DK3392232T3 - Multifunktionel fluorenfotoinitiator og fremstilling og anvendelse deraf, og fotosensitiv resinsammensætning indeholdende fluorenfotoinitiator og anvendelse deraf - Google Patents
Multifunktionel fluorenfotoinitiator og fremstilling og anvendelse deraf, og fotosensitiv resinsammensætning indeholdende fluorenfotoinitiator og anvendelse deraf Download PDFInfo
- Publication number
- DK3392232T3 DK3392232T3 DK16874613.9T DK16874613T DK3392232T3 DK 3392232 T3 DK3392232 T3 DK 3392232T3 DK 16874613 T DK16874613 T DK 16874613T DK 3392232 T3 DK3392232 T3 DK 3392232T3
- Authority
- DK
- Denmark
- Prior art keywords
- photoinitiator
- fluoren
- multifunctional
- manufacture
- resin composition
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C29/00—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring
- C07C29/09—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by hydrolysis
- C07C29/12—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by hydrolysis of esters of mineral acids
- C07C29/124—Preparation of compounds having hydroxy or O-metal groups bound to a carbon atom not belonging to a six-membered aromatic ring by hydrolysis of esters of mineral acids of halides
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C45/00—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds
- C07C45/45—Preparation of compounds having >C = O groups bound only to carbon or hydrogen atoms; Preparation of chelates of such compounds by condensation
- C07C45/46—Friedel-Crafts reactions
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/20—Unsaturated compounds containing keto groups bound to acyclic carbon atoms
- C07C49/213—Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing six-membered aromatic rings
- C07C49/215—Unsaturated compounds containing keto groups bound to acyclic carbon atoms containing six-membered aromatic rings polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C49/00—Ketones; Ketenes; Dimeric ketenes; Ketonic chelates
- C07C49/76—Ketones containing a keto group bound to a six-membered aromatic ring
- C07C49/82—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups
- C07C49/83—Ketones containing a keto group bound to a six-membered aromatic ring containing hydroxy groups polycyclic
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D273/00—Heterocyclic compounds containing rings having nitrogen and oxygen atoms as the only ring hetero atoms, not provided for by groups C07D261/00 - C07D271/00
- C07D273/01—Heterocyclic compounds containing rings having nitrogen and oxygen atoms as the only ring hetero atoms, not provided for by groups C07D261/00 - C07D271/00 having one nitrogen atom
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07D—HETEROCYCLIC COMPOUNDS
- C07D295/00—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms
- C07D295/04—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms
- C07D295/10—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms
- C07D295/104—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings
- C07D295/108—Heterocyclic compounds containing polymethylene-imine rings with at least five ring members, 3-azabicyclo [3.2.2] nonane, piperazine, morpholine or thiomorpholine rings, having only hydrogen atoms directly attached to the ring carbon atoms with substituted hydrocarbon radicals attached to ring nitrogen atoms substituted by doubly bound oxygen or sulphur atoms with the ring nitrogen atoms and the doubly bound oxygen or sulfur atoms attached to the same carbon chain, which is not interrupted by carbocyclic rings to an acyclic saturated chain
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
- G03F7/031—Organic compounds not covered by group G03F7/029
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/039—Macromolecular compounds which are photodegradable, e.g. positive electron resists
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/40—Treatment after imagewise removal, e.g. baking
-
- C—CHEMISTRY; METALLURGY
- C07—ORGANIC CHEMISTRY
- C07C—ACYCLIC OR CARBOCYCLIC COMPOUNDS
- C07C2603/00—Systems containing at least three condensed rings
- C07C2603/02—Ortho- or ortho- and peri-condensed systems
- C07C2603/04—Ortho- or ortho- and peri-condensed systems containing three rings
- C07C2603/06—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members
- C07C2603/10—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings
- C07C2603/12—Ortho- or ortho- and peri-condensed systems containing three rings containing at least one ring with less than six ring members containing five-membered rings only one five-membered ring
- C07C2603/18—Fluorenes; Hydrogenated fluorenes
Landscapes
- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Polymerisation Methods In General (AREA)
- Optical Filters (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
- Low-Molecular Organic Synthesis Reactions Using Catalysts (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
CN201510937328.0A CN106883114B (zh) | 2015-12-15 | 2015-12-15 | 一种芴类多官能度光引发剂及其制备和应用 |
CN201610210118.6A CN107272336A (zh) | 2016-04-06 | 2016-04-06 | 一种含芴类光引发剂的感光性树脂组合物及其应用 |
PCT/CN2016/100601 WO2017101553A1 (zh) | 2015-12-15 | 2016-09-28 | 一种芴类多官能度光引发剂及其制备和应用、含芴类光引发剂的感光性树脂组合物及其应用 |
Publications (1)
Publication Number | Publication Date |
---|---|
DK3392232T3 true DK3392232T3 (da) | 2021-04-12 |
Family
ID=59055689
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK16874613.9T DK3392232T3 (da) | 2015-12-15 | 2016-09-28 | Multifunktionel fluorenfotoinitiator og fremstilling og anvendelse deraf, og fotosensitiv resinsammensætning indeholdende fluorenfotoinitiator og anvendelse deraf |
Country Status (7)
Country | Link |
---|---|
US (1) | US11054743B2 (da) |
EP (1) | EP3392232B1 (da) |
JP (1) | JP6725663B2 (da) |
KR (1) | KR102079026B1 (da) |
DK (1) | DK3392232T3 (da) |
TW (1) | TWI591050B (da) |
WO (1) | WO2017101553A1 (da) |
Families Citing this family (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DK3392232T3 (da) | 2015-12-15 | 2021-04-12 | Changzhou Tronly Advanced Electronic Mat Co Ltd | Multifunktionel fluorenfotoinitiator og fremstilling og anvendelse deraf, og fotosensitiv resinsammensætning indeholdende fluorenfotoinitiator og anvendelse deraf |
KR102197059B1 (ko) | 2016-09-13 | 2020-12-31 | 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드 | 플루오렌 광개시제, 그 제조 방법, 이를 갖는 광경화성 조성물, 및 광경화 분야에서 그 용도 |
US11118065B2 (en) | 2017-02-17 | 2021-09-14 | Changzhou Tronly Advanced Electronic Materials Co., Ltd. | Fluorenylaminoketone photoinitiator, preparation method thereof, and UV photocurable composition containing same |
CN108117616B (zh) * | 2017-11-22 | 2019-08-09 | 惠州市华泓新材料股份有限公司 | 二丁基芴基衍生物与其作为光引发剂的应用 |
JP6999039B2 (ja) * | 2017-12-22 | 2022-02-04 | 常州強力先端電子材料有限公司 | フッ素含有フルオレンオキシムエステル系光開始剤、それを含む光硬化組成物およびその適用 |
JP6998490B1 (ja) * | 2021-08-30 | 2022-01-18 | サカタインクス株式会社 | 光硬化型インクジェット印刷用インク組成物 |
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US4533670A (en) | 1983-09-21 | 1985-08-06 | Eli Lilly And Company | Anti-convulsant fluorenylalkylimidazole derivatives, compositions, and method of use |
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ITVA20030028A1 (it) | 2003-08-07 | 2005-02-08 | Lamberti Spa | Sistemi fotopolimerizzabili trasparenti per la preparazione di rivestimenti ad elevato spessore. |
KR100596364B1 (ko) * | 2004-05-31 | 2006-07-03 | 주식회사 엘지화학 | 감광성 수지 조성물 및 이를 이용하여 제조된 액정표시소자 |
JP2009019142A (ja) | 2007-07-13 | 2009-01-29 | Toyo Ink Mfg Co Ltd | 光硬化型インキ |
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EP2845845B1 (en) | 2012-05-03 | 2019-07-03 | Korea Research Institute of Chemical Technology | Novel oximester fluorine compound, and photopolymerization initiator and photoresist composition comprising same |
KR101531149B1 (ko) | 2012-09-28 | 2015-06-23 | 다이토 케믹스 코포레이션 | 플루오렌계 화합물, 상기 플루오렌계 화합물을 포함하는 광중합 개시제, 및 상기 광중합 개시제를 포함하는 감광성 조성물 |
WO2014157676A1 (ja) | 2013-03-29 | 2014-10-02 | 東京応化工業株式会社 | ビニル基含有フルオレン系化合物 |
KR101567837B1 (ko) * | 2013-06-11 | 2015-11-11 | 애경화학 주식회사 | 플루오렌 구조를 갖는 신규한 광개시제 및 이를 포함하는 반응성 액정 조성물 및 감광성 조성물 |
KR101939552B1 (ko) | 2013-12-06 | 2019-01-17 | 롬엔드하스전자재료코리아유한회사 | 유기 전계 발광 화합물 및 이를 포함하는 유기 전계 발광 소자 |
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CN107903156B (zh) | 2014-07-15 | 2019-05-31 | 东京应化工业株式会社 | 感光性组合物及化合物 |
CN107075000B (zh) | 2014-09-04 | 2020-01-31 | Igm集团公司 | 多环光引发剂 |
CN107001927B (zh) | 2014-11-21 | 2019-09-17 | 香港科技大学 | 用于细菌成像、杀灭、光动力疗法和抗生素筛选的aie发光团及其生产方法 |
CN104892512B (zh) | 2015-05-21 | 2018-01-05 | 常州强力先端电子材料有限公司 | 一种吡唑啉类增感剂及其制备方法和应用 |
CN106883114B (zh) | 2015-12-15 | 2019-11-19 | 常州强力先端电子材料有限公司 | 一种芴类多官能度光引发剂及其制备和应用 |
DK3392232T3 (da) | 2015-12-15 | 2021-04-12 | Changzhou Tronly Advanced Electronic Mat Co Ltd | Multifunktionel fluorenfotoinitiator og fremstilling og anvendelse deraf, og fotosensitiv resinsammensætning indeholdende fluorenfotoinitiator og anvendelse deraf |
KR102197059B1 (ko) | 2016-09-13 | 2020-12-31 | 창저우 트론리 어드벤스드 일렉트로닉 머티어리얼스 컴퍼니, 리미티드 | 플루오렌 광개시제, 그 제조 방법, 이를 갖는 광경화성 조성물, 및 광경화 분야에서 그 용도 |
US11118065B2 (en) * | 2017-02-17 | 2021-09-14 | Changzhou Tronly Advanced Electronic Materials Co., Ltd. | Fluorenylaminoketone photoinitiator, preparation method thereof, and UV photocurable composition containing same |
-
2016
- 2016-09-28 DK DK16874613.9T patent/DK3392232T3/da active
- 2016-09-28 US US16/061,490 patent/US11054743B2/en active Active
- 2016-09-28 WO PCT/CN2016/100601 patent/WO2017101553A1/zh active Application Filing
- 2016-09-28 JP JP2018530699A patent/JP6725663B2/ja active Active
- 2016-09-28 EP EP16874613.9A patent/EP3392232B1/en active Active
- 2016-09-28 KR KR1020187019720A patent/KR102079026B1/ko active IP Right Grant
- 2016-11-30 TW TW105139349A patent/TWI591050B/zh active
Also Published As
Publication number | Publication date |
---|---|
TWI591050B (zh) | 2017-07-11 |
EP3392232A4 (en) | 2019-08-28 |
EP3392232B1 (en) | 2021-02-17 |
JP2019507108A (ja) | 2019-03-14 |
JP6725663B2 (ja) | 2020-07-22 |
WO2017101553A1 (zh) | 2017-06-22 |
US11054743B2 (en) | 2021-07-06 |
EP3392232A1 (en) | 2018-10-24 |
KR20180101385A (ko) | 2018-09-12 |
US20200264508A1 (en) | 2020-08-20 |
TW201808874A (zh) | 2018-03-16 |
KR102079026B1 (ko) | 2020-02-19 |
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