EP0452954A2 - Oberflächenbehandlungsvorrichtung für Druckplatten - Google Patents

Oberflächenbehandlungsvorrichtung für Druckplatten Download PDF

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Publication number
EP0452954A2
EP0452954A2 EP91106341A EP91106341A EP0452954A2 EP 0452954 A2 EP0452954 A2 EP 0452954A2 EP 91106341 A EP91106341 A EP 91106341A EP 91106341 A EP91106341 A EP 91106341A EP 0452954 A2 EP0452954 A2 EP 0452954A2
Authority
EP
European Patent Office
Prior art keywords
support
steam
treating
liquid
continuously treating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP91106341A
Other languages
English (en)
French (fr)
Other versions
EP0452954A3 (en
EP0452954B1 (de
Inventor
Nobuyoshi C/O Fuji Photo Film Co. Ltd. Kaneko
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of EP0452954A2 publication Critical patent/EP0452954A2/de
Publication of EP0452954A3 publication Critical patent/EP0452954A3/en
Application granted granted Critical
Publication of EP0452954B1 publication Critical patent/EP0452954B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B41—PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41N—PRINTING PLATES OR FOILS; MATERIALS FOR SURFACES USED IN PRINTING MACHINES FOR PRINTING, INKING, DAMPING, OR THE LIKE; PREPARING SUCH SURFACES FOR USE AND CONSERVING THEM
    • B41N3/00—Preparing for use and conserving printing surfaces
    • B41N3/03—Chemical or electrical pretreatment

Definitions

  • the present invention relates to an entrance section of an apparatus used for making surface treatment supports for printing plate, particularly, a support such as an aluminum plate on which an anodized film has been formed or which has been dyed.
  • an anodized film is formed on the aluminum plate.
  • a surface treatment method is known in which, after an anodized film has been etched so as to act suitable adhesion between the support and a photosensitive layer, sealing with steam or hot water is used. (See USP 4,116,695 corresponding to Japanese Examined Patent Application No. 12518/1981). This method provides a photosensitive printing plate which has a good shelf-life stability, good development performance, and no staining in non-image areas.
  • an apparatus in which, for making the quantity of leaking steam as small as possible, use a seal section having a labyrinth structure 11 which does not touch the surfaces of the support 1 at the entrance is also known.
  • an object of the invention is to eliminate the above problems and to provide a surface treatment apparatus for printing plate supports which has a entrance section which employs only the minimum amount of steam and which does not damage the support, irrespective of its thickness and vibration of the support.
  • an apparatus which continuously treats a surface of a support for a printing plate with steam, comprising a bath which contains liquid and which is arranged at at least one of an entrance section and an exit section of the apparatus through which the support passes while being supported by rollers.
  • the entrance section of the apparatus of the present invention is sealed by the liquid in the baths through which the support supported by the rollers passes.
  • Fig. 2 is a sectional side elevational view showing a preferred embodiment of a surface treatment apparatus for printing plate supports according to the present invention.
  • Fig. 2 depicts an apparatus of the present invention in which, for example, a support etched after an anodized film has been formed thereon enters a steam treatment apparatus 3 and is there treated with steam so as to seal the pores of the etched surface with steam blown from a steam-supplying nozzle 2.
  • a steam treatment apparatus 3 enters a steam treatment apparatus 3 and is there treated with steam so as to seal the pores of the etched surface with steam blown from a steam-supplying nozzle 2.
  • respective baths 6 and 7 are arranged to seal the path between the inside and the outside of the apparatus by a liquid through which a support 1 passes while being supported by rollers 8.
  • Fig. 3 shows a modification of the apparatus of Fig. 2 wherein a curtain of water is formed at an entrance section 4 along a wall 9 of the apparatus from a water-supplying nozzle 10, and a bath 6 contains liquid through which the support passes while being supported by the rollers 8. In this case, the bath 6 receives the flowing liquid. Otherwise, this embodiment is the same as that of Fig. 2 in that the entrance and exit of the steam treatment apparatus 3 are sealed by liquid.
  • the preferred liquid used in the present invention is hot water, but water at room temperature may be used.
  • pure water may be used; however, at least one of an organic solvent, amine compound, organic acid, phosphorous oxyacid or phosphorus oxysalt, sulfur oxyacid or sulfur oxysalt, and arsenic oxyacid and arsenic oxysalt may be used.
  • a plate made of either pure aluminum or aluminum alloy can be used.
  • various materials may be used for alloying purposes, for example, silicone, copper, manganese, magnesium, chrome, zinc, lead, bismuth, and nickel.
  • the graining-treated aluminum plate is then etched and further etched after an anode-oxide film is formed.
  • a suitable example of such a treatment is described in USP 4,116,695.
  • the etching treatment may be omitted before and after formation of the anodized film.
  • the temperature of the treatment should be between about 80 and 200°C, and preferably between about 90 and 120°C.
  • the time of treatment can be freely selected, for example, between 3 seconds and 30 minutes, but is preferably between 5 seconds and 10 minutes.
  • the pH value of the liquid should be between about 2 and 11, and preferably is about 3 and 10. If the treatment is carried out using pressurized steam, the pressure is suitably between about 1 and 15 kg/cm2 (absolute pressure), and preferably between about 1 and 5 kg/cm2.
  • the support for a printing plate according to the present invention attains a high surface wettability and good adhesion to the compound coated thereon, so that the support may be used as it is.
  • the surface of the support may be treated, if desired, with an undercoating.
  • USP 4,116,695 discloses suitable photosensitive compounds, etc ., that can be used with the invention.
  • An aluminum plate 0.4 mm thick and 1500 mm wide was formed with an anodized film and etched.
  • a surface hole-sealing treatment was applied thereto by steam using an apparatus as shown in Fig. 2.
  • the conditions in the steam treatment (hole-sealing) apparatus 3 were a pressure of 200 mm (Aq) and a temperature of 98 - 102°C.
  • Hot water at 70°C was filled in the baths 6 and 7, which had dimensions of 300 mm by 1800 mm in the bottom plane and 400 mm in height.
  • Steam was supplied at a rate of 150 kg/hr. With this apparatus, it was found that the leakage of steam was positively prevented at the entrance sections of the apparatus.
  • a labyrinth-type sealing apparatus shown in Fig. 1 was tested under the same conditions as the above example of the invention.
  • the apparatus had a clearance 12 of the narrowest section in the labyrinth structure of 10 mm. With this apparatus, leakage of steam was often observed. Moreover, the quantity of steam used was 950 kg/hr, which is more than about six times that required in the above apparatus of the invention.
  • the surface treatment apparatus according to the present invention attains the following advantages:
  • soaking the support in the liquid in the bath effects a sufficient wetting treatment, enhancing the quality of the manufactured product and reducing its cost.

Landscapes

  • Printing Plates And Materials Therefor (AREA)
EP91106341A 1990-04-20 1991-04-19 Oberflächenbehandlungsvorrichtung für Druckplatten Expired - Lifetime EP0452954B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP103091/90 1990-04-20
JP2103091A JP2614133B2 (ja) 1990-04-20 1990-04-20 印刷版用支持体の表面処理装置

Publications (3)

Publication Number Publication Date
EP0452954A2 true EP0452954A2 (de) 1991-10-23
EP0452954A3 EP0452954A3 (en) 1992-02-19
EP0452954B1 EP0452954B1 (de) 1996-03-06

Family

ID=14344970

Family Applications (1)

Application Number Title Priority Date Filing Date
EP91106341A Expired - Lifetime EP0452954B1 (de) 1990-04-20 1991-04-19 Oberflächenbehandlungsvorrichtung für Druckplatten

Country Status (3)

Country Link
EP (1) EP0452954B1 (de)
JP (1) JP2614133B2 (de)
DE (1) DE69117567T2 (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0541068A1 (de) * 1991-11-05 1993-05-12 Fuji Photo Film Co., Ltd. Verfahren zur Dampfbehandlung eines Druckplattenträgers und Gerät dafür
CN101889108B (zh) * 2007-12-06 2012-07-04 株式会社爱发科 保护膜制造方法

Families Citing this family (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4250490B2 (ja) 2003-09-19 2009-04-08 富士フイルム株式会社 平版印刷版用アルミニウム合金素板および平版印刷版用支持体
EP1712368B1 (de) 2005-04-13 2008-05-14 FUJIFILM Corporation Verfahren zur Herstellung eines Flachdruckplattenträgers
JP2009208140A (ja) 2008-03-06 2009-09-17 Fujifilm Corp 平版印刷版用アルミニウム合金板の製造方法、ならびに該製造方法により得られる平版印刷版用アルミニウム合金板および平版印刷版用支持体
CN102460749A (zh) 2009-06-26 2012-05-16 富士胶片株式会社 光反射基板及其制造方法
US8883401B2 (en) 2009-09-24 2014-11-11 Fujifilm Corporation Lithographic printing original plate
WO2011078010A1 (ja) 2009-12-25 2011-06-30 富士フイルム株式会社 絶縁基板、絶縁基板の製造方法、配線の形成方法、配線基板および発光素子
JP2012033853A (ja) 2010-04-28 2012-02-16 Fujifilm Corp 絶縁性光反射基板
KR20120022628A (ko) 2010-08-16 2012-03-12 후지필름 가부시키가이샤 Ｌｅｄ 용 방열 반사판
EP2434592A3 (de) 2010-09-24 2014-09-24 Fujifilm Corporation Anisotropisch leitfähiges Element
EP2693500A1 (de) 2011-03-28 2014-02-05 FUJI-FILM Corporation Reflektierendes substrat für ein lichtemittierendes element und herstellungsverfahren dafür
CN103635611A (zh) 2011-07-04 2014-03-12 富士胶片株式会社 绝缘反射基板及其制造方法

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3685837A (en) * 1969-05-06 1972-08-22 William George Newell Sealing means
JPS58131470A (ja) * 1982-01-29 1983-08-05 Fuji Photo Film Co Ltd ロ−ラ−式シ−ル装置

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3685837A (en) * 1969-05-06 1972-08-22 William George Newell Sealing means
JPS58131470A (ja) * 1982-01-29 1983-08-05 Fuji Photo Film Co Ltd ロ−ラ−式シ−ル装置

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN, vol. 7, no. 244 (M-252)[1389] 28 October 1983; & JP-A-58 131 470 (FUJI SHASHIN FILM K.K.) 5 August 1983 *

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0541068A1 (de) * 1991-11-05 1993-05-12 Fuji Photo Film Co., Ltd. Verfahren zur Dampfbehandlung eines Druckplattenträgers und Gerät dafür
CN101889108B (zh) * 2007-12-06 2012-07-04 株式会社爱发科 保护膜制造方法

Also Published As

Publication number Publication date
DE69117567D1 (de) 1996-04-11
DE69117567T2 (de) 1996-08-29
JPH044194A (ja) 1992-01-08
EP0452954A3 (en) 1992-02-19
JP2614133B2 (ja) 1997-05-28
EP0452954B1 (de) 1996-03-06

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