EP0270392B1 - Elektrolumineszenzanzeige mit amorphem hydriertem und karboniertem Silizium - Google Patents
Elektrolumineszenzanzeige mit amorphem hydriertem und karboniertem Silizium Download PDFInfo
- Publication number
- EP0270392B1 EP0270392B1 EP87402320A EP87402320A EP0270392B1 EP 0270392 B1 EP0270392 B1 EP 0270392B1 EP 87402320 A EP87402320 A EP 87402320A EP 87402320 A EP87402320 A EP 87402320A EP 0270392 B1 EP0270392 B1 EP 0270392B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- layer
- display device
- electroluminescent
- photoconductive layer
- photoconductive
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 229910052710 silicon Inorganic materials 0.000 title description 2
- 239000010703 silicon Substances 0.000 title description 2
- 229910021417 amorphous silicon Inorganic materials 0.000 claims description 29
- 238000001228 spectrum Methods 0.000 claims description 14
- 230000003446 memory effect Effects 0.000 claims description 12
- 230000005284 excitation Effects 0.000 claims description 7
- 230000035945 sensitivity Effects 0.000 claims description 3
- 239000003086 colorant Substances 0.000 claims 1
- 239000000203 mixture Substances 0.000 description 10
- 239000000463 material Substances 0.000 description 9
- VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 7
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 6
- 229910052799 carbon Inorganic materials 0.000 description 6
- 230000003287 optical effect Effects 0.000 description 5
- 230000008878 coupling Effects 0.000 description 4
- 238000010168 coupling process Methods 0.000 description 4
- 238000005859 coupling reaction Methods 0.000 description 4
- 238000010348 incorporation Methods 0.000 description 4
- 238000002347 injection Methods 0.000 description 4
- 239000007924 injection Substances 0.000 description 4
- 239000000758 substrate Substances 0.000 description 4
- 238000010521 absorption reaction Methods 0.000 description 3
- 230000006978 adaptation Effects 0.000 description 3
- 230000006399 behavior Effects 0.000 description 3
- 239000000969 carrier Substances 0.000 description 3
- 230000000694 effects Effects 0.000 description 3
- 238000005401 electroluminescence Methods 0.000 description 3
- 238000000034 method Methods 0.000 description 3
- 239000010409 thin film Substances 0.000 description 3
- 206010041067 Small cell lung cancer Diseases 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 229910052782 aluminium Inorganic materials 0.000 description 2
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 2
- 230000007423 decrease Effects 0.000 description 2
- 230000008021 deposition Effects 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 238000002474 experimental method Methods 0.000 description 2
- 230000006870 function Effects 0.000 description 2
- 238000012423 maintenance Methods 0.000 description 2
- 238000004519 manufacturing process Methods 0.000 description 2
- 230000007246 mechanism Effects 0.000 description 2
- 230000003071 parasitic effect Effects 0.000 description 2
- PLXMOAALOJOTIY-FPTXNFDTSA-N Aesculin Natural products OC[C@@H]1[C@@H](O)[C@H](O)[C@@H](O)[C@H](O)[C@H]1Oc2cc3C=CC(=O)Oc3cc2O PLXMOAALOJOTIY-FPTXNFDTSA-N 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- BLRPTPMANUNPDV-UHFFFAOYSA-N Silane Chemical compound [SiH4] BLRPTPMANUNPDV-UHFFFAOYSA-N 0.000 description 1
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
- 240000008042 Zea mays Species 0.000 description 1
- 230000002745 absorbent Effects 0.000 description 1
- 239000002250 absorbent Substances 0.000 description 1
- 230000009286 beneficial effect Effects 0.000 description 1
- UHYPYGJEEGLRJD-UHFFFAOYSA-N cadmium(2+);selenium(2-) Chemical compound [Se-2].[Cd+2] UHYPYGJEEGLRJD-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 230000005684 electric field Effects 0.000 description 1
- 238000005530 etching Methods 0.000 description 1
- 239000010408 film Substances 0.000 description 1
- 239000011521 glass Substances 0.000 description 1
- 230000035876 healing Effects 0.000 description 1
- 238000005286 illumination Methods 0.000 description 1
- 229910003437 indium oxide Inorganic materials 0.000 description 1
- PJXISJQVUVHSOJ-UHFFFAOYSA-N indium(iii) oxide Chemical compound [O-2].[O-2].[O-2].[In+3].[In+3] PJXISJQVUVHSOJ-UHFFFAOYSA-N 0.000 description 1
- 239000012212 insulator Substances 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- CMOQUKQBSAJCOD-UHFFFAOYSA-N methane silane Chemical compound C.[SiH4] CMOQUKQBSAJCOD-UHFFFAOYSA-N 0.000 description 1
- 210000003739 neck Anatomy 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- 230000001443 photoexcitation Effects 0.000 description 1
- 230000008092 positive effect Effects 0.000 description 1
- 239000000843 powder Substances 0.000 description 1
- 230000005855 radiation Effects 0.000 description 1
- 238000005215 recombination Methods 0.000 description 1
- 230000006798 recombination Effects 0.000 description 1
- 238000011160 research Methods 0.000 description 1
- 238000012552 review Methods 0.000 description 1
- 229910000077 silane Inorganic materials 0.000 description 1
- 239000007787 solid Substances 0.000 description 1
- 229910001887 tin oxide Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
- H05B33/00—Electroluminescent light sources
- H05B33/12—Light sources with substantially two-dimensional radiating surfaces
Definitions
- the present invention relates to an electroluminescent display device using hydrogenated and carbonated amorphous silicon.
- the device of the invention is not necessarily a memory effect, as will be better understood later, it is all the same this property which is most often sought in practice. We can therefore briefly recall what it consists of. It is said that a display device has a memory effect if its electro-optical characteristic (luminance-voltage curve) has hysteresis. For the same voltage located inside the hysteresis loop, the device could thus have two stable beings: is on or on. Plasma and alternately excited screens have such a characteristic of bistability, which is currently widely used.
- a memory effect display to display a still image, it is sufficient to apply simultaneously and continuously to the entire screen a so-called maintenance voltage.
- the latter can be a sinusoidal signal or in the form of slots for example.
- the form and frequency of this maintenance signal can be chosen independently of the complexity of the screen, in particular the number of lines of display points. There is therefore in principle no limit to the complexity of a memory effect display screen.
- ACTFEL capacitive coupling
- the PC-EL memory effect the principle of which is as follows.
- the photoconductor When the device is in the steady state, the photoconductor is not very conductive and retains a large part of the voltage V applied to the assembly. If one increases V to a value Von such that the voltage present at the terminals of the electroluminescent layer exceeds the electroluminescence threshold, the PC-EL device switches to the on state. The photoconductor is then lit by the electroluminescent structure and goes into the conductive state. The voltage across its terminals drops and this results in an increase in the voltage available for the electroluminescent structure. To switch off a PC-EL device, it suffices to reduce the total voltage V to a value Voff lower than Von: this gives a luminance-voltage characteristic comprising a hysteresis.
- FIG. 1 It comprises a glass substrate 10 on which is deposited an electrode 12, for example made of ITO (tin and indium oxide), a first dielectric layer 14, an electroluminescent layer 16, for example in ZnS: Mn, a second dielectric layer 18, a photoconductive layer 20 consisting of a stack of layers n + - nn + , made of amorphous silicon hydrogenated a-Si: H and finally an electrode 22, for example of aluminum.
- the electrodes 12 and 24 are connected to a voltage source 24.
- the layers PC and EL are thin layers, the thickness of which is of the order of a micron.
- the n + layers, heavily doped n and of very small thickness have the role of allowing a quasi-ohmic electronic injection into the so-called intrinsic n layer.
- this quasi-ohmic injection is obtained, it is the electrical and photoconductive characteristics of the intrinsic layer which first determine the behavior of the stack n + - nn + , called here "photoconductive layer", and the memory characteristics. of the PCEL device.
- Such a structure is simple to produce because it does not require an optical screen or additional etching steps. Furthermore, the current-voltage behavior of the thin layer photoconductor in the dark is highly non-linear and reproducible. The beneficial consequences are that the electrical ignition of the device is always easy, that the hysteresis depends only slightly on the excitation frequency and that the reproducibility of the hysteresis margin from one manufacturing to another is guaranteed. .
- the inventors have also studied the question of the sensitivity spectrum of a photoconductive material. This spectrum is directly linked to the width of the forbidden band of the material used, its intensity depends on the characteristics of the centers of recombination of the electron-hole pairs generated by photo-excitation (energy depth, effective capture section, trapping time, etc. .). For an optimal PC-EL memory effect, it would be desirable to adapt the spectrum of the photoconductor to that of the electroluminescent structure, so as to improve the optical coupling between the EL and PC layers. But in a system using a-Si: H, there is no possibility of carrying out this adaptation.
- This material is hydrogenated and carbonated amorphous silicon whose formula is a-Si x C 1-x : H.
- the invention relates to an electroluminescent display device comprising, on an insulating support an electroluminescent layer and a photoconductive layer, these layers being stacked one on the other, all of these two layers being interposed between two systems of electrodes connected to an electric voltage source allowing the excitation of certain zones of the light-emitting layer, this device being characterized by the fact that the photoconductive layer is made of hydrogenated and carbonated amorphous silicon ⁇ -SixC, _x : H with 1-x between 0.05 and 0.50.
- the photoconductive layer will consist of an intrinsic layer n of hydrogenated and carbonated amorphous silicon a-Si x C 1-x : H, optionally inserted between two necks. ches n + of quasi-ohmic injection, also in hydrogenated and carbonized amorphous silicon a-Si y C 1-y : H.
- Photoconductivity drops at short wavelengths (high energies) due to the absorption of radiation in the material.
- a characteristic of the photoconductivity spectrum of a-SixC 1-x : H is the energy E 04 (in Ev) at which the absorption coefficient a is 10 4 cm -1 . It is this energy which is represented on figure 3,
- 1-x is preferably between 0.05 and 0.50.
- the carbon concentration [C] / [C] + [Si] is between 5% and 50%.
- the emission wavelengths used for the polychrome display range from approximately 450 nm for blue to approximately 640 nm for red.
- An adaptation to such spectra can be obtained by taking 1-x equal to 0.50 for blue and 0.05 for red, respectively.
- the photoconductive layer can give an electroluminescent structure an excellent display contrast due to the accompanying "black layer” effect.
- the photoconductive layer in fact masks the rear aluminum electrodes, absorbs ambient light and prevents its reflection on the electrodes.
- the principle of using an absorbent layer is naturally known. It is described for example in the publication of the inventors cited above, as well as in the American patent US-A-3,560,784. But in these previous documents, the "black layer” is sometimes a-Si: H, sometimes a dielectric, in other words bodies of composition, therefore of property, given. We cannot therefore play freely on the optical properties of these bodies.
- the refractive index in a wide range (2.0 to 3.6) by acting on 1-x and optically adapt the black layer to the other layers, for example to the dielectric layer which adjoining and which may be Ta 2 O 5 with index 2.1 or with the electroluminescent layer, which may be ZnS with index 2.35. This minimizes the reflection of ambient light by the photoconductive layer-underlying layer (insulator or electroluminescent layer).
- a layer of a-Si: H with phosphorus (P) makes it possible to very significantly increase the density of free carriers: up to 10 18 ⁇ 10 19 cm- 3 . It is this high density of free carriers which ensures quasi-ohmic electronic injection into the intrinsic layer.
- the ohmic conductivity of such layers n + is so high (10 -2, 10 -3 ⁇ -1 cm -1) it causes lateral parasitic conduction phenomena in PCEL materials screens.
- the incorporation of C into the n + layer makes it possible to significantly reduce the conductivity without significantly modifying the density of free carriers.
- the incorporation of carbon into the a-Si: H has significant positive effects both for the intrinsic layer n and for the layers n + possibly introduced into the photoconductive structure.
- the layers of hydrogenated and carbonated amorphous silicon are deposited by glow discharge ("glow discharge") from a mixture of silane (SiH 4 ) and methane (CH 4 ).
- glow discharge a mixture of silane (SiH 4 ) and methane (CH 4 ).
- CH 4 mixture content varies in a range from 0 to 60%
- the carbon 1-x content in the deposited layer varies from 0 to 0.2.
- FIGS. 2 and 3 make it possible to better specify the experimental conditions to be implemented to obtain certain performances.
- the abscissa axis corresponds to the concentration C of methane to be used in the methane-silane gas mixture.
- the ordinate axis corresponds to the refractive index n in FIG. 2 and to the energy E04 of the absorption band of the photoconductor expressed in electron volts in FIG. 3.
- adjusting 1-x to optimize the DOS, resistivity, photoconductivity, spectrum, index, etc. does not in any way exclude the adjustment of the operating conditions of deposition (temperature of the substrate, power of the plasma, etc.). This adjustment makes it possible to perfect the effects of the presence of carbon, or on the contrary, to compensate for this action. This is the case, for example, when 1-x has been chosen to adjust the photoconductivity spectrum and / or the index and we also want to corrode the DOS, the resistivity and the photoconductivity which result from this choice.
- n + layers of a-Si 1-y C y : H will be obtained for example by adding to the mixture of [SiH 4 ] - [CH 4 ] an adequate concentration of [PH 3] (typically 0.5%).
- the invention is applicable to any type of electroluminescent structure in thin layers or based on powder, and with continuous or alternative excitation, this although the example described relates to electroluminescence in thin layers with alternative excitation.
Landscapes
- Electroluminescent Light Sources (AREA)
- Devices For Indicating Variable Information By Combining Individual Elements (AREA)
Claims (6)
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8614715 | 1986-10-23 | ||
FR8614715A FR2605777B1 (fr) | 1986-10-23 | 1986-10-23 | Dispositif d'affichage electroluminescent utilisant du silicium amorphe hydrogene et carbone |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0270392A1 EP0270392A1 (de) | 1988-06-08 |
EP0270392B1 true EP0270392B1 (de) | 1991-01-16 |
Family
ID=9340108
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP87402320A Expired - Lifetime EP0270392B1 (de) | 1986-10-23 | 1987-10-16 | Elektrolumineszenzanzeige mit amorphem hydriertem und karboniertem Silizium |
Country Status (5)
Country | Link |
---|---|
US (1) | US4877995A (de) |
EP (1) | EP0270392B1 (de) |
JP (1) | JPS63170895A (de) |
DE (1) | DE3767456D1 (de) |
FR (1) | FR2605777B1 (de) |
Families Citing this family (24)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5156924A (en) * | 1988-12-29 | 1992-10-20 | Sharp Kabushiki Kaisha | Multi-color electroluminescent panel |
FR2643180B1 (fr) * | 1989-02-10 | 1991-05-10 | France Etat | Dispositif d'affichage monochrome a memoire du type photoconducteur-electroluminescent |
FR2644920B1 (fr) * | 1989-03-21 | 1993-09-24 | France Etat | Dispositif d'affichage polychrome a memoire du type photoconducteur-electroluminescent |
FR2645998B1 (fr) * | 1989-04-12 | 1991-06-07 | France Etat | Ecran d'affichage electroluminescent a memoire et a configuration particuliere d'electrodes |
US5264714A (en) * | 1989-06-23 | 1993-11-23 | Sharp Kabushiki Kaisha | Thin-film electroluminescence device |
US5043632A (en) * | 1990-04-13 | 1991-08-27 | Westinghouse Electric Corp. | TFEL edge emitter structure with uniform light emission filter |
JPH04368795A (ja) * | 1991-06-14 | 1992-12-21 | Fuji Xerox Co Ltd | 薄膜トランジスタ内蔵薄膜el素子 |
US5243332A (en) * | 1991-10-31 | 1993-09-07 | Massachusetts Institute Of Technology | Information entry and display |
JPH06160850A (ja) * | 1992-11-26 | 1994-06-07 | Sharp Corp | 液晶表示装置 |
US5552679A (en) * | 1993-07-15 | 1996-09-03 | International En-R-Tech Incorporated | Electroluminescent and light reflective panel |
WO1996033594A1 (en) * | 1995-04-18 | 1996-10-24 | Cambridge Display Technology Limited | Electroluminescent device |
JP2739844B2 (ja) * | 1995-05-19 | 1998-04-15 | 日本電気株式会社 | 薄膜トランジスタアレイ |
EP0812526B1 (de) * | 1995-12-30 | 2001-08-08 | Casio Computer Co., Ltd. | Anzeigervorrichtung für anzeigeoperation gemäss lichtsignal und steuerverfahren dafür |
US6965196B2 (en) * | 1997-08-04 | 2005-11-15 | Lumimove, Inc. | Electroluminescent sign |
GB2350926A (en) * | 1999-05-27 | 2000-12-13 | Seiko Epson Corp | Monolithic,semiconductor light emitting and receiving device |
US20010042329A1 (en) * | 2000-04-13 | 2001-11-22 | Matthew Murasko | Electroluminescent sign |
US20020159246A1 (en) * | 2001-03-21 | 2002-10-31 | Matthew Murasko | Illuminated display system |
US7048400B2 (en) * | 2001-03-22 | 2006-05-23 | Lumimove, Inc. | Integrated illumination system |
ATE377257T1 (de) | 2001-03-22 | 2007-11-15 | Lumimove Inc | Beleuchtetes anzeigesystem und prozess |
AU2002345988A1 (en) * | 2001-06-27 | 2003-03-03 | Lumimove, Inc. | Electroluminescent panel having controllable transparency |
US7358658B2 (en) * | 2002-03-08 | 2008-04-15 | Chien-Min Sung | Amorphous diamond materials and associated methods for the use and manufacture thereof |
JP2005317439A (ja) * | 2004-04-30 | 2005-11-10 | Seiko Epson Corp | 表示パネル及び表示装置 |
FR2983438B1 (fr) * | 2011-12-05 | 2014-03-14 | Renault Sas | Dispositif d'eclairage pour vehicule automobile |
CN103247731A (zh) * | 2013-04-16 | 2013-08-14 | 苏州瑞晟太阳能科技有限公司 | 一种基于纳米材料的新型光控发光二极管 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3560784A (en) * | 1968-07-26 | 1971-02-02 | Sigmatron Inc | Dark field, high contrast light emitting display |
US4695717A (en) * | 1984-04-24 | 1987-09-22 | Canon Kabushiki Kaisha | Semi-conductor device and electronic apparatus using the same |
FR2574972B1 (fr) * | 1984-12-18 | 1987-03-27 | Thioulouse Pascal | Dispositif d'affichage a effet memoire comprenant des couches electroluminescente et photoconductrice superposees |
US4675265A (en) * | 1985-03-26 | 1987-06-23 | Fuji Electric Co., Ltd. | Electrophotographic light-sensitive element with amorphous C overlayer |
FR2595741A1 (fr) * | 1986-03-17 | 1987-09-18 | Lefloch Maurice | Support de garde-corps filant en bordure de plancher |
-
1986
- 1986-10-23 FR FR8614715A patent/FR2605777B1/fr not_active Expired
-
1987
- 1987-10-16 EP EP87402320A patent/EP0270392B1/de not_active Expired - Lifetime
- 1987-10-16 DE DE8787402320T patent/DE3767456D1/de not_active Expired - Lifetime
- 1987-10-19 US US07/110,116 patent/US4877995A/en not_active Expired - Fee Related
- 1987-10-23 JP JP62266676A patent/JPS63170895A/ja active Pending
Also Published As
Publication number | Publication date |
---|---|
FR2605777B1 (fr) | 1989-02-17 |
EP0270392A1 (de) | 1988-06-08 |
FR2605777A1 (fr) | 1988-04-29 |
JPS63170895A (ja) | 1988-07-14 |
US4877995A (en) | 1989-10-31 |
DE3767456D1 (de) | 1991-02-21 |
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