EP0286191A1 - Vakuum-Lichtbogen-Ionenquelle - Google Patents

Vakuum-Lichtbogen-Ionenquelle Download PDF

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Publication number
EP0286191A1
EP0286191A1 EP88200649A EP88200649A EP0286191A1 EP 0286191 A1 EP0286191 A1 EP 0286191A1 EP 88200649 A EP88200649 A EP 88200649A EP 88200649 A EP88200649 A EP 88200649A EP 0286191 A1 EP0286191 A1 EP 0286191A1
Authority
EP
European Patent Office
Prior art keywords
micro
plasma
droplets
receptacles
cathode
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP88200649A
Other languages
English (en)
French (fr)
Other versions
EP0286191B1 (de
Inventor
Henri Société Civile S.P.I.D. Bernardet
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
SODERN SA
Koninklijke Philips NV
Original Assignee
SODERN SA
Philips Gloeilampenfabrieken NV
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by SODERN SA, Philips Gloeilampenfabrieken NV, Koninklijke Philips Electronics NV filed Critical SODERN SA
Publication of EP0286191A1 publication Critical patent/EP0286191A1/de
Application granted granted Critical
Publication of EP0286191B1 publication Critical patent/EP0286191B1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/022—Details
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/08—Ion sources; Ion guns using arc discharge

Definitions

  • the invention relates to a vacuum arc ion source device comprising a plasma emitting cathode and an anode, polarized at suitable potentials.
  • the material of the electrodes When an arc is blown between two electrodes placed under vacuum, the material of the electrodes is locally vaporized under the effect of heating.
  • the ionized gas gives rise to a plasma formed by an ion-electron mixture with zero total charge.
  • the arc is initiated by the projection of an auxiliary plasma between the anode and the cathode by means of an autonomous trigger for a short time relative to the length of the arc pulse.
  • This emission of plasma is accompanied, for certain materials, by a projection of micro-droplets of molten material; this emission is not isotropic and is located mainly in a solid angle close to the surface of the cathode.
  • the invention aims at the partial or total elimination of this emission of micro-droplets liable to harm the quality of the desired layer or the proper functioning of the equipment equipped with this source.
  • this elimination is carried out by means of recovery of said micro-droplets constituted by receptacles polarized or not, or by means of separation of said micro-droplets from the plasma, each of said means ensuring elimination by tial of micro-projections and their total elimination being ensured by any combination of said means.
  • the receptacles are formed by hollow parts arranged in the zone of maximum emission of micro-projections (directions forming a small angle with the plasma emission plane), said hollow parts having undergone an appropriate surface treatment allowing good adhesion of micro-projections, this adhesion being able to be improved by polarization of the receptacles relative to the source.
  • the receptacles are in the form of grids arranged at or beyond the anode and so as to avoid a direct view of the cathode from the extraction.
  • the means for separating the micro-droplets from the plasma consist of induction coils providing a magnetic field for confining the plasma which limits its radial diffusion along a rectilinear or toroidal path, said plasma expanding again at the outlet of said device, in the absence of magnetic field.
  • FIG. 1 shows a plasma 1 emitted by a cathode 2 between said cathode and an anode 3.
  • the maximum emission zone 4 of the microdroplets 5, close to the plasma emission plane is limited by this plane on the one hand and by a cone whose trace on the plane of the figure is indicated by dashed lines on the other hand.
  • the cathode 2 of cylindrical shape is surrounded by a sleeve of the same shape constituting the anode trigger 6.
  • the recovery of the micro-projections is carried out in the maximum emission zone defined in FIG. 1 using receptacles formed by hollow parts 7 isolated from the trigger 6 and the anode 3 by means of parts 8 and 9 respectively.
  • These hollow parts serve as a container for projections and allow, by an appropriate surface treatment, a good adhesion which can be improved by a limited polarization of the receptacle relative to the source and in the opposite direction to the electric charge of the micro-droplets.
  • a system of receptacles in the form of grids placed in the projection zone of the plasma, as represented at 10 in FIG. grids are arranged at or beyond the anode 3 and so as to avoid a direct view of the cathode from the extraction; they can be weakly polarized to ensure more efficient capture, taking into account the electrical charge of the micro-droplets.
  • micro-projections are intercepted by these grids on which they are fixed by bonding if their surface has received a treatment promoting adhesion or maintained by gravity if their section has the shape of a chute (case shown in FIG. 3).
  • the arrangement of the coils 12b ensures a toroidal path of the plasma.
  • the baffles 14 distributed along the walls along this path ensure the recovery of micro-projections.

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Combustion & Propulsion (AREA)
  • Plasma Technology (AREA)
  • Electron Sources, Ion Sources (AREA)
EP88200649A 1987-04-10 1988-04-06 Vakuum-Lichtbogen-Ionenquelle Expired - Lifetime EP0286191B1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8705120A FR2613897B1 (fr) 1987-04-10 1987-04-10 Dispositif de suppression des micro-projections dans une source d'ions a arc sous vide
FR8705120 1987-04-10

Publications (2)

Publication Number Publication Date
EP0286191A1 true EP0286191A1 (de) 1988-10-12
EP0286191B1 EP0286191B1 (de) 1992-09-09

Family

ID=9350012

Family Applications (1)

Application Number Title Priority Date Filing Date
EP88200649A Expired - Lifetime EP0286191B1 (de) 1987-04-10 1988-04-06 Vakuum-Lichtbogen-Ionenquelle

Country Status (5)

Country Link
US (1) US4924138A (de)
EP (1) EP0286191B1 (de)
JP (1) JPS63279543A (de)
DE (1) DE3874386T2 (de)
FR (1) FR2613897B1 (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4929321A (en) * 1988-03-23 1990-05-29 Balzers Aktiengesellschaft Method and apparatus for coating workpieces
AU604856B2 (en) * 1987-03-13 1991-01-03 Ian Gordon Brown Multi-cathode metal vapor arc ion source
EP0480518A1 (de) * 1990-10-12 1992-04-15 Societe Anonyme D'etudes Et Realisations Nucleaires S.O.D.E.R.N. Elektronenquelle mit teilchenhaltender Anordnung

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1993010552A1 (en) * 1991-11-11 1993-05-27 Nauchno-Proizvodstvennoe Predpriyatie 'novatekh' Method and device for generation of ion beam

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191888A (en) * 1978-11-17 1980-03-04 Communications Satellite Corporation Self-shielding small hole accel grid
EP0094473A2 (de) * 1982-03-08 1983-11-23 International Business Machines Corporation Verfahren und Vorrichtung zur Erzeugung eines Ionenstrahles

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL152898B (nl) * 1950-04-12 Grace Gmbh Microporeuze, plaatvormige kunstharsvoorwerpen, alsmede werkwijze voor de vervaardiging hiervan.
DE1073638B (de) * 1953-02-19 1960-01-21 Standard Elektrik Lorenz Aktiengesellschaft, Stuttgart-Zuffenhausen Strahlerzeugungssystem für Kathodenstrahlröhren mit Ionenfalle
BE548096A (de) * 1953-05-30
GB1064101A (en) * 1964-07-13 1967-04-05 Atomic Energy Authority Uk Improvements in or relating to ion sources
JPS5711447A (en) * 1980-06-23 1982-01-21 Toshiba Corp Hollow cathode discharge device
JPS59165356A (ja) * 1983-03-09 1984-09-18 Hitachi Ltd イオン源
JPS6122548A (ja) * 1984-07-09 1986-01-31 Hitachi Ltd 荷電粒子引出系

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4191888A (en) * 1978-11-17 1980-03-04 Communications Satellite Corporation Self-shielding small hole accel grid
EP0094473A2 (de) * 1982-03-08 1983-11-23 International Business Machines Corporation Verfahren und Vorrichtung zur Erzeugung eines Ionenstrahles

Non-Patent Citations (4)

* Cited by examiner, † Cited by third party
Title
NUCLEAR INSTRUMENTS AND METHODS, vol. 185, nos. 1-3, juin 1981, pages 25-27, North-Holland Publ. Co., Amsterdam, NL; J.H. WHEALTON: "Improvement of gas efficiency of negative ion sources" *
PATENT ABSTRACTS OF JAPAN, vol. 10, no. 170 (E-412)[2226], 17 juin 1986; & JP-A-61 022 548 (HITACHI SEISAKUSHO K.K.) 31-01-986 *
PATENT ABSTRACTS OF JAPAN, vol. 4, no. 170 (E-35)[652], 22 novembre 1980; & JP-A-55 117 856 (HITACHI SEISAKUSHO K.K.) 10-09-1980 *
PATENT ABSTRACTS OF JAPAN, vol. 6, no. 72 (E-105)[950], 7 mai 1982; & JP-A-57 011 447 (TOKYO SHIBAURA DENKI K.K.) 21-01-1982 *

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
AU604856B2 (en) * 1987-03-13 1991-01-03 Ian Gordon Brown Multi-cathode metal vapor arc ion source
US4929321A (en) * 1988-03-23 1990-05-29 Balzers Aktiengesellschaft Method and apparatus for coating workpieces
EP0480518A1 (de) * 1990-10-12 1992-04-15 Societe Anonyme D'etudes Et Realisations Nucleaires S.O.D.E.R.N. Elektronenquelle mit teilchenhaltender Anordnung
FR2667980A1 (fr) * 1990-10-12 1992-04-17 Sodern Source d'electrons presentant un dispositif de retention de matieres.
US5256931A (en) * 1990-10-12 1993-10-26 U.S. Philips Corp. Electron source having a material-retaining device

Also Published As

Publication number Publication date
EP0286191B1 (de) 1992-09-09
US4924138A (en) 1990-05-08
JPS63279543A (ja) 1988-11-16
DE3874386T2 (de) 1993-04-08
FR2613897B1 (fr) 1990-11-09
DE3874386D1 (de) 1992-10-15
FR2613897A1 (fr) 1988-10-14

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