EP0403468A1 - Procede optique integre d'interference - Google Patents

Procede optique integre d'interference

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Publication number
EP0403468A1
EP0403468A1 EP88901823A EP88901823A EP0403468A1 EP 0403468 A1 EP0403468 A1 EP 0403468A1 EP 88901823 A EP88901823 A EP 88901823A EP 88901823 A EP88901823 A EP 88901823A EP 0403468 A1 EP0403468 A1 EP 0403468A1
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EP
European Patent Office
Prior art keywords
waveguide
layer
sample
light
measured
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP88901823A
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German (de)
English (en)
Inventor
Walter Lukosz
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Individual
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Individual
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Publication date
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Publication of EP0403468A1 publication Critical patent/EP0403468A1/fr
Withdrawn legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N21/7703—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator using reagent-clad optical fibres or optical waveguides
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/45—Refractivity; Phase-affecting properties, e.g. optical path length using interferometric methods; using Schlieren methods
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/02—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by interferometric methods
    • G01J2009/0226—Fibres
    • G01J2009/023—Fibres of the integrated optical type
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01J—MEASUREMENT OF INTENSITY, VELOCITY, SPECTRAL CONTENT, POLARISATION, PHASE OR PULSE CHARACTERISTICS OF INFRARED, VISIBLE OR ULTRAVIOLET LIGHT; COLORIMETRY; RADIATION PYROMETRY
    • G01J9/00—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength
    • G01J9/04—Measuring optical phase difference; Determining degree of coherence; Measuring optical wavelength by beating two waves of a same source but of different frequency and measuring the phase shift of the lower frequency obtained
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/75—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated
    • G01N21/77—Systems in which material is subjected to a chemical reaction, the progress or the result of the reaction being investigated by observing the effect on a chemical indicator
    • G01N2021/7769—Measurement method of reaction-produced change in sensor
    • G01N2021/7779—Measurement method of reaction-produced change in sensor interferometric

Definitions

  • the present invention relates to an integrated optical interference method according to the preamble of patent claim 1
  • Optical layer waveguides consist of a thin waveguiding layer with a higher refractive index on a substrate with a lower refractive index.
  • Strip waveguides consist of a strip with a higher refractive index, which is attached to a substrate with a lower refractive index or embedded in its surface.
  • the medium called superstrate, with which the layer or strip waveguide is covered, must also have a lower refractive index than the layer or strip waveguide.
  • the optical waves in layer waveguides are guided laterally by total reflection in the plane of the layer, and additionally also laterally in strip waveguides.
  • An important special case of the layered waveguide is the planar waveguide in which the substrate is flat.
  • C is the speed of light in a vacuum and N is the effective refractive index of the mode.
  • the modes are referred to according to their polarization as TE m - (transversely electrical) and TM m - (transversely magnetic) modes.
  • the mode number m 0.1, 2, .. denotes modes with different transverse field distributions.
  • Modes of different polarization and different transverse field distributions also occur with the strip waveguides.
  • the effective refractive indices N depend on the frequency v, the polarization and mode number of the mode and the properties of the waveguide, such as the refractive indices of the substrate and superstrate and waveguiding layer or strip and its layer thickness or thickness and width.
  • Light of the same frequency v can propagate simultaneously in a waveguide in the form of modes of different polarization, for example in a planar waveguide as TE m and as TM m mode with the same
  • Mode number m 0, 1, ...
  • the effective refractive indices N (TE m ) and N (TM m ) are different from each other.
  • a guided wave or mode with a beam splitter is divided into two partial waves 1 and 2, which pass through different paths and then from one Strahlvere iniger be superimposed again.
  • Beam splitters and combiners can e.g. in a planar waveguide. with gratings and with the use of strip waveguides with 3dB couplers.
  • the intensity can be measured photoelectrically. If the interference fringes, ie the maxima and minima of the intensity I, are counted, the values of the phase difference ⁇ 1 - ⁇ 2 result in integer multiples of 2 ⁇ t or ⁇ .
  • the invention has for its object to provide an integrated optical interference method for the selective detection of substances in liquid and gaseous samples, and / or for measuring changes in the refractive index in liquid and gaseous samples, and / or ion concentrations, which despite high sensitivity and large measuring range is simpler and cheaper to implement and does not require waveguides with structures such as beam splitters, gratings, 3dB couplers, etc., but requires only a single layer waveguide or a single strip waveguide, and to provide a device for carrying out this method which is fabricated is easier to manufacture. Another task is to create a device that can be inserted directly into the sample to be measured.
  • the invention achieves the object by a method according to the features of claim 1 and a device according to the features of claim 15.
  • the two modes orthogonally polarized to one another are a TE m and a TM m ' mode, the mode numbers m and m' being either the same or different; the two modes are preferably the TE 0 and the TM 0 mode.
  • the easiest way to couple the laser light into the waveguide is via the end face.
  • the easiest way to disconnect is via an end face.
  • the incident laser light must be linearly polarized at an angle ⁇ with respect to the normal on the waveguide surface, where ⁇ ⁇ 0 and ⁇ 90 0 and is preferably ⁇ 45 0 , or else is elliptical, preferably circular, polarized.
  • the outcoupled laser light has two mutually orthogonal polarization components s and p, the component p being linearly polarized in the direction of the normal on the waveguide by the TM mode and the component s polarized perpendicularly, ie in the plane of the layer, by the TE mode .
  • the sample is placed on at least one measuring point below mentioned - section of the waveguide on its surface, or if this is provided with a chemically selectively sensitive layer - which is hereinafter referred to as chemo-responsive layer - placed on this chemo-responsive layer, or the part of the waveguide with the measuring point introduced into the sample.
  • chemo-responsive layer - placed on this chemo-responsive layer, or the part of the waveguide with the measuring point introduced into the sample.
  • phase difference ⁇ ⁇ (t) The light of the two mutually orthogonal polarization components s and p in the decoupled light is coherent with one another; there is a phase difference ⁇ ⁇ (t) between the two, which depends on the time t if a temporal change occurs in the sample or if the sample is applied to the measuring point.
  • the phase difference ⁇ ⁇ (t) is measured as a function of time t and from this the change in the quantity to be measured is concluded or this is determined quantitatively.
  • Various particularly suitable methods for measuring ⁇ ⁇ (t) are given below.
  • the optical paths ie the path integrals via the product of the local refractive index and path element, are of the same size for the mutually orthogonal polarization components.
  • the phase difference between the two polarization components does not change with the light propagation.
  • the interferometer is largely insensitive to shocks and temperature changes, which result in a change in the optical paths.
  • This property is very advantageous because the mechanical structure does not have to have the great stability that is required with some other interferometers in three-dimensional optics.
  • polarization-optical components such as phase-shifting plates, for example ⁇ / 4 plates, and / or by means of beam splitters, additional phase differences ⁇ 0 can be generated between the two polarization components.
  • phase differences ⁇ 0 which are generated for the purpose of measuring the phase difference ⁇ ⁇ (t), are discussed in more detail below.
  • phase difference ⁇ ⁇ (t) occurs in the light propagation in the waveguide between the mutually orthogonally polarized modes due to the interaction with the sample; this depends on the time when a temporal change occurs in the sample or when the sample is applied to the measuring point.
  • the occurrence of the phase difference ⁇ ⁇ (t) can be understood as follows: the light of the modes is guided by total reflection in the waveguiding layer or in the strip; however, the field distribution extends into the superstrate in the form of a transversely damped wave, i.e. into the chemo-responsive layer and / or sample. The depths of penetration of the fields of the two mutually orthogonally polarized modes differ, and therefore the strength of their interaction with the sample.
  • ⁇ ⁇ (L) 2 ⁇ (L / ⁇ ) [N (TE 0 ) -N (TM 0 )] + ⁇ ⁇ (0), (3) if ⁇ ⁇ (0) is their phase difference at the beginning of the measuring point. If the effective refractive indices change as a function of time t, namely N (TE 0 ) by ⁇ N (t; TE 0 ) and N (TM 0 ) by ⁇ N (t; TM 0 ), the phase difference ⁇ f (L) changes in time
  • the TE o mode decoupled from the waveguide generates the polarization component s
  • the decoupled TM 0 mode generates the polarization component p.
  • the phase difference ⁇ ⁇ (t) + ⁇ ⁇ exists between these polarization components, ⁇ ⁇ being constant.
  • the outcoupled light is directed through a polarizer to a photodetector.
  • the transmission direction of the polarizer is oriented in the direction of the bisector of the polarization directions of the two linearly polarized polarization components s and p.
  • I s and I p are the intensities which the polarization components s and p would produce on their own, ⁇ ⁇ the constant phase difference and ⁇ ⁇ (t) the temporal resulting from the changes in the quantity to be measured are changing phase difference. If the maxima and minima of I (t) are counted, then ⁇ ⁇ (t) with an accuracy of
  • I s I p is preferably selected so that the
  • the sensitivity of the method according to the invention is proportional to the length L of the measuring point.
  • the effective refractive index N depends on the refractive index of the medium with which the waveguide is covered and on the layer thickness of a layer adsorbed on the surface of the waveguiding layer or strip. Changes in ⁇ N (t) and thus the phase difference ⁇ ⁇ (t) occur when
  • the method according to the invention is suitable as a differential refractometer.
  • Examples of this are: With waveguiding layers made of SiO 2 -TiO 2 , changes in the relative humidity, for. B. relative humidity, because water is adsorbed or sorbed on the surface and in the micropores of the SiO 2 -TiO 2 layer.
  • the method according to the invention is suitable as a moisture sensor.
  • chemo-responsive layer on the surface of the measuring point of the wave-guiding layer or the strip, which selectively adsorbs, chemisorbs or binds the substance to be detected and thereby either changes its refractive index or layer thickness, or causes an additional layer to be deposited on the chemoresponsive layer .
  • This chemo-responsive layer can also be present in the micropores of a porous waveguide.
  • the chemo-responsive layer can also be preceded by a semi-permeable membrane, so that only the substances diffusing through the membrane from the sample can interact with the chemo-responsive layer.
  • chemo-responsive layers are as follows: a) The chemo-responsive layer consists of, for example, a monomolecular layer made of molecules of an antibody, which are preferably covalently bound to the waveguiding layer or the strip. If the antigen or skin corresponding to this antibody is contained in the sample, then antigen or hapten molecules bind to the antibodies and thereby form an additional layer, the formation of which is verified by the method according to the invention.
  • the immunoreaction between antigen or hapten and antibody is highly specific and selective, especially when monoclonal Antibodies are used. The same applies if the measuring point is coated with an antigen or anti-antibody. Molecules of the corresponding antibody present in the sample then bind to these fixed molecules.
  • MAK monoclonal antibodies
  • the method according to the invention can thus be used in medical diagnostics for the detection of antibodies or antigens in body fluids, in agro-diagnostics for the detection of plant diseases, in food chemistry for the detection of bacterial contaminants and for the detection of toxic substances.
  • Methods for the covalent binding of antibodies to, for example, glass and SiO 2 surfaces are described in the literature.
  • palladium can be applied to the surface as a chemo-responsive layer or introduced into the pores of the wave-guiding layer.
  • ion concentrations for example of H + ions (pH value) or K + ions, is possible with suitable chemo-responsive layers.
  • Chemo-responsive layers consisting of chemisorbed or bonded indicator dyes or embedded in a polymer layer are suitable for measuring the pH value. Since indicator dyes change their color depending on the pH value, they also have to change their refractive index in the wavelength ranges in which they have low light absorption, which is known to result from the dispersion relationships.
  • a chemo-responsive layer consisting of va- nomyc in molecules embedded in a polymer layer, which absorb K + ions very selectively, is suitable.
  • the dependence of the sensitivity of the method according to the invention on the properties of the waveguide used is considered below for a planar waveguide when using the TE 0 and TM 0 modes.
  • the effective changes in refractive index ⁇ N (t; TE 0 ) and ⁇ N (t; TM 0 ) of the two modes themselves are large if their interaction with the sample or with the chemo-responsive layer changed by the sample is strong.
  • the effective layer thickness d eff is defined as the sum of the geometric layer thickness d of the vein-conducting layer and the depth of penetration of the transversely damped fields into the substrate on the one hand and into the sample and / or chemo-responsive layer on the other. It is small if d is small and if the difference n 1 -n 2 of the 3-index numbers of the waveguiding layer (n 1 ) and substrate (n 2 ) is as large as possible, preferably n 1 -n 2 > 0.25.
  • the layer thickness d must of course be greater than the cut-off layer thickness d c (TM 0 ) of the TM 0
  • Modes are selected so that both the TE 0 - and the TE 0 -
  • the range of d, in the sensitivity of the method according to the invention can be determined by the person skilled in the art without difficulty by simple calculations or suitable test series in a specific case; the range depends on the refractive indices n 1 and n 2 and that (n 4 ) of the sample, and on the refractive indices and layer thicknesses of the chemo-responsive ones
  • the layer thickness d at least at the measuring point, to be smaller than the cut-off layer thickness d c (TE 1 ) of the TE 1 mode, so that the guided shaft is only in the TE 0 and TM 0 mode can spread and no modes of higher order m> 1 can spread and possibly cause interference.
  • Pyrex glass substrates with n 2 ⁇ 1.47 resulted in areas with high sensitivity: a) in gaseous samples (n 4 ⁇ 1.0) 220 nm ⁇ d ⁇ 420 nm and b) 150 nm ⁇ d ⁇ 390 nm in aqueous samples ( n 4 ⁇ 1.33) for the measurement of changes in the refractive index of the sample and for the absorption of proteins on the waveguide surface.
  • the specified lower limits of d correspond to approximately 5/3 of the cut-off layer thicknesses d c (TM 0 ) of the TM 0 mode.
  • the waveguiding layers or strips are made of materials, preferably with a high refractive index n 1 , for example mixtures of SiO 2 and TiO 2 (n 1 ⁇ 1.75) or Si 3 N 4 (n 1 ⁇ 2.0), on substrates with a much smaller size
  • Refractive index n 2 preferably made of glass (n 1 ⁇ 1.5), for example made of Pyrex glass.
  • a silicon wafer can also serve as the substrate, the surface of which is covered with a non-light-absorbing spacer layer with a low refractive index, preferably made of SiO 2 , in order to avoid damping the guided wave.
  • the wave-guiding layers or strips can also be produced from polyimide (n 1 ⁇ 1.8) on substrates made from glass or plastic, preferably from PMMA (polymethyl methacrylate) or polycarbonate.
  • Layers of mixtures of SiO 2 and TiO 2 can be produced, for example, with a dipping process from organometallic solutions by the sol-gel process; Layers of Si 3 N 4, for example using the CVD method.
  • 1 is a schematic longitudinal section through a planar waveguide with the measuring point and the sample
  • FIG. 2 shows a schematic longitudinal section through a planar waveguide with the j measuring point and the sample and with a reflector
  • FIG. 3 shows a schematic cross section through a strip waveguide on a flat substrate
  • Fig. 5 is a schematic representation of a device according to the invention in longitudinal section through the waveguide.
  • FIG. 6 shows a schematic illustration of a device according to the invention in longitudinal section through the waveguide with two-way interaction of the guided mode with the sample
  • FIG. 7 shows a schematic longitudinal section through a planar waveguide, the latter having a smaller layer thickness at the measuring point than outside it,
  • FIG. 8 shows an expanded schematic longitudinal section through the waveguide, this being provided outside the measuring point with a protective layer and at the measuring point with a chemo-responsive layer, and with a heating layer between the waveguide and the substrate and a cell above the measuring parts,
  • FIG. 9 shows a schematic perspective illustration of the part of the device according to the invention for measuring the phase difference ⁇ (t) with a measuring channel
  • 10 shows a schematic illustration of the part of the device according to the invention for measuring the phase difference ⁇ (t) with a Wollaston prism for dividing the outcoupled light into two measuring channels
  • 11 shows a schematic representation of the part of the device according to the invention for measuring the phase difference ⁇ ⁇ (t) with a beam splitter and two Wollaston prisms for dividing the outcoupled light into four measuring channels.
  • the guided wave 3 is composed of two coherently excited mutually orthogonally polarized modes, a TE and a TM mode, preferably the TE 0 and the TM 0 mode.
  • the coupling of the shaft 3 into the waveguide 1/2 is not shown.
  • the guided shaft 3 interacts with the sample 4 over a section 1 'of the length L of the waveguide 1, which is referred to below as the measuring point 1'.
  • the coupling of the guided shaft 3 from the waveguide 1/2 is also not shown.
  • FIG. 2 shows a planar waveguide 1/2 with a reflector 5.
  • the coupled-in guided wave 3 interacts with the sample 4 at the measuring point 1 ′ and is then reflected by the reflector 5.
  • the reflected guided wave 3r in turn interacts with the sample 4.
  • the end of the waveguide that is cut off or broken off or polished as sharp as possible can be used as the reflector 5, i.e. whose end face serve, which can preferably be provided with a metal layer or dielectric mirror layers.
  • a grating for example a surface relief grating on the waveguide 1, 2 can serve as a reflector 5 if the Bragg condition is met.
  • the width of the strip can typically be a few ⁇ m to a few mm.
  • the sample 4, which points to the measuring parts 1 'of FIG Length L is applied.
  • the possibility of attaching a plurality of strip waveguides to one another in parallel on the same substrate 2 is not shown.
  • the substrates are typically between 0.1-1 mm thick. Their dimensions can be chosen within wide limits. They are typically a few mm to 75 mm long and a few mm to 25 mm wide.
  • Fig. 4 shows the cross section through a cylindrical substrate 2 and a waveguiding strip 1a attached thereon.
  • the diameter of the substrate 2 can typically be 0.1-10 mm and its length typically a few mm to 100 mm. With a reflector 5 at the end, this waveguide 1a / 2 is particularly suitable for immersion or introduction into a sample (not shown).
  • the width of the waveguiding strip 1a can typically be between 10 ⁇ m and a few mm. However, it is also possible to choose its width equal to the circumference of the substrate 2, i.e. to cover the entire surface of the substrate 2 with a waveguiding layer.
  • the method according to the invention consists in that polarized light emitted by a laser 6, preferably a kelium-neon laser or a calf conductor laser, with a system of spherical and / or cylindrical lenses 7, for example a microscope objective, is focused on the end face 8 of the layer waveguide 1/2 and is coupled into the latter in such a way that the coupled-in guided wave 3 consists of two mutually coherently excited and mutually orthogonally polarized modes, preferably the TE 0 - and the TM 0 mode exists, interacts with the sample 4 in the area of the measuring point 1 'and is coupled out of the waveguide 1/2 via the end face 8', and that the time-dependent phase difference ⁇ ⁇ (t) between the two mutually orthogonal polarization components s and p is measured in the outcoupled light 3a with a device 10.
  • a laser 6 preferably a kelium-neon laser or a calf conductor laser
  • cylindrical compared to spherical lenses 7 is that the light from the cylindrical lens only in the 5, ie focused on the end face of the wave-guiding layer 1, but not in the plane perpendicular to it.
  • a spherical lens 7 also causes a focusing in the plane of the wave-guiding layer 1 and thus a divergence of the coupled-in guided wave 3, which can have a disadvantageous effect. If a laser 6 which emits unpolarized light is used, a polarization filter is placed between the laser 6 and the lens system 7.
  • the light incident on the waveguide 1/2 is preferably first linearly polarized at an angle ⁇ 45 0 to the plane of the drawing, so that the TE and TM modes are excited with approximately the same intensity.
  • the outcoupled light 3a contains two mutually orthogonal polarization components s and p, which are polarized linearly perpendicular (s) and parallel (p) to the plane of the drawing and which correspond to the outcoupled TE or TM mode.
  • the angle ⁇ is preferably readjusted so that the polarization components s and p have the same intensity in the outcoupled light 3a and therefore the interference has maximum modulation.
  • the polarization components s and p are superimposed and thus brought to interference.
  • the method according to the invention requires that the guided wave 3 generated as in the method described in FIG. 5 is reflected by a reflector 5 in the area of the measuring point 1 ′ after the interaction with the sample 4 that the reflected wave 3r also interacts with the sample 4 in the area of the measuring point 1 'and is then coupled out again through the same end face 8 through which the coupling took place, and that the outcoupled light 3a is spatially separated from the incident light 3e by a beam splitter 9 and is supplied to the device 10 for measuring the phase difference ⁇ (t).
  • Advantages of this method are that the waveguide 1/2 can be introduced directly into a sample and, because of the two-way interaction with the sample 4, the sensitivity is twice as great.
  • the in Fig. 5 and 6 schematically shown in layer section waveguide 1/2 can also be viewed as a strip waveguide 1 a / 2; the method according to the invention works in an analogous manner.
  • the incident laser light 3e and the outcoupled light 3a each with a fiber waveguide, preferably with polarization-maintaining monomode fiber waveguides, from the laser 6 to the layer waveguide 1/2 or strip waveguide 1a / 2, and / or to lead away from this to the device 1 0.
  • the fiber waveguide can, for example, be attached directly to the end faces 8 and 8 'of the layered waveguide 1/2 or strip waveguide 1 a / 2.
  • the wave-guiding layer 7 shows a planar wave-guiding layer 1, which has a smaller layer thickness d in the area of the measuring point 1 'than outside it, in particular as in the area of the end faces 8 and 8'.
  • the advantages of this device according to the invention are: 1. ) For the coupling of the laser light 3e in the Wellenlei ter 1/2 over the end face 8, a larger layer thickness d is advantageous because the adjustment of the lenses 7 is easier and the coupling efficiency is higher, and 2nd )
  • the method according to the invention has a greater sensitivity if the layer thickness in the area of the measuring point 1 'is small, as has already been described above. This also applies analogously to waveguides. Strip 1 a.
  • the protective layer 12 must have a refractive index n 12 which must be less than the refractive index n 1 of the wave-guiding layer 1 or strip 1a and also less than the effective refractive index N of the two modes of the guided wave 3.
  • the layer thickness of the protective layer 12 must be greater than the penetration depth ( ⁇ / 2 ⁇ ) [N 2 -n 12 2 ] -1/2 of the transversely damped wave of the field of the guided wave 3 into the protective layer 12.
  • Suitable materials for the protective layer 12 are preferably SiO 2 , glass-resin polymers, or plastics such as FMMA or polycarbonate, which can be applied, for example, using a centrifugal or immersion method.
  • the wave-guiding layer 1 can be covered with a chemo-responsive layer 11.
  • a heating layer 13, for example an indium tin oxide (ITO) layer can be applied between the substrate 2 and the wave-guiding layer 1, at least at the measuring point 1 '.
  • the heating layer 13 can be heated by electric current; The resulting increase in temperature enables the desorption of adsorbed molecules, in particular in the case of gaseous samples, and the measuring point 1 ′ to be cleaned of adsorbates.
  • the sample 4 is applied to the measuring point 1 '.
  • the measuring point 1 ' can also be covered with a cell 14 into which the sample 4 is filled. The walls of the cell 14 are preferably attached to the protective layer 12.
  • 9-11 show examples of the part of the devices according to the invention for measuring the phase difference ⁇ ⁇ (t) between the polarization components s and p in the outcoupled light 3a.
  • 9 shows an arrangement with a measuring channel.
  • the outcoupled light 3a is passed through a polarizer 15, whose transmission direction 16 is oriented in the direction of the bisector between the polarization directions of the polarization components s and p, to the photodetector 17, which measures the intensity I (t), which of the Electronics 20 is detected and evaluated. From G1. (6) it follows that the temporal change in the phase difference ⁇ ⁇ (t) can be determined from I (t), for example by counting the maxima and minima of I (t).
  • FIGS. 10 and 11 show devices for measuring ⁇ i (t) with a plurality of measuring channels.
  • the outcoupled light is divided into M measuring channels using beam splitters and / or Wollaston prisms.
  • the decoupled light 3a is split by the Wollaston prism 18 into two mutually perpendicularly polarized portions 3a1 and 3a2 which fall on the photodetectors 17a and 17b.
  • the outcoupled light 3a is divided into two parts by a beam splitter 19. These are further made vertical by the Wollaston prisms 18a and 18b, each in two parts polarized to each other split up, so that the four parts 3a1-3a4 arise.
  • a ⁇ / 4 plate (20) In front of the Wollaston prism 18b is a ⁇ / 4 plate (20), which generates a phase difference of ⁇ / 2 between the polarization components s and p.
  • phase difference ⁇ ⁇ (t) with only one measuring channel are not shown in the figures; these devices essentially correspond to those according to FIG. 9, but have additional components.
  • phase difference ⁇ 0 (t) is varied periodically with the period T linearly between - ⁇ and + ⁇ with modulators described under point a). It is determined at which value ⁇ 0 'of ⁇ n the measured intensity I (t) becomes minimal; according to Eq. (7) the phase difference can then be determined from:
  • the methods a) and b) have a resolution of 6 ( ⁇ ⁇ ) ⁇ 2 ⁇ / 100.
  • the phase difference ⁇ ⁇ (t) can also be measured using the keterodyne method.
  • a frequency difference Av is generated between the two polarization components of the laser light 3e incident on the waveguide 1 / 2,1a / 2, and thus in the guided wave (3) between the two modes of orthogonal polarization.
  • This can be generated, for example, with a helium-neon laser by a Zeemann splitter, or with an acous-to-optical modulator, or with a ⁇ / 2 plate rotating at a constant angular velocity and a stationary ⁇ / 4 plate.
  • the intensity I (t) measured by the photodetector 17 oscillates at the frequency ⁇ v.
  • the relative phase of this intensity I (t) is measured relative to that intensity, which also oscillates with the frequency .DELTA.v, which is measured by a second photodetector on which a laser light is incident on the waveguide 1 / 2,1a / 2 with a beam splitter 3e branched part of this light is directed.
  • the phase difference ⁇ ⁇ (t) can be measured with a measuring accuracy of ⁇ ( ⁇ ⁇ ) ⁇ 2 ⁇ / 1000.

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  • Investigating Or Analysing Materials By Optical Means (AREA)

Abstract

Selon un procédé optique intégré d'interférence, la lumière laser polarisée (3e) est couplée dans un guide d'ondes plan (1/2), se propage dans le guide d'ondes sous forme d'onde guidée (3) composée de deux modes cohérents orthogonalement polarisés l'un par rapport à l'autre et interagit au moins une fois avec une sonde (4) appliquée sur la surface d'une section déterminée d'un emplacement de mesure (1') du guide d'ondes (1/2; 1a/2), puis est découplée du guide d'ondes (1/2). La différence entre les phases en fonction du temps DELTAPHI(t) des deux composantes de polarisation mutuellement orthogonales dans la lumière découplée (3a) est mesurée par un dispositif (10) formé de photodétecteurs et d'éléments optiques polariseurs.
EP88901823A 1988-02-14 1988-02-14 Procede optique integre d'interference Withdrawn EP0403468A1 (fr)

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PCT/EP1988/000108 WO1989007756A1 (fr) 1988-02-14 1988-02-14 Procede optique integre d'interference

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EP0403468A1 true EP0403468A1 (fr) 1990-12-27

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US (1) US5120131A (fr)
EP (1) EP0403468A1 (fr)
JP (1) JPH03502726A (fr)
BR (1) BR8807884A (fr)
WO (1) WO1989007756A1 (fr)

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BR8807884A (pt) 1990-11-13
JPH03502726A (ja) 1991-06-20
US5120131A (en) 1992-06-09
WO1989007756A1 (fr) 1989-08-24

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