponding several reference hole structures After the cover layer with the corresponding several reference hole structures is completed, these are measured to determine the degree of permeability to determine the respective reference hole structures. Is that true Finally, the permeability corresponds to the target permeability or if it has been adequately approximated to this, then metallic will become on the cover layer Material applied to obtain a sieve, which is then from Template body is removed. Is this z. B. made of nickel, so nickel can be galvanically deposited on its surface to form sieves. The finished screen then contains not only the multiple reference hole structures, but also the finished template pattern.
  • the permeability becomes the reference hole structure by means of a light beam passing through the sieve openings measured, which is essentially perpendicular to the stencil surface runs and can enforce this in one direction or the other.
  • the light beam is focused, with the focus being on the stencil surface is coming.
  • the degree of permeability of the reference hole structure can be used in this case also by means of a gas flow passing through the sieve openings be measured.
  • this from Target permeability differs depending on the manufacturing variant preferably the pulse ratio of the laser beam or an on / off cycle the nozzle spraying the liquid changes to the degree of permeability to match the target permeability.
  • the template body can be a hollow cylinder be designed so that according to the inventive method also halftone rotary printing stencils are producible.
  • An inventive device for producing a halftone stencil contains a bearing device for the rotatable mounting of a hollow cylinder; a Means for machining the outer peripheral surface of the hollow cylinder; one Slidable parallel to the hollow cylinder axis, the at least one Carries part of the processing device; and a control device for Control of the machining device and for moving the carriage with rotating hollow cylinder.
  • This device is characterized by that they have a measuring device for measuring the transmittance of in has reference hole structures lying in a predetermined template area.
  • the reference hole structures are preferably located on only one end face End of the hollow cylinder so that the location of the measuring device is chosen accordingly is. You can therefore z. B. attached to the storage facility.
  • a halftone stencil is drawn with an approximately central one Stencil pattern area by being outside the stencil pattern area several uniform reference hole structures, each with a different one Has degree of permeability.
  • the halftone template can be used be hollow cylindrical to obtain a rotary printing stencil.
  • the reference hole structures can lie directly on one another or separately be arranged from each other.
  • the halftone template 1 shows a hollow cylindrical rotary printing stencil produced according to the invention 1 for halftone printing, which in its middle part or Template pattern area 2 with an engraving or template pattern hole structure is equipped to form a template pattern 3.
  • the template pattern 3 has different permeability ratios in different Areas on.
  • the halftone template 1 exists from a hollow cylindrical sieve with a covering layer on which the Stencil pattern hole structure has been engraved around screen openings in the to expose cylindrical carrier sieve at least in regions.
  • Fig. 1 On an end Edge of the halftone template 1 area marks 4, each of which is uniform Have reference hole structure, but differ in terms of permeability differentiate.
  • Fig. 1 four surface marks 4 are shown, each Have permeabilities of 10, 50, 75 and 100% and separate from each other are arranged.
  • the permeability doesn't just depend on it to what extent the respective screen openings of the one below the cover layer Cylinder screen have been exposed, but also on the type and viscosity the color that later passes through the stencil openings, from fluid pressure, etc.
  • the permeability in the area of the area marks 4 must not be identical to those in the respective Areas of the template pattern 3 are present.
  • a print mark 5 (Pico) is provided, which here is a circular ring is realized. It has the task of adjusting several halftone templates to help each other in a rotary printing press.
  • FIG. 2 shows a rotary printing press 6 on which the invention is based
  • Manufactured templates 1 are used.
  • the stencils 1 are driven via gear wheels 7 and repeat gear 8, so that it is synchronized with that under the templates 1 through the machine 6 run web 9 run.
  • the gears 7 are attached to template heads, which are glued into the end faces of the templates 1.
  • the web 9 is glued to the printing blanket 10 with a very easily removable adhesive and held by the blanket 10 during printing.
  • the printing blanket 10 is a very wide rubber fabric conveyor belt; it is driven by two deflecting rollers 11 driven, which are wrapped by the printing blanket 10.
  • the area marks 4 of each template 1 are printed together with the pattern on the web 9 and result area mark images there 12.
  • a video camera 13 is at the end of the Printing machine 6 mounted on its side wall 14 and continuously measures the color intensities of the area mark images 12. If there is a deviation in the color tone or the color intensity, then either an acoustic or a emitted optical signal or it can be adjusted via the inking unit Servomechanics can be influenced, if there is one.
  • a laser engraving system is shown in FIG. 3.
  • the template to be engraved 1 is centered and held between two clamping cones 15 and 16.
  • Of the Clamping cone 15 is rotatably driven and mounted in a gear box 17, in which the drive motor is also located.
  • the template is on this 1 pushed on with her left face.
  • the clamping cone 16 is in a tailstock 18 rotatably mounted and is not driven in this embodiment.
  • the tailstock 18 can on guides 19 in the direction of the connecting axis 20 adjusted between the two clamping cones 15 and 16 and so any Lengths of template 1 can be set.
  • Torsionally rigid connected to the Clamping cone 15 is an encoder 21 which transmits the pulse or via a line 21a Provides rotational position signals for the engraving system computer 22.
  • For engraving is a laser beam 23, which is emitted from the laser 24, via deflecting mirror 25 and an optic 26 focused on the surface of the template 1.
  • the laser beam 23 is according to the requirements of pattern 3 via a line 22a clocked by the computer 22, d. H. on or off, and accordingly a lacquer layer 1a is removed from the cylinder screen 1b or cured.
  • a carriage 28 which carries the optics 26, advanced in the direction of the connecting axis 20. The carriage is shifted under the control of the computer 22 via a Line 22b.
  • the area marks 4 are first engraved. This are immediately after their manufacture, even before the actual engraving Pattern 3 is started, subjected to inspection.
  • a measuring or Inspection device 27 is attached to tailstock 18 in this embodiment. However, it may well be useful to have this device 27 on the gearbox 17 attach and then the area marks 4 on the opposite To provide the edge of the template 1.
  • the inspection device 27 can of the designs described in the following figures. Its output signals are transmitted to the computer 22 via a line 22c.
  • the tailstock 18 contains not only that mounted on ball bearings 29 Clamping cone 16, but also a projection device 30 for the generation an aerial photograph 31. This lies approximately in the area of the jacket of the template 1.
  • a Tube 33 carries a lamp house 32 from its right end. This tube 33 is by a conical clamping sleeve 34 in a matching conical Location hole in tailstock 18 held.
  • a pressure plate 35 presses the Clamping sleeve 34 in this receiving bore.
  • a projection lamp 36 is provided, which is held by a holder 37 becomes.
  • a concave mirror 38 serves to increase the luminous efficiency of the projection lamp 36.
  • a metallic bezel 40 contains a diaphragm opening in the form of a circle or in the form of a square. This Aperture 40 is illuminated as evenly as possible by the condenser 39. The aperture is opened by optics 41 (achromatic) via a deflecting mirror 42 projected as an aerial image 31 onto the jacket of the template 1. From this aerial photo 31 only those positions are perceptible from the outside that relate to the disclosed Make the template 1 fall.
  • FIG. 5 shows a further inspection device 27 'working on an optical basis, which reflects the radiation reflected from the area of the area mark 4 Measurement of the engraving quality used.
  • This device 27 ' is then used if the engraving is in a layer 1c on a closed (i.e. not screen-like) Hollow cylinder 1d is to be introduced.
  • Via an optic 48 of a lamp house 32 the lighting area of a lamp 49 on the surface of the area mark 4 shown.
  • this lamp house 32 can do something again more complex - approximately as shown in Fig. 4 - are formed.
  • the area mark 4 is illuminated in such a way that the whole of your occupied area is illuminated as evenly as possible.
  • An image of the area mark 4 is from the optics 45 projected onto the photosensitive semiconductor 46 and its output signal amplified by the integrated amplifier 47 and no longer shown evaluation unit 22 forwarded.
  • Fig. 6 is a fluid working and designed as a measuring nozzle Inspection device 27 '' for determining the quality of the engraving or the degree of permeability the area marks 4 shown.
  • the inside of the template 1 is shown this embodiment under a slightly excessive air pressure, approximately in the size of 0.1 to 0.3 bar overpressure. This pressure is created by the feed of compressed air through a hollow shaft 55, which carries the clamping cone 16.
  • the engraving of these surface marks 4 must be done anyway at the beginning of the engraving work, because the result from the measurement of these marks 4 for one at best necessary correction of the setting parameters of the engraving machine before the start the actual pattern engraving must be available. Therefore, the above mentioned Restriction is not an obstacle.
  • Those from the areas disclosed The area mark 4 emerging air is from the mouth 49 of the pneumatically working Inspection device 27 '' collected.
  • the distance of the mouth 49 from the outer jacket the template 1 is preferably less than 1/4 of the mouth diameter.
  • the air caught by the mouth 49 then flows through a taper 51 of the flow channel 50. It is known from fluid mechanics that the speed increases in the taper and the static pressure drops if the flow channel 50 has no opening to the outside here.
  • NTC resistor first temperature-dependent resistor 52
  • NTC resistor first temperature-dependent resistor 52
  • This resistance 52 is strongly cooled here by the high flow rate.
  • the channel 50 is then widened again like a diffuser so that none high energy losses occur and as much air as possible through the measuring nozzle flows and as little air as possible over the gap in front of the mouth 49 into the outside atmosphere exit.
  • a second temperature-dependent Resistor 53 NTC resistor

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  • Manufacturing & Machinery (AREA)
  • Health & Medical Sciences (AREA)
  • General Health & Medical Sciences (AREA)
  • Optics & Photonics (AREA)
  • Toxicology (AREA)
  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Printing Methods (AREA)
  • Printing Plates And Materials Therefor (AREA)
  • Silver Salt Photography Or Processing Solution Therefor (AREA)
  • Shaping Of Tube Ends By Bending Or Straightening (AREA)
  • Spectrometry And Color Measurement (AREA)

Claims (24)

  1. Procédé de fabrication d'un pochoir à demi-tons (1), dans lequel, dans une zone Je modèle du pochoir (2) prédéterminée d'un corps de base du pochoir (1a, 1b, 1c, 1d) est gravé une structure peforée du modèle de pochoir, en vue de constituer a modèle de pochoir (3), caractérisé a ce que plusieurs structures perforées de référence (4) régulières, situées hors de la zone de modèle de pochoir (2), sont gravées dans le corps de base du pochoir (1a, 1b; 1c, 1d) et présentent chacune des degrés de perméabilité différents.
  2. Procédé selon la revendication 1, caractérisé en ce que le degré de perméabilité de chaque structure perforée de référence (4) est comparé à un degré de perméabilité de consigne respectif, afin de graver de nouveau les structures perforées de référence régulières en fonction de l'écart spécifique, de manière que l'écart cité soit diminué, cette succession d'étapes étant effectuée au moins une fois.
  3. Procédé selon la revendication 2, caractérisé en ce que la structure perforée du modèle du pochoir se trouvant dans la zone de modèle du pochoir (2) est gravée en fonction des écarts cités.
  4. Procédé selon la revendication 2 ou 3, caractérisé en ce que les anciennes structures perforées de référence (4) sont éliminées après avoir procédé à une comparaison entre leurs degrés de perméabilité et le degré de perméabilité de consigne.
  5. Procédé selon la revendication 4, caractérisé en ce que l'élimination des anciennes structures perforées de référence (4) s'effectue avant de procéder à la nouvelle gravure.
  6. Procédé selon l'une des revendications 2 à 5, caractérisé en ce que le degré de perméabilité d'une structure perforée de référence (4) spécifique est mesuré de façon automatique.
  7. Procédé selon l'une des revendications 1 à 6, caractérisé en ce qu'on utilise comme corps de base du pochoir un tamis (1b) sur lequel vient se placer une couche de recouvrement (1a) qui laisse libre au moins par zones les ouvertures du tamis en vue de constituer une structure perforée de référence (4).
  8. Procédé selon l'une des revendications 1 à 6, caractérisé en ce qu'on utilise comme corps de base du pochoir un corps de base (1d) ayant une surface fermée sur laquelle vient se placer une couche de recouvrement (1c) qui laisse libre par zones la surface en vue de constituer la structure perforée de référence (4).
  9. Procédé selon les revendications 6 et 7, caractérisé en ce que le degré de perméabilité de la structure perforée de référence (4) est mesuré au moyen d'un faisceau lumineux traversant les ouvertures du tamis.
  10. Procédé selon les revendications 6 et 7, caractérisé en ce que le degré de perméabilité de la structure perforée de référence (4) est mesuré au moyen d'un flux de gaz passant à travers les ouvertures du tamis.
  11. Procédé selon les revendications 6 et 8, caractérisé en ce que le degré de perméabilité de la structure perforée de référence est mesuré au moyen d'un faisceau lumineux réfléchi sur la surface laissée libre.
  12. Procédé selon l'une des revendications 2 à 11, caractérisé en ce que pour former la structure perforée de référence (4) est utilisé un rayon laser (23) dont les conditions de cadencement sont modifiées en coïncidence avec l'écart existant entre le degré de perméabilité et le degré de perméabilité de consigne de la structure perforée de référence (4).
  13. Procédé selon l'une des revendications 2 à 11, caractérisé en ce que pour former la structure perforée de référence (4) est utilisée une buse destinée à projeter un vernis de recouvrement, buse dont le cycle de mise en service/hors service est modifié en coïncidence avec l'écart existant entre le degré de perméabilité et le degré de perméabilité de consigne de la structure perforée de référence (4).
  14. Procédé selon l'une des revendications 1 à 13, caractérisé en ce que le corps de base du pochoir est réalisé sous forme de cylindre creux.
  15. Dispositif de fabrication d'un pochoir demi-tons comportant :
    un dispositif de type tourillon (15, 16) conçu pour le montage à rotation d'un cylindre creux (1a, 1b; 1c, 1d);
    un dispositif (24 à 26) conçu pour l'usinage de la surface périphérique extérieure du cylindre creux;
    un chariot (28) déplaçable parallèlement à l'axe du cylindre creux (20), portant au moins une partie du dispositif d'usinage; et
    un dispositif de commande (22) conçu pour commander le dispositif d'usinage ainsi que pour déplacer le chariot (28) lorsque le cylindre creux est en rotation.
       caractérisé en ce qu'il présente un dispositif de mesure (27, 27', 27'') conçu pour effectuer la mesure du degré de perméabilité des structures perforées de référence (4) situées dans une zone du pochoir prédéterminée.
  16. Dispositif selon la revendication 15, caractérisé ce que le dispositif de commande (22) présente a dispositif comparateur conçu pour comparer le degré de perméabilité mesuré à un degré de perméabilité de consigne et en ce que le dispositif d'usinage (24 à 26) est susceptible d'être commandé en fonction du résultat de la comparaison.
  17. Dispositif selon la revendication 16, caractérisé en ce que le dispositif de mesure (27) présente une source de rayonnement (36) destinée à émettre un faisceau de rayons et présente un détecteur de rayons (47), ces éléments étant disposés par rapport à la paroi de cylindre creux, en dispositif à transmission.
  18. Dispositif selon la revendication 15 ou 16, caractérisé en ce que le dispositif de mesure (27') présente une source de rayonnement (49) conçue pour émettre un faisceau de rayons et présente un détecteur de rayons (47), positionnés par rapport à la paroi du cylindre creux, en dispositif à réflexion.
  19. Dispositif selon la revendication 18, caractérisé en ce que la source de rayonnement (49) est conçue pour émettre un faisceau de rayons monochromatiques.
  20. Dispositif selon la revendication 15 ou la revendication 16, caractérisé en ce que le dispositif de mesure présente une buse de mesure (27'') qui est placée extérieurement sensiblement radialement par rapport au cylindre creux (1a, 1b) et en ce que le dispositif de type tourbillon (16) est pourvu d'un canal d'amenée de gaz (55), destiné à introduire un gaz en surpression à l'intérieur du cylindre creux (1a, 1b).
  21. Dispositif selon l'une des revendications 15 à 20, caractérisé en ce que le dispositif de mesure (27, 27', 27'') est fixé au dispositif du type tourillon (16).
  22. Pochoir demi-tons comportant une zone de modèle du pochoir (2) placée à peu près centralement, caractérisé en ce qu'il présente à l'extérieur de la zone de modèle du pochoir (2) plusieurs structures perforées de référence (4) régulières ayant chacune un degré de perméabilité différent.
  23. Pochoir demi-tons selon la revendication 22, caractérisé en ce qu'il est de réalisation cylindrique creuse.
  24. Pochoir demi-tons selon la revendication 22 ou 23, caractérisé en ce que les structures perforées de référence respectives sont disposées séparément les unes des autres.
EP96106203A 1996-04-19 1996-04-19 Pochoir à demi-tons et procédé et dispositif pour sa fabrication Expired - Lifetime EP0802047B1 (fr)

Priority Applications (7)

Application Number Priority Date Filing Date Title
DE59600276T DE59600276D1 (de) 1996-04-19 1996-04-19 Halbtonschablone sowie Verfahren und Vorrichtung zu ihrer Herstellung
EP96106203A EP0802047B1 (fr) 1996-04-19 1996-04-19 Pochoir à demi-tons et procédé et dispositif pour sa fabrication
AT96106203T ATE167111T1 (de) 1996-04-19 1996-04-19 Halbtonschablone sowie verfahren und vorrichtung zu ihrer herstellung
ES96106203T ES2119529T3 (es) 1996-04-19 1996-04-19 Plantilla de medio tono, asi como procedimiento y dispositivo para su fabricacion.
US08/833,531 US5740733A (en) 1996-04-19 1997-04-07 Method for producing a half-tone stencil including reference structures for assessing accuracy of printing with the stencil
JP9093965A JP3040732B2 (ja) 1996-04-19 1997-04-11 ハーフトーンステンシルならびにその製造方法および製造装置
CN97104203A CN1115246C (zh) 1996-04-19 1997-04-18 半色调模版及其制造方法和设备

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP96106203A EP0802047B1 (fr) 1996-04-19 1996-04-19 Pochoir à demi-tons et procédé et dispositif pour sa fabrication

Publications (2)

Publication Number Publication Date
EP0802047A1 EP0802047A1 (fr) 1997-10-22
EP0802047B1 true EP0802047B1 (fr) 1998-06-10

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EP96106203A Expired - Lifetime EP0802047B1 (fr) 1996-04-19 1996-04-19 Pochoir à demi-tons et procédé et dispositif pour sa fabrication

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US (1) US5740733A (fr)
EP (1) EP0802047B1 (fr)
JP (1) JP3040732B2 (fr)
CN (1) CN1115246C (fr)
AT (1) ATE167111T1 (fr)
DE (1) DE59600276D1 (fr)
ES (1) ES2119529T3 (fr)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
ES2129907T3 (es) * 1996-04-19 1999-06-16 Schablonentechnik Kufstein Ag Procedimiento de impresion a media tinta y maquina de imprimir para su realizacion.
US6567166B2 (en) * 2001-02-21 2003-05-20 Honeywell International Inc. Focused laser light turbidity sensor
JP4969362B2 (ja) * 2007-08-06 2012-07-04 株式会社小森コーポレーション 液体供給装置
JP2013194348A (ja) * 2012-03-23 2013-09-30 Japan Vilene Co Ltd 装飾繊維シート及びその製造方法
MX2019008310A (es) * 2017-01-17 2019-11-18 Sage Automotive Interiors Inc Impresion de patrones por malla rotatoria de resina de poliuretano sobre materiales textiles.

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DK111083B (da) * 1966-06-03 1968-05-27 Zeuthen & Aagaard As Maskine til perforering af en stencil ad elektrisk vej.
DK118275B (da) * 1968-03-14 1970-07-27 Zeuthen & Aagaard As Apparat til elektrisk perforering af en stencil.
CH543386A (de) * 1971-06-21 1973-10-31 Zimmer Peter Druckschablone
GB1565380A (en) * 1975-12-26 1980-04-16 Kohan Kk Halftone printing process and plates
JPS5983167A (ja) * 1982-11-04 1984-05-14 Oki Electric Ind Co Ltd 多層印刷の位置合わせ方法
JPS62178393A (ja) * 1986-02-01 1987-08-05 Hikari Maeda 暈し印刷用シルクスクリ−ン及びそれを用いた印刷方法
DE4109744C2 (de) * 1991-03-25 1994-01-20 Heidelberger Druckmasch Ag Verfahren zur Ermittlung der Flächendeckung einer druckenden Vorlage, insbes. einer Druckplatte, sowie Vorrichtung zur Durchführung des Verfahrens
EP0679510B1 (fr) * 1994-04-26 1997-03-19 Schablonentechnik Kufstein Aktiengesellschaft Procédé et dispositif de fabrication d'un écran pour sérigraphie

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JP3040732B2 (ja) 2000-05-15
DE59600276D1 (de) 1998-07-16
CN1165085A (zh) 1997-11-19
EP0802047A1 (fr) 1997-10-22
US5740733A (en) 1998-04-21
JPH1035075A (ja) 1998-02-10
CN1115246C (zh) 2003-07-23
ES2119529T3 (es) 1998-10-01
ATE167111T1 (de) 1998-06-15

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