EP0874537B1 - Dispositif d'excitation d'un gaz par plasma d'onde de surface et installation de traitement de gaz incorporant un tel dispositif - Google Patents
Dispositif d'excitation d'un gaz par plasma d'onde de surface et installation de traitement de gaz incorporant un tel dispositif Download PDFInfo
- Publication number
- EP0874537B1 EP0874537B1 EP98400974A EP98400974A EP0874537B1 EP 0874537 B1 EP0874537 B1 EP 0874537B1 EP 98400974 A EP98400974 A EP 98400974A EP 98400974 A EP98400974 A EP 98400974A EP 0874537 B1 EP0874537 B1 EP 0874537B1
- Authority
- EP
- European Patent Office
- Prior art keywords
- gas
- tube
- sleeve
- plasma
- hollow
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Definitions
- the present invention relates to a device excitation of a gas, of the surfaguide type, in which the gas is excited by a surface wave plasma, especially at atmospheric pressure.
- the invention also relates to an installation for treating a gas incorporating such a device excitation.
- a particularly interesting example of application of these types of devices is the plasma treatment of a chemically non-reactive gas containing impurities consisting of perfluorinated greenhouse gas compounds or volatile organic compounds.
- the gas to be treated and the impurities it contains are placed in an electric field sufficiently intense to achieve an electric discharge by ionization gas molecules, caused by the wrenching of electrons initially neutral gas molecules.
- the molecules of the gas are dissociated to form plus size radicals smaller than the original molecules and, therefore, the case where appropriate, individual atoms, these atoms or fragments of molecules thus excited giving rise to substantially no chemical reaction.
- the atoms or gas molecules de-energize and recombine respectively, to be left intact on exit.
- the impurities undergo by excitation irreversible dissociation and transformation by formation of new molecular fragments having chemical properties different from those of molecules initials, which are therefore likely to be extracted from the gas by appropriate further treatment.
- a guide surfatron has a hollow structure in electrically conductive material comprising a first part closed by a movable piston in waveguide forming short circuit and a second part extending perpendicularly to the first part and in which rose coaxially a tube of dielectric material in which circulates the gas to be treated.
- the second part is provided with a tuning piston axially displaceable to adapt the impedance of the device.
- This type of electromagnetic field applicator gives satisfaction for creating a surface wave plasma at atmospheric pressure.
- This type of excitation device includes a hollow structure forming waveguides, of material electrically conductive, intended to be connected to a microwave generator provided with a passage intended to be crossed by a hollow discharge tube of dielectric material in which circulates said gas to be excited and an area of wave concentration suitable for concentrating radiation microwave produced by the generator towards said tube, during operation of the device, with a view to producing a plasma surface wave in said gas.
- the surfaguide does not have a tuning piston and is therefore less expensive than the guide-surfatron.
- the length of the plasma created by the surfaguide is, at power equal, a little higher than that of the plasma created by the surfatron guide.
- the density of the plasma column produced by the guide surfatron is locally higher than for the surfaguide.
- the surfaguide is less effective than the guide-surfatron, when using discharge tubes with a diameter greater than 20 mm at the frequency of 2.45 GHz.
- the object of the invention is to overcome the drawbacks state of the art devices and provide a device for excitation of a less expensive gas than the surfatron-guide, and able to work also under pressure atmospheric.
- an excitation device of a gas of the surfaguide type comprising a hollow structure forming waveguide, of electrically conductive material, intended to be connected to a microwave generator and provided with a passage intended to be crossed by a hollow tube dielectric in which circulates said gas to be excited and of a wave concentration zone adapted to concentrate the microwave radiation produced by the generator towards said tube, during the operation of said device, with a view to producing a surface wave plasma in said gas, characterized in that it further comprises at least one sleeve of conductive material of integral electromagnetic shielding of said structure and extending in the extension of said passage so as to surround said hollow tube said at least one sleeve having a length at least equal to the length of the plasma created in the gas.
- the invention also relates to an installation for treatment of a gas, comprising a device for exciting the gas connected to a microwave generator and crossed by a hollow dielectric tube in which the gas to be excited circulates, the device comprising means for concentrating the microwave radiation produced by the generator towards the tube dielectric, so as to produce a plasma in the gas atmospheric ionization and excitation of molecules of the gas to be treated for the formation of gaseous compounds reagents, the installation further comprising at least one reactive compound processing unit arranged at the outlet of the dielectric hollow tube, characterized in that the gas excitation device consists of a device excitation as defined above.
- Figure 1 there is shown a schematic view in perspective of a classic type surfaguide, designated by the general reference 10.
- the surfaguide 10 mainly consists of a hollow structure 12 made of electrically material conductor, provided with a first end 14 intended to be connected to a microwave generator (not shown) and of an opposite open end 16 intended to be closed by a plate arranged transversely to the axis longitudinal of the structure 12 and constituting a short circuit.
- the short circuit plate has not been represented.
- the wall of the middle part of the structure 12 is provided with transverse holes 18 for the passage of a tube to discharge 20 of dielectric material in which a gas column.
- the microwave radiation produced by the microwave generator is guided by the structure 12 which concentrates the incident radiation towards the tube 20 of so as to spread in it and in the mixture ionized gas it contains an electromagnetic wave progressive surface including the associated electric field generates and maintains the discharge in the gas column.
- this guy exciter can be used in the field of processing by plasma of gaseous effluents of various types with a view to their purification or destruction of perfluorocarbon compounds or volatile organic compounds in a mixture gas, by excitation of the gas mixture and treatment later adapted to react chemical species excited by the action of plasma with a reactive compound corresponding so as to remove them from the gas or mixture gaseous incident.
- FIGS. 4 and 5 show a device gas exciter which overcomes these drawbacks.
- the exciter designated by the reference numeral 22
- the exciter has a hollow structure 24 of longitudinal shape and made of electrically material conductor suitable for the intended use, in particular a metal.
- the hollow structure 24 preferably has a section transverse parallelepiped and has two ends open, respectively 26 and 28 intended one to be connected to a microwave generator and the other to suitable means for forming a short circuit, preferably a conductive plate arranged transversely and adjustable longitudinally.
- the structure 24 includes a zone 30 of narrowed section having a middle portion 32 of constant cross section extending between two parts 34 and 36 of section linearly increasing towards the end zones 26 and 28.
- the constituent walls of the middle part 32 are equipped each of an orifice, such as 38, these orifices forming a passage for a tube 40 of dielectric material, such as silica, fictitiously truncated in Figure 4 in which circulates a column of gas to be excited.
- a tube 40 of dielectric material such as silica, fictitiously truncated in Figure 4 in which circulates a column of gas to be excited.
- a sleeve, 42 and 44 of material is mounted electrically conductive, preferably identical to the material constituting the structure 24.
- the sleeves are of preferably cylindrical and placed coaxially on the way formed by the orifices 38.
- these sleeves 42 and 44 must be made of an electrically conductive material. It is necessary furthermore that the contact of these sleeves with the structure 24 is electrically excellent. Indeed, for waves electromagnetic with a frequency of 2.45 GHz, all discontinuity in electrical conduction would be likely to offer an escape route to the outside of the radiation produced by the generator, even with mechanical adjustment very tight.
- the structure 24 and the sleeves 42 and 44 are preferably made of brass so as to avoid creation in the fixing area of these parts of a layer insulating oxide.
- the free ends of the sleeves 42 and 44 are each equipped with a flange, such as 50, fixed by screwed onto them and provided with an orifice, such as 52, for the passage of the dielectric tube 40.
- the flanges 50 can be made of material electrically conductive, made of insulating material or possibly be removed depending on the length of the sleeves.
- each sleeve is provided with orifices 54 allowing the visualization of the plasma in the gas column during operation of the device.
- the waveguide 24 guides the incident microwave radiation from the generator towards the narrowed section area 30, which constitutes an area of concentration of microwaves, and in particular towards the tube dielectric 40.
- the zone 30 of narrowed section concentrates the incident radiation towards the middle part 32 in order to make propagate in tube 40 and in the gas column that it contains a progressive electromagnetic surface wave whose associated electric field generates and maintains a plasma in the gas column in sight, as is conventional, to excite and ionize gaseous particles.
- the transition between the two end zones and the middle part 32 takes place substantially gradually, using a length of transition zone approximately equal to a multiple of half the wavelength ⁇ g / 2 of propagation in the waveguide 24.
- each sleeves must be chosen large enough not to disrupt the propagation of the surface wave creating the dump.
- the minimum diameter depends on the power microwave that we want to inject into the plasma, i.e. operating conditions of the device.
- the minimum diameter of the sleeve is chosen equal to twice that of tube 40.
- the structure of the electromagnetic field may lose its character progressive surface wave and cavity type couplings resonant manifest themselves, which will make the diet of unstable discharge operation by energy exchange between the cavity modes and that of the surface wave.
- a compromise between these two considerations is to choose a diameter between three to four times the diameter of the tube 40, for example a diameter included between 60 and 80 mm, for an incident frequency of 2.45 GHz.
- the length of the sleeves is chosen at least equal to the length of the plasma, so that it is fully understood within sleeves.
- the flanges 50 are preferably made of electrically conductive material so as to prevent the radiation from escaping towards outside.
- these flanges 50 are not necessarily made in conductive material, since the intensity of the microwave field is weak in this region beyond the plasma limit.
- the intensity of the radiation is substantially zero at the end edge of the sleeves 42 and 44.
- the flanges 50 can be removed.
- the surfaguide device that comes to be described is of a very simple structure. It has a only impedance matching means, connected to one of the ends of the waveguide structure 24, opposite to the arrival of microwaves from the generator then that the guide surfatron has an intrinsic means additional adaptation. It can however be advantageous to add on the waveguide, on the arrival side of microwave power, three impedance adapter screw plungers in the long side of the guide, of known type.
- the installation shown in this figure is for example intended for the destruction of C 2 F 6 in a gas mixture consisting, for example, of C 2 F 6 , O 2 and Ar introduced into the discharge tube 40, by one of its ends, as represented by the arrow F.
- the surfaguide 22 identical to the exciter shown in FIGS. 4 and 5, is connected, by one of its ends 26, to a generator microwave 56, the other end 28 being equipped with a conductive plate 58 forming a short circuit arranged transversely and longitudinally adjustable.
- the discharge tube 40 opens into a pipe 60, via a cooling cartridge 62, consisting for example of a heat exchanger equipped with a coil, in which the gas to be treated circulates, enclosed in an enclosure inside which is established a water circulation.
- a cooling cartridge 62 consisting for example of a heat exchanger equipped with a coil, in which the gas to be treated circulates, enclosed in an enclosure inside which is established a water circulation.
- Line 60 routes the excited gas under the action of the plasma 64 towards a processing unit 66, consisting of a cartridge comprising an element suitable for react with excited chemical species to be destroyed, for example an alkaline element such as lime soda or an alkaline aqueous solution and then to a unit of dehydration 68.
- a processing unit 66 consisting of a cartridge comprising an element suitable for react with excited chemical species to be destroyed, for example an alkaline element such as lime soda or an alkaline aqueous solution and then to a unit of dehydration 68.
- the line 60 has two bypass assemblies 70 and 72 controlled by corresponding valves, such as 74 and 76, and on which come tightly mount sampling cells 78 and 80 capable of analyzing the gas by Fourrier transform infrared spectrometry.
- This installation provides a rate of destruction, at the outlet of the dehydration unit 68 comparable to that obtained using a guide surfatron.
- the diameter of the passage 38 is greater than the external diameter of the tube 40.
- the diameter of the passage is preferably chosen between 20 and 22 mm, so as to arrange a interstice between the wall constituting the middle part 32 and tube 40.
- the sleeves have a cylindrical shape.
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Physical Or Chemical Processes And Apparatus (AREA)
- Plasma Technology (AREA)
Description
- ladite structure creuse formant guide d'ondes a une forme générale longitudinale et comporte une première extrémité ouverte destinée à être raccordée audit générateur de micro-ondes, une deuxième extrémité ouverte destinée à être munie de moyens formant court-circuit en guide et une zone de section rétrécie s'étendant entre lesdites première et deuxième extrémités et délimitant ladite zone de concentration des ondes ;
- ladite zone de section rétrécie comporte une partie médiane de section constante équipée dudit passage et s'étendant entre deux parties de section linéairement croissante en direction desdites extrémités ;
- ledit au moins un manchon a une longueur au moins égale à la longueur du plasma créé dans le gaz ;
- l'extrémité libre de chaque manchon porte un flasque équipé d'un trou pour le passage dudit tube diélectrique ;
- ledit au moins un manchon a une longueur égale à la somme de la longueur du plasma et de la longueur d'onde dudit rayonnement micro-onde dans le vide ;
- la paroi dudit au moins un manchon est munie d'au moins un orifice de visualisation du plasma dont les dimensions sont adaptées pour éviter le passage du rayonnement;
- ledit au moins un manchon a une forme générale cylindrique de section au moins égale au double de la section du tube creux ;
- il comporte deux manchons s'étendant dans le prolongement l'un de l'autre, de part et d'autre de la partie médiane ;
- chaque manchon comporte une platine d'extrémité s'étendant chacune latéralement au-delà de la partie médiane en vue de la fixation desdits manchons sur ladite structure, par vissage des platines l'une sur l'autre ; et
- le diamètre du passage est supérieur au diamètre externe du tube creux.
- la figure 1 est une vue schématique en perspective d'un surfaguide de type classique ;
- les figures 2 et 3 sont des tableaux montrant les efficacités respectives du surfaguide de la figure 1 et d'un surfatron-guide ;
- la figure 4 est une vue schématique latérale du dispositif d'excitation selon l'invention ;
- la figure 5 est une vue de dessus du dispositif de la figure 4 ;
- la figure 6 est une vue schématique d'une installation de traitement d'un gaz utilisant le dispositif d'excitation des figures 4 et 5 ; et
- la figure 7 est un tableau montrant les efficacités respectives du dispositif excitateur selon l'invention et du surfaguide de la figure 1.
Claims (11)
- Dispositif d'excitation d'un gaz, du type surfaguide, comprenant une structure creuse (24) formant guide d'ondes, en matériau électriquement conducteur, destinée à être raccordée à un générateur de micro-ondes et munie d'un passage (38) destiné à être traversé par un tube creux (40) diélectrique dans lequel circule ledit gaz à exciter et d'une zone (30) de concentration d'ondes adaptée pour concentrer le rayonnement micro-ondes produit par le générateur vers ledit tube (40), lors du fonctionnement dudit dispositif, en vue de produire un plasma d'onde de surface dans ledit gaz, caractérisé en ce qu'il comporte en outre au moins un manchon (42, 44) en matériau conducteur de blindage électromagnétique solidaire de ladite structure (24) et s'étendant dans le prolongement dudit passage (38) de manière à entourer ledit tube creux (40), ledit au moins un manchon (42, 44) ayant une longueur au moins égale à la longueur du plasma créé dans le gaz.
- Dispositif selon la revendication 1, caractérisé en ce que ladite structure creuse (24) formant guide d'ondes a une forme générale longitudinale et comporte une première extrémité ouverte (26) destinée à être raccordée audit générateur de micro-ondes, une extrémité opposée (28) ouverte destinée à être munie de moyens formant court-circuit, et une zone de section rétrécie (30) s'étendant entre lesdites première (26) et deuxième (28) extrémités et délimitant ladite zone de concentration des ondes.
- Dispositif selon la revendication 2, caractérisé en ce que ladite zone (30) et de section rétrécie comporte une partie médiane (32) de section constante équipée dudit passage (38) s'étendant entre deux parties (34, 36) de section linéairement croissante en direction desdites extrémités (26, 28).
- Dispositif selon l'une des revendications 1 à 3, caractérisé en ce que l'extrémité libre de chaque manchon (42, 44) porte un flasque (50) équipé d'un trou (52) pour le passage dudit tube diélectrique (40).
- Dispositif selon l'une des revendications 1 à 4, caractérisé en ce que ledit au moins un manchon (42, 44) a une longueur égale à la somme de la longueur du plasma et de la longueur d'onde dudit rayonnement micro-onde dans le vide.
- Dispositif selon l'une quelconque des revendications 1 à 5, caractérisé en ce que la paroi dudit au moins un manchon est munie d'au moins un orifice (54) de visualisation du plasma dont les dimensions sont adaptées pour éviter le passage du rayonnement.
- Dispositif selon l'une quelconque des revendications 1 à 6, caractérisé en ce que ledit au moins un manchon (42, 44) a une forme générale cylindrique de section au moins égale au double de la section du tube creux (40).
- Dispositif selon l'une quelconque des revendications 3 à 7, caractérisé en ce qu'il comporte deux manchons (42, 44) s'étendant dans le prolongement l'un de l'autre, de part et d'autre de la partie médiane (32).
- Dispositif selon la revendication 8, caractérisé en ce que chaque manchon comporte une platine d'extrémité (46) s'étendant chacune latéralement au-delà de la partie médiane en vue de la fixation desdits manchons (42, 44) sur ladite structure (24), par vissage des platines (46) l'une sur l'autre.
- Dispositif selon l'une quelconque des revendications 1 à 9, caractérisé en ce que le diamètre du passage (38) est supérieur au diamètre externe du tube creux (40).
- Installation de traitement d'un gaz, comprenant un dispositif (22) d'excitation du gaz raccordé à un générateur de micro-ondes (56) et traversé par un tube creux diélectrique (40) dans lequel circule le gaz à exciter, le dispositif (22) comprenant des moyens (30) pour concentrer le rayonnement micro-onde produit par le générateur vers le tube diélectrique (40), de manière à produire dans le gaz un plasma atmosphérique d'ionisation et d'excitation des molécules du gaz à traiter en vue de la formation de composés gazeux réactifs, l'installation comportant en outre au moins une unité de traitement (66, 68) des composés réactifs disposés en sortie du tube creux diélectrique (40), caractérisée en ce que le dispositif d'excitation du gaz est constitué par un dispositif d'excitation selon l'une quelconque des revendications 1 à 10.
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR9705147 | 1997-04-25 | ||
FR9705147A FR2762748B1 (fr) | 1997-04-25 | 1997-04-25 | Dispositif d'excitation d'un gaz par plasma d'onde de surface |
Publications (2)
Publication Number | Publication Date |
---|---|
EP0874537A1 EP0874537A1 (fr) | 1998-10-28 |
EP0874537B1 true EP0874537B1 (fr) | 2003-12-17 |
Family
ID=9506321
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EP98400974A Expired - Lifetime EP0874537B1 (fr) | 1997-04-25 | 1998-04-21 | Dispositif d'excitation d'un gaz par plasma d'onde de surface et installation de traitement de gaz incorporant un tel dispositif |
Country Status (8)
Country | Link |
---|---|
US (1) | US6224836B1 (fr) |
EP (1) | EP0874537B1 (fr) |
JP (1) | JPH1157460A (fr) |
CA (1) | CA2235648A1 (fr) |
DE (1) | DE69820518T2 (fr) |
FR (1) | FR2762748B1 (fr) |
TW (1) | TW413731B (fr) |
ZA (1) | ZA983172B (fr) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2787677B1 (fr) | 1998-12-22 | 2001-01-19 | Air Liquide | Element de canalisation pour dispositif de traitement de gaz et dispositif incorporant un tel element de canalisation |
DE19943953A1 (de) * | 1999-09-14 | 2001-04-12 | Bosch Gmbh Robert | Vorrichtung und Verfahren zur Erzeugung eines lokalen Plasmas durch Mikrostrukturelektrodenentladungen mit Mikrowellen |
AUPQ861500A0 (en) * | 2000-07-06 | 2000-08-03 | Varian Australia Pty Ltd | Plasma source for spectrometry |
FR2815888B1 (fr) * | 2000-10-27 | 2003-05-30 | Air Liquide | Dispositif de traitement de gaz par plasma |
FR2825295B1 (fr) * | 2001-05-31 | 2004-05-28 | Air Liquide | Application des plasmas denses crees a pression atmospherique au traitement d'effluents gazeux |
DE10143375C1 (de) * | 2001-09-05 | 2002-11-07 | Deutsch Zentr Luft & Raumfahrt | Pyrolysevorrichtung und Pyrolyseverfahren |
US7638727B2 (en) * | 2002-05-08 | 2009-12-29 | Btu International Inc. | Plasma-assisted heat treatment |
US7504061B2 (en) * | 2002-05-08 | 2009-03-17 | Leonhard Kurz Gmbh & Co., Kg | Method of decorating large plastic 3D objects |
US20050233091A1 (en) * | 2002-05-08 | 2005-10-20 | Devendra Kumar | Plasma-assisted coating |
US7497922B2 (en) * | 2002-05-08 | 2009-03-03 | Btu International, Inc. | Plasma-assisted gas production |
US7445817B2 (en) * | 2002-05-08 | 2008-11-04 | Btu International Inc. | Plasma-assisted formation of carbon structures |
CN100436763C (zh) * | 2002-05-08 | 2008-11-26 | Btu国际公司 | 等离子体辅助发动机排气处理 |
US20060237398A1 (en) * | 2002-05-08 | 2006-10-26 | Dougherty Mike L Sr | Plasma-assisted processing in a manufacturing line |
US20060228497A1 (en) * | 2002-05-08 | 2006-10-12 | Satyendra Kumar | Plasma-assisted coating |
US20060233682A1 (en) * | 2002-05-08 | 2006-10-19 | Cherian Kuruvilla A | Plasma-assisted engine exhaust treatment |
US20060057016A1 (en) * | 2002-05-08 | 2006-03-16 | Devendra Kumar | Plasma-assisted sintering |
US7846414B2 (en) * | 2002-11-15 | 2010-12-07 | Mcgill University | Method for producing carbon nanotubes using a DC non-transferred thermal plasma torch |
US7189940B2 (en) * | 2002-12-04 | 2007-03-13 | Btu International Inc. | Plasma-assisted melting |
WO2006127037A2 (fr) * | 2004-11-05 | 2006-11-30 | Dana Corporation | Traitement atmospherique effectue au moyen de plasmas generes par des micro-ondes |
FR2880236B1 (fr) * | 2004-12-23 | 2007-03-30 | Air Liquide | Excitateurs de plasmas micro-ondes |
CN100352793C (zh) * | 2006-01-20 | 2007-12-05 | 杨鸿生 | 用于以天然气制乙烯的槽波导微波化学反应设备及制备方法 |
DE102007013219A1 (de) * | 2007-03-15 | 2008-09-18 | Rev Renewable Energy Ventures, Inc. | Plasmagestützte Synthese |
WO2008129977A1 (fr) * | 2007-04-17 | 2008-10-30 | Ulvac, Inc. | Appareil de formation de film |
JP5073545B2 (ja) * | 2008-03-26 | 2012-11-14 | 東京エレクトロン株式会社 | プラズマ処理装置、プラズマ処理方法 |
EP2131633A1 (fr) * | 2008-05-28 | 2009-12-09 | L'AIR LIQUIDE, Société Anonyme pour l'Etude et l'Exploitation des Procédés Georges Claude | Procédé de refroidissement d'un plasma micro-onde et système de destruction sélective de molécules chimiques utilisant ce procédé |
FR2932058A1 (fr) * | 2008-05-28 | 2009-12-04 | Air Liquide | Procede de demarrage d'un plasma micro-onde et systeme de destruction selective de molecules chimiques utilisant ce procede |
DE102010043940B4 (de) * | 2010-11-15 | 2012-08-30 | Forschungsverbund Berlin E.V. | Mikrowellen-ICP-Resonator |
RU2468544C1 (ru) * | 2011-03-21 | 2012-11-27 | Общество с ограниченной ответственностью "Фиберус" | Устройство для возбуждения и поддержания свч-разрядов в плазмохимических реакторах |
US8633648B2 (en) | 2011-06-28 | 2014-01-21 | Recarbon, Inc. | Gas conversion system |
TWI484871B (zh) * | 2011-07-22 | 2015-05-11 | Triple Cores Korea | 大氣電漿裝置及其波導 |
DE102013215252A1 (de) * | 2013-08-02 | 2015-02-05 | Eeplasma Gmbh | Vorrichtung und Verfahren zur Behandlung von Prozessgasen in einem Plasma angeregt durch elektromagnetische Wellen hoher Frequenz |
WO2015026938A1 (fr) | 2013-08-20 | 2015-02-26 | H Quest Partners, LP | Système permettant de traiter des combustibles hydrocarbonés au moyen d'un surfaguide |
US20150057479A1 (en) | 2013-08-20 | 2015-02-26 | H Quest Partners, LP | Multi-stage system for processing hydrocarbon fuels |
WO2015026945A1 (fr) | 2013-08-20 | 2015-02-26 | H Quest Partners, LP | Procédé de traitement de carburants hydrocarbonés utilisant l'énergie micro-onde |
US9623397B2 (en) | 2013-08-20 | 2017-04-18 | H Quest Partners, LP | System for processing hydrocarbon fuels using surfaguide |
US9767992B1 (en) * | 2017-02-09 | 2017-09-19 | Lyten, Inc. | Microwave chemical processing reactor |
Family Cites Families (11)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR2579855A1 (fr) | 1985-03-28 | 1986-10-03 | Centre Nat Rech Scient | Dispositif pour l'excitation par ondes hyperfrequences d'un plasma dans une colonne de gaz, permettant notamment la realisation d'un laser ionique |
FR2583250B1 (fr) * | 1985-06-07 | 1989-06-30 | France Etat | Procede et dispositif d'excitation d'un plasma par micro-ondes a la resonance cyclotronique electronique |
FR2628730B1 (fr) * | 1988-03-16 | 1990-06-29 | France Etat | Dispositif de fabrication de preformes pour fibres optiques |
GB8821672D0 (en) * | 1988-09-02 | 1988-10-19 | Emi Plc Thorn | Discharge tube arrangement |
JPH03193880A (ja) * | 1989-08-03 | 1991-08-23 | Mikakutou Seimitsu Kogaku Kenkyusho:Kk | 高圧力下でのマイクロ波プラズマcvdによる高速成膜方法及びその装置 |
FR2678956B1 (fr) * | 1991-07-12 | 1993-09-24 | Pechiney Recherche | Dispositif et procede de depot de diamant par dcpv assiste par plasma microonde. |
US5468356A (en) * | 1991-08-23 | 1995-11-21 | The United States Of America As Represented By The Secretary Of The Navy | Large scale purification of contaminated air |
US5389153A (en) * | 1993-02-19 | 1995-02-14 | Texas Instruments Incorporated | Plasma processing system using surface wave plasma generating apparatus and method |
FR2733384B1 (fr) * | 1995-04-21 | 1997-07-04 | Univ Lille Sciences Tech | Dispositif pour creer deux ou plusieurs decharges plasma dans un meme tube guide d'onde |
US5597624A (en) * | 1995-04-24 | 1997-01-28 | Ceram Optic Industries, Inc. | Method and apparatus for coating dielectrics |
US5750823A (en) * | 1995-07-10 | 1998-05-12 | R.F. Environmental Systems, Inc. | Process and device for destruction of halohydrocarbons |
-
1997
- 1997-04-25 FR FR9705147A patent/FR2762748B1/fr not_active Expired - Fee Related
-
1998
- 1998-04-14 TW TW087105602A patent/TW413731B/zh not_active IP Right Cessation
- 1998-04-15 ZA ZA983172A patent/ZA983172B/xx unknown
- 1998-04-21 DE DE69820518T patent/DE69820518T2/de not_active Expired - Fee Related
- 1998-04-21 EP EP98400974A patent/EP0874537B1/fr not_active Expired - Lifetime
- 1998-04-23 CA CA002235648A patent/CA2235648A1/fr not_active Abandoned
- 1998-04-24 JP JP10115369A patent/JPH1157460A/ja not_active Withdrawn
- 1998-04-27 US US09/066,653 patent/US6224836B1/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
US6224836B1 (en) | 2001-05-01 |
JPH1157460A (ja) | 1999-03-02 |
CA2235648A1 (fr) | 1998-10-25 |
DE69820518D1 (de) | 2004-01-29 |
DE69820518T2 (de) | 2004-09-30 |
FR2762748B1 (fr) | 1999-06-11 |
ZA983172B (en) | 1998-10-21 |
FR2762748A1 (fr) | 1998-10-30 |
TW413731B (en) | 2000-12-01 |
EP0874537A1 (fr) | 1998-10-28 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
EP0874537B1 (fr) | Dispositif d'excitation d'un gaz par plasma d'onde de surface et installation de traitement de gaz incorporant un tel dispositif | |
EP0043740B1 (fr) | Générateur de plasma | |
EP1332511B1 (fr) | Dispositif de traitement de gaz par plasma | |
EP0209469B1 (fr) | Procédé et dispositif d'excitation d'un plasma par micro-ondes à la résonance cyclotronique électronique | |
WO2009047441A1 (fr) | Dispositifs generateurs de plasma micro-ondes et torches a plasma | |
FR2472329A1 (fr) | Procede et dispositif pour produire une decharge dans un courant de gaz a vitesse supersonique | |
EP0711100B1 (fr) | Dispositif de production d'un plasma permettant une dissociation entre les zones de propagation et d'absorption des micro-ondes | |
FR2702119A1 (fr) | Dispositif d'excitation d'un plasma à la résonance cyclotronique électronique par l'intermédiaire d'un applicateur filaire d'un champ micro-onde et d'un champ magnétique statique. | |
EP0197843B1 (fr) | Dispositif pour l'excitation par ondes hyperfréquences d'un plasma dans une colonne de gaz, permettant notamment la réalisation d'un laser ionique | |
EP1518256B1 (fr) | Dispositif de production d'une nappe de plasma | |
FR2550017A1 (fr) | Charge calorimetrique a micro-ondes | |
EP0995345B1 (fr) | Dispositif d'excitation d'un gaz par plasma d'onde de surface | |
EP0346168B1 (fr) | Réacteur à plasma | |
EP2873307A1 (fr) | Applicateur d'onde de surface pour la production de plasma | |
EP0722651B1 (fr) | Dispositif et procede pour former un plasma par application de micro-ondes | |
EP0532411B1 (fr) | Source d'ions à résonance cyclotronique électronique et à injection coaxiale d'ondes électromagnétiques | |
CH641912A5 (fr) | Appareil a decharge electronique. | |
FR2665323A1 (fr) | Dispositif de production d'un plasma. | |
FR2702328A1 (fr) | Dispositif de production d'un plasma. | |
FR2757310A1 (fr) | Systeme magnetique, en particulier pour les sources ecr, permettant la creation de surfaces fermees d'equimodule b de forme et de dimensions quelconques | |
EP3560299A1 (fr) | Réacteur plasma de décharge à barrière diélectrique | |
FR2554982A1 (fr) | Cathode creuse pour laser a vapeur metallique et laser en faisant application |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
PUAI | Public reference made under article 153(3) epc to a published international application that has entered the european phase |
Free format text: ORIGINAL CODE: 0009012 |
|
AK | Designated contracting states |
Kind code of ref document: A1 Designated state(s): BE DE FR GB IT NL |
|
AX | Request for extension of the european patent |
Free format text: AL;LT;LV;MK;RO;SI |
|
17P | Request for examination filed |
Effective date: 19990428 |
|
AKX | Designation fees paid |
Free format text: BE DE FR GB IT NL |
|
RAP1 | Party data changed (applicant data changed or rights of an application transferred) |
Owner name: L'AIR LIQUIDE, S.A. A DIRECTOIRE ET CONSEIL DE SUR |
|
17Q | First examination report despatched |
Effective date: 20021002 |
|
GRAH | Despatch of communication of intention to grant a patent |
Free format text: ORIGINAL CODE: EPIDOS IGRA |
|
GRAS | Grant fee paid |
Free format text: ORIGINAL CODE: EPIDOSNIGR3 |
|
GRAA | (expected) grant |
Free format text: ORIGINAL CODE: 0009210 |
|
AK | Designated contracting states |
Kind code of ref document: B1 Designated state(s): BE DE FR GB IT NL |
|
REG | Reference to a national code |
Ref country code: GB Ref legal event code: FG4D Free format text: NOT ENGLISH |
|
REF | Corresponds to: |
Ref document number: 69820518 Country of ref document: DE Date of ref document: 20040129 Kind code of ref document: P |
|
GBT | Gb: translation of ep patent filed (gb section 77(6)(a)/1977) |
Effective date: 20040209 |
|
PLBE | No opposition filed within time limit |
Free format text: ORIGINAL CODE: 0009261 |
|
STAA | Information on the status of an ep patent application or granted ep patent |
Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT |
|
26N | No opposition filed |
Effective date: 20040920 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: FR Payment date: 20050310 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: GB Payment date: 20050314 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: NL Payment date: 20050316 Year of fee payment: 8 Ref country code: DE Payment date: 20050316 Year of fee payment: 8 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: BE Payment date: 20050504 Year of fee payment: 8 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: GB Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20060421 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: BE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20060430 |
|
PGFP | Annual fee paid to national office [announced via postgrant information from national office to epo] |
Ref country code: IT Payment date: 20060430 Year of fee payment: 9 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: NL Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20061101 Ref country code: DE Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20061101 |
|
GBPC | Gb: european patent ceased through non-payment of renewal fee |
Effective date: 20060421 |
|
NLV4 | Nl: lapsed or anulled due to non-payment of the annual fee |
Effective date: 20061101 |
|
REG | Reference to a national code |
Ref country code: FR Ref legal event code: ST Effective date: 20061230 |
|
BERE | Be: lapsed |
Owner name: S.A. L'*AIR LIQUIDE A DIRECTOIRE ET CONSEIL DE SUR Effective date: 20060430 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: FR Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20060502 |
|
PG25 | Lapsed in a contracting state [announced via postgrant information from national office to epo] |
Ref country code: IT Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES Effective date: 20070421 |