EP0444598A1 - Azeotropic solvent composition - Google Patents
Azeotropic solvent composition Download PDFInfo
- Publication number
- EP0444598A1 EP0444598A1 EP91102807A EP91102807A EP0444598A1 EP 0444598 A1 EP0444598 A1 EP 0444598A1 EP 91102807 A EP91102807 A EP 91102807A EP 91102807 A EP91102807 A EP 91102807A EP 0444598 A1 EP0444598 A1 EP 0444598A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- composition
- solvent
- azeotropic
- dichloro
- mixture
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Withdrawn
Links
- 239000000203 mixture Substances 0.000 title claims abstract description 85
- 239000002904 solvent Substances 0.000 title claims abstract description 46
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims abstract description 18
- COAUHYBSXMIJDK-UHFFFAOYSA-N 3,3-dichloro-1,1,1,2,2-pentafluoropropane Chemical compound FC(F)(F)C(F)(F)C(Cl)Cl COAUHYBSXMIJDK-UHFFFAOYSA-N 0.000 claims abstract description 17
- 229910052731 fluorine Inorganic materials 0.000 claims abstract description 15
- 239000011737 fluorine Substances 0.000 claims abstract description 15
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 claims abstract description 12
- UJIGKESMIPTWJH-UHFFFAOYSA-N 1,3-dichloro-1,1,2,2,3-pentafluoropropane Chemical compound FC(Cl)C(F)(F)C(F)(F)Cl UJIGKESMIPTWJH-UHFFFAOYSA-N 0.000 claims description 11
- COWKRCCNQSQUGJ-UHFFFAOYSA-N 1,1,2,2,3-pentafluoropropan-1-ol Chemical compound OC(F)(F)C(F)(F)CF COWKRCCNQSQUGJ-UHFFFAOYSA-N 0.000 claims description 10
- 238000004140 cleaning Methods 0.000 abstract description 19
- 239000002184 metal Substances 0.000 abstract description 13
- 229910052751 metal Inorganic materials 0.000 abstract description 13
- 239000000126 substance Substances 0.000 abstract description 7
- 238000009835 boiling Methods 0.000 abstract description 6
- 150000002739 metals Chemical class 0.000 abstract description 6
- 239000007788 liquid Substances 0.000 abstract description 4
- 239000000463 material Substances 0.000 abstract description 3
- 239000004033 plastic Substances 0.000 description 16
- 229920003023 plastic Polymers 0.000 description 16
- 239000003381 stabilizer Substances 0.000 description 13
- AJDIZQLSFPQPEY-UHFFFAOYSA-N 1,1,2-Trichlorotrifluoroethane Chemical compound FC(F)(Cl)C(F)(Cl)Cl AJDIZQLSFPQPEY-UHFFFAOYSA-N 0.000 description 11
- 230000000694 effects Effects 0.000 description 9
- 230000004907 flux Effects 0.000 description 8
- 239000012046 mixed solvent Substances 0.000 description 8
- 230000000052 comparative effect Effects 0.000 description 6
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 5
- -1 greases Substances 0.000 description 5
- 229920001971 elastomer Polymers 0.000 description 4
- LYGJENNIWJXYER-UHFFFAOYSA-N nitromethane Chemical compound C[N+]([O-])=O LYGJENNIWJXYER-UHFFFAOYSA-N 0.000 description 4
- 239000003960 organic solvent Substances 0.000 description 4
- 239000005060 rubber Substances 0.000 description 4
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- SJRJJKPEHAURKC-UHFFFAOYSA-N N-Methylmorpholine Chemical compound CN1CCOCC1 SJRJJKPEHAURKC-UHFFFAOYSA-N 0.000 description 3
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
- 238000004458 analytical method Methods 0.000 description 3
- 150000001875 compounds Chemical class 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 239000011521 glass Substances 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000003921 oil Substances 0.000 description 3
- 235000019198 oils Nutrition 0.000 description 3
- YACLCMMBHTUQON-UHFFFAOYSA-N 1-chloro-1-fluoroethane Chemical class CC(F)Cl YACLCMMBHTUQON-UHFFFAOYSA-N 0.000 description 2
- RKMGAJGJIURJSJ-UHFFFAOYSA-N 2,2,6,6-tetramethylpiperidine Chemical compound CC1(C)CCCC(C)(C)N1 RKMGAJGJIURJSJ-UHFFFAOYSA-N 0.000 description 2
- XTHFKEDIFFGKHM-UHFFFAOYSA-N Dimethoxyethane Chemical compound COCCOC XTHFKEDIFFGKHM-UHFFFAOYSA-N 0.000 description 2
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 2
- BAPJBEWLBFYGME-UHFFFAOYSA-N Methyl acrylate Chemical compound COC(=O)C=C BAPJBEWLBFYGME-UHFFFAOYSA-N 0.000 description 2
- JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 description 2
- 150000001298 alcohols Chemical class 0.000 description 2
- XXROGKLTLUQVRX-UHFFFAOYSA-N allyl alcohol Chemical compound OCC=C XXROGKLTLUQVRX-UHFFFAOYSA-N 0.000 description 2
- 239000000919 ceramic Substances 0.000 description 2
- HGCIXCUEYOPUTN-UHFFFAOYSA-N cyclohexene Chemical compound C1CCC=CC1 HGCIXCUEYOPUTN-UHFFFAOYSA-N 0.000 description 2
- PAFZNILMFXTMIY-UHFFFAOYSA-N cyclohexylamine Chemical compound NC1CCCCC1 PAFZNILMFXTMIY-UHFFFAOYSA-N 0.000 description 2
- LPIQUOYDBNQMRZ-UHFFFAOYSA-N cyclopentene Chemical compound C1CC=CC1 LPIQUOYDBNQMRZ-UHFFFAOYSA-N 0.000 description 2
- 230000003247 decreasing effect Effects 0.000 description 2
- 239000003925 fat Substances 0.000 description 2
- 125000001153 fluoro group Chemical group F* 0.000 description 2
- 238000004817 gas chromatography Methods 0.000 description 2
- ZGEGCLOFRBLKSE-UHFFFAOYSA-N methylene hexane Natural products CCCCCC=C ZGEGCLOFRBLKSE-UHFFFAOYSA-N 0.000 description 2
- DPBLXKKOBLCELK-UHFFFAOYSA-N pentan-1-amine Chemical compound CCCCCN DPBLXKKOBLCELK-UHFFFAOYSA-N 0.000 description 2
- 238000005476 soldering Methods 0.000 description 2
- 230000000087 stabilizing effect Effects 0.000 description 2
- 238000013020 steam cleaning Methods 0.000 description 2
- MGSRCZKZVOBKFT-UHFFFAOYSA-N thymol Chemical compound CC(C)C1=CC=C(C)C=C1O MGSRCZKZVOBKFT-UHFFFAOYSA-N 0.000 description 2
- 239000001993 wax Substances 0.000 description 2
- PMJHHCWVYXUKFD-SNAWJCMRSA-N (E)-1,3-pentadiene Chemical compound C\C=C\C=C PMJHHCWVYXUKFD-SNAWJCMRSA-N 0.000 description 1
- DNIAPMSPPWPWGF-GSVOUGTGSA-N (R)-(-)-Propylene glycol Chemical compound C[C@@H](O)CO DNIAPMSPPWPWGF-GSVOUGTGSA-N 0.000 description 1
- BOSAWIQFTJIYIS-UHFFFAOYSA-N 1,1,1-trichloro-2,2,2-trifluoroethane Chemical compound FC(F)(F)C(Cl)(Cl)Cl BOSAWIQFTJIYIS-UHFFFAOYSA-N 0.000 description 1
- CSUFEOXMCRPQBB-UHFFFAOYSA-N 1,1,2,2-tetrafluoropropan-1-ol Chemical compound CC(F)(F)C(O)(F)F CSUFEOXMCRPQBB-UHFFFAOYSA-N 0.000 description 1
- JXMGZLBGSDLPKN-UHFFFAOYSA-N 1,1-dichloro-1,2,2,3,3-pentafluoropropane Chemical compound FC(F)C(F)(F)C(F)(Cl)Cl JXMGZLBGSDLPKN-UHFFFAOYSA-N 0.000 description 1
- YERASKROMPMIBM-UHFFFAOYSA-N 1,1-dichloro-1,2,3,3,3-pentafluoropropane Chemical compound FC(F)(F)C(F)C(F)(Cl)Cl YERASKROMPMIBM-UHFFFAOYSA-N 0.000 description 1
- RBACIKXCRWGCBB-UHFFFAOYSA-N 1,2-Epoxybutane Chemical compound CCC1CO1 RBACIKXCRWGCBB-UHFFFAOYSA-N 0.000 description 1
- XAHBEACGJQDUPF-UHFFFAOYSA-N 1,2-dichloro-1,1,3,3,3-pentafluoropropane Chemical compound FC(F)(F)C(Cl)C(F)(F)Cl XAHBEACGJQDUPF-UHFFFAOYSA-N 0.000 description 1
- BGJSXRVXTHVRSN-UHFFFAOYSA-N 1,3,5-trioxane Chemical compound C1OCOCO1 BGJSXRVXTHVRSN-UHFFFAOYSA-N 0.000 description 1
- QTYUSOHYEPOHLV-FNORWQNLSA-N 1,3-Octadiene Chemical compound CCCC\C=C\C=C QTYUSOHYEPOHLV-FNORWQNLSA-N 0.000 description 1
- IDGBOLGHJQQORA-UHFFFAOYSA-N 1,3-dichloro-1,1,2,3,3-pentafluoropropane Chemical compound FC(Cl)(F)C(F)C(F)(F)Cl IDGBOLGHJQQORA-UHFFFAOYSA-N 0.000 description 1
- RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
- BMVXCPBXGZKUPN-UHFFFAOYSA-N 1-hexanamine Chemical compound CCCCCCN BMVXCPBXGZKUPN-UHFFFAOYSA-N 0.000 description 1
- LIKMAJRDDDTEIG-UHFFFAOYSA-N 1-hexene Chemical compound CCCCC=C LIKMAJRDDDTEIG-UHFFFAOYSA-N 0.000 description 1
- JSZOAYXJRCEYSX-UHFFFAOYSA-N 1-nitropropane Chemical compound CCC[N+]([O-])=O JSZOAYXJRCEYSX-UHFFFAOYSA-N 0.000 description 1
- KWKAKUADMBZCLK-UHFFFAOYSA-N 1-octene Chemical compound CCCCCCC=C KWKAKUADMBZCLK-UHFFFAOYSA-N 0.000 description 1
- JEWUXLHWYRSHJK-UHFFFAOYSA-N 2,2-dichloro-1,1,1,3,3-pentafluoropropane Chemical compound FC(F)C(Cl)(Cl)C(F)(F)F JEWUXLHWYRSHJK-UHFFFAOYSA-N 0.000 description 1
- XRUGBBIQLIVCSI-UHFFFAOYSA-N 2,3,4-trimethylphenol Chemical compound CC1=CC=C(O)C(C)=C1C XRUGBBIQLIVCSI-UHFFFAOYSA-N 0.000 description 1
- YGFIGGVCQHKDOL-UHFFFAOYSA-N 2,3-dichloro-1,1,1,2,3-pentafluoropropane Chemical compound FC(Cl)C(F)(Cl)C(F)(F)F YGFIGGVCQHKDOL-UHFFFAOYSA-N 0.000 description 1
- FXNDIJDIPNCZQJ-UHFFFAOYSA-N 2,4,4-trimethylpent-1-ene Chemical compound CC(=C)CC(C)(C)C FXNDIJDIPNCZQJ-UHFFFAOYSA-N 0.000 description 1
- STMDPCBYJCIZOD-UHFFFAOYSA-N 2-(2,4-dinitroanilino)-4-methylpentanoic acid Chemical compound CC(C)CC(C(O)=O)NC1=CC=C([N+]([O-])=O)C=C1[N+]([O-])=O STMDPCBYJCIZOD-UHFFFAOYSA-N 0.000 description 1
- LKMJVFRMDSNFRT-UHFFFAOYSA-N 2-(methoxymethyl)oxirane Chemical compound COCC1CO1 LKMJVFRMDSNFRT-UHFFFAOYSA-N 0.000 description 1
- MVRPPTGLVPEMPI-UHFFFAOYSA-N 2-cyclohexylphenol Chemical compound OC1=CC=CC=C1C1CCCCC1 MVRPPTGLVPEMPI-UHFFFAOYSA-N 0.000 description 1
- NJBCRXCAPCODGX-UHFFFAOYSA-N 2-methyl-n-(2-methylpropyl)propan-1-amine Chemical compound CC(C)CNCC(C)C NJBCRXCAPCODGX-UHFFFAOYSA-N 0.000 description 1
- CEBKHWWANWSNTI-UHFFFAOYSA-N 2-methylbut-3-yn-2-ol Chemical compound CC(C)(O)C#C CEBKHWWANWSNTI-UHFFFAOYSA-N 0.000 description 1
- HNVRRHSXBLFLIG-UHFFFAOYSA-N 3-hydroxy-3-methylbut-1-ene Chemical compound CC(C)(O)C=C HNVRRHSXBLFLIG-UHFFFAOYSA-N 0.000 description 1
- NGKNMHFWZMHABQ-UHFFFAOYSA-N 4-chloro-2h-benzotriazole Chemical compound ClC1=CC=CC2=NNN=C12 NGKNMHFWZMHABQ-UHFFFAOYSA-N 0.000 description 1
- NLZUEZXRPGMBCV-UHFFFAOYSA-N Butylhydroxytoluene Chemical compound CC1=CC(C(C)(C)C)=C(O)C(C(C)(C)C)=C1 NLZUEZXRPGMBCV-UHFFFAOYSA-N 0.000 description 1
- 239000004215 Carbon black (E152) Substances 0.000 description 1
- BRLQWZUYTZBJKN-UHFFFAOYSA-N Epichlorohydrin Chemical compound ClCC1CO1 BRLQWZUYTZBJKN-UHFFFAOYSA-N 0.000 description 1
- OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 1
- JIGUQPWFLRLWPJ-UHFFFAOYSA-N Ethyl acrylate Chemical compound CCOC(=O)C=C JIGUQPWFLRLWPJ-UHFFFAOYSA-N 0.000 description 1
- CTKINSOISVBQLD-UHFFFAOYSA-N Glycidol Chemical compound OCC1CO1 CTKINSOISVBQLD-UHFFFAOYSA-N 0.000 description 1
- BJIOGJUNALELMI-ONEGZZNKSA-N Isoeugenol Natural products COC1=CC(\C=C\C)=CC=C1O BJIOGJUNALELMI-ONEGZZNKSA-N 0.000 description 1
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 1
- FQYUMYWMJTYZTK-UHFFFAOYSA-N Phenyl glycidyl ether Chemical compound C1OC1COC1=CC=CC=C1 FQYUMYWMJTYZTK-UHFFFAOYSA-N 0.000 description 1
- 239000004820 Pressure-sensitive adhesive Substances 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- 239000005844 Thymol Substances 0.000 description 1
- RHQDFWAXVIIEBN-UHFFFAOYSA-N Trifluoroethanol Chemical compound OCC(F)(F)F RHQDFWAXVIIEBN-UHFFFAOYSA-N 0.000 description 1
- 239000002253 acid Substances 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 1
- 229910052782 aluminium Inorganic materials 0.000 description 1
- 150000001412 amines Chemical class 0.000 description 1
- 239000010775 animal oil Substances 0.000 description 1
- QRUDEWIWKLJBPS-UHFFFAOYSA-N benzotriazole Chemical compound C1=CC=C2N[N][N]C2=C1 QRUDEWIWKLJBPS-UHFFFAOYSA-N 0.000 description 1
- 239000012964 benzotriazole Substances 0.000 description 1
- MKUWVMRNQOOSAT-UHFFFAOYSA-N but-3-en-2-ol Chemical compound CC(O)C=C MKUWVMRNQOOSAT-UHFFFAOYSA-N 0.000 description 1
- CQEYYJKEWSMYFG-UHFFFAOYSA-N butyl acrylate Chemical compound CCCCOC(=O)C=C CQEYYJKEWSMYFG-UHFFFAOYSA-N 0.000 description 1
- CZBZUDVBLSSABA-UHFFFAOYSA-N butylated hydroxyanisole Chemical compound COC1=CC=C(O)C(C(C)(C)C)=C1.COC1=CC=C(O)C=C1C(C)(C)C CZBZUDVBLSSABA-UHFFFAOYSA-N 0.000 description 1
- 125000004432 carbon atom Chemical group C* 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- BJIOGJUNALELMI-ARJAWSKDSA-N cis-isoeugenol Chemical compound COC1=CC(\C=C/C)=CC=C1O BJIOGJUNALELMI-ARJAWSKDSA-N 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- ZWAJLVLEBYIOTI-UHFFFAOYSA-N cyclohexene oxide Chemical compound C1CCCC2OC21 ZWAJLVLEBYIOTI-UHFFFAOYSA-N 0.000 description 1
- FWFSEYBSWVRWGL-UHFFFAOYSA-N cyclohexene oxide Natural products O=C1CCCC=C1 FWFSEYBSWVRWGL-UHFFFAOYSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000005238 degreasing Methods 0.000 description 1
- 230000018044 dehydration Effects 0.000 description 1
- 238000006297 dehydration reaction Methods 0.000 description 1
- 239000002274 desiccant Substances 0.000 description 1
- 229940043279 diisopropylamine Drugs 0.000 description 1
- NKDDWNXOKDWJAK-UHFFFAOYSA-N dimethoxymethane Chemical compound COCOC NKDDWNXOKDWJAK-UHFFFAOYSA-N 0.000 description 1
- WEHWNAOGRSTTBQ-UHFFFAOYSA-N dipropylamine Chemical compound CCCNCCC WEHWNAOGRSTTBQ-UHFFFAOYSA-N 0.000 description 1
- 238000004821 distillation Methods 0.000 description 1
- MCPKSFINULVDNX-UHFFFAOYSA-N drometrizole Chemical compound CC1=CC=C(O)C(N2N=C3C=CC=CC3=N2)=C1 MCPKSFINULVDNX-UHFFFAOYSA-N 0.000 description 1
- 238000005108 dry cleaning Methods 0.000 description 1
- 238000001035 drying Methods 0.000 description 1
- 238000003912 environmental pollution Methods 0.000 description 1
- 150000002118 epoxides Chemical class 0.000 description 1
- 230000003628 erosive effect Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- NBVXSUQYWXRMNV-UHFFFAOYSA-N fluoromethane Chemical compound FC NBVXSUQYWXRMNV-UHFFFAOYSA-N 0.000 description 1
- 239000007789 gas Substances 0.000 description 1
- 229930195733 hydrocarbon Natural products 0.000 description 1
- 150000002430 hydrocarbons Chemical class 0.000 description 1
- 125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
- 230000001771 impaired effect Effects 0.000 description 1
- 239000000976 ink Substances 0.000 description 1
- QXLPXWSKPNOQLE-UHFFFAOYSA-N methylpentynol Chemical compound CCC(C)(O)C#C QXLPXWSKPNOQLE-UHFFFAOYSA-N 0.000 description 1
- 230000004048 modification Effects 0.000 description 1
- 238000012986 modification Methods 0.000 description 1
- 239000006082 mold release agent Substances 0.000 description 1
- 238000000465 moulding Methods 0.000 description 1
- MCSAJNNLRCFZED-UHFFFAOYSA-N nitroethane Chemical compound CC[N+]([O-])=O MCSAJNNLRCFZED-UHFFFAOYSA-N 0.000 description 1
- 239000003973 paint Substances 0.000 description 1
- RGSFGYAAUTVSQA-UHFFFAOYSA-N pentamethylene Natural products C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 1
- 229940100684 pentylamine Drugs 0.000 description 1
- PNJWIWWMYCMZRO-UHFFFAOYSA-N pent‐4‐en‐2‐one Natural products CC(=O)CC=C PNJWIWWMYCMZRO-UHFFFAOYSA-N 0.000 description 1
- 150000002989 phenols Chemical class 0.000 description 1
- DOIRQSBPFJWKBE-UHFFFAOYSA-N phthalic acid di-n-butyl ester Natural products CCCCOC(=O)C1=CC=CC=C1C(=O)OCCCC DOIRQSBPFJWKBE-UHFFFAOYSA-N 0.000 description 1
- 238000005498 polishing Methods 0.000 description 1
- 229920000642 polymer Polymers 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 description 1
- 239000010453 quartz Substances 0.000 description 1
- 238000007789 sealing Methods 0.000 description 1
- 239000004065 semiconductor Substances 0.000 description 1
- 229910052710 silicon Inorganic materials 0.000 description 1
- 239000010703 silicon Substances 0.000 description 1
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 1
- 230000002195 synergetic effect Effects 0.000 description 1
- 229960000790 thymol Drugs 0.000 description 1
- BJIOGJUNALELMI-UHFFFAOYSA-N trans-isoeugenol Natural products COC1=CC(C=CC)=CC=C1O BJIOGJUNALELMI-UHFFFAOYSA-N 0.000 description 1
- IMFACGCPASFAPR-UHFFFAOYSA-N tributylamine Chemical compound CCCCN(CCCC)CCCC IMFACGCPASFAPR-UHFFFAOYSA-N 0.000 description 1
- 229930195735 unsaturated hydrocarbon Natural products 0.000 description 1
- 235000015112 vegetable and seed oil Nutrition 0.000 description 1
- 239000008158 vegetable oil Substances 0.000 description 1
- 235000012431 wafers Nutrition 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
- C23G5/00—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents
- C23G5/02—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents
- C23G5/028—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons
- C23G5/02809—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine
- C23G5/02825—Cleaning or de-greasing metallic material by other methods; Apparatus for cleaning or de-greasing metallic material with organic solvents using organic solvents containing halogenated hydrocarbons containing chlorine and fluorine containing hydrogen
- C23G5/02841—Propanes
- C23G5/02851—C2HCl2F5
-
- C—CHEMISTRY; METALLURGY
- C11—ANIMAL OR VEGETABLE OILS, FATS, FATTY SUBSTANCES OR WAXES; FATTY ACIDS THEREFROM; DETERGENTS; CANDLES
- C11D—DETERGENT COMPOSITIONS; USE OF SINGLE SUBSTANCES AS DETERGENTS; SOAP OR SOAP-MAKING; RESIN SOAPS; RECOVERY OF GLYCEROL
- C11D7/00—Compositions of detergents based essentially on non-surface-active compounds
- C11D7/50—Solvents
- C11D7/5036—Azeotropic mixtures containing halogenated solvents
- C11D7/504—Azeotropic mixtures containing halogenated solvents all solvents being halogenated hydrocarbons
- C11D7/5063—Halogenated hydrocarbons containing heteroatoms, e.g. fluoro alcohols
Definitions
- the present invention relates to an azeotropic solvent composition
- an azeotropic solvent composition comprising a dichloropentafluoropropane (hereinafter referred to as "HCFC-225”) and a fluorine alcohol.
- CFC-113 Trichlorotrifluoroethane
- chlorofluoroethane compounds one of chlorofluoroethane compounds, is incombustible, low in toxity to living bodies and excellent in selective solvent power that it can dissolve fats and oils, greases, waxes, and the like without erosion of polymer substances such as plastics and rubbers. Accordingly, CFC-113 has hitherto been widely used alone or in the state of a mixture or azeotropic composition with another organic solvent as a solvent, a cleaning solvent, or the like.
- perhaloethanes chlorofluoroethane compounds in which all hydrogen atoms of ethane are substituted by chlorine atoms and fluorine atoms
- perhaloethanes chlorofluoroethane compounds in which all hydrogen atoms of ethane are substituted by chlorine atoms and fluorine atoms
- An object of the present invention is to provide an azeotropic solvent composition containing no CFC-113, which has the improved rogin-flux cleaning power, which destroys scarcely the ozone layer, and which is incombustible.
- an azeotropic solvent composition comprising a dichloropentafluoropropane and a fluorine alcohol.
- the composition of the present invention surprisingly, does not corrode metals even in the presence of moisture and is stable.
- HCFC-225 used in the present invention has isomers such as 1,1-dichloro-2,2,3,3,3-pentafluoropropane [boiling point (bp) : 51°C], 1,2-dichloro-1,2,3,3,3-pentafluoropropane (bp : 56°C), 1,3-dichloro-1,2,2,3,3-pentafluoropropane (bp : 56.1°C), 2,2-dichloro-1,1,3,3,3-pentafluoropropane (bp : 54°C), 2,3-dichloro-1,1-2,3,3-pentafluoropropane (bp : 56°C), 3,3-dichloro-1,1,2,2,3-pentafluoropropane (bp : 58°C), 1,1-dichloro-1,2,3,3,3-pentafluoropropane (bp : 49°C), 1,3-dichloro
- HCFC-225 is incombustible, low in toxity to living bodies and chemically stable, and has the selective solvent power that it can wash and remove stains such as fats and oils, exerting scarcely influence on plastics, rubbers, metals, and the like. Moreover, HCFC-225 less destroys the ozone layer than CFC-113.
- fluorine alcohol there are exemplified alcohols having at least two fluorine atoms and not less than two carbon atoms in one molecule. More concretely, fluorine alcohols having the following formulas as mentioned below are cited; wherein each a, c, e, g and i is an integer of 1 to 5 and each b, d, f, h and j is an integer of 1 to 3.
- trifluoroethanol bp : 77°C
- tetrafluoropropanol bp : 107°C
- pentafluoropropanol hereinafter referred to as "5FP", bp : 81°C
- 5FP is more preferable because it is incombustible.
- the fluorine alcohols may be used alone or as an admixture thereof.
- the composition of the present invention comprises HCFC-225 having the above-mentioned properties and the fluorine alcohol. Moreover, since the composition is azeotropic, it is easy to control the liquid composition of the solvent and to recover and reuse the solvent, so the composition can be applied to steam cleaning. Furthermore, the composition is very effective in electric and electronic industries as a cleaning solvent for removing rogin-flux used in soldering of printed-circuit board. The composition is also chemically stable, particularly is remarkably stable even in the presence of moisture and the metal, and has the selective solvent power that it can wash and remove only the stains, exerting no bad influence on plastics, rubbers, metals, and the like. Moreover, the composition less destroys the ozone layer than CFC-113 and is incombustible.
- the mixture of HCFC-225 and the fluorine alcohol forms an azeotropic composition or an azeotropic like composition within the range of a weight ratio of HCFC-225 to the fluorine alcohol of 99.5 to 88.0/0.5 to 12.0, preferably 99.5 to 91.0/0.5 to 9.0.
- the azotropic composition has an azeotropic temperature of 47,5° to 57.5°C.
- azeotropic mixture and the azeotropic like composition are, for instance, an azeotropic mixture (azeotropic point : 49.8°C) of 93.5 % by weight of 1,1-dichloro-2,2,3,3,3-pentafluoropropane (bp : 51°C) and 6.5 % by weight of pentafluoropropanol (5FP) (bp : 81°C), an azeotropic mixture (azeotropic point: 54.5 °C) of 92.2 % by weight of 1,3-dichloro-1,2,2,3,3-pentafluoropropane (bp: 56.1°C) and 7.8 % by weight of 5FP (bp: 81°C), an azeotropic like composition of 93.5 to 92.2 % by weight of a mixture of 1,1-dichloro-2,2,3,3,3-pentafluoropropane and 1,3-dichloro-1,2,2,3,3-
- composition containing mainly HCFC-225 of the present invention is suitable for use not only as a cleaning solvent for removing the rogin-flux which is used in printed-circuit boards and which is difficult to be removed by a single component alone, but also in various uses in which CFC-113 has been generally used, for instance, as a degreasing solvent for removing paraffins, animal and vegetable oils, processing oils; as a cleaning solvent for removing mold release agents used in molding and processing of plastics; as a cleaning solvent for removing waxes used for temporarily fixing silicon wafers used in semiconductors, quartz and ceramics in their processing such as cutting or polishing, pressure sensitive adhesive tapes, paints, inks, and the like; as a disperse medium for ceramics or metal powder; as a drying dehydration desiccant; as a dry-cleaning solvent; and the like.
- composition of the present invention is chemically stable compared to solvents containing an aliphatic alcohol, a stabilizer can be included.
- the stabilizers can be distilled together with the azeotropic composition of the invention or the mixture of the azeotropic composition and the stabilizer can form an azeotropic composition, in addition that the stabilizers have a large effect for stabilizing the composition.
- stabilizers are, for instance, aliphatic nitro compounds such as nitromethane, nitroethane and nitropropane; acetylene alcohols such as 3-methyl-1-butyne-3-ol and 3-methyl-1-pentyne-3-ol; epoxides such as glycidol, methyl glycidyl ether, allyl glycidyl ether, phenyl glycidyl ether, 1,2-butylene oxide, cyclohexene oxide and epichlorohydrin; ethers such as dimethoxymethane, 1,2-dimethoxyethane, 1,4-dioxane and 1,3,5-trioxane; unsaturated hydrocarbons such as hexene, heptene, octene, 2,4,4-trimethyl-1-pentene, pentadiene, octadiene, cyclohexene and
- the stabilizers may be used alone or as an admixture thereof. Among them, nitromethane is preferable. In addition thereto, other compounds may be used. In such a case as the stabilizer is used with the other compounds, synergic stabilizing effect can be obtained.
- Examples of the other compounds are, for instance, phenols such as phenol, trimethylphenol, cyclohexylphenol, thymol, 2,6-di-t-butyl-4-methylphenol, butylhydroxyanisole and isoeugenol; amines such as hexylamine, pentylamine, dipropylamine, diisopropylamine, diisobutylamine, triethylamine, tributylamine, pyridine, N-methylmorpholine, cyclohexylamine, 2,2,6,6-tetramethylpiperidine and N,N'-diallyl-p-phenylenediamine; toriazoles such as benzotriazole, 2-(2'-hydroxy-5'-methylphenyl)benzotriazole and chlorobenzotriazole; and the like.
- phenols such as phenol, trimethylphenol, cyclohexylphenol, thymol, 2,6-di-t-buty
- an amount of the stabilizer depends on the kind of the stabilizer, so it is suitably determined according to the kind of the used stabilizer. Generally, the amount is from 0.1 to 10 % by weight, preferably from 0.5 to 5 % by weight, based on the azeotropic composition. In such a case as nitromethane is used, an amount of nitromethane is from about 0.1 to 1.0 % by weight of the azeotropic composition.
- the stabilizer is used in an amount such that the azeotropic composition is not impaired. Usually, since the stabilizer is used in a small amount such as not more than 1 % by weight, the addition of the stabilizer does not influence much the azeotropic composition.
- the composition of the present invention is the same as or superior to CFC-113 in the flux cleaning power, incombustibility, chemical stability, and the like.
- the composition has the selective solvent power while it exerts scarcely influence on the plastics, rubbers, particularly metals.
- the azeotropic solvent composition of the invention contains HCFC-225 destroying less the ozone layer than CFC-113 as the main component, is excellent in rogin-flux cleaning power, that is, it can remove the rogin-flux which cannot be removed sufficiently by using the single component alone with maintaining the excellent various properties of HCFC-225.
- the composition is excellent in properties to be required as the azeotropic solvent composition, that is, it is low in boiling point, high in solubility, easy to control the liquid composition of solvent and easy to recover or reuse the solvent.
- the composition of the present invention when used, the metal cannot be corroded even in the presence of water, though the metal corrosion in the presence of water could not be avoided by the combination with the alcohol as conventionally used. Accordingly, the composition of the invention can be used in various use conditions and various kinds of materials to be washed.
- a distillation flask was charged with 200 g of a mixture of 1,1-dichloro-2,2,3,3,3-pentafluoropropane (225ca, bp : 51°C) and pentafluoropropanol (5FP, bp : 81°C) in a weight ratio of 225ca to 5FP of 50/50.
- the mixture was distilled under normal pressure in a rectification towar having a theoritical plate number of 30 to give a distillate having an azeotropic point of 49.8°C which was lower than the boiling point of each solvent.
- distillate consisted of 93.5 % of 1,1-dichloro-2,2,3,3,3-pentafluoropropane and 6.5 % of pentafluoropropanol.
- a rogin-flux commercially available under the trademark "MH-320V” from Kabushiki Kaisha Tamura Seisakusho is applied to a printed-circuit board (10 cm x 10 cm), and it is pre-heated at 110°C. Then, the printed-circuit board is subjected to soldering (63Sn) at 250°C for 5 seconds. Then, using 1 l of a solvent shown in Table 1, dip cleaning is conducted for 1 minute and vapor cleaning is conducted for 1 minute.
- the surface state of the printed-circuit board is observed with the naked eye. Also, an ionic residue remaining on the board is measured by using Omegameter® 500 commercially available from KENCO INDUSTRIES INC.
- the change of the weight and volume of the plastic test pieces are calculated, and the effects on plastics are estimated according to the following criteria: o : A percentage of the increase of the weight or volume is from zero and less to than 2 % ⁇ : A percentage of the increase of the weight or volume is not less than 2 % and less than 5 % ⁇ : A percentage of the increase of the weight or volume is not less than 5 % ⁇ : The plastic test piece is dissolved in the solvent.
- a 100 ml glass bottle with a sealing stopper is charged with 100 g of the solvent shown in Table 1, 0.1 % of the solvent of water [in Comparative Examples 1 or 4 as mentioned below, 0.01 % of the solvent (225ca or 225cb alone) of water] and a metal, Al or Zn, and the glass bottle was sealed.
- the glass bottle was placed in a thermostat having a temperature of 50°C for 30 days.
- distillate consisted of 92.2 % of 1,3-dichloro-1,2,2,3,3-pentafluoropropane and 7.8 % of 5FP.
- a composition of a mixture of 55 % of 1,1-dichloro-2,2,3,3,3-pentafluoropropane (bp: 51°C) and 45 % of 1,3-dichloro-1,2,2,3,3-pentafluoropropane (bp: 56.1°C), and 5FP in a weight ratio of the mixture to 5FP being 50/50 was distilled in the same manner as in Example 1 to give a distillate.
- the distillate showed a stable boiling point within a narrow temperature range of 50° to 54.9°C.
- distillate consisted of 93.4 to 92.4 % of the mixture of 1,1-dichloro-2,2,3,3,3pentafluoropropane/1,3-dichloro-1,2,2,3,3pentafluoropropane (60 to 4 % /40 to 96 %) and 6.6 to 7.6 % of 5FP.
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- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
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- General Chemical & Material Sciences (AREA)
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- Wood Science & Technology (AREA)
- Detergent Compositions (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Manufacturing Of Printed Wiring (AREA)
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Applications Claiming Priority (2)
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CN100419054C (zh) * | 2002-10-16 | 2008-09-17 | 杭州贝尔通讯系统有限公司 | 一种电子设备清洗剂 |
JP4578186B2 (ja) * | 2004-09-07 | 2010-11-10 | 三井・デュポンフロロケミカル株式会社 | 共沸様組成物 |
JP4526334B2 (ja) * | 2004-09-07 | 2010-08-18 | 三井・デュポンフロロケミカル株式会社 | 共沸様組成物 |
JP5084876B2 (ja) * | 2010-07-22 | 2012-11-28 | 三井・デュポンフロロケミカル株式会社 | 共沸様組成物 |
WO2017038933A1 (ja) * | 2015-09-04 | 2017-03-09 | 旭硝子株式会社 | 溶剤組成物、洗浄方法および塗膜の形成方法 |
CN106350307A (zh) * | 2016-08-24 | 2017-01-25 | 诺而曼环保科技(江苏)有限公司 | 用于碳氢清洗剂的粉屑沉降添加剂及其制备和使用方法 |
CN110204949A (zh) * | 2019-06-21 | 2019-09-06 | 佛山市高明德健五金有限公司 | 一种金属表面不干胶膜剥离剂及其制备方法 |
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GB1321375A (en) * | 1971-03-03 | 1973-06-27 | Ici Ltd | Solvent compositions |
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1991
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- 1991-02-21 CA CA002036837A patent/CA2036837A1/en not_active Abandoned
- 1991-02-26 ZA ZA911389A patent/ZA911389B/xx unknown
- 1991-02-26 EP EP91102807A patent/EP0444598A1/en not_active Withdrawn
- 1991-02-27 JP JP3032724A patent/JPH04211500A/ja active Pending
- 1991-02-27 CS CS91513A patent/CS51391A2/cs unknown
- 1991-02-27 CN CN91101212A patent/CN1054441A/zh active Pending
- 1991-02-28 PL PL28924291A patent/PL289242A1/xx unknown
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GB1321375A (en) * | 1971-03-03 | 1973-06-27 | Ici Ltd | Solvent compositions |
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PATENT ABSTRACTS OF JAPAN, unexamined applications, C field, vol. 14, No. 24, January 18, 1990 THE PATENT OFFICE JAPANESE GOVERNMENT page 5 C 677 * |
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CN101338258B (zh) * | 2008-08-11 | 2010-08-18 | 张平安 | 高压带电清洗剂 |
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BR9100903A (pt) | 1991-11-05 |
CN1054441A (zh) | 1991-09-11 |
TW206257B (enrdf_load_stackoverflow) | 1993-05-21 |
PL289242A1 (en) | 1991-11-04 |
CS51391A2 (en) | 1991-09-15 |
CA2036837A1 (en) | 1991-08-29 |
JPH04211500A (ja) | 1992-08-03 |
ZA911389B (en) | 1993-04-28 |
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