EA023891B1 - Устройство и способ для обработки и/или нанесения покрытия на поверхности подложек методом вакуумного напыления - Google Patents
Устройство и способ для обработки и/или нанесения покрытия на поверхности подложек методом вакуумного напыления Download PDFInfo
- Publication number
- EA023891B1 EA023891B1 EA201170814A EA201170814A EA023891B1 EA 023891 B1 EA023891 B1 EA 023891B1 EA 201170814 A EA201170814 A EA 201170814A EA 201170814 A EA201170814 A EA 201170814A EA 023891 B1 EA023891 B1 EA 023891B1
- Authority
- EA
- Eurasian Patent Office
- Prior art keywords
- coating
- processing
- substrates
- substrate
- treating
- Prior art date
Links
- 238000000576 coating method Methods 0.000 title claims abstract description 130
- 239000011248 coating agent Substances 0.000 title claims abstract description 125
- 239000000758 substrate Substances 0.000 title claims abstract description 121
- 238000000034 method Methods 0.000 title claims abstract description 53
- 238000001771 vacuum deposition Methods 0.000 title claims abstract description 6
- 238000005530 etching Methods 0.000 claims abstract description 16
- 238000010438 heat treatment Methods 0.000 claims abstract description 15
- 238000011282 treatment Methods 0.000 claims abstract description 13
- 238000001704 evaporation Methods 0.000 claims abstract description 8
- 230000008020 evaporation Effects 0.000 claims abstract description 8
- 238000004381 surface treatment Methods 0.000 claims abstract description 8
- 238000012545 processing Methods 0.000 claims description 91
- 230000033001 locomotion Effects 0.000 claims description 14
- 229910052751 metal Inorganic materials 0.000 claims description 6
- 239000002184 metal Substances 0.000 claims description 6
- 230000008859 change Effects 0.000 claims description 3
- 230000001360 synchronised effect Effects 0.000 claims description 2
- 238000012216 screening Methods 0.000 abstract description 3
- 238000010276 construction Methods 0.000 abstract description 2
- 238000009434 installation Methods 0.000 description 30
- 230000008569 process Effects 0.000 description 30
- 238000000151 deposition Methods 0.000 description 13
- 230000008021 deposition Effects 0.000 description 13
- 239000007789 gas Substances 0.000 description 7
- 238000004519 manufacturing process Methods 0.000 description 7
- 238000013461 design Methods 0.000 description 6
- 239000000463 material Substances 0.000 description 6
- 238000005240 physical vapour deposition Methods 0.000 description 5
- 238000005553 drilling Methods 0.000 description 4
- 230000004048 modification Effects 0.000 description 4
- 238000012986 modification Methods 0.000 description 4
- 230000000694 effects Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 238000005253 cladding Methods 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 238000005516 engineering process Methods 0.000 description 2
- 239000002245 particle Substances 0.000 description 2
- 239000002244 precipitate Substances 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 description 1
- UQZIWOQVLUASCR-UHFFFAOYSA-N alumane;titanium Chemical compound [AlH3].[Ti] UQZIWOQVLUASCR-UHFFFAOYSA-N 0.000 description 1
- 230000005540 biological transmission Effects 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 238000006243 chemical reaction Methods 0.000 description 1
- 238000005229 chemical vapour deposition Methods 0.000 description 1
- 238000005260 corrosion Methods 0.000 description 1
- 230000007797 corrosion Effects 0.000 description 1
- 238000005520 cutting process Methods 0.000 description 1
- 125000004122 cyclic group Chemical group 0.000 description 1
- 230000001419 dependent effect Effects 0.000 description 1
- 238000010586 diagram Methods 0.000 description 1
- 238000010891 electric arc Methods 0.000 description 1
- 238000010894 electron beam technology Methods 0.000 description 1
- -1 for example Substances 0.000 description 1
- 238000011900 installation process Methods 0.000 description 1
- 238000010849 ion bombardment Methods 0.000 description 1
- 238000001755 magnetron sputter deposition Methods 0.000 description 1
- 150000002739 metals Chemical class 0.000 description 1
- 238000003801 milling Methods 0.000 description 1
- 239000002052 molecular layer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 238000005192 partition Methods 0.000 description 1
- 238000005289 physical deposition Methods 0.000 description 1
- 230000000704 physical effect Effects 0.000 description 1
- 230000001681 protective effect Effects 0.000 description 1
- 238000005086 pumping Methods 0.000 description 1
- 230000009467 reduction Effects 0.000 description 1
- 230000002441 reversible effect Effects 0.000 description 1
- 238000001228 spectrum Methods 0.000 description 1
- 239000007921 spray Substances 0.000 description 1
- 238000005507 spraying Methods 0.000 description 1
- 238000000992 sputter etching Methods 0.000 description 1
- 239000010936 titanium Substances 0.000 description 1
- 229910052719 titanium Inorganic materials 0.000 description 1
- 238000007738 vacuum evaporation Methods 0.000 description 1
- 239000011364 vaporized material Substances 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
- C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/34—Sputtering
- C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/54—Apparatus specially adapted for continuous coating
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Physical Vapour Deposition (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE102008062332A DE102008062332A1 (de) | 2008-12-15 | 2008-12-15 | Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten |
| PCT/DE2009/001712 WO2010069289A1 (de) | 2008-12-15 | 2009-12-04 | Vorrichtung zur oberflächenbehandlung und/oder -beschichtung von substratkomponenten |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| EA201170814A1 EA201170814A1 (ru) | 2011-12-30 |
| EA023891B1 true EA023891B1 (ru) | 2016-07-29 |
Family
ID=41818515
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| EA201170814A EA023891B1 (ru) | 2008-12-15 | 2009-12-04 | Устройство и способ для обработки и/или нанесения покрытия на поверхности подложек методом вакуумного напыления |
Country Status (13)
| Country | Link |
|---|---|
| US (2) | US20110305833A1 (enExample) |
| EP (1) | EP2373828B1 (enExample) |
| JP (1) | JP5700454B2 (enExample) |
| KR (1) | KR20110098764A (enExample) |
| CN (1) | CN102245799B (enExample) |
| AU (1) | AU2009328788B2 (enExample) |
| BR (1) | BRPI0923092B1 (enExample) |
| CA (1) | CA2748893A1 (enExample) |
| DE (1) | DE102008062332A1 (enExample) |
| EA (1) | EA023891B1 (enExample) |
| MX (1) | MX2011006238A (enExample) |
| SG (1) | SG172178A1 (enExample) |
| WO (1) | WO2010069289A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2678492C1 (ru) * | 2017-05-03 | 2019-01-30 | Чэнду Риэлли Шарп Коэтинг Текнолоджи Ко.,Лтд | Устройство для получения композитной пленки из многоэлементного сплава |
Families Citing this family (16)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102010032591A1 (de) | 2010-07-23 | 2012-01-26 | Leybold Optics Gmbh | Vorrichtung und Verfahren zur Vakuumbeschichtung |
| CN102560373B (zh) * | 2010-12-16 | 2014-12-17 | 北京北方微电子基地设备工艺研究中心有限责任公司 | 基片加热腔室、使用基片加热腔室的方法及基片处理设备 |
| CN102560381A (zh) * | 2010-12-29 | 2012-07-11 | 鸿富锦精密工业（深圳）有限公司 | 溅镀装置 |
| EP2664690B1 (en) * | 2012-05-15 | 2015-09-16 | ZhongAo HuiCheng Technology Co. Ltd. | A magnetron sputtering coating device and the preparation method of a nano-multilayer film |
| EP2868768B1 (en) | 2013-10-29 | 2021-06-16 | Oerlikon Surface Solutions AG, Pfäffikon | Shutter system |
| CN103643205B (zh) * | 2013-12-04 | 2015-11-18 | 王普 | 一种真空镀膜机 |
| WO2015161469A1 (zh) * | 2014-04-23 | 2015-10-29 | 中奥汇成科技股份有限公司 | 一种人工关节臼杯、磁控溅射镀膜装置及其制备方法 |
| CN104120389B (zh) * | 2014-08-04 | 2016-08-24 | 上海和辉光电有限公司 | 镀膜设备 |
| JP6823392B2 (ja) * | 2016-07-05 | 2021-02-03 | 東京エレクトロン株式会社 | 絶縁膜を形成する方法 |
| CN112166208B (zh) * | 2017-07-19 | 2023-12-12 | 因特瓦克公司 | 用于形成纳米层合光学涂层的系统 |
| KR102022927B1 (ko) * | 2017-10-19 | 2019-09-19 | 재단법인 오송첨단의료산업진흥재단 | 의료용 peek 소재 표면의 마이크로 기공 구조의 타이타늄 코팅 방법 |
| CN109023245B (zh) * | 2017-12-08 | 2020-04-03 | 西安穿越光电科技有限公司 | 一种高稳定性oled蒸镀设备 |
| KR20210130762A (ko) * | 2019-02-20 | 2021-11-01 | 외를리콘 서피스 솔루션즈 아게, 페피콘 | 모듈식 코팅 시설에서 기판을 수송 및 이동시키기 위한 최적화된 시스템 및 방법 |
| CN109898062A (zh) * | 2019-03-07 | 2019-06-18 | 厦门阿匹斯智能制造系统有限公司 | 一种磁控溅射镀膜设备及镀膜方法 |
| CN115896747B (zh) * | 2021-09-30 | 2024-10-15 | 馗鼎奈米科技(深圳)有限公司 | 表面处理设备 |
| US12331400B2 (en) | 2022-11-07 | 2025-06-17 | Creating Nano Technologies, Inc. | Surface treatment apparatus |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2303380A (en) * | 1995-07-19 | 1997-02-19 | Teer Coatings Ltd | Improving the sputter deposition of metal-sulphur coatings |
| US6054029A (en) * | 1996-02-23 | 2000-04-25 | Singulus Technologies Gmbh | Device for gripping, holdings and/or transporting substrates |
| WO2008013469A1 (en) * | 2006-07-26 | 2008-01-31 | Dmitry Davidovich Spivakov | Method for ion-plasma application of film coatings and a device for carrying out said method |
Family Cites Families (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4485759A (en) * | 1983-01-19 | 1984-12-04 | Multi-Arc Vacuum Systems Inc. | Planetary substrate support apparatus for vapor vacuum deposition coating |
| JPS59157281A (ja) * | 1983-02-24 | 1984-09-06 | Tokuda Seisakusho Ltd | スパツタリング装置 |
| US5328583A (en) * | 1991-11-05 | 1994-07-12 | Canon Kabushiki Kaisha | Sputtering apparatus and process for forming lamination film employing the apparatus |
| GB9405442D0 (en) * | 1994-03-19 | 1994-05-04 | Applied Vision Ltd | Apparatus for coating substrates |
| DE29615190U1 (de) * | 1996-03-11 | 1996-11-28 | Balzers Verschleissschutz GmbH, 55411 Bingen | Anlage zur Beschichtung von Werkstücken |
| US6174377B1 (en) * | 1997-03-03 | 2001-01-16 | Genus, Inc. | Processing chamber for atomic layer deposition processes |
| DE19738234C1 (de) * | 1997-09-02 | 1998-10-22 | Fraunhofer Ges Forschung | Einrichtung zum Aufstäuben von Hartstoffschichten |
| US6051113A (en) | 1998-04-27 | 2000-04-18 | Cvc Products, Inc. | Apparatus and method for multi-target physical-vapor deposition of a multi-layer material structure using target indexing |
| US6576062B2 (en) * | 2000-01-06 | 2003-06-10 | Tokyo Electron Limited | Film forming apparatus and film forming method |
| US6630053B2 (en) * | 2000-08-22 | 2003-10-07 | Asm Japan K.K. | Semiconductor processing module and apparatus |
| JP2006051594A (ja) * | 2004-07-14 | 2006-02-23 | Mitsubishi Materials Corp | 耐熱合金の高速重切削で硬質被覆層がすぐれた耐チッピング性を発揮する表面被覆超硬合金製切削工具 |
| CH697552B1 (de) | 2004-11-12 | 2008-11-28 | Oerlikon Trading Ag | Vakuumbehandlungsanlage. |
| US9997338B2 (en) * | 2005-03-24 | 2018-06-12 | Oerlikon Surface Solutions Ag, Pfäffikon | Method for operating a pulsed arc source |
| US20070218702A1 (en) * | 2006-03-15 | 2007-09-20 | Asm Japan K.K. | Semiconductor-processing apparatus with rotating susceptor |
| DE102006020004B4 (de) | 2006-04-26 | 2011-06-01 | Systec System- Und Anlagentechnik Gmbh & Co.Kg | Vorrichtung und Verfahren zur homogenen PVD-Beschichtung |
| CN100575540C (zh) * | 2006-08-28 | 2009-12-30 | 北京有色金属研究总院 | 批量化制备双面高温超导薄膜装置 |
| JPWO2008050384A1 (ja) * | 2006-10-23 | 2010-02-25 | オーエスジー株式会社 | 硬質積層被膜、硬質積層被膜被覆工具、および被膜形成方法 |
| JP4768699B2 (ja) * | 2006-11-30 | 2011-09-07 | キヤノンアネルバ株式会社 | 電力導入装置及び成膜方法 |
-
2008
- 2008-12-15 DE DE102008062332A patent/DE102008062332A1/de not_active Withdrawn
-
2009
- 2009-12-04 KR KR1020117014943A patent/KR20110098764A/ko not_active Ceased
- 2009-12-04 CN CN200980150003.0A patent/CN102245799B/zh not_active Expired - Fee Related
- 2009-12-04 SG SG2011043791A patent/SG172178A1/en unknown
- 2009-12-04 AU AU2009328788A patent/AU2009328788B2/en not_active Ceased
- 2009-12-04 WO PCT/DE2009/001712 patent/WO2010069289A1/de not_active Ceased
- 2009-12-04 CA CA2748893A patent/CA2748893A1/en not_active Abandoned
- 2009-12-04 EP EP09807664.9A patent/EP2373828B1/de active Active
- 2009-12-04 JP JP2011539893A patent/JP5700454B2/ja active Active
- 2009-12-04 MX MX2011006238A patent/MX2011006238A/es active IP Right Grant
- 2009-12-04 BR BRPI0923092-0A patent/BRPI0923092B1/pt not_active IP Right Cessation
- 2009-12-04 EA EA201170814A patent/EA023891B1/ru not_active IP Right Cessation
-
2011
- 2011-05-10 US US13/104,394 patent/US20110305833A1/en not_active Abandoned
-
2013
- 2013-04-01 US US13/854,311 patent/US10711349B2/en active Active
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB2303380A (en) * | 1995-07-19 | 1997-02-19 | Teer Coatings Ltd | Improving the sputter deposition of metal-sulphur coatings |
| US6054029A (en) * | 1996-02-23 | 2000-04-25 | Singulus Technologies Gmbh | Device for gripping, holdings and/or transporting substrates |
| WO2008013469A1 (en) * | 2006-07-26 | 2008-01-31 | Dmitry Davidovich Spivakov | Method for ion-plasma application of film coatings and a device for carrying out said method |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| RU2678492C1 (ru) * | 2017-05-03 | 2019-01-30 | Чэнду Риэлли Шарп Коэтинг Текнолоджи Ко.,Лтд | Устройство для получения композитной пленки из многоэлементного сплава |
Also Published As
| Publication number | Publication date |
|---|---|
| AU2009328788A1 (en) | 2011-07-28 |
| MX2011006238A (es) | 2011-06-28 |
| EP2373828B1 (de) | 2014-11-12 |
| CA2748893A1 (en) | 2010-06-24 |
| US20110305833A1 (en) | 2011-12-15 |
| EA201170814A1 (ru) | 2011-12-30 |
| SG172178A1 (en) | 2011-07-28 |
| JP2012512321A (ja) | 2012-05-31 |
| DE102008062332A1 (de) | 2010-06-17 |
| AU2009328788B2 (en) | 2015-10-29 |
| JP5700454B2 (ja) | 2015-04-15 |
| CN102245799B (zh) | 2014-02-12 |
| KR20110098764A (ko) | 2011-09-01 |
| US20130216711A1 (en) | 2013-08-22 |
| WO2010069289A1 (de) | 2010-06-24 |
| BRPI0923092B1 (pt) | 2020-02-11 |
| EP2373828A1 (de) | 2011-10-12 |
| CN102245799A (zh) | 2011-11-16 |
| BRPI0923092A2 (pt) | 2016-07-26 |
| US10711349B2 (en) | 2020-07-14 |
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