CN102245799B - 用于基片组件的表面处理和/或表面涂敷的设备 - Google Patents

用于基片组件的表面处理和/或表面涂敷的设备 Download PDF

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Publication number
CN102245799B
CN102245799B CN200980150003.0A CN200980150003A CN102245799B CN 102245799 B CN102245799 B CN 102245799B CN 200980150003 A CN200980150003 A CN 200980150003A CN 102245799 B CN102245799 B CN 102245799B
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CN
China
Prior art keywords
coating
substrate
deposition
equipment
erecting bed
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Expired - Fee Related
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CN200980150003.0A
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English (en)
Chinese (zh)
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CN102245799A (zh
Inventor
M·菲德勒
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Guehring KG
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Guehring KG
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Publication of CN102245799A publication Critical patent/CN102245799A/zh
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Expired - Fee Related legal-status Critical Current
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    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/564—Means for minimising impurities in the coating chamber such as dust, moisture, residual gases
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/54—Apparatus specially adapted for continuous coating

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  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Physical Vapour Deposition (AREA)
CN200980150003.0A 2008-12-15 2009-12-04 用于基片组件的表面处理和/或表面涂敷的设备 Expired - Fee Related CN102245799B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
DE102008062332A DE102008062332A1 (de) 2008-12-15 2008-12-15 Vorrichtung zur Oberflächenbehandlung und/oder -beschichtung von Substratkomponenten
DE102008062332.6 2008-12-15
PCT/DE2009/001712 WO2010069289A1 (de) 2008-12-15 2009-12-04 Vorrichtung zur oberflächenbehandlung und/oder -beschichtung von substratkomponenten

Publications (2)

Publication Number Publication Date
CN102245799A CN102245799A (zh) 2011-11-16
CN102245799B true CN102245799B (zh) 2014-02-12

Family

ID=41818515

Family Applications (1)

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CN200980150003.0A Expired - Fee Related CN102245799B (zh) 2008-12-15 2009-12-04 用于基片组件的表面处理和/或表面涂敷的设备

Country Status (13)

Country Link
US (2) US20110305833A1 (enExample)
EP (1) EP2373828B1 (enExample)
JP (1) JP5700454B2 (enExample)
KR (1) KR20110098764A (enExample)
CN (1) CN102245799B (enExample)
AU (1) AU2009328788B2 (enExample)
BR (1) BRPI0923092B1 (enExample)
CA (1) CA2748893A1 (enExample)
DE (1) DE102008062332A1 (enExample)
EA (1) EA023891B1 (enExample)
MX (1) MX2011006238A (enExample)
SG (1) SG172178A1 (enExample)
WO (1) WO2010069289A1 (enExample)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109898062A (zh) * 2019-03-07 2019-06-18 厦门阿匹斯智能制造系统有限公司 一种磁控溅射镀膜设备及镀膜方法
RU2830266C1 (ru) * 2023-12-11 2024-11-18 Акционерное общество "Омский научно-исследовательский институт приборостроения" (АО "ОНИИП") Магнетронная распылительная система

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DE102010032591A1 (de) 2010-07-23 2012-01-26 Leybold Optics Gmbh Vorrichtung und Verfahren zur Vakuumbeschichtung
CN102560373B (zh) * 2010-12-16 2014-12-17 北京北方微电子基地设备工艺研究中心有限责任公司 基片加热腔室、使用基片加热腔室的方法及基片处理设备
CN102560381A (zh) * 2010-12-29 2012-07-11 鸿富锦精密工业（深圳）有限公司 溅镀装置
EP2664690B1 (en) * 2012-05-15 2015-09-16 ZhongAo HuiCheng Technology Co. Ltd. A magnetron sputtering coating device and the preparation method of a nano-multilayer film
EP2868768B1 (en) 2013-10-29 2021-06-16 Oerlikon Surface Solutions AG, Pfäffikon Shutter system
CN103643205B (zh) * 2013-12-04 2015-11-18 王普 一种真空镀膜机
WO2015161469A1 (zh) * 2014-04-23 2015-10-29 中奥汇成科技股份有限公司 一种人工关节臼杯、磁控溅射镀膜装置及其制备方法
CN104120389B (zh) * 2014-08-04 2016-08-24 上海和辉光电有限公司 镀膜设备
JP6823392B2 (ja) * 2016-07-05 2021-02-03 東京エレクトロン株式会社 絶縁膜を形成する方法
CN107130213B (zh) * 2017-05-03 2019-04-09 成都真锐科技涂层技术有限公司 多元合金复合薄膜制备设备和制备方法
CN112166208B (zh) * 2017-07-19 2023-12-12 因特瓦克公司 用于形成纳米层合光学涂层的系统
KR102022927B1 (ko) * 2017-10-19 2019-09-19 재단법인 오송첨단의료산업진흥재단 의료용 peek 소재 표면의 마이크로 기공 구조의 타이타늄 코팅 방법
CN109023245B (zh) * 2017-12-08 2020-04-03 西安穿越光电科技有限公司 一种高稳定性oled蒸镀设备
KR20210130762A (ko) * 2019-02-20 2021-11-01 외를리콘 서피스 솔루션즈 아게, 페피콘 모듈식 코팅 시설에서 기판을 수송 및 이동시키기 위한 최적화된 시스템 및 방법
CN115896747B (zh) * 2021-09-30 2024-10-15 馗鼎奈米科技(深圳)有限公司 表面处理设备
US12331400B2 (en) 2022-11-07 2025-06-17 Creating Nano Technologies, Inc. Surface treatment apparatus

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Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CN109898062A (zh) * 2019-03-07 2019-06-18 厦门阿匹斯智能制造系统有限公司 一种磁控溅射镀膜设备及镀膜方法
RU2830266C1 (ru) * 2023-12-11 2024-11-18 Акционерное общество "Омский научно-исследовательский институт приборостроения" (АО "ОНИИП") Магнетронная распылительная система

Also Published As

Publication number Publication date
AU2009328788A1 (en) 2011-07-28
MX2011006238A (es) 2011-06-28
EP2373828B1 (de) 2014-11-12
CA2748893A1 (en) 2010-06-24
US20110305833A1 (en) 2011-12-15
EA201170814A1 (ru) 2011-12-30
SG172178A1 (en) 2011-07-28
JP2012512321A (ja) 2012-05-31
DE102008062332A1 (de) 2010-06-17
AU2009328788B2 (en) 2015-10-29
JP5700454B2 (ja) 2015-04-15
KR20110098764A (ko) 2011-09-01
US20130216711A1 (en) 2013-08-22
WO2010069289A1 (de) 2010-06-24
BRPI0923092B1 (pt) 2020-02-11
EP2373828A1 (de) 2011-10-12
CN102245799A (zh) 2011-11-16
BRPI0923092A2 (pt) 2016-07-26
EA023891B1 (ru) 2016-07-29
US10711349B2 (en) 2020-07-14

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