EA201270260A1 - Способ и устройство анализа материалов с помощью сфокусированного пучка электронов с использованием характеристического рентгеновского излучения и обратноотраженных электронов - Google Patents
Способ и устройство анализа материалов с помощью сфокусированного пучка электронов с использованием характеристического рентгеновского излучения и обратноотраженных электроновInfo
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- EA201270260A1 EA201270260A1 EA201270260A EA201270260A EA201270260A1 EA 201270260 A1 EA201270260 A1 EA 201270260A1 EA 201270260 A EA201270260 A EA 201270260A EA 201270260 A EA201270260 A EA 201270260A EA 201270260 A1 EA201270260 A1 EA 201270260A1
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/26—Electron or ion microscopes; Electron or ion diffraction tubes
- H01J37/28—Electron or ion microscopes; Electron or ion diffraction tubes with scanning beams
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/2206—Combination of two or more measurements, at least one measurement being that of secondary emission, e.g. combination of secondary electron [SE] measurement and back-scattered electron [BSE] measurement
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
- G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
- G01N23/225—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material using electron or ion
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/22—Optical or photographic arrangements associated with the tube
- H01J37/222—Image processing arrangements associated with the tube
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/02—Details
- H01J37/244—Detectors; Associated components or circuits therefor
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/40—Imaging
- G01N2223/402—Imaging mapping distribution of elements
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- G—PHYSICS
- G01—MEASURING; TESTING
- G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
- G01N2223/00—Investigating materials by wave or particle radiation
- G01N2223/60—Specific applications or type of materials
- G01N2223/616—Specific applications or type of materials earth materials
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/2441—Semiconductor detectors, e.g. diodes
- H01J2237/24415—X-ray
- H01J2237/2442—Energy-dispersive (Si-Li type) spectrometer
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/244—Detection characterized by the detecting means
- H01J2237/24475—Scattered electron detectors
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
- H01J2237/245—Detection characterised by the variable being measured
- H01J2237/24571—Measurements of non-electric or non-magnetic variables
- H01J2237/24585—Other variables, e.g. energy, mass, velocity, time, temperature
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- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Biochemistry (AREA)
- General Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Immunology (AREA)
- Pathology (AREA)
- Computer Vision & Pattern Recognition (AREA)
- Engineering & Computer Science (AREA)
- Analysing Materials By The Use Of Radiation (AREA)
Abstract
Способ анализа материалов с помощью сфокусированного пучка электронов и устройство для его реализации, где создаются электронная карта В, где отображается активность эмиссии обратноотраженных электронов в различных точках образца, и спектральная карта S, где отображается активность эмиссии рентгеновского излучения в точках образца в зависимости от энергии излучения. Для выбранных химических элементов создают рентгеновские карты M, где отражена активность рентгеновского излучения, характерная для данных элементов. Рентгеновские карты Mи электронная карта В конвертируются в дифференциальные рентгеновские карты D, которые затем объединятся в итоговую дифференциальную карту D. Итоговая дифференциальная карта D затем используется для обнаружения частиц. Затем для каждой частицы рассчитывается аккумулированный спектр Xрентгеновского излучения, причем точки образца, расположенные на краю частицы, имеют меньший вес, чем точки, расположенные внутри частицы. Затем из аккумулированного спектра X, в ходе количественного спектроскопического анализа определяется концентрация химических элементов в данной частице.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CZ20110154A CZ2011154A3 (cs) | 2011-03-23 | 2011-03-23 | Zpusob analýzy materiálu fokusovaným elektronovým svazkem s využitím charakteristického rentgenového zárení a zpetne odražených elektronu a zarízení k jeho provádení |
Publications (2)
Publication Number | Publication Date |
---|---|
EA201270260A1 true EA201270260A1 (ru) | 2012-10-30 |
EA021273B1 EA021273B1 (ru) | 2015-05-29 |
Family
ID=46160534
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
EA201270260A EA021273B1 (ru) | 2011-03-23 | 2012-03-06 | Способ и устройство анализа материалов с помощью сфокусированного пучка электронов с использованием характеристического рентгеновского излучения и обратноотраженных электронов |
Country Status (6)
Country | Link |
---|---|
US (1) | US20130054153A1 (ru) |
AU (1) | AU2012201146B2 (ru) |
BR (1) | BR102012005032A2 (ru) |
CZ (1) | CZ2011154A3 (ru) |
EA (1) | EA021273B1 (ru) |
ZA (1) | ZA201201095B (ru) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2664012C1 (ru) * | 2017-05-12 | 2018-08-14 | Борис Никитович Васичев | Электронно-лучевой процессор квантового компьютера и способ его осуществления |
Families Citing this family (16)
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US8903045B2 (en) * | 2011-04-15 | 2014-12-02 | American Science And Engineering, Inc. | Backscatter system with variable size of detector array |
US9593982B2 (en) | 2012-05-21 | 2017-03-14 | Digimarc Corporation | Sensor-synchronized spectrally-structured-light imaging |
US9453801B2 (en) * | 2012-05-25 | 2016-09-27 | Kla-Tencor Corporation | Photoemission monitoring of EUV mirror and mask surface contamination in actinic EUV systems |
US9778215B2 (en) * | 2012-10-26 | 2017-10-03 | Fei Company | Automated mineral classification |
US9621760B2 (en) | 2013-06-07 | 2017-04-11 | Digimarc Corporation | Information coding and decoding in spectral differences |
EP2881972B1 (en) | 2013-08-09 | 2017-03-22 | Carl Zeiss Microscopy Ltd. | Method and data analysis system for semi-automated particle analysis using a charged particle beam |
EP2879156A1 (en) * | 2013-12-02 | 2015-06-03 | Fei Company | Charged-particle microscopy with enhanced electron detection |
JP6328456B2 (ja) * | 2014-03-20 | 2018-05-23 | 株式会社日立ハイテクサイエンス | エネルギー分散型x線分析装置及びエネルギー分散型x線分析方法 |
CZ309309B6 (cs) | 2015-09-22 | 2022-08-17 | TESCAN BRNO s.r.o. | Způsob analýzy materiálů fokusovaným elektronovým svazkem s využitím charakteristického rentgenového záření a zpětně odražených elektronů a zařízení k jejímu provádění |
US20170140538A1 (en) * | 2015-11-16 | 2017-05-18 | Le Holdings (Beijing) Co., Ltd. | Image preprocessing method and electronic device for image registration |
JP2019191169A (ja) * | 2018-04-23 | 2019-10-31 | ブルカー ジェイヴィ イスラエル リミテッドBruker Jv Israel Ltd. | 小角x線散乱測定用のx線源光学系 |
EP3614414A1 (en) * | 2018-08-20 | 2020-02-26 | FEI Company | Method of examining a sample using a charged particle microscope |
AT524288B1 (de) * | 2020-09-16 | 2024-05-15 | Gatan Inc | Computergestütztes Verfahren zur Bestimmung eines Elementanteiles eines Bestimmungselementes kleiner Ordnungszahl, insbesondere eines Li-Anteiles, und Vorrichtung zur Datenverarbeitung hierzu |
EP4067888A1 (en) * | 2021-03-31 | 2022-10-05 | FEI Company | Multiple image segmentation and/or multiple dynamic spectral acquisition for material and mineral classification |
JP7307770B2 (ja) * | 2021-07-20 | 2023-07-12 | 日本電子株式会社 | 分析装置および画像処理方法 |
GB2621003A (en) * | 2023-01-13 | 2024-01-31 | Oxford Instruments Nanotechnology Tools Ltd | Live chemical imaging with multiple detectors |
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ZA80633B (en) * | 1979-02-09 | 1981-02-25 | Martin Marietta Corp | Field portable element analysis unit |
CA1170375A (en) * | 1980-06-11 | 1984-07-03 | Alan F. Reid | Method and apparatus for material analysis |
JP2922940B2 (ja) * | 1989-11-22 | 1999-07-26 | 株式会社日立製作所 | エネルギ分散形x線分析装置 |
DE69325157T2 (de) * | 1992-09-28 | 2000-01-20 | Hitachi Ltd | Methode und vorrichtung zur oberflächenanalyse |
JP3607023B2 (ja) * | 1996-05-10 | 2005-01-05 | 株式会社堀場製作所 | X線定量分析装置および方法 |
US5798525A (en) * | 1996-06-26 | 1998-08-25 | International Business Machines Corporation | X-ray enhanced SEM critical dimension measurement |
US6751287B1 (en) * | 1998-05-15 | 2004-06-15 | The Trustees Of The Stevens Institute Of Technology | Method and apparatus for x-ray analysis of particle size (XAPS) |
US7490009B2 (en) * | 2004-08-03 | 2009-02-10 | Fei Company | Method and system for spectroscopic data analysis |
US20070114419A1 (en) * | 2005-08-29 | 2007-05-24 | Glenn Bastiaans | Apparatus and method for detecting a designated group of materials and apparatus and method for determining if a designated group of materials can be distinguished from one or more other materials |
JP4851804B2 (ja) * | 2006-02-13 | 2012-01-11 | 株式会社日立ハイテクノロジーズ | 集束イオンビーム加工観察装置、集束イオンビーム加工観察システム及び加工観察方法 |
JP2008122267A (ja) * | 2006-11-14 | 2008-05-29 | Jeol Ltd | 試料分析方法及び試料分析装置 |
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2011
- 2011-03-23 CZ CZ20110154A patent/CZ2011154A3/cs unknown
-
2012
- 2012-02-15 ZA ZA2012/01095A patent/ZA201201095B/en unknown
- 2012-02-16 US US13/398,114 patent/US20130054153A1/en not_active Abandoned
- 2012-02-27 AU AU2012201146A patent/AU2012201146B2/en active Active
- 2012-03-06 EA EA201270260A patent/EA021273B1/ru not_active IP Right Cessation
- 2012-03-06 BR BRBR102012005032-3A patent/BR102012005032A2/pt not_active Application Discontinuation
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
RU2664012C1 (ru) * | 2017-05-12 | 2018-08-14 | Борис Никитович Васичев | Электронно-лучевой процессор квантового компьютера и способ его осуществления |
Also Published As
Publication number | Publication date |
---|---|
CZ303228B6 (cs) | 2012-06-06 |
CZ2011154A3 (cs) | 2012-06-06 |
AU2012201146B2 (en) | 2013-05-23 |
BR102012005032A2 (pt) | 2014-02-04 |
AU2012201146A1 (en) | 2012-10-11 |
EA021273B1 (ru) | 2015-05-29 |
ZA201201095B (en) | 2012-10-31 |
US20130054153A1 (en) | 2013-02-28 |
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