EP0709496B1 - Procédé d'électrodéposition d'un revêtement de chrome comportant des inclusions solides et bain mis en oeuvre dans ce procédé - Google Patents
Procédé d'électrodéposition d'un revêtement de chrome comportant des inclusions solides et bain mis en oeuvre dans ce procédé Download PDFInfo
- Publication number
- EP0709496B1 EP0709496B1 EP95402414A EP95402414A EP0709496B1 EP 0709496 B1 EP0709496 B1 EP 0709496B1 EP 95402414 A EP95402414 A EP 95402414A EP 95402414 A EP95402414 A EP 95402414A EP 0709496 B1 EP0709496 B1 EP 0709496B1
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- EP
- European Patent Office
- Prior art keywords
- chromium
- solution
- plating solution
- per liter
- solid particles
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
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- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 title claims description 82
- 239000011651 chromium Substances 0.000 title claims description 72
- 229910052804 chromium Inorganic materials 0.000 title claims description 70
- 239000002245 particle Substances 0.000 title claims description 45
- 238000000034 method Methods 0.000 title claims description 30
- 239000007787 solid Substances 0.000 title claims description 16
- 238000009713 electroplating Methods 0.000 title claims 4
- 239000000243 solution Substances 0.000 claims description 66
- 238000007747 plating Methods 0.000 claims description 15
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 claims description 14
- 239000000758 substrate Substances 0.000 claims description 12
- 238000000576 coating method Methods 0.000 claims description 11
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 claims description 11
- 239000011248 coating agent Substances 0.000 claims description 10
- 239000011159 matrix material Substances 0.000 claims description 8
- 239000007864 aqueous solution Substances 0.000 claims description 7
- 239000003638 chemical reducing agent Substances 0.000 claims description 6
- 238000004070 electrodeposition Methods 0.000 claims description 5
- 239000011253 protective coating Substances 0.000 claims description 4
- 238000005868 electrolysis reaction Methods 0.000 description 12
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 7
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 7
- JOPOVCBBYLSVDA-UHFFFAOYSA-N chromium(6+) Chemical compound [Cr+6] JOPOVCBBYLSVDA-UHFFFAOYSA-N 0.000 description 7
- 229910052751 metal Inorganic materials 0.000 description 7
- 239000002184 metal Substances 0.000 description 7
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 6
- 238000012986 modification Methods 0.000 description 6
- 230000004048 modification Effects 0.000 description 6
- 230000003647 oxidation Effects 0.000 description 6
- 238000007254 oxidation reaction Methods 0.000 description 6
- 239000003795 chemical substances by application Substances 0.000 description 5
- 238000000151 deposition Methods 0.000 description 5
- 229920001343 polytetrafluoroethylene Polymers 0.000 description 5
- 239000004810 polytetrafluoroethylene Substances 0.000 description 5
- 239000000725 suspension Substances 0.000 description 5
- 238000012360 testing method Methods 0.000 description 5
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 4
- QAOWNCQODCNURD-UHFFFAOYSA-N Sulfuric acid Chemical compound OS(O)(=O)=O QAOWNCQODCNURD-UHFFFAOYSA-N 0.000 description 4
- 230000001464 adherent effect Effects 0.000 description 4
- -1 amino silicates Chemical class 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- 238000009826 distribution Methods 0.000 description 4
- 238000004452 microanalysis Methods 0.000 description 4
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
- OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 3
- 239000002253 acid Substances 0.000 description 3
- 239000003054 catalyst Substances 0.000 description 3
- 239000008139 complexing agent Substances 0.000 description 3
- 239000002131 composite material Substances 0.000 description 3
- 230000007797 corrosion Effects 0.000 description 3
- 238000005260 corrosion Methods 0.000 description 3
- 239000000203 mixture Substances 0.000 description 3
- 229910052759 nickel Inorganic materials 0.000 description 3
- 238000001228 spectrum Methods 0.000 description 3
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 description 3
- 229910018072 Al 2 O 3 Inorganic materials 0.000 description 2
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 2
- KRHYYFGTRYWZRS-UHFFFAOYSA-N Fluorane Chemical compound F KRHYYFGTRYWZRS-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 2
- 238000005299 abrasion Methods 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- HIGRAKVNKLCVCA-UHFFFAOYSA-N alumine Chemical compound C1=CC=[Al]C=C1 HIGRAKVNKLCVCA-UHFFFAOYSA-N 0.000 description 2
- 150000001768 cations Chemical class 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- 229910052802 copper Inorganic materials 0.000 description 2
- 239000010949 copper Substances 0.000 description 2
- 229910052500 inorganic mineral Inorganic materials 0.000 description 2
- 150000002739 metals Chemical class 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
- 239000011707 mineral Substances 0.000 description 2
- 230000000737 periodic effect Effects 0.000 description 2
- 230000000704 physical effect Effects 0.000 description 2
- 239000012429 reaction media Substances 0.000 description 2
- 238000003756 stirring Methods 0.000 description 2
- 231100000419 toxicity Toxicity 0.000 description 2
- 230000001988 toxicity Effects 0.000 description 2
- 231100000925 very toxic Toxicity 0.000 description 2
- RILZRCJGXSFXNE-UHFFFAOYSA-N 2-[4-(trifluoromethoxy)phenyl]ethanol Chemical compound OCCC1=CC=C(OC(F)(F)F)C=C1 RILZRCJGXSFXNE-UHFFFAOYSA-N 0.000 description 1
- OSWFIVFLDKOXQC-UHFFFAOYSA-N 4-(3-methoxyphenyl)aniline Chemical compound COC1=CC=CC(C=2C=CC(N)=CC=2)=C1 OSWFIVFLDKOXQC-UHFFFAOYSA-N 0.000 description 1
- 206010001488 Aggression Diseases 0.000 description 1
- 229910052582 BN Inorganic materials 0.000 description 1
- PZNSFCLAULLKQX-UHFFFAOYSA-N Boron nitride Chemical compound N#B PZNSFCLAULLKQX-UHFFFAOYSA-N 0.000 description 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
- 229910004298 SiO 2 Inorganic materials 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 1
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- 238000004125 X-ray microanalysis Methods 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 230000016571 aggressive behavior Effects 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
- 150000008064 anhydrides Chemical class 0.000 description 1
- 238000013459 approach Methods 0.000 description 1
- 238000007664 blowing Methods 0.000 description 1
- 230000000711 cancerogenic effect Effects 0.000 description 1
- 231100000315 carcinogenic Toxicity 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 229910000423 chromium oxide Inorganic materials 0.000 description 1
- 229940117975 chromium trioxide Drugs 0.000 description 1
- GAMDZJFZMJECOS-UHFFFAOYSA-N chromium(6+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[Cr+6] GAMDZJFZMJECOS-UHFFFAOYSA-N 0.000 description 1
- 239000010941 cobalt Substances 0.000 description 1
- 229910017052 cobalt Inorganic materials 0.000 description 1
- GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
- 230000000536 complexating effect Effects 0.000 description 1
- 229910052593 corundum Inorganic materials 0.000 description 1
- 230000001627 detrimental effect Effects 0.000 description 1
- 238000011161 development Methods 0.000 description 1
- 230000004064 dysfunction Effects 0.000 description 1
- 239000008151 electrolyte solution Substances 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 235000019253 formic acid Nutrition 0.000 description 1
- 239000010439 graphite Substances 0.000 description 1
- 229910002804 graphite Inorganic materials 0.000 description 1
- 238000010191 image analysis Methods 0.000 description 1
- 150000008040 ionic compounds Chemical class 0.000 description 1
- 230000002045 lasting effect Effects 0.000 description 1
- 231100001231 less toxic Toxicity 0.000 description 1
- 238000004519 manufacturing process Methods 0.000 description 1
- 150000001247 metal acetylides Chemical class 0.000 description 1
- 239000002923 metal particle Substances 0.000 description 1
- 238000000386 microscopy Methods 0.000 description 1
- 150000002823 nitrates Chemical class 0.000 description 1
- 150000004767 nitrides Chemical class 0.000 description 1
- 150000002825 nitriles Chemical class 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 238000000399 optical microscopy Methods 0.000 description 1
- 150000007524 organic acids Chemical class 0.000 description 1
- 235000005985 organic acids Nutrition 0.000 description 1
- 150000002894 organic compounds Chemical class 0.000 description 1
- 230000001590 oxidative effect Effects 0.000 description 1
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 description 1
- 244000045947 parasite Species 0.000 description 1
- 238000002360 preparation method Methods 0.000 description 1
- 238000004626 scanning electron microscopy Methods 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 description 1
- 229910010271 silicon carbide Inorganic materials 0.000 description 1
- 239000000126 substance Substances 0.000 description 1
- 150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
- 238000004381 surface treatment Methods 0.000 description 1
- 239000004094 surface-active agent Substances 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
- 230000000007 visual effect Effects 0.000 description 1
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
- 238000004846 x-ray emission Methods 0.000 description 1
- 229910001845 yogo sapphire Inorganic materials 0.000 description 1
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
- C25D15/00—Electrolytic or electrophoretic production of coatings containing embedded materials, e.g. particles, whiskers, wires
- C25D15/02—Combined electrolytic and electrophoretic processes with charged materials
Definitions
- the subject of the invention is a method of electrodeposition chrome coating with inclusions solid; it also targets the bath used in this process.
- US Pat. No. 1,098,066 describes a process for obtaining a chromium coating comprising, as solid inclusions, aluminum oxide, titanium oxide or a mixture Ca 2 Al 2 Si 3 O 8 and Al 2 O 3 2 SiO 2 .
- This coating is produced by electrodeposition from a bath comprising chromium in the oxidation state VI.
- chromium in the oxidation state VI comes from chromic anhydride.
- patent GB 1,220,331 describes a process obtaining a coating consisting of a matrix in chromium having, as solid inclusions, ceramic particles, metal particles or a mixture of metal and ceramic particles.
- This coating here again is produced by electrodeposition from of a solution comprising chromium in the oxidation state VI.
- the chromium in the oxidation state VI comes, in the example appearing in this patent, of chromic acid.
- the speed will be of the order of 1 ⁇ m / min for a deposit obtained with a solution of hexavalent chromium, whereas it will be double (2 ⁇ m / min) for a trivalent chromium solution.
- Hv is the "Vickers hardness", unit of force in which the hardness of the substrate is expressed.
- the Applicant has carried out various types of tests for test the possibilities of particle codeposition in depositing chromium from a trivalent chromium solution, the chromium being obtained by reduction of chromic acid, and for that, she tried to co-deposit particles of different nature and size in solutions of trivalent chromium obtained by reduction using reducers such as alcohols, hydrogen peroxide, hyposulfites, anhydride sulfurous in hydrohalogenated, sulfuric acid medium, organic (formic acid, acetic acid), without this list is limiting.
- reducers such as alcohols, hydrogen peroxide, hyposulfites, anhydride sulfurous in hydrohalogenated, sulfuric acid medium, organic (formic acid, acetic acid
- the bath put in use contains trivalent chromium at a concentration between 5 and 150g per liter of bath and preferably between 25 and 50g per liter of bath, solid particles to a concentration between 1 and 100g per liter of bath and preferably between 5 and 50g per liter of bath.
- the electrolytic bath is advantageously stirred and / or the bath temperature is fixed between 20 and 60 ° C and preferably between 40 and 55 ° C and / or the current density is maintained at a value between 5 and 150 A / dm 2 and preferably between 30 and 80 A / dm 2 .
- the bath according to the invention suitable for giving a metal substrate a protective coating based on chromium comprising a chromium matrix in which are distributed solid particles is characterized by the fact that it contains trivalent chromium at a concentration between 5 and 150g per liter of bath and preferably between 25 and 50g per liter of bath, solid particles to a concentration between 1 and 100g per liter of bath and preferably between 5 and 50 g per liter of bath.
- Microanalysis, microscopy examinations optical and electronic scanning on the sections of deposits confirm the nature of the coating obtained and allow to highlight the presence in the matrix of chromium, of particles of the same nature and size as those of the particles introduced into the bath before electrolysis and having a distribution in the deposit very homogeneous.
- Figures 1 and 2 are spectra obtained by X-ray microanalysis on prepared samples according to the method according to the invention. They allow to highlight the nature of the inclusions.
- the horizontal axis represents the energy of the X-rays emitted; she is expressed in kiloelectronvolt (keV).
- the vertical axis represents the intensity of the X-ray emission.
- FIG. 1 is a spectrum of microanalysis X (beam of approximately 1 ⁇ m 2 ) produced on the points which include the inclusions. It clearly appears the X, K ⁇ fluorescence peak of aluminum, as well as the K ⁇ and K ⁇ lines of chromium.
- FIG. 2 is a spectrum of microanalysis X of the part without inclusions of the deposit. This microanalysis was performed for the sole purpose of demonstrating the presence of alumina particles in the deposit.
- the solid particles that have been used are of nature as variable as alumina, carbide silicon, chromium oxide, boron nitride or PTFE (polytetrafluoroethylene). It is obvious according to the invention that it is possible by this method of codepositing any other type of particles, polarizable or no, metallic or not, conductive or not, organic or mineral, synthetic or natural in order to modify the physical characteristics of the chromium deposit.
- any particle that can be suspended without causing a chemical reaction parasite in the trivalent chromium solution used can be used to serve as inclusion in the area of the invention.
- a trivalent chromium electrolysis solution was prepared according to the method described in patent EP 0 099 793. This solution had an ionic concentration of trivalent chromium of 30 g / l. The pH of this solution was brought close to 0 by the addition of hydrochloric acid.
- the electrolysis lasted 30 minutes and we examined the appearance, after electrolysis, of the deposit obtained on the submerged part (metal cylinder with a diameter of 10 mm and height 70 mm): it appeared smooth, semi-shiny, dense and adherent.
- the thickness of the deposit obtained on this cylinder metallic, calculated using the mass difference a was found to be 60 ⁇ m. After cross-sectional examination, the deposit was revealed to be between 62 and 66 ⁇ m thick, presenting a homogeneous distribution of inclusions whose rate estimated by image analysis was close to 15%.
- Example 2 From a solution of the same type as for Example 1, with a solution having a concentration of 40 g / l of Cr 3+ , the pH was brought to near 0 by adding sulfuric acid and fluosilicic acid. , the temperature at 45 ° C.
- TiC titanium carbide
- Vickers microhardness under load of 100 g has been measured and found equal to 1150 Hv.
- this solution is a concentrated to 600 g / l of PTFE.
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- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Electroplating And Plating Baths Therefor (AREA)
- Electroplating Methods And Accessories (AREA)
- Other Surface Treatments For Metallic Materials (AREA)
Description
- de la résistance à l'usure et à l'abrasion,
- de la résistance à la corrosion,
- du coefficient de frottement,
- de la dureté.
- très forte densité de courant,
- utilisation de cations d'addition,
- inversion périodique et codéposition pendant la phase anodique comme décrit dans les brevets EP 0 217 126 et US 4 846 940.
- les résultats ne sont pas reproductibles dans la majorité des cas, et ceci même en utilisant les mêmes conditions expérimentales,
- les inclusions ne sont pas réparties de manière homogène dans le dépôt, souvent elles sont concentrées dans les fissures du dépôt provoquées par la libération des contraintes internes et par leur ouverture lors de la phase anodique (dans les procédés avec inversion périodique de courant). Cette répartition hétérogène des particules peut introduire des dysfonctionnements préjudiciables aux caractéristiques que l'on cherche à améliorer,
- la concentration en particules incluses reste limitée à quelques pour-cent,
- ces méthodes nécessitent une préparation longue et coûteuse des particules.
- les photographies 1 à 3 ont été réalisées en microscopie électronique à balayage, sur des coupes de dépôts de chrome obtenus par électrolyse d'une solution aqueuse de chrome trivalent obtenue à partir de la réduction d'acide chromique, solution contenant en suspension des particules d'alumine (Al2O3) de taille variant entre 0,2 et 0,6µm. Les photographies 1 à 3 ont été réalisées sur le même échantillon. La photographie 1 a été obtenue avec un grossissement de 250, les photographies 2 et 3 avec un grossissement de 1000 à deux endroits différents de l'échantillon. On peut constater une répartition homogène des particules dans la masse du dépôt, ainsi qu'une parfaite adhérence de ce dépôt caractérisée par l'interface dépôt-substrat. Dans le cas de cet échantillon, l'épaisseur moyenne est d'environ 30 à 40µm;
- les photographies 4 et 5 présentent les empreintes de microdureté VICKERS, réalisées sous une charge de 100g, sur une couche d'environ 100µm d'un dépôt de chrome obtenu avec une solution de chrome trivalent obtenue à partir de la réduction d'acide chromique, solution contenant en suspension des particules d'alumine. Cette microdureté peut être estimée à environ 1050-1100 Hv.
- sans modification sensible ni de la nature du courant ni de son intensité pendant le temps de l'électrolyse,
- sans adjonction nécessaire (bien que cela soit possible) de composés autres que ceux nécessaires pour mettre en solution les particules dans de bonnes conditions, notamment sans complexants,
- à partir d'une solution de chrome trivalent obtenue par la réduction du trioxyde de chrome (CrO3) généralement sous forme d'acide chromique (en solution dans l'eau) par différents agents chimiques réducteurs dans différents milieux réactionnels. L'adjonction à la solution de composés minéraux ou organiques (agents tensioactifs, agents améliorant la conductivité de la solution, ou agents complexants ou chélatants) peut provoquer une modification des conditions de l'électrodéposition mais ne provoque pas une modification notable des caractéristiques du dépôt composite.
Claims (4)
- Procédé propre à conférer à un substrat un revêtement protecteur à base de chrome comprenant une matrice en chrome dans laquelle sont réparties des particules solides, ledit procédé comportant une étape d'électrodéposition dudit revêtement réalisée par passage d'un courant électrique entre la ou les cathode(s) comprenant le substrat à revêtir et la ou les anode(s), cathode(s) et anode(s) étant plongées dans un bain électrolytique, caractérisé par le fait que le bain électrolytique est à base d'une solution aqueuse comprenant du chrome trivalent obtenu à partir de la réduction d'acide chromique par un agent réducteur, ce bain comportant des particules solides.
- Procédé selon la revendication 1, caractérisé par le fait que le bain mis en oeuvre comporte du chrome trivalent à une concentration comprise entre 5 et 150 g par litre de bain et de préférence entre 25 et 50 g par litre de bain, des particules solides à une concentration comprise entre 1 et 100 g par litre de bain et de préférence entre 5 et 50 g par litre de bain.
- Procédé selon l'une quelconque des revendications 1 ou 2, caractérisé par le fait que l'on provoque une agitation du bain électrolytique et/ou que l'on fixe la température du bain entre 20 et 60°C et de préférence entre 40 et 55°C et/ou que l'on maintient la densité de courant à une valeur comprise entre 5 et 150 A/dm2 et de préférence entre 30 et 80 A/dm2.
- Bain propre à conférer à un substrat métallique un revêtement protecteur à base de chrome comprenant une matrice en chrome dans laquelle sont réparties des particules solides, caractérisé par le fait qu'il contient du chrome trivalent obtenu à partir de la réduction d'acide chromique par un agent réducteur à une concentration comprise entre 5 et 150 g par litre de bain et de préférence entre 25 et 50 g par litre de bain, des particules solides à une concentration comprise entre 1 et 100 g par litre de bain et de préférence entre 5 et 50 g par litre de bain.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9412981 | 1994-10-28 | ||
FR9412981A FR2726289B1 (fr) | 1994-10-28 | 1994-10-28 | Procede d'electrodeposition d'un revetement de chrome comportant des inclusions solides et bain mis en oeuvre dans ce procede |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0709496A1 EP0709496A1 (fr) | 1996-05-01 |
EP0709496B1 true EP0709496B1 (fr) | 1999-12-08 |
Family
ID=9468351
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP95402414A Revoked EP0709496B1 (fr) | 1994-10-28 | 1995-10-27 | Procédé d'électrodéposition d'un revêtement de chrome comportant des inclusions solides et bain mis en oeuvre dans ce procédé |
Country Status (6)
Country | Link |
---|---|
US (1) | US5868917A (fr) |
EP (1) | EP0709496B1 (fr) |
DE (1) | DE69513783T2 (fr) |
ES (1) | ES2141906T3 (fr) |
FR (1) | FR2726289B1 (fr) |
PT (1) | PT709496E (fr) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6709555B1 (en) * | 1999-10-19 | 2004-03-23 | Ebara Corporation | Plating method, interconnection forming method, and apparatus for carrying out those methods |
US7052592B2 (en) * | 2004-06-24 | 2006-05-30 | Gueguine Yedigarian | Chromium plating method |
KR101367924B1 (ko) * | 2006-03-31 | 2014-03-17 | 아토테크 도이칠란드 게엠베하 | 결정형 크롬 고착물 |
ES2491517T3 (es) | 2007-10-02 | 2014-09-08 | Atotech Deutschland Gmbh | Depósito de aleación de cromo cristalino |
JP5721766B2 (ja) * | 2013-03-29 | 2015-05-20 | 株式会社リケン | 複合硬質クロムめっき皮膜、及びかかる皮膜を被覆した摺動部材 |
CN111705345B (zh) * | 2020-06-04 | 2021-12-21 | 东华大学 | 一种适用于槽针的镀层复合制备工艺 |
Family Cites Families (9)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US1098066A (en) | 1913-06-25 | 1914-05-26 | James S Turner | Machine for covering rolls with leather. |
US3061525A (en) * | 1959-06-22 | 1962-10-30 | Platecraft Of America Inc | Method for electroforming and coating |
GB1220331A (en) | 1967-04-27 | 1971-01-27 | Bristol Aerojet Ltd | Improvements in and relating to the electro-deposition of composite coatings |
GB1380055A (en) * | 1971-11-23 | 1975-01-08 | British Non Ferrous Metals Res | Electrodeposition of a composite coating including chromium |
DE2236443C3 (de) | 1972-07-25 | 1978-05-24 | Elektroschmelzwerk Kempten Gmbh, 8000 Muenchen | Wäßriges Bad zur Herstellung von metallischen Überzügen, die nichtmetallische, feinverteilte Feststoffe eingelagert enthalten |
GB1482747A (en) * | 1973-10-10 | 1977-08-10 | Bnf Metals Tech Centre | Chromium plating baths |
FR2529581A1 (fr) * | 1982-06-30 | 1984-01-06 | Armines | Bain d'electrolyse a base de chrome trivalent |
DE3531410A1 (de) | 1985-09-03 | 1987-03-05 | Goetze Ag | Galvanische hartchromschicht |
JPH06210306A (ja) * | 1993-01-18 | 1994-08-02 | Nippon Steel Corp | 金属板の冷間圧延方法 |
-
1994
- 1994-10-28 FR FR9412981A patent/FR2726289B1/fr not_active Expired - Fee Related
-
1995
- 1995-10-27 EP EP95402414A patent/EP0709496B1/fr not_active Revoked
- 1995-10-27 ES ES95402414T patent/ES2141906T3/es not_active Expired - Lifetime
- 1995-10-27 DE DE69513783T patent/DE69513783T2/de not_active Revoked
- 1995-10-27 US US08/548,976 patent/US5868917A/en not_active Expired - Fee Related
- 1995-10-27 PT PT95402414T patent/PT709496E/pt unknown
Also Published As
Publication number | Publication date |
---|---|
DE69513783D1 (de) | 2000-01-13 |
DE69513783T2 (de) | 2000-06-29 |
FR2726289A1 (fr) | 1996-05-03 |
FR2726289B1 (fr) | 1997-03-28 |
US5868917A (en) | 1999-02-09 |
ES2141906T3 (es) | 2000-04-01 |
PT709496E (pt) | 2000-05-31 |
EP0709496A1 (fr) | 1996-05-01 |
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