EP0043740B1 - Générateur de plasma - Google Patents

Générateur de plasma Download PDF

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Publication number
EP0043740B1
EP0043740B1 EP81400557A EP81400557A EP0043740B1 EP 0043740 B1 EP0043740 B1 EP 0043740B1 EP 81400557 A EP81400557 A EP 81400557A EP 81400557 A EP81400557 A EP 81400557A EP 0043740 B1 EP0043740 B1 EP 0043740B1
Authority
EP
European Patent Office
Prior art keywords
tube
generator according
sleeve
plasma generator
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
EP81400557A
Other languages
German (de)
English (en)
French (fr)
Other versions
EP0043740A1 (fr
Inventor
Emile Bloyet
Philippe Leprince
Jean Marec
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bpifrance Financement SA
Original Assignee
Agence National de Valorisation de la Recherche ANVAR
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
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Publication of EP0043740A1 publication Critical patent/EP0043740A1/fr
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Publication of EP0043740B1 publication Critical patent/EP0043740B1/fr
Expired legal-status Critical Current

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    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/26Plasma torches
    • H05H1/30Plasma torches using applied electromagnetic fields, e.g. high frequency or microwave energy
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00Generating plasma; Handling plasma
    • H05H1/24Generating plasma
    • H05H1/46Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Definitions

  • the invention relates to a plasma generator, in particular a plasma torch.
  • plasmas are gases ionized at very high temperatures, of the order of several thousand degrees. It has already been proposed to use them in industry to produce torches, in particular in order to carry out surface treatments.
  • a plasma can be obtained by excitation, using an electric field, of a gas in an enclosure, such as the inside of a tube.
  • a plasma torch is thus known in which an electric field is generated by calling upon an inductance surrounding a tube in which a current of a gas to be excited circulates and which is supplied by a high-frequency or ultra-high alternating current. frequency of the order of 20 to 50 MHz.
  • the inductance encloses a tube made of an insulating material such as glass inside which the plasma is formed.
  • the formation of plasma inside the tube limits the use of this torch to the treatment of parts of reduced dimensions which can be introduced inside this tube.
  • the low value of the energy density of the plasma obtained also limits the field of application of this torch.
  • the tube has the disadvantage of being fragile and expensive.
  • Plasmas with a higher energy density can be obtained at the outlet of a metal tube using electric arc torches in which an electric field is generated radially between a central cathode disposed inside the tube and the tube. itself constituting an anode to create an electric arc which is blown by the gas to be ionized towards the exit of the tube.
  • this torch has drawbacks which limit its applications; in particular, the plasma thus produced inevitably contains impurities originating from the electrodes and these impurities may be undesirable for surface treatments.
  • the operating costs of this torch are high because the electrodes deteriorate quickly and the gas flow is important.
  • the plasma generator according to the invention has the advantages of known torches without having the disadvantages.
  • a gas to be excited is circulated in a metal tube, the terminal part of which has an opening allowing the escape of this gas.
  • This tube is supplied with an alternating electric current preferably microwave or microwave of frequency equal to at least 100 MHz by means of an excitation structure allowing the terminal part of this to radiate in electromagnetic form a at least part of the energy transmitted to it.
  • the device according to the invention allows in its application to the plasma torch to combine the advantages of the plasma torches of the prior art without having the disadvantages. This eliminates the need to use a glass tube or other insulating material capable of withstanding high temperatures. It is not essential that the end of the metal tube where the flame occurs is surrounded by the antenna power generator. This flame can then be used like that of a conventional gas combustion torch. Finally, the plasma obtained is of very high purity and its energy density is high.
  • the internal diameter of the metal tube is of the order of 0.5 to 2 mm; the length of the flame is then of the order of a centimeter.
  • This flame therefore has small dimensions and the energy density of the plasma which forms it is of the order of 20 kW per cm 3 , that is to say approximately four times greater than the energy density obtained by the first known plasma torch mentioned above.
  • the efficiency of the device that is to say the ratio between the energy produced by the microwave generator and the energy of the plasma obtained is very close to 100%.
  • a metal ring or washer 4 Around the tube 1, whose internal diameter is between 0.5 and 2 mm, is mounted a metal ring or washer 4 whose thickness, in the axial direction, is of the order of 5 mm and having an internal opening 5 whose diameter is slightly greater than the outside diameter of the tube 1 so that this ring can slide on this tube while maintaining a conductive contact therewith.
  • This ring 4 the periphery of which has an outside diameter of the order of a centimeter, is also slidably mounted inside a metal tube or sleeve 6 coaxial with the tube 1 and constituting the internal wall of a hollow metal ring 7, the external wall of which is constituted by a second cylindrical metallic sleeve 8 of circular section, coaxial with the tube 1.
  • the cavity 7a defined inside the hollow ring 7 is closed at its rear end by a metal plate or flange 9 perpendicular to the axis 1a and connecting the tubes 6 and 8.
  • this plate is slidably mounted around the sleeve 6 and inside the sleeve 8 parallel to the axis 1a as illustrated by the arrow 9a, while keeping conductive contact with the sleeves 6 and 8.
  • the cavity 7 is limited by a second flat metal flange 10 in the form of a crown, also perpendicular to the axis 1a.
  • the flange 10 is connected all along its periphery 108 to the front end of the sleeve 8. It has a central opening 11, of a diameter substantially equal, in this example, to the diameter of the tube or sleeve 6.
  • the flange in crown shape 10 is not connected to the front end 12 of the tube 6, an interval 13 of axial length g, of a few millimeters, for example 1.6 mm, being provided between this end 12 and the edge of the flange 10 around the opening 11.
  • the tube 1 projects beyond the end 12 and passes through the opening 11 and has an end portion 14 protruding outside the ring 7.
  • the front end 3 of the tube is placed at a distance d, for example around 5 mm in front of the plane of the opening 11.
  • the tube or external sleeve 8 has a chimney-shaped opening 15 and closed by an insulating plug 15a allowing passage to the central conductor 16 or core of a coaxial cable 17 including the external conductor or sheath 18 is welded, or otherwise connected, to the tube 8 around the opening 15.
  • the central conductor 16 passes through the internal cavity 7a. of the ring 7. Its end 20 is joined for example by welding to the internal tube 6 in the vicinity, in an axial direction, of the interval 13, that is to say a short distance 1 from the end 12.
  • the end 20 of the conductor 16 instead of being welded to the tube 6 can be welded to a small metal plate (not shown), placed at a small distance opposite, but without contact with the external wall of the tube or sleeve 6 inside the ring 7.
  • the conductors 16 and 18 are connected to the two output terminals of a microwave generator 21.
  • a threaded rod 22 radially crosses the wall of the tube 8 in the vicinity of the plate 9, by means of an internally threaded bush 22a which makes it possible to adjust the penetration depth x, in the radial direction, of this rod 22 to the inside the cavity 7a of the ring 7.
  • This cavity is normally filled with air, as is the interior of the tube or sleeve 6. It could contain another dielectric medium.
  • the coaxial 17 When the coaxial 17 is supplied from the generator 21 with an electrical voltage of a frequency of one or more gigahertz and a current of gas, such as argon, is circulated inside the tube 1, at low flow rate, it is possible to generate, by a very simple priming operation, the formation of a plasma at the outlet of the opening at the end 3 of the tube 1 which is maintained as long as the excitation of the generator 21 is maintained.
  • a very simple priming operation it suffices for an operator to bring a metal part into contact with the end 3 of the tube 1 and withdraw it so that a micro-spark springs up which initiates the formation of the plasma.
  • the hollow annular structure 7 is not a resonant cavity, that is to say capable of operating only at a relatively well determined frequency, but that it performs an impedance matching and allows the energy transfer by coupling in a frequency range which can easily vary by 20% or more around the nominal frequency.
  • a nominal frequency of 2450 MHz such a coupler can operate without difficulty in a range of 2000 to 2800 MHz what a resonant cavity could not do.
  • the overvoltage coefficient which can be measured in the cavity 7a hardly exceeds 4 in the example described. This results in particular from the positioning of the connection point of the coaxial 17 supplying the energy, near the flange 10.
  • the device loses its antenna quality when a plasma is formed at the end 3 of the front part 14 of the tube 1.
  • the creation of a spark in fact causes the release of electrons in the gaseous medium at the outlet of this tube, which are accelerated very strongly by the electric field which prevails at the exit of this tube and cause, by multiple collisions with the molecules of the ambient gas, the formation of additional ions until a state of ionic discharge in equilibrium is established in which the plasma formed absorbs a very large part of the electromagnetic energy coming from the tube 1.
  • This coupler performs an adaptation of the impedance of the plasma generator to the impedance of the coaxial cable 17 for supplying energy.
  • the impedance of the plasma generator varies significantly with that of the plasma itself. The latter depends on a considerable number of factors such as the ionization energy of the gas used, the pressure regime of the latter, etc.
  • this impedance is essentially resistive at high pressure, such as atmospheric pressure, and varies appreciably with the power consumed by this plasma, that is to say in fact with the volume of plasma. It is therefore possible, for each power configuration of the microwave generator 21, to adjust the impedance of the coupler constituted by the hollow ring 7.
  • Another means of adapting the impedance of the hollow ring coupler 7 consists in varying the depth x of penetration of the threaded rod 22. Another means also consists in modifying the position of the plate 9 closing the rear end of the cavity or enclosure delimited between the sleeves 6 and 8, parallel to the arrow 9a.
  • a is the difference between the radius of the tube 8 and that of the tube 6
  • b is the axial length of the ring 7, that is to say the distance separating the plates or flanges 9 and 10
  • X the wavelength of the current produced by the generator 21.
  • the frequency of the current produced by the microwave generator 21 is 2450 MHz
  • the tube 1 has an internal diameter of the order of 0.5 to 2 mm
  • the internal diameter of the tube 6 is of the order of a centimeter
  • the parameters a and b have for a value of 12.5 mm and 20 mm respectively
  • the axial length g of the gap 13 between the crown 10 and the end 12 of the tube 6 is of the order of a few millimeters
  • the length d of the projection 14 of the tube 1 outside the ring 7 is also of the order of a centimeter.
  • the flow rate of the gas leaving the tube 1, which in this example is argon, is between 0.2 and a few liters per minute.
  • Argon is a gas which has a high ionization potential and which is inert even at high temperature with regard to a very large number of surfaces capable of being treated.
  • the power density of the plasma 23 is of the order of 20 KW / cm 3 if the power of the generator 21 is of the order of 200 W.
  • the plasma 23 can be used for its thermal properties as a “micro-torch” in order to carry out surface treatments, welds, etc.
  • the flame 23 can also be used as a torch or light source in a spectroscope to analyze the gas or the mixture of gases introduced into the tube 1. The device then constitutes a torch or “micro-torch”.
  • the internal surface of the latter is covered with a protective layer, for example a layer of alumina. It is sufficient in this case that the external surface of the end portion 14 of the tube is conductive to function as an antenna, the internal coating of the tube with an insulator not opposing the production of plasma.
  • the projection 14 formed by the front of the tube 1 may include a removable tip 3a, the shape of this tip depending, on the one hand, on the desired flow rate, on the other hand, on the use of the device. In other words, the same device can be used for several applications and to excite gases of various natures.
  • This tip can be made, if necessary, of a refractory material.
  • the length of the part 14a of the tube 1 which projects from the external face of the flange 10 is more larger than that of the projecting part 14 in the example of FIG. 1.
  • this part 14a of the tube 1 is surrounded at a distance by another metal tube 30, coaxial with the tube 1 and with a diameter between that of the tube 6 and that of the tube 8.
  • the diameter of the tube 30 can also be less than that of the tube 6.
  • the tube 30 is in conductive contact at its rear end 42 with the front face of the plate or flange 10.
  • the washer 4 does not exist and the sleeve 6 is simply closed at its front part 12a by a partition 25 through which the tube 1 passes.
  • the rear end of the sleeve 6 can advantageously also be closed by a partition 26, also traversed by the tube 1 and which extends at its periphery to be connected with the rear end 109 of the sleeve 8 to close, by a partition 9c, the rear part of the cavity 7a.
  • the position of the rear closure plate of this cavity is not adjustable. It is of course possible to adopt, as for FIG. 1, a plunger such as 22 for carrying out the adaptation of the impedance of the hollow ring 7, as has been explained. It would also be possible, instead of a fixed partition 25, to provide a sliding ring or washer such as 4 in FIG. 1 between the tube 1 and the sleeve 6.
  • the internal face 10a of the plate 10 is covered by an insulating disc 31, for example made of teflon, having a central opening 32 whose diameter is equal to the external diameter of the tube 1, and against the external or front face 10b of the crown 10 inside the tube 30, another insulating disk 33 is applied such as a teflon disk mounted around the tube 1.
  • the annular space 34 delimited by the projection 14a and the tube 30 are thus isolated from the space.
  • annular 7a demounted by the tubes 8 and 6 so that a gas injected by a nozzle 35 in the first annular space 34 cannot enter the second annular space 7a, between the tubes 6 and 8.
  • the injected gas can also be of the argon so as to generate a plasma 23a obtained by the excitation of the argon escaping from a nozzle 3b at the end of the projecting part 14a in an atmosphere of the same gas.
  • the gas introduced into the space 34 may be of a different nature from that of the gas to be excited, the latter naturally being able to be another gas than argon. It is noted that this arrangement thus makes it possible to generate a plasma at a pressure which is not equal - lower or higher - to atmospheric pressure.
  • the gap between the tube 14a and the sleeve 30 could also be filled with a solid dielectric for example.
  • the diameter of the tube 30 is 18 mm
  • the diameter of the tube 6 is of the order of 10 mm
  • the diameter of the tube 8 is 40 mm
  • the axial length of said tube 8 is 32 mm
  • the distance g defining the thickness of the gap 13a between the end 12a of the sleeve 6 and the edges of the opening 11a in the center of the flange 10 is 1.6 mm
  • the distance between this flange 10 and the conductor 16 is 8 mm.
  • the frequency of the generator 21 is 2450 MHz and its power of 2 KW.
  • the internal diameter of the tube 1 is 0.5 mm and its external diameter is 3 mm.
  • the length of the part 14a and of the sleeve 30 can be determined at will. In an embodiment described, it is 80 millimeters.
  • the projecting part 14a of the tube 1 forms the core of a coaxial structure having a sheath formed by the tube 30, this coaxial being supplied from the coaxial 17 via 'a coupling coaxial formed by the structure in the form of a hollow ring 7.
  • the coupling between the coaxial 17 and the coaxial formed by the sleeves 6 and 8 which respectively form the core and the sheath is obtained by direct bonding, for example by welding, as explained in connection with FIG. 1.
  • the coaxial formed by the hollow annular structure 7 allows an impedance adaptation by means which have been explained above.
  • the coupling between this coaxial and the coaxial formed by the tube 14a and the tube 30 is effected by means of the interval 13a, in which there is a very strong electric field by which this energy transfer takes place, and from the central opening 11a in the plate 10 which allows the energy to escape from the interval 13a to propagate along the coaxial 14a, 30.
  • the end free from the tube 14a radiates the energy which reaches it. After ignition, this energy is on the contrary entirely used to ionize the gas of the flame 23a at the outlet of the tube 14a.
  • the impedance matching coaxial formed by the hollow annular structure 7 is coupled via the interval 13 to an excitation coaxial whose core is constituted by the tube 1 and the sheath by the portion of the sleeve 6 surrounding this tube between the washer 4 and the anterior end 12 of this sleeve, the end portion 14 of the tube projecting from this coaxial structure.
  • FIG. 2 shows a borderline case in which the coaxial structure of the radiating part comprising the tube 1 has disappeared.
  • the elements identical to those of FIG. 1 have been designated by the same reference numbers.
  • Such a device which is intended for an application in which an adjustment of the rendering ment of the plasma flame as a function of the power emitted is not necessary, the gas to be excited being argon, differs from that of FIG. 1 only by the following arrangements: instead of having a sliding ring to establish the conductive connection between the sleeve 6 and the tube 1, this sleeve 6 is closed at its anterior end 12b by a partition 25b traversed by the tube 1. This partition is located at a distance g from the edges of the central opening 11 formed in the flange 10, this distance representing the thickness of the coupling gap 13b between the hollow annular structure 7 and the tube 1. At the rear, the sleeve 6 is closed by a partition 9b through which the tube 1 passes and which also closes the rear part of the annular cavity 7a delimited between the sleeves 6 and 8.
  • the tube 1 has a projection 14b which, after having passed through the opening 11, projects at the front of the flange 10 over a distance which is determined according to the operating conditions of the device (nature of the gas flow rate, transmitted power, operating frequency) and is 5 mm in this example to obtain a plasma flame at the end 3c of the tube 1 through which the gas escapes.
  • This structure constitutes a borderline case of the structure exposed in connection with FIGS. 1 and 3 in which the energy transmitted in the coupling interval 13b does not propagate along a coaxial structure but is directly transmitted to the radiating part 14b of the tube.
  • the conductor 16 is at a distance of 1.6 mm from the crown 10.
  • this plasma is obtained under very good conditions even at high pressures, such as atmospheric pressure, unlike the results obtained with certain prior plasma generators.
  • This pressure can moreover be adjusted to a certain extent by external tube devices 30 with gas supply 35 as described with reference to FIG. 3.
  • This application to high pressures is not limiting. Thanks to an arrangement of the coaxial type (14a, 30) as shown in FIG. 3, it is possible to cause the plasma to form at a certain distance from the exciter part of the latter comprising the generator 21 and the coupling device 7.
  • the transverse dimension of the tube 1 is much smaller than that of the sleeves 6 and 30, a ratio of 1 to 10 being common, on the one hand, because the formation of a plasma at high pressure takes place more easily at the outlet of a small opening and on the other hand, because it has been found that a sleeve diameter 6 and 30 larger than that of the tube 1 is generally necessary to achieve a suitable adaptation of the device impedance.
  • the central opening 11 a in the front flange 10 must be dimensioned sufficiently wide to allow the energy concentrated in the interval 13, 13a, or 13b by the intense electric field which prevails there to escape therefrom. in order to be transferred to the front part of the tube.
  • the plasma generator can, whatever its embodiment, be used not only for the thermal and optical properties of the flame but also for the mechanical properties of the plasma. Indeed, the gas leaving the tube 1 at high temperature produces a force; this can be used for example for the stabilization of artificial satellites.
  • This generator can also be used to constitute an ion source having a precise reference of potential constituted by the metal tube 1.
  • An ion source in fact, implies that the ions generated in a plasma can be accelerated to escape from this last. This acceleration is generally obtained by subjecting these ions to a continuous electric field between two electrodes.
  • the ions produced are at the potential of the metal tube itself and it is easy to accelerate them by placing a second electrode at a suitable potential at a sufficient distance from the plasma. .

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Electromagnetism (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Plasma Technology (AREA)
EP81400557A 1980-04-10 1981-04-07 Générateur de plasma Expired EP0043740B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR8008073A FR2480552A1 (fr) 1980-04-10 1980-04-10 Generateur de plasmaŸ
FR8008073 1980-04-10

Publications (2)

Publication Number Publication Date
EP0043740A1 EP0043740A1 (fr) 1982-01-13
EP0043740B1 true EP0043740B1 (fr) 1984-03-21

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EP81400557A Expired EP0043740B1 (fr) 1980-04-10 1981-04-07 Générateur de plasma

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US (2) US4473736A (enrdf_load_stackoverflow)
EP (1) EP0043740B1 (enrdf_load_stackoverflow)
JP (1) JPS575299A (enrdf_load_stackoverflow)
CA (1) CA1177543A (enrdf_load_stackoverflow)
DE (1) DE3162741D1 (enrdf_load_stackoverflow)
FR (1) FR2480552A1 (enrdf_load_stackoverflow)

Families Citing this family (66)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2533397A2 (fr) * 1982-09-16 1984-03-23 Anvar Perfectionnements aux torches a plasma
US4965540A (en) * 1987-12-23 1990-10-23 Hewlett-Packard Company Microwave resonant cavity
JP2805009B2 (ja) * 1988-05-11 1998-09-30 株式会社日立製作所 プラズマ発生装置及びプラズマ元素分析装置
GB8821671D0 (en) * 1988-09-02 1988-10-19 Emi Plc Thorn Discharge tube arrangement
GB8821672D0 (en) * 1988-09-02 1988-10-19 Emi Plc Thorn Discharge tube arrangement
GB8821673D0 (en) * 1988-09-02 1988-10-19 Emi Plc Thorn Discharge tube arrangement
US5083004A (en) * 1989-05-09 1992-01-21 Varian Associates, Inc. Spectroscopic plasma torch for microwave induced plasmas
US4968142A (en) * 1989-06-02 1990-11-06 The United States Of America As Represented By The United States Department Of Energy Closed inductively coupled plasma cell
US5227695A (en) * 1989-06-05 1993-07-13 Centre National De La Recherche Scientifique Device for coupling microwave energy with an exciter and for distributing it therealong for the purpose of producing a plasma
US5051557A (en) * 1989-06-07 1991-09-24 The United States Of America As Represented By The Secretary Of The Department Of Health And Human Services Microwave induced plasma torch with tantalum injector probe
US5081397A (en) * 1989-07-11 1992-01-14 University Of British Columbia Atmospheric pressure capacitively coupled plasma atomizer for atomic absorption and source for atomic emission spectroscopy
NL8901806A (nl) * 1989-07-13 1991-02-01 Philips Nv Vermogensgenerator voor het leveren van een hoogfrequente hoogspanning.
JP2922223B2 (ja) * 1989-09-08 1999-07-19 株式会社日立製作所 マイクロ波プラズマ発生装置
GB9025695D0 (en) * 1990-11-27 1991-01-09 Welding Inst Gas plasma generating system
US5273587A (en) * 1992-09-04 1993-12-28 United Solar Systems Corporation Igniter for microwave energized plasma processing apparatus
US5565118A (en) * 1994-04-04 1996-10-15 Asquith; Joseph G. Self starting plasma plume igniter for aircraft jet engine
US5617717A (en) * 1994-04-04 1997-04-08 Aero-Plasma, Inc. Flame stabilization system for aircraft jet engine augmentor using plasma plume ignitors
AU2003195A (en) * 1994-06-21 1996-01-04 Boc Group, Inc., The Improved power distribution for multiple electrode plasma systems using quarter wavelength transmission lines
GB9414561D0 (en) * 1994-07-19 1994-09-07 Ea Tech Ltd Method of and apparatus for microwave-plasma production
TW285746B (enrdf_load_stackoverflow) * 1994-10-26 1996-09-11 Matsushita Electric Ind Co Ltd
US5793013A (en) * 1995-06-07 1998-08-11 Physical Sciences, Inc. Microwave-driven plasma spraying apparatus and method for spraying
US5963169A (en) * 1997-09-29 1999-10-05 The United States Of America As Represented By The Secretary Of The Navy Multiple tube plasma antenna
DE19814812C2 (de) 1998-04-02 2000-05-11 Mut Mikrowellen Umwelt Technol Plasmabrenner mit einem Mikrowellensender
RU2157061C1 (ru) * 1999-03-23 2000-09-27 Институт проблем технологии микроэлектроники и особочистых материалов РАН Устройство для свч-плазменной обработки материалов
FR2797372B1 (fr) * 1999-08-04 2002-10-25 Metal Process Procede de production de plasmas elementaires en vue de creer un plasma uniforme pour une surface d'utilisation et dispositif de production d'un tel plasma
US6369763B1 (en) 2000-04-05 2002-04-09 Asi Technology Corporation Reconfigurable plasma antenna
US6624719B1 (en) 2000-04-05 2003-09-23 Asi Technology Corporation Reconfigurable electromagnetic waveguide
US6812895B2 (en) 2000-04-05 2004-11-02 Markland Technologies, Inc. Reconfigurable electromagnetic plasma waveguide used as a phase shifter and a horn antenna
US7053576B2 (en) * 2001-07-19 2006-05-30 Correa Paulo N Energy conversion systems
DE10215660B4 (de) * 2002-04-09 2008-01-17 Eads Space Transportation Gmbh Hochfrequenz-Elektronenquelle, insbesondere Neutralisator
US7638727B2 (en) 2002-05-08 2009-12-29 Btu International Inc. Plasma-assisted heat treatment
US7494904B2 (en) 2002-05-08 2009-02-24 Btu International, Inc. Plasma-assisted doping
AU2003267863A1 (en) 2002-05-08 2003-11-11 Dana Corporation Plasma-assisted sintering
US7498066B2 (en) 2002-05-08 2009-03-03 Btu International Inc. Plasma-assisted enhanced coating
US7432470B2 (en) 2002-05-08 2008-10-07 Btu International, Inc. Surface cleaning and sterilization
US7497922B2 (en) 2002-05-08 2009-03-03 Btu International, Inc. Plasma-assisted gas production
US7560657B2 (en) 2002-05-08 2009-07-14 Btu International Inc. Plasma-assisted processing in a manufacturing line
US7445817B2 (en) 2002-05-08 2008-11-04 Btu International Inc. Plasma-assisted formation of carbon structures
US7465362B2 (en) 2002-05-08 2008-12-16 Btu International, Inc. Plasma-assisted nitrogen surface-treatment
US6876330B2 (en) * 2002-07-17 2005-04-05 Markland Technologies, Inc. Reconfigurable antennas
US6710746B1 (en) 2002-09-30 2004-03-23 Markland Technologies, Inc. Antenna having reconfigurable length
US7189940B2 (en) 2002-12-04 2007-03-13 Btu International Inc. Plasma-assisted melting
US7164095B2 (en) * 2004-07-07 2007-01-16 Noritsu Koki Co., Ltd. Microwave plasma nozzle with enhanced plume stability and heating efficiency
WO2006137832A2 (en) * 2004-09-01 2006-12-28 Amarante Technologies, Inc. Portable microwave plasma systems including a supply line for gas and microwaves
US7189939B2 (en) * 2004-09-01 2007-03-13 Noritsu Koki Co., Ltd. Portable microwave plasma discharge unit
US7271363B2 (en) * 2004-09-01 2007-09-18 Noritsu Koki Co., Ltd. Portable microwave plasma systems including a supply line for gas and microwaves
US20080093358A1 (en) * 2004-09-01 2008-04-24 Amarante Technologies, Inc. Portable Microwave Plasma Discharge Unit
US20060052883A1 (en) * 2004-09-08 2006-03-09 Lee Sang H System and method for optimizing data acquisition of plasma using a feedback control module
KR100689037B1 (ko) * 2005-08-24 2007-03-08 삼성전자주식회사 마이크로파 공명 플라즈마 발생장치 및 그것을 구비하는플라즈마 처리 시스템
US9681529B1 (en) * 2006-01-06 2017-06-13 The United States Of America As Represented By The Secretary Of The Air Force Microwave adapting plasma torch module
US7619178B2 (en) * 2006-02-06 2009-11-17 Peschel William P Directly connected magnetron powered self starting plasma plume igniter
TW200742506A (en) * 2006-02-17 2007-11-01 Noritsu Koki Co Ltd Plasma generation apparatus and work process apparatus
JP5230976B2 (ja) * 2007-07-27 2013-07-10 株式会社プラズマアプリケーションズ 大気中マイクロ波プラズマニードル発生装置
US20100074810A1 (en) * 2008-09-23 2010-03-25 Sang Hun Lee Plasma generating system having tunable plasma nozzle
JP5586137B2 (ja) * 2008-09-30 2014-09-10 長野日本無線株式会社 プラズマ処理装置
US7921804B2 (en) * 2008-12-08 2011-04-12 Amarante Technologies, Inc. Plasma generating nozzle having impedance control mechanism
US20100201272A1 (en) * 2009-02-09 2010-08-12 Sang Hun Lee Plasma generating system having nozzle with electrical biasing
US20100254853A1 (en) * 2009-04-06 2010-10-07 Sang Hun Lee Method of sterilization using plasma generated sterilant gas
FR2952786B1 (fr) * 2009-11-17 2012-06-08 Centre Nat Rech Scient Torche a plasma et procede de stabilisation d'une torche a plasma
JP5868137B2 (ja) * 2011-11-18 2016-02-24 住友理工株式会社 マイクロ波プラズマ処理装置
US10477665B2 (en) * 2012-04-13 2019-11-12 Amastan Technologies Inc. Microwave plasma torch generating laminar flow for materials processing
US9259798B2 (en) * 2012-07-13 2016-02-16 Perkinelmer Health Sciences, Inc. Torches and methods of using them
JP6323849B2 (ja) 2012-08-28 2018-05-16 アジレント・テクノロジーズ・インクAgilent Technologies, Inc. 電磁導波路およびプラズマ源を含む機器、プラズマ生成方法
JP5475902B2 (ja) * 2013-03-21 2014-04-16 株式会社プラズマアプリケーションズ 大気中マイクロ波プラズマニードル発生装置
KR102376982B1 (ko) * 2015-04-14 2022-03-21 삼성전자주식회사 세라믹을 이용하여 파티클 저감 효과를 가지는 원격 플라즈마 발생장치
FR3062770B1 (fr) * 2017-02-06 2019-03-29 Polygon Physics Source de plasma

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US29304A (en) * 1860-07-24 Compensating lever-sprincr
NL264188A (enrdf_load_stackoverflow) * 1960-04-29
US3242798A (en) * 1962-01-13 1966-03-29 Hitachi Ltd Plasma light source for spectroscopic analysis
USRE29304E (en) 1963-10-21 1977-07-12 Raydne Limited Plasma light source for spectroscopic investigation
US3903891A (en) * 1968-01-12 1975-09-09 Hogle Kearns Int Method and apparatus for generating plasma
US3588594A (en) * 1968-01-19 1971-06-28 Hitachi Ltd Device for bending a plasma flame
FR2074715A7 (enrdf_load_stackoverflow) * 1970-01-19 1971-10-08 Dupret Christian
US3757518A (en) * 1970-11-03 1973-09-11 Messerschmitt Boelkow Blohm Ion engine
LU65047A1 (enrdf_load_stackoverflow) * 1972-03-27 1973-10-03
GB1356769A (en) * 1973-03-27 1974-06-12 Cit Alcatel Apparatus and method for depositing thin layers on a substrate
FR2290126A1 (fr) * 1974-10-31 1976-05-28 Anvar Perfectionnements apportes aux dispositifs d'excitation, par des ondes hf, d'une colonne de gaz enfermee dans une enveloppe
FR2346939A2 (fr) * 1975-10-31 1977-10-28 Anvar Perfectionnements aux dispositifs d'excitation, par des ondes hyperfrequences, d'une colonne de gaz dans une enveloppe allongee
JPS5939178B2 (ja) * 1977-04-25 1984-09-21 株式会社東芝 活性化ガス発生装置
US4230448A (en) * 1979-05-14 1980-10-28 Combustion Electromagnetics, Inc. Burner combustion improvements

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US4473736A (en) 1984-09-25
EP0043740A1 (fr) 1982-01-13
US4609808A (en) 1986-09-02
FR2480552B1 (enrdf_load_stackoverflow) 1983-09-30
JPH0219600B2 (enrdf_load_stackoverflow) 1990-05-02
FR2480552A1 (fr) 1981-10-16
DE3162741D1 (en) 1984-04-26
JPS575299A (en) 1982-01-12
CA1177543A (fr) 1984-11-06

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