EP0088220B1 - Elément de contact et méthode pour sa fabrication - Google Patents

Elément de contact et méthode pour sa fabrication Download PDF

Info

Publication number
EP0088220B1
EP0088220B1 EP83100717A EP83100717A EP0088220B1 EP 0088220 B1 EP0088220 B1 EP 0088220B1 EP 83100717 A EP83100717 A EP 83100717A EP 83100717 A EP83100717 A EP 83100717A EP 0088220 B1 EP0088220 B1 EP 0088220B1
Authority
EP
European Patent Office
Prior art keywords
layer
rhodium
contact member
silver
contact
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP83100717A
Other languages
German (de)
English (en)
Other versions
EP0088220A2 (fr
EP0088220A3 (en
Inventor
Cornelia Dipl.-Phys. Albert
Ulf Dipl.-Phys. Rauterberg
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Original Assignee
Siemens AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG filed Critical Siemens AG
Publication of EP0088220A2 publication Critical patent/EP0088220A2/fr
Publication of EP0088220A3 publication Critical patent/EP0088220A3/de
Application granted granted Critical
Publication of EP0088220B1 publication Critical patent/EP0088220B1/fr
Expired legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H1/00—Contacts
    • H01H1/02—Contacts characterised by the material thereof
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01H—ELECTRIC SWITCHES; RELAYS; SELECTORS; EMERGENCY PROTECTIVE DEVICES
    • H01H11/00—Apparatus or processes specially adapted for the manufacture of electric switches
    • H01H11/04—Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts
    • H01H11/041—Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts by bonding of a contact marking face to a contact body portion
    • H01H2011/046—Apparatus or processes specially adapted for the manufacture of electric switches of switch contacts by bonding of a contact marking face to a contact body portion by plating

Definitions

  • the invention relates to a contact element as prior art, which has on a preferably ferromagnetic carrier material at least two contact layers electroplated one above the other, of which the outer layer consists of rhodium and the underlying second layer of a noble metal.
  • the invention relates to a method for producing such contact elements.
  • the object of the invention is therefore to provide a contact element with a noble metal contact layer and a rhodium coating, which maintains a low contact resistance even at high switching numbers and does not tend to cold welding.
  • the noble metal layer consists of silver and the rhodium protective layer has a thickness between 0.2 ⁇ m and 2 ⁇ m.
  • the wafer-rhodium-plated contact elements coated with silver according to the invention do not tend to cold welding or gluing even after a long service life and thereby maintain a largely constant low contact resistance.
  • the contact resistance is even more constant than with correspondingly thin rhodium-plated contact layers made of gold or gold alloys.
  • the contacts according to the invention have the additional advantages that result from the use of the contact material silver. Silver is much cheaper than gold and also more resilient as a contact material.
  • rhodium-plated silver contacts Up to a layer thickness of approximately 2 pm rhodium, rhodium-plated silver contacts have lower resistance than pure rhodium contacts. Particularly good results can be achieved with a rhodium layer thickness between 0.3 pm and 1 pm.
  • the thickness of the silver layer is advantageously between 1 and 10 ⁇ m, preferably 2 to 5 ⁇ m.
  • a nickel layer with a thickness of about 2 to 4 pm and, if appropriate, a copper layer with a thickness of 2 to 10 ⁇ m is expediently provided below the silver layer in order to achieve a diffusion barrier between the preferably ferromagnetic carrier material and the silver contact layer.
  • Table 1 shows the development of the contact resistance for the different contact layers:
  • the silver contact layer For the application of the silver contact layer, an electrolyte is expediently used which is largely free of additions of gloss and wetting agents and is advantageously deposited using wave plating technology.
  • the rhodium layer which expediently has a sulfur content of 4 to 7% by weight, is advantageously produced using spray electroplating technology (“jet ptating”).
  • jet ptating spray electroplating technology
  • the layer thickness of the protective layer can be achieved particularly precisely. It is also advantageous to anneal the contact element after the contact layers have been applied.

Landscapes

  • Contacts (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Manufacture Of Switches (AREA)

Claims (9)

1. Elément de contact qui possède, sur un matériau de support de préférence ferromagnétique, au moins deux couches de contact disposées l'une au-dessus de l'autre par voie galvanique et parmi lesquelles la couche extérieure est constituée par du rhodium et la seconde couche sous-jacente est constituée en un métal précieux, caractérisé par le fait que la couche de rhodium possède une épaisseur comprise entre environ 0,2 pm et 2 pm et que la couche sous-jacente de métal précieux est constituée par de l'argent.
2. Elément de contact suivant la revendication 1, caractérisé par le fait que la couche de rhodium possède une épaisseur comprise entre 0,3 et 1 pm.
3. Elément de contact suivant la revendication 1 ou 2, caractérisé par le fait que la couche de rhodium possède une teneur en soufre comprise entre 4 et 7% en poids.
4. Elément de contact suivant l'une des revendications 1 à 3, caractérisé par le fait que la couche d'argent possède une épaisseur comprise entre 1 et 10 pm, de préférence entre 2 et 5 µm.
5. Elément de contact suivant l'une des revendications 1 à 4, caractérisé par le fait qu'une couche de nickel possédant une épaisseur comprise entre 2 et 4 µm est située au-dessous de la couche d'argent.
6. Elément de contact suivant l'une des revendications 1 à 5, caractérisé par le fait qu'une couche supplémentaire de cuivre possédant une épaisseur comprise entre 2 et 10 µm est prévue entre le matériau de support et la couche de métal précieux.
7. Procédé pour fabriquer un élément de contact suivant la revendication 1, caractérisé par le fait que l'on dépose successivement, sur le matériau de support recouvert éventuellement par du cuivre et/ou du nickel, la couche d'argent selon une technique à bain de galvanoplastie ou une technique de galvanoplastie à la vague et ensuite la couche de rhodium selon une technique de galvanoplastie par projection.
8. Procédé suivant la revendication 7, caractérisé par le fait que pour le dépôt de la couche d'argent, on utilise un électrolyte particulièrement pur, qui est, dans une large mesure, exempt de produits de brillantage et d'agents de réticulation.
9. Procédé suivant la revendication 7 ou 8, caractérisé par le fait qu'après le dépôt des couches de contact, on soumet l'élément de contact à un recuit.
EP83100717A 1982-01-29 1983-01-26 Elément de contact et méthode pour sa fabrication Expired EP0088220B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3203037A DE3203037C2 (de) 1982-01-29 1982-01-29 Kontaktelement und Verfahren zu dessen Herstellung
DE3203037 1982-01-29

Publications (3)

Publication Number Publication Date
EP0088220A2 EP0088220A2 (fr) 1983-09-14
EP0088220A3 EP0088220A3 (en) 1985-05-15
EP0088220B1 true EP0088220B1 (fr) 1987-06-03

Family

ID=6154317

Family Applications (1)

Application Number Title Priority Date Filing Date
EP83100717A Expired EP0088220B1 (fr) 1982-01-29 1983-01-26 Elément de contact et méthode pour sa fabrication

Country Status (3)

Country Link
EP (1) EP0088220B1 (fr)
JP (1) JPS58133717A (fr)
DE (2) DE3203037C2 (fr)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE3664833D1 (en) * 1985-12-06 1989-09-07 Siemens Ag Contact element for electrical switch contacts
DE3813142A1 (de) * 1988-04-20 1989-11-09 Duerrwaechter E Dr Doduco Bandfoermiges oder plattenfoermiges halbzeug fuer elektrische kontakte
DE19530512C1 (de) * 1995-08-18 1996-10-17 Siemens Ag Elektrisches Schichtkontaktelement, Halbzeug für Schichtkontaktelemente und Verfahren zu seiner Herstellung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1802932B2 (de) * 1968-10-14 1974-11-14 W.C. Heraeus Gmbh, 6450 Hanau Verfahren zur Herstellung eines elektrischen Schaltkontaktes
DE2038929B2 (de) * 1969-08-29 1978-03-16 N.V. Philips' Gloeilampenfabrieken, Eindhoven (Niederlande) Kontakt für eine Schaltvorrichtung der Nachrichtentechnik
DE2442212A1 (de) * 1974-09-04 1976-03-25 Licentia Gmbh Verfahren zur haftfesten galvanischen beschichtung von kontaktwerkstoffen mit rhodium
GB1517702A (en) * 1974-09-19 1978-07-12 Fujitsu Ltd Electrical contact
JPS5913811B2 (ja) * 1976-11-18 1984-04-02 富士通株式会社 スイツチ可動体の製造方法
JPS54129359A (en) * 1978-03-30 1979-10-06 Nippon Electric Co Lead switch

Also Published As

Publication number Publication date
DE3203037A1 (de) 1983-08-18
DE3203037C2 (de) 1984-03-08
DE3371958D1 (en) 1987-07-09
JPS58133717A (ja) 1983-08-09
EP0088220A2 (fr) 1983-09-14
EP0088220A3 (en) 1985-05-15

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