EP0222777A1 - Ensemble destine a redonner les conditions initiales de proprete dans un tube de quartz utilise comme chambre de reaction pour la fabrication des circuits integres. - Google Patents
Ensemble destine a redonner les conditions initiales de proprete dans un tube de quartz utilise comme chambre de reaction pour la fabrication des circuits integres.Info
- Publication number
- EP0222777A1 EP0222777A1 EP86901424A EP86901424A EP0222777A1 EP 0222777 A1 EP0222777 A1 EP 0222777A1 EP 86901424 A EP86901424 A EP 86901424A EP 86901424 A EP86901424 A EP 86901424A EP 0222777 A1 EP0222777 A1 EP 0222777A1
- Authority
- EP
- European Patent Office
- Prior art keywords
- tube
- enclosure
- rinsing
- tank
- quartz tube
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B08—CLEANING
- B08B—CLEANING IN GENERAL; PREVENTION OF FOULING IN GENERAL
- B08B15/00—Preventing escape of dirt or fumes from the area where they are produced; Collecting or removing dirt or fumes from that area
-
- F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
- F24—HEATING; RANGES; VENTILATING
- F24F—AIR-CONDITIONING; AIR-HUMIDIFICATION; VENTILATION; USE OF AIR CURRENTS FOR SCREENING
- F24F3/00—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems
- F24F3/12—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling
- F24F3/16—Air-conditioning systems in which conditioned primary air is supplied from one or more central stations to distributing units in the rooms or spaces where it may receive secondary treatment; Apparatus specially designed for such systems characterised by the treatment of the air otherwise than by heating and cooling by purification, e.g. by filtering; by sterilisation; by ozonisation
- F24F3/163—Clean air work stations, i.e. selected areas within a space which filtered air is passed
Definitions
- the present invention relates to an assembly intended to restore the initial conditions of cleanliness in a quartz tube used as a reaction chamber for the manufacture of integrated circuits.
- the invention finds its application in particular in the series production units of integrated circuits.
- one of the essential conditions to be respected is the absolute cleanliness of the ambient air. This cleanness is evaluated by the detection of a very small number of particle size su ⁇ Stainlesseure to 0.5 micron in a unit volume of air, and by the substantial absence of corrosive gases in the air. Such rooms, called “clean rooms”, have a very high production and operating cost. Consequently, the following factors should be limited:
- a deposition furnace essentially comprises a quartz tube which serves as a reaction chamber and which must be periodically extracted and treated in order to remove from its surface the deposits which are formed there.
- This clean-up or, more precisely, resetting to the initial cleanliness conditions operation consists in immersing the tube in a stirred bath of extremely corrosive chemicals, generally a mixture of concentrated and hot HF and HN0 3 . In this way it is possible to remove the tungsten deposits which are particularly resistant.
- the quartz tubes are very fragile and about two to three meters long, the cleaning operation is delicate.
- a treatment of the tube in the clean room near the place requires significant air extraction. To limit contamination of the air by corrosive fumes, and does not completely eliminate this risk.
- Treatment outside the clean room involves handling the tube to take it out and back into the room, with the risk of depositing dust or pollutants on the tube during its stay outside the room.
- the handling of the tube for its exit and entry into the clean room requires the significant opening of the room and therefore a consumption of filtered air and a pressure drop in the room .
- the cleaning assembly includes a vertical separation panel delimiting on one side an area in the manufacturing workshop of integrated circuits whose air is filtered to obtain an average level of cleanliness, and on the other side an area in the manufacturing workshop whose air is filtered to obtain a maximum level of cleanliness, an area called the clean room, this area being that in which the main manufacturing operations are carried out and comprising the manufacturing machines using said quartz tubes, an elongated tank partially opened upper, located against the panel in the first zone and containing the chemical (s) intended to eliminate the undesirable elements covering said quartz tubes, an opening made in the panel, in which is tightly inserted a parallelepiped enclosure of elongated shape, arranged vertically and intended to receive a quartz tube and carry thereon ne spray rinsing and drying operation, said enclosure further comprising a door opening onto the medium cleanliness zone and a door opening onto the maximum cleanliness zone,
- said tank is fixed, of cylindrical shape and is surmon ⁇ ted with a horizontal shaft of axis coinciding with the geometrical axis of the tank, provided with two arches rigidly connected to it , these two arches having a curvature whose center coincides with the axis of the tank, the quartz tube ve ⁇ ing immersing in the chemical treatment liquid contained in the tank resting on the two arches, agitation of the tube being obtained by oscillating
- the rinsing and drying enclosure is embedded in the panel so as to protrude on either side of the panel by a substantially identical distance; the tank is arranged near the rinsing and drying enclosure and the axis of this tank is arranged perpendicular to the vertical plane of the panel.
- the rinsing and drying enclosure has a substantially flat and horizontal wall separating said enclosure into a lower compartment and an upper compartment, the quartz tube being able to rest on this wall in a vertical position when it is in the upper compartment, said wall comprising at least one opening opening inside the tube and at least one opening opening outside the tube when the latter rests on this wall in a vertical position.
- the rinsing and drying enclosure may also include:
- the rinsing and drying enclosure comprises a rinsing tube having a first end connected to an inlet pipe for a liquid rinsing the quartz tube and a second end connected to a shower comprising a first part able to spray the rinsing liquid radially inside the quartz tube and a second part able to spray the rinsing liquid radially on the outside of the quartz tube when the latter is in vertical position inside the enclosure.
- said rinsing tube is mounted so as to slide longitudinally along its axis inside the enclosure.
- the rinsing and drying enclosure comprises means for holding the tube in a vertical position, these holding means comprising:
- a first set of elongated supports located substantially in a first horizontal plane
- At least one of said supports is fixed and at least one of said supports passes through a wall of the enclosure and is mounted to slide longitudinally.
- FIG. 1 shows in perspective view the general diagram of the assembly
- FIG. 2 represents in section along AA the part of the cleaning assembly corresponding to the rinsing and drying operations
- Figure 3 is a sectional view along line BB of Figure 2
- Figure 4 shows in perspective view the part of the cleaning assembly corresponding to the chemical treatment operation
- Figure 5 shows the part according to Figure 4 in cross section.
- FIG 1 there is a set for cleaning the quartz tubes.
- This assembly is mounted in a space corresponding to a clean room in a workshop for manufacturing integrated circuits. In such a workshop (not shown), there is a set of machines each intended to carry out one of the processing operations of the platelets made of semiconductor material in order to produce integrated circuits on these wafers.
- the assembly according to the invention comprises a panel 1 serving as a separation between two zones 2, 3 of the workshop, a zone 2 in which the air is of average cleanliness and the other zone 3 in which the air is of maximum cleanliness and is mainte ⁇ naked to a slight overpressure compared to zone 2.
- the two zones 2 and 3 of the workshop are delimited not only by the panel 1 but also by a set of bulkheads and watertight doors (not shown).
- an opening 5 which is obstructed by an enclosure 6 of parallelepiped shape, vertically elongated and whose height is greater than the length of the quartz tubes.
- This enclosure 6 comprises a door 7 of height greater than the length of the tubes, this door being disposed on the wall of the enclosure 6 situated opposite the zone 2.
- the enclosure comprises another identical door 8 situated opposite the zone 3.
- the enclosure 6 allows a quartz tube to be received in the vertical position after washing and pre-rinsing in the tank 4 and allows a complete rinsing and drying operation to be performed on it.
- a quartz tube whose * internal surface condition is no longer satisfactory is extracted from the oven which is located in zone 3, also called the clean room.
- the tube is transported to the other zone 2, also called the gray room, by passing it through the enclosure 6 which serves as an airlock, that is to say that the tube is first placed in the enclosure 6 by only opening door 8, then door 8 is closed, door 7 is opened and the tube is removed from enclosure 6: it is therefore found in zone 2.
- This tube is then placed in the tank 4, a certain quantity of liquid product intended to dissolve the undesirable deposits on the internal face of the tube is placed in this tank. Then, the tank is emptied and filled with water to pre-rinse the tube.
- the tube is replaced in a vertical position in the enclosure 6 by only opening the door 7.
- the tube is rinsed using a shower that sends deionized water simultaneously to the inner and outer wall of the tube. Then cut off the water supply to the shower and circulate from the bottom to the top of the enclosure dry and hot air which dries the tube. This air comes from the air supply from the clean room, that is to say it is filtered through absolute filters.
- the enclosure 6 serves both as a cabinet for rinsing and drying the tube as well as an airlock for the passage of the tube from the clean room to the gray room and vice versa, without significant consumption of ultra air.
- clean room air other than the amount of air needed to dry the tube.
- the clean room 3 has always remained under overpressure and isolated from the gray room 2, and that the polluting vapors coming from the tank 4 could not enter the clean room during the tube cleaning operation.
- the sealed enclosure 6 is arranged in the form of an airlock for the passage of the tube 29 in the vertical position between the two zones 2 and 3.
- the tube 29 is placed vertically in the center of the enclosure 6 and thus rests at mid-height on a flat and horizontal wall 17, forming a partition in the enclosure 6.
- This wall 17 has a central orifice 22 and orifices 21 repaired around and outside the tube 29.
- the tube 29 is • maintained in a vertical position by two sets of three supports 18, 19 and 20 of which, for each set, one of the three supports 18 is fixed and ' is arranged horizontally in the extension of the panel 1, the second support 19 is horizontal and crosses the side wall of the enclosure 6 to lead into zone 3,
- the third support 20 is in a position symmetrical to that of the support 19 with respect to the plane of the panel 1 and therefore opens into the zone 2.
- the two supports 19 and 20 are also mounted to slide longitudinally.
- the device also comprises an inlet for deionized filtered water connected to a vertical rigid tube 23 in the enclosure 6, sliding longitudinally and connected at its end to a shower in two parts, the first part 24 coming to project the water radially to the inside the tube, and the second part 25 projecting water radially onto the outside of the tube.
- This part comprises a frame 12, optionally fixed to the panel 1 by its lateral part, at its upper part a tank 4 of cylindrical shape, open upwards, with a horizontal axis situated higher than the lateral edges of the tank, and a shaft 11 centered on the axis of the tank 4 and on which two hoops 9, 10 are rigidly fixed, which extend radially from the shaft then in the form of an arc of a circle centered on the merged axis of the shaft 11 and of the tank 4 and of radius slightly lower than that of the tank.
- the machine also includes an extractor hood 13 connected by a duct 14 to the air extraction system, and a motor 15 intended to print to the shaft 11 a periodic oscillating movement.
- the tube to be treated 29 is placed in the tank 4 on the arches 9 and 10.
- the tank 4 is then partially filled from a tank 30 par.des canali ⁇ sations 16 and * pumps (not shown), then starts the motor 15: the shaft oscillates and drives the tubes through the hoops in an oscillating movement. Then drain the tank 4, then fill it and empty it with water to pre-rinse the tube. The tube is then removed to bring it into the rinsing and drying cabinet 6, the arrangement and instructions for which have been described above.
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Combustion & Propulsion (AREA)
- Mechanical Engineering (AREA)
- General Engineering & Computer Science (AREA)
- Cleaning By Liquid Or Steam (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Cleaning In General (AREA)
Abstract
Description
Claims
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR8503433A FR2578455B1 (fr) | 1985-03-08 | 1985-03-08 | Ensemble destine a redonner les conditions initiales de proprete dans un tube de quartz utilise comme chambre de reaction pour la fabrication des circuits integres |
FR8503433 | 1985-03-08 |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0222777A1 true EP0222777A1 (fr) | 1987-05-27 |
EP0222777B1 EP0222777B1 (fr) | 1989-07-12 |
Family
ID=9317008
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP86901424A Expired EP0222777B1 (fr) | 1985-03-08 | 1986-03-04 | Ensemble destine a redonner les conditions initiales de proprete dans un tube de quartz utilise comme chambre de reaction pour la fabrication des circuits integres |
Country Status (6)
Country | Link |
---|---|
US (1) | US4756322A (fr) |
EP (1) | EP0222777B1 (fr) |
JP (1) | JPS62502107A (fr) |
DE (1) | DE3664264D1 (fr) |
FR (1) | FR2578455B1 (fr) |
WO (1) | WO1986005129A1 (fr) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US7964085B1 (en) | 2002-11-25 | 2011-06-21 | Applied Materials, Inc. | Electrochemical removal of tantalum-containing materials |
US6902628B2 (en) * | 2002-11-25 | 2005-06-07 | Applied Materials, Inc. | Method of cleaning a coated process chamber component |
US20060105182A1 (en) * | 2004-11-16 | 2006-05-18 | Applied Materials, Inc. | Erosion resistant textured chamber surface |
US7910218B2 (en) * | 2003-10-22 | 2011-03-22 | Applied Materials, Inc. | Cleaning and refurbishing chamber components having metal coatings |
US7579067B2 (en) * | 2004-11-24 | 2009-08-25 | Applied Materials, Inc. | Process chamber component with layered coating and method |
US8617672B2 (en) | 2005-07-13 | 2013-12-31 | Applied Materials, Inc. | Localized surface annealing of components for substrate processing chambers |
US7762114B2 (en) | 2005-09-09 | 2010-07-27 | Applied Materials, Inc. | Flow-formed chamber component having a textured surface |
US7981262B2 (en) | 2007-01-29 | 2011-07-19 | Applied Materials, Inc. | Process kit for substrate processing chamber |
US7942969B2 (en) | 2007-05-30 | 2011-05-17 | Applied Materials, Inc. | Substrate cleaning chamber and components |
CN112695508B (zh) * | 2021-01-24 | 2022-04-15 | 扬州苏油油成商贸实业有限公司 | 一种棉织物服装表面绒毛除杂工艺 |
Family Cites Families (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3893869A (en) * | 1974-05-31 | 1975-07-08 | Rca Corp | Megasonic cleaning system |
FR2418034A1 (fr) * | 1978-02-28 | 1979-09-21 | Sagem | Perfectionnements apportes aux appareils pour le traitement de surfaces impliquant l'utilisation d'au moins un solvant |
DE2818895C3 (de) * | 1978-04-28 | 1981-01-22 | Metall + Plastic Gmbh, 7760 Radolfzell | Vorrichtung zum Überführen von Gegenständen zwischen Räumen unterschiedlichen Keimgehaltes |
US4294271A (en) * | 1979-11-30 | 1981-10-13 | Dexon, Inc. | Apparatus for removing deposited matter from a diffusion tube |
JPS58127035A (ja) * | 1982-01-25 | 1983-07-28 | Hitachi Ltd | 清浄室装置 |
US4561268A (en) * | 1984-07-02 | 1985-12-31 | G. A. Braun Inc. | Wall adapter for tilt type washer-extractor machine |
-
1985
- 1985-03-08 FR FR8503433A patent/FR2578455B1/fr not_active Expired
-
1986
- 1986-03-04 US US06/930,267 patent/US4756322A/en not_active Expired - Fee Related
- 1986-03-04 DE DE8686901424T patent/DE3664264D1/de not_active Expired
- 1986-03-04 WO PCT/FR1986/000069 patent/WO1986005129A1/fr active IP Right Grant
- 1986-03-04 JP JP61501452A patent/JPS62502107A/ja active Pending
- 1986-03-04 EP EP86901424A patent/EP0222777B1/fr not_active Expired
Non-Patent Citations (1)
Title |
---|
See references of WO8605129A1 * |
Also Published As
Publication number | Publication date |
---|---|
FR2578455A1 (fr) | 1986-09-12 |
EP0222777B1 (fr) | 1989-07-12 |
JPS62502107A (ja) | 1987-08-20 |
US4756322A (en) | 1988-07-12 |
WO1986005129A1 (fr) | 1986-09-12 |
FR2578455B1 (fr) | 1987-05-07 |
DE3664264D1 (en) | 1989-08-17 |
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