EP0426470A2 - Verfahren zum Entwickeln von wasserfrei arbeitenden, lichtempfindlichen Druckplatten - Google Patents

Verfahren zum Entwickeln von wasserfrei arbeitenden, lichtempfindlichen Druckplatten Download PDF

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Publication number
EP0426470A2
EP0426470A2 EP90311968A EP90311968A EP0426470A2 EP 0426470 A2 EP0426470 A2 EP 0426470A2 EP 90311968 A EP90311968 A EP 90311968A EP 90311968 A EP90311968 A EP 90311968A EP 0426470 A2 EP0426470 A2 EP 0426470A2
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EP
European Patent Office
Prior art keywords
acid
developer
sulfite
amount
total weight
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP90311968A
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English (en)
French (fr)
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EP0426470A3 (en
Inventor
Akira Konica Corporation Nogami
Masafumi Konica Corporation Uehara
Kazuhiro Konica Corporation Shimura
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Konica Minolta Inc
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Konica Minolta Inc
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Publication date
Priority claimed from JP28710789A external-priority patent/JPH03146955A/ja
Priority claimed from JP28695789A external-priority patent/JPH03148664A/ja
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Publication of EP0426470A2 publication Critical patent/EP0426470A2/de
Publication of EP0426470A3 publication Critical patent/EP0426470A3/en
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/30—Imagewise removal using liquid means
    • G03F7/32—Liquid compositions therefor, e.g. developers
    • G03F7/322—Aqueous alkaline compositions
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography

Definitions

  • This invention relates to a method of developing a waterless light-sensitive lithographic plate and, more particularly, to a method of developing a waterless light-­sensitive lithographic plate, which is high in development rate, low in environmental pollution, odor production and inflammability and excellent in safety.
  • the developers applicable thereto include, for example, the organic solvent type developers such as those detailed in Japanese Patent Examined Publication No. 54-­26923/1979, with which waterless light-sensitive lithographic plates are developed.
  • the well-known aqueous type developers including those described in, for example, Japanese Patent Publication Open to Public Inspection -hereinafter referred to as Japanese Patent O.P.I. Publication- Nos. 60-140243/1985 and 61-275759/1986.
  • the techniques described therein are low in inflammability and excellent in safety because the developers contain water.
  • these developers have the problem that the development efficiency is seriously deteriorated especially when processing a great number of plate materials with an automatic processor, because the development rate thereof is not high enough.
  • the present inventors have seriously studied on the above-mentioned problems and, resultingly, they have discovered that the problems can be solved by containing an organic carboxylic acid and at least one of a sulfite and a surfactant.
  • an object of the invention to provide a method of developing a waterless light-sensitive lithographic plate, which is high in development rate, low in environmental pollution, odor production and inflammability, and excellent in safety.
  • the above-mentioned object of the invention can be achieved in a method of developing a waterless light-sensitive lithographic printing plate having a support and, provided thereon, a light-sensitive layer comprising a diazo resin and a silicone gum layer with a developer, wherein said developer comprises an organic carboxylic acid or salt thereof, water, and at least one of a sulfite and a surfactant.
  • the components of the developers applicable to the invention for developing waterless light-sensitive lithographic plates include an organic carboxylic acid, a sulfite and/or a surfactant. The components thereof will be detailed.
  • the organic carboxylic acid applicable to the invention includes, preferably, an aliphatic or aromatic carboxylic acid having 6 to 20 carbon atoms.
  • the typical examples of the aliphatic carboxylic acids each having 6 to 20 carbon atoms include caproic acid, enanthylic acid, caprylic acid, pelargonic acid, capric acid, lauric acid, mistylic acid, palmitic acid, and stearic acid.
  • the particularly preferable examples thereof include an alkane acid having 8 to 12 carbon atoms.
  • either an aliphatic acid having a double bond in the carbon chain thereof or those having a branched carbon chain may also be used.
  • the above-given aliphatic carboxylic acids should preferably be used in the form of the sodium, potassium or ammonium salts thereof so that the water-solubility of the aliphatic carboxylic acids may be enhanced.
  • the aromatic carboxylic acids include the compounds having a benzene ring, a naphthalene ring or an anthracene ring substituted with an carboxyl group.
  • the typical examples of the compounds include benzoic acid, o-chlorobenzoic acid, p-o-chlorobenzoic acid, o-hydroxybenzoic acid, p-­hydroxybenzoic acid, o-aminobenzoic acid, p-aminobenzoic acid, 2,4-dihydroxybenzoic acid, 2,5-dihydroxybenzoic acid, 2,6-­dihydroxybenzoic acid, 2,3-dihydroxybenzoic acid, 3,5-­dihydroxybenzoic acid, gallic acid, 1-hydroxy-2-naphthoic acid, 3-hydroxy-2-naphthoic acid, 2-hydroxy-1-naphthoic acid, 1-naphthoic acid and 2-naphthoic acid.
  • an aromatic carboxylic acid is
  • organic carboxylic acids or salts thereof should be added into the developers of the invention, in an amount within the range of, preferably, 0.1 wt% to 10 wt% and, preferably, 0.5 wt% to 4 wt%.
  • the sulfite usefully applicable to the invention includes, for example, sodium sulfite, potassium sulfite, lithium sulfite and ammonium sulfite.
  • the sulfite is contained in the developer in an amount within the range of 0.1 to 10% by weight.
  • the surfactant preferably useful includes, for example, an anionic or nonionic surfactant.
  • the anionic surfactant includes, for example; a higher alcohol having C8 to C22; sulfates such as sodium lauryl alcohol sulfate, sodium cetyl alcohol sulfate, ammonium lauryl alcohol sulfate, 'T-Pole B-81', a brand-name, manufactured by Shell Chemical Co., and secondary sodium alkylsulfate; aliphatic alcohol phosphates such as the sodium salts of cetyl alcohol phosphate; alkylaryl sulfonates such as sodium dodecylbenzene sulfonate, sodium isopropylnaphthalene sulfonate, sodium dinaphthalene sulfonate and sodium metanitrobenzene sulfonate; alkylamide sulfonates such as and the sulfonic acid salts of dibasic aliphatic acid esters, such as sodium sulfosuccinic acid dioctyl ester and sodium s
  • the content of the anionic surfactant is within the range of 1 wt% to 30 wt% and, preferably, 3 wt% to 15 wt%, each to the whole amount of a developer used.
  • nonionic surfactants may be used therein.
  • the nonionic surfactants may roughly be classified into two types, namely, a polyethylene glycol and a polyhydric alcohol. In the invention, any one of these two types of them may be used. From the viewpoint of obtaining a greater effect, a polyethylene glycol is preferably used as a nonionic surfactant.
  • nonionic surfactant having three or more ethylene oxide groups, i.e., -CH2CH2O-­groups, and a value of hydrophilic lipophile balance, abbreviated to HLB, of 5 to 20 and, preferably, 8 to 20.
  • nonionic surfactants those having both of an ethyleneoxy group and a propylene oxide group are particularly preferable. Further, among them, those having an HLB value of 8 to 20 are preferable.
  • nonionic surfactants applicable to the invention include the compounds represented by the following formulas 1 through 8.
  • R represents a hydrogen atom or a monovalent organic group.
  • the organic groups include, for example; an alkyl group which may have a straight-chained or branched substituent having 1 to 30 carbon atoms, such as an aryl group, e.g., a phenyl group; an alkylcarbonyl group comprising an alkyl component that is the above-mentioned alkyl group; and a phenyl group which may have a substituent such as a hydroxyl group or such an alkyl group as mentioned above.
  • a, b, c, m , n, x and y are each an integer of 1 to 40.
  • the weight average molecular weight of the non-ion type surfactants applicable to the invention is within the range of, preferably, 300 to 10000 and, particularly, 500 to 5000.
  • the concentration of the non-ion type surfactants in a developer is within the range of 0.001 to 20 wt%. When it is less than 0.001 wt%, any noticeable effects can be obtained.
  • the particularly preferable concentration of the non-ion type surfactants on as developer is within the range of 0.1 to 10 wt%.
  • the non-ion type surfactants may be used independently or in combination.
  • sulfites and the surfactants may be used independently or in combination.
  • the water-contents thereof is within the range of 20 wt% to 97 wt% and, preferably, 50 wt% to 95 wt%.
  • an alkaline aqueous type developers may preferably be used.
  • the pH values of the developers are not lower than 10 and, preferably, within the range of pH 11.5 to 13.0.
  • silicates such as sodium silicate and potassium silicate
  • inorganic alkali agents such as potassium hydroxide, sodium hydroxide, lithium hydroxide, tertiary sodium phosphate, secondary sodium phosphate, tertiary potassium phosphate, secondary potassium phosphate, tertiary ammonium phosphate, secondary ammonium phosphate, sodium metasilicate, sodium bicarbonate, sodium carbonate, potassium carbonate, and ammonium carbonate
  • organic alkali agents such as a mono- or di-triethanolamine and tetraalkyl hydroxide
  • organic ammonium silicates are preferably used.
  • Silicates are contained in an amount within the range of 0.1 to 20% by weight in the developer of the invention.
  • the developers of the invention further contain an organic solvent in a proportion within the range of 0.1 to 20 wt%.
  • the preferable organic solvents include at least one selected from the group consisting of alcohols such as methanol, ethanol and benzyl alcohol; amines such as methylamine, ethylamine and diethanolamine; ethylene glycols such as diethylene glycol and triethylene glycol; and propylene glycols such as ⁇ -propylene glycol and ⁇ -propylene glycol.
  • alcohols such as methanol, ethanol and benzyl alcohol
  • amines such as methylamine, ethylamine and diethanolamine
  • ethylene glycols such as diethylene glycol and triethylene glycol
  • propylene glycols such as ⁇ -propylene glycol and ⁇ -propylene glycol.
  • Benzyl alcohol or propylene glycol is more preferable.
  • the following additives may be added; namely, neutral salts such as NaCl, KCl and KBr each described in Japanese Patent O.P.I. Publication No. 58-75152/1983; chelating agents such as EDTA and NTA each described in Japanese Patent O.P.I. Publication No. 58-190952/1983; Complexes such as [CO(NH3)6]Cl and COCl2 ⁇ 6H2O each described in Japanese Patent O.P.I. Publication No.
  • anionic or amphoteric surfactants such as sodium alkylnaphthalene sulfonate and N-­tetradecyl-N,N-dihydroxyethyl betaine each described in Japanese Patent O.P.I. Publication No. 50-51324/1975; non-ion type surfactants such as tetramethyl decynediol described in U.S. Patent No. 4,374,920; cationic polymers such as quaternary methyl chloride compounds of p-dimethylaminomethyl polystyrene described in Japanese Patent O.P.I. Publication No.
  • amphoteric high molecular electrolytes such as a copolymer of vinylbenzyltrimethyl ammonium chloride and sodium acrylate described in Japanese Patent O.P.I. Publication No. 56-142528/1981; reducible inorganic salts such as sodium sulfite described in Japanese Patent O.P.I. Publication No. 57-192952/1982; Inorganic lithium compounds such as lithium chloride described in Japanese Patent O.P.I. Publication No. 58-59444/1983; organic lithium compounds such as lithium benzoate described in Japanese Patent Examined Publication No. 50-34442/1975; organic metal surfactants each containing silica or titanium described in Japanese Patent O.P.I. Publication No.
  • a diazo compound is used.
  • the following diazo compounds may be used.
  • they include, typically, diazo resins such as a condensate of an aromatic diazonium salt and formaldehyde and, particularly, the salts of the condensate of p-­diazodiphenylamine and formaldehyde or acetaldehyde; such as the inorganic salts of diazo resin which are the reacted products of the above-mentioned condensates and a hexafluorophosphate, a tetrafluoroborate, a perchlorate or a periodate; and the organic salts of diazo resin which are the reacted products of the above-mentioned condensates and sulfonic acids, such as those described in U.S.
  • the diazo resins are used together with a binder.
  • binders various kinds of high molecular compounds may be used. They include, preferably, copolymers oftained by copolymerization of monomers having an aromatic hydroxyl group such as those described in Japanese Patent O.P.I. Publication No. 54-­98613/1979 with other monomers.
  • the monomers having an aromatic hydroxyl group include, for example; N-(4-­hydroxyphenyl)methacrylamide, N-(4-­hydroxyphenyl)methacrylamide, o-, m- or p-hydroxystyrene, or o-, m- or p-hydroxyphenyl methacrylate; polymers each containing a hydroxyethyl acrylate unit or a hydroxyethyl methacrylate unit as the main repetition unit thereof, natural resins such as shellac and rosin, and polyvinyl alcohol, each described in U.S. Patent No. 4,123,276; polyamide resins such as those described in U.S. Patent No.
  • linear polyurethane resins linear polyurethane resins, phthalate resins of polyvinyl alcohol, epoxy resins condensed with Bisphenol A and epichlorohydrin, and cellulose such as cellulose acetate and cellulose acetatephthalate, each described in U.S. Patent No. 3,660,097.
  • the light-sensitive layers contain, besides the above, the following dyes and substances; namely, the dyes for visualizing an image after an exposure or development is made, including the triphenyl methane type or the diphenyl methane type dyes such as Victoria Pure Blue BOH manufactured by Hodogaya Chemical Industries Co.
  • the light-sensitive layers are further allowed to contain, for example; alkyl ether such as ethyl cellulose and methyl cellulose, fluorine type surfactants and ninionic type surfactants such as PLURONIC L64 manufactured by Asahi Electrochemical Industries Co., each for improving the coatability of the layers; plasticizers such as polyethylene glycol, tricresyl phosphate and acrylic acid or methacrylic acid polymers; and stabilizers such as phosphoric acid.
  • alkyl ether such as ethyl cellulose and methyl cellulose
  • fluorine type surfactants and ninionic type surfactants such as PLURONIC L64 manufactured by Asahi Electrochemical Industries Co.
  • plasticizers such as polyethylene glycol, tricresyl phosphate and acrylic acid or methacrylic acid polymers
  • stabilizers such as phosphoric acid.
  • the silicone rubbers applicable to the invention include, preferably, those having each linear organic polysiloxane as the main component, a hydroxyl group in the principal chain having a molecular weight of tens of hundreds to hundreds of thousands and the repetition unit represented by the following formula I, or at the end of the principal chain.
  • n is an integer of not less than 2; and R represents an alkyl group having 1 to 10 carbon atoms, a halogenoalkyl group, an alkoxyl group, a vinyl group, an aryl group or a silanol group, i.e., an OH group; provided, not less than 60% of R is preferable to be a methyl group.
  • the silanol group i.e., the OH group
  • the silanol group may be attached to either inside or the end of the principal chain, provided, it is preferable that the silanol group is attached to the end of the principal chain.
  • the silane coupling agents or the silicone cross coupling agents applicable to the invention are the silane compounds represented by the following formula: R n SiX 4-n wherein n is an integer of 1 to 3; R represents an alkyl group, an aryl group, an alkenyl group, or the monovalent group combined thereof, provided, these groups may have a functional group such as those of halogen, amine, hydroxy, alkoxy, aryloxy and thiol; X represents a substituent such as those of -OH, -OR2, -OAc, -Cl, -Br, and I, wherein R2 and R3 represent each the same as the above-denoted R, and R2 and R3 may be the same with or the different from each other; and Ac represents an acetyl group.
  • the silicone rubber useful in the invention can be obtained through the condensation reaction of the silicone ⁇ base polymer with a silicone cross coupling agent such as those given above.
  • silane coupling agents applicable to the invention include, typically, HN[(CH2)3Si(OMe)3]2, vinyltriethoxysilane, Cl(CH2)3Si(OMe)3, CH3Si(OAc)3, HS(CH2)3Si(OMe)3, and vinyltris(methylethylketooxime) silane.
  • the above-mentioned silicone rubber are available on the market as commercial articles such as YE-3085 manufactured by Toshiba Silicone Co.
  • the other useful silicone rubber may be obtained through the reaction of the foregoing base ⁇ polymer with silicone oil having a repetition unit represented by the following formula II, the addition reaction thereof with a silicone base ⁇ polymer in which about 3% of R is a vinyl group, or the reaction of the silicone oil with each other.
  • R is synonymous with R representing the substituent of the polymers in Formula I; m is an integer of not less than 2; and n is an integer of 0 or not less than 1.
  • the cross coupling reaction is carried out with a catalyst.
  • the catalysts applicable thereto include, for example, the organic carboxylates of metals such as tin, zinc, cobalt, lead, calcium and manganese.
  • tin dibutyllaurate, tin(II) octate or cobalt naphthenate, or chloroauric acid are examples of the organic carboxylates of metals such as tin, zinc, cobalt, lead, calcium and manganese.
  • a filler may be mixed in.
  • Silicone rubber mixed in advance with a filler therein are available on the market in the forms of a silicone rubber stock and a silicone rubber dispersion.
  • an RTV or LTV silicone rubber dispersion is preferably used.
  • the examples thereof include, for example, the silicone rubber dispersions for paper coating such as Syl Off 23, SRX-257 and SH237, manufactured by Toray Silicone Co.
  • a silane coupling agent having an amino group into a silicone rubber layer.
  • the preferable silane coupling agents include, for example;
  • the silicone rubber layer applicable to the invention is further allowed to contain a small amount of a photosensitizer.
  • the silicone rubber layer applicable to the invention is coated and then dried on a light-sensitive layer, after the silicone rubber is dissolved in a suitable solvent.
  • the support of the invention should preferably have a flexibility suitable for setting it to an ordinary lithographic printer and a resistance against a load applied when carrying out a printing operation.
  • the supports include, for example, a sheet of metal, paper, plastic film or glass, each plated or vacuum evaporated thereon with a metal such as chromium, zinc, copper, nickel, aluminium and iron; and a sheet of paper coated with a resin or pasted with a foil of a metal such as aluminium.
  • one of the preferable supports is an aluminium plate.
  • the treatments on the supports themselves for improving the above-mentioned adhesive property thereof include, for example, a variety of the surface roughening treatments.
  • the supports are allowed each to have a primer layer.
  • the primer layers include, for example, those of a polyester resin, a vinyl chloride-vinyl acetate copolymer, an acryl resin, a vinyl chloride resin, a polyamide resin, a polyvinyl butyral resin, an epoxy resin, an acrylate type copolymer, a vinyl acetate type copolymer, a phenoxy resin, a polyurethane resin, a polycarbonate resin, a polyacrylonitrile butadiene, and a polyvinyl acetate.
  • the above-given primer layers may be added by a compound capable of producing an acid when the above-mentioned exposure is made, or a dye discolored or faded by an acid.
  • the anchoring agents constituting the above-mentioned primer layer include, for example, the above-mentioned silane coupling agent and a silicone primer and, besides, an organic titanate is also useful for this purpose.
  • the thicknesses of each layers constituting the lithographic plates of the invention are as follows:
  • the thicknesses of the supports are within the range of 50 to 400 ⁇ m and, preferably, 100 to 300 ⁇ m;
  • the thicknesses of the light-sensitive layers are within the range of 0.05 to 10 ⁇ m and, preferably, 0.5 to 5 ⁇ m;
  • the thicknesses of the silicone rubber layers are within the range of 0.1 to 10 ⁇ m and, preferably, 0.5 to 2 ⁇ m.
  • a protective layer may be provided onto the silicone rubber layer.
  • the methods in which the above-mentioned light-­sensitive lithographic printing plates are developed with the developer of the invention it is allowed to use the methods such as a shower development method and a dipping development method, each having been well-known in the developments of light-sensitive lithographic printing plates such as a PS plate; provided, however, it is preferable to rub the plate surface with a brush or a sponge either in the course of a development or in one of the post processing steps of the development, such as a dyeing or washing step.
  • the developers are generally used with circulating them and replenishing a part of them when it is fatigued.
  • a substantially fresh developer is supplied onto a plate every time when processing light-sensitive lithographic plates to develop the plate and the developer is then throw it away.
  • the developing temperatures are within the range of 15°C to 45°C and, preferably, 25°C to 35°C.
  • the developing time is within the range of 15 seconds to 150 seconds and, preferably, 20 seconds to 60 seconds.
  • the following primer layer was coated on a 0.3 ⁇ m-thick aluminium plate and was then heat-treated at 200°C for 2 minutes, so that a primer layer having a dried thickness of 3 ⁇ m could be prepared.
  • Composition of the primer layer Polyurethane resin, Sanprene LQ-T 1331, manufactured by Sanyo Kasei Industries Co. 100 wt ⁇ parts Block isocyanate, Takenate B 830, manufactured by Takeda Phermaceutical Industrial Co. 20 wt ⁇ parts Epoxy ⁇ phenol ⁇ urea resin, ST 9372, manufactured by Kansai Paint Co. 8 wt ⁇ parts Dimethylformamide 725 wt ⁇ parts
  • the following light-­sensitive layer was successively coated so that the light-­sensitive layer could be 2 ⁇ m in dry thickness.
  • Composition of light-sensitive layer Hexafluorophosphate of the paraformaldehyde condensate of p-diazodiphenyl amine 0.5 wt ⁇ parts
  • a copolymer of N-(4-hydroxyphenyl)methacrylamide: acrylonitrile: ethylacrylate:methacrylic acid 27:33:41:6 in the ratio by weight;
  • Acid value 80 5 wt ⁇ parts Tartaric acid 0.05 wt ⁇ parts Victoria Pure Blue BOH, a dye, manufactured by Hodogaya Chemical Industries Co. 0.1 wt ⁇ parts
  • Silicone rubber layer Dimethyl polysiloxane, having a molecular weight of about 80000 100 wt ⁇ parts Methyltriacetoxy silane 5 wt ⁇ parts Tin dibutylacetate 0.2 wt ⁇ parts
  • the developers No. 1 to No. 6 of the invention have almost no odor and are high in safety, because they do not contain any organic solvent. They are also high in development rate, although they are of the aqueous type.
  • the developers No. 1 to No. 3 of the comparative examples are not satisfactory in development rate and not suitable for a mass and continuous processing treatment, though they have a cold odor and are good in safety.
  • An original document film was superposed on the same waterless printing plate as used in Example 1 and an exposure was then made for 50 seconds to a 3 KW metal halide lamp from a distance of 70 cm.
  • the exposed light-sensitive lithographic printing plate was processed at random for 50 seconds with the following developer B.
  • Developer B Propylene glycol 10 wt ⁇ parts ⁇ -anilinoethanol 1 wt ⁇ parts p-tert-butylbenzoate 3 wt ⁇ parts Emulgen 147, a nonionic surfactant, manufactured by Kao Corporation 0.1 wt ⁇ parts Potassium sulfite 2 wt ⁇ parts
  • An aqueous potassium silicate solution having a SiO2 content of 26 wt% and a K2O content of 14 wt% 2 wt ⁇ parts Potassium hydroxide 2 wt ⁇ parts Water 80 wt ⁇ parts

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
EP19900311968 1989-11-02 1990-11-01 Method for developing a waterless light-sensitive lithographic plate Withdrawn EP0426470A3 (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP287107/89 1989-11-02
JP28710789A JPH03146955A (ja) 1989-11-02 1989-11-02 感光性平版印刷版の現像方法
JP28695789A JPH03148664A (ja) 1989-11-03 1989-11-03 湿し水不要の感光性平版印刷版用現像液
JP286957/89 1989-11-03

Publications (2)

Publication Number Publication Date
EP0426470A2 true EP0426470A2 (de) 1991-05-08
EP0426470A3 EP0426470A3 (en) 1992-02-12

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0441638A3 (en) * 1990-02-08 1992-06-17 Konica Corporation Light sensitive litho printing plate
US5225309A (en) * 1990-02-08 1993-07-06 Konica Corporation Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer
EP0741334A1 (de) * 1995-05-04 1996-11-06 Hoechst Aktiengesellschaft Mit Wasser entschichtbares Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten
WO1997007430A1 (en) * 1995-08-15 1997-02-27 Horsell Graphic Industries Limited Water-less lithographic plates
EP1522898A2 (de) * 2003-10-08 2005-04-13 Kodak Polychrome Graphics LLC Nachfüllösung für Entwickler

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AUPM349094A0 (en) * 1994-01-25 1994-02-17 Commonwealth Scientific And Industrial Research Organisation Surface treatment of substrates
US5922522A (en) * 1998-04-29 1999-07-13 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US6063550A (en) * 1998-04-29 2000-05-16 Morton International, Inc. Aqueous developing solutions for reduced developer residue
US6248506B1 (en) * 1998-12-04 2001-06-19 Nichigo-Morton Aqueous developing solutions for reduced developer residue
EP1172699B1 (de) * 2000-07-14 2013-09-11 FUJIFILM Corporation Verfahren zur Herstellung lithographischer Druckplatten
JP2002351094A (ja) * 2001-05-22 2002-12-04 Fuji Photo Film Co Ltd 現像液組成物及び画像形成方法
US6503694B1 (en) * 2001-06-12 2003-01-07 Chi Mei Corporation Developer solution and edge bead remover composition
JP4230130B2 (ja) * 2001-07-04 2009-02-25 富士フイルム株式会社 感光性平版印刷版用現像液及び平版印刷版の製版方法

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Publication number Priority date Publication date Assignee Title
EP0441638A3 (en) * 1990-02-08 1992-06-17 Konica Corporation Light sensitive litho printing plate
US5225309A (en) * 1990-02-08 1993-07-06 Konica Corporation Light-sensitive litho printing plate with cured diazo primer layer, diazo resin/salt light-sensitive layer containing a coupler and silicone rubber overlayer
EP0741334A1 (de) * 1995-05-04 1996-11-06 Hoechst Aktiengesellschaft Mit Wasser entschichtbares Aufzeichnungsmaterial zur Herstellung von Wasserlos-Offsetdruckplatten
US5773187A (en) * 1995-05-04 1998-06-30 Agfa-Gevaert Ag Water developable diazonium and mineral acid containing recording material for producing water-free offset printing plates
WO1997007430A1 (en) * 1995-08-15 1997-02-27 Horsell Graphic Industries Limited Water-less lithographic plates
US6187511B1 (en) 1995-08-15 2001-02-13 Kodak Polychrome Graphics Llc Water-less lithographic plates
EP1522898A2 (de) * 2003-10-08 2005-04-13 Kodak Polychrome Graphics LLC Nachfüllösung für Entwickler
EP1522898A3 (de) * 2003-10-08 2005-09-14 Kodak Polychrome Graphics, LLC Nachfüllösung für Entwickler
US7078162B2 (en) 2003-10-08 2006-07-18 Eastman Kodak Company Developer regenerators
US7316894B2 (en) 2003-10-08 2008-01-08 Eastman Kodak Company Developer regenerators
US7507526B2 (en) 2003-10-08 2009-03-24 Eastman Kodak Company Developer regenerators

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