DK173784D0 - Vandbaseret,fotopolymeriserbart materiale og dets anvendelse - Google Patents
Vandbaseret,fotopolymeriserbart materiale og dets anvendelseInfo
- Publication number
- DK173784D0 DK173784D0 DK1737/84A DK173784A DK173784D0 DK 173784 D0 DK173784 D0 DK 173784D0 DK 1737/84 A DK1737/84 A DK 1737/84A DK 173784 A DK173784 A DK 173784A DK 173784 D0 DK173784 D0 DK 173784D0
- Authority
- DK
- Denmark
- Prior art keywords
- water
- water based
- photopolymerizable material
- sensitizers
- plasticizers
- Prior art date
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G85/00—General processes for preparing compounds provided for in this subclass
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/11—Vinyl alcohol polymer or derivative
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/106—Binder containing
- Y10S430/113—Binder containing with plasticizer
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/115—Cationic or anionic
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/122—Sulfur compound containing
- Y10S430/123—Sulfur in heterocyclic ring
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/114—Initiator containing
- Y10S430/126—Halogen compound containing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
- Y10S430/1055—Radiation sensitive composition or product or process of making
- Y10S430/127—Spectral sensitizer containing
Landscapes
- Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Epoxy Resins (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Polymerisation Methods In General (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
GB08309019A GB2137626B (en) | 1983-03-31 | 1983-03-31 | Water based photopolymerisable compositions and their use |
Publications (2)
Publication Number | Publication Date |
---|---|
DK173784D0 true DK173784D0 (da) | 1984-03-30 |
DK173784A DK173784A (da) | 1984-10-01 |
Family
ID=10540571
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK173784A DK173784A (da) | 1983-03-31 | 1984-03-30 | Vandbaseret, fotopolymeriserbart materiale og dets anvendelse |
Country Status (9)
Country | Link |
---|---|
US (1) | US4548890A (da) |
EP (1) | EP0124292B1 (da) |
JP (1) | JPS59184220A (da) |
AT (1) | ATE40757T1 (da) |
AU (1) | AU574672B2 (da) |
CA (1) | CA1264889A (da) |
DE (1) | DE3476706D1 (da) |
DK (1) | DK173784A (da) |
GB (1) | GB2137626B (da) |
Families Citing this family (46)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
GB2139369B (en) * | 1983-05-06 | 1987-01-21 | Sericol Group Ltd | Photosensitive systems showing visible indication of exposure |
DE3565013D1 (en) * | 1984-02-10 | 1988-10-20 | Ciba Geigy Ag | Process for the preparation of a protection layer or a relief pattern |
GB8405549D0 (en) * | 1984-03-02 | 1984-04-04 | Sericol Group Ltd | Screen printing compositions |
US4554342A (en) * | 1984-07-30 | 1985-11-19 | Shell Oil Company | Heat-curable compositions comprising an epoxy resin, an amine and a sulfonium salt |
JPS61252546A (ja) * | 1985-05-01 | 1986-11-10 | Ueno Kagaku Kogyo Kk | 感光性レジストインク,それを用いたps板の製造方法およびそのps板の蝕刻方法 |
JPS62273226A (ja) * | 1986-05-20 | 1987-11-27 | Nippon Soda Co Ltd | 無電解メッキ用光硬化性レジスト樹脂組成物 |
US5300380A (en) * | 1986-08-06 | 1994-04-05 | Ciba-Geigy Corporation | Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers |
DE3766315D1 (de) * | 1986-08-06 | 1991-01-03 | Ciba Geigy Ag | Negativ-photoresist auf basis von polyphenolen und epoxidverbindungen oder vinylethern. |
EP0267554A3 (en) * | 1986-11-12 | 1990-09-19 | S.C. Johnson & Son, Inc. | Aqueous polymer systems curable by cationic photo-initiation and methods of applying same to substrates |
JPS63200339A (ja) * | 1987-02-12 | 1988-08-18 | Canon Inc | 情報記録媒体 |
JPH0814695B2 (ja) * | 1987-03-25 | 1996-02-14 | 富士写真フイルム株式会社 | 光可溶化組成物 |
US4994346A (en) * | 1987-07-28 | 1991-02-19 | Ciba-Geigy Corporation | Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds |
US4840977A (en) * | 1987-10-01 | 1989-06-20 | General Electric Company | Polymeric iodonium salts, method for making, and heat curable compositions |
JP2686283B2 (ja) * | 1988-06-13 | 1997-12-08 | 関西ペイント株式会社 | 光重合性組成物 |
US6180317B1 (en) | 1988-12-30 | 2001-01-30 | International Business Machines Corporation | Composition for photoimaging |
US4940651A (en) * | 1988-12-30 | 1990-07-10 | International Business Machines Corporation | Method for patterning cationic curable photoresist |
US5026624A (en) * | 1989-03-03 | 1991-06-25 | International Business Machines Corporation | Composition for photo imaging |
US5439766A (en) * | 1988-12-30 | 1995-08-08 | International Business Machines Corporation | Composition for photo imaging |
US5747223A (en) * | 1988-12-30 | 1998-05-05 | International Business Machines Corporation | Composition for photoimaging |
US5264325A (en) * | 1988-12-30 | 1993-11-23 | International Business Machines Corporation | Composition for photo imaging |
US5304457A (en) * | 1989-03-03 | 1994-04-19 | International Business Machines Corporation | Composition for photo imaging |
US5278010A (en) * | 1989-03-03 | 1994-01-11 | International Business Machines Corporation | Composition for photo imaging |
US5391465A (en) * | 1989-06-20 | 1995-02-21 | Rohm And Haas Company | Method of using selected photoactive compounds in high resolution, acid hardening photoresists with near ultraviolet radiation wherein the photoresist comprise conventional deep UV photoacid generators |
US5110711A (en) * | 1989-10-10 | 1992-05-05 | International Business Machines Corporation | Method for forming a pattern |
US5059512A (en) * | 1989-10-10 | 1991-10-22 | International Business Machines Corporation | Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions |
US5667934A (en) * | 1990-10-09 | 1997-09-16 | International Business Machines Corporation | Thermally stable photoimaging composition |
GB2269385A (en) * | 1992-07-14 | 1994-02-09 | Coates Brothers Plc | Coating compositions |
US5439779A (en) * | 1993-02-22 | 1995-08-08 | International Business Machines Corporation | Aqueous soldermask |
US6020436A (en) * | 1993-03-09 | 2000-02-01 | The Chromaline Corporation | Photosensitive resin composition |
TW460509B (en) * | 1996-07-12 | 2001-10-21 | Ciba Sc Holding Ag | Curing process for cationically photocurable formulations |
DE69731542T2 (de) * | 1996-09-19 | 2005-05-19 | Nippon Soda Co. Ltd. | Photokatalytische zusammensetzung |
JP3993691B2 (ja) * | 1997-09-24 | 2007-10-17 | 関西ペイント株式会社 | レジストパターン形成方法 |
US20030157414A1 (en) * | 1997-11-13 | 2003-08-21 | Pradeep K. Dhal | Holographic medium and process for use thereof |
EP1106639B1 (en) * | 1998-03-20 | 2007-08-29 | Nippon Soda Co., Ltd. | Photocurable composition containing iodonium salt compound |
US6232361B1 (en) * | 1998-12-11 | 2001-05-15 | Sun Chemical Corporation | Radiation curable water based cationic inks and coatings |
JP3992550B2 (ja) | 2002-07-04 | 2007-10-17 | 國宏 市村 | 感活性エネルギー線樹脂組成物、感活性エネルギー線樹脂フィルム及び該フィルムを用いるパターン形成方法 |
CA2532414C (en) | 2003-07-12 | 2017-03-14 | Accelr8 Technology Corporation | Sensitive and rapid biodetection |
US20120077206A1 (en) | 2003-07-12 | 2012-03-29 | Accelr8 Technology Corporation | Rapid Microbial Detection and Antimicrobial Susceptibility Testing |
JP2005162962A (ja) * | 2003-12-05 | 2005-06-23 | Konica Minolta Medical & Graphic Inc | 活性光線硬化型組成物及び活性光線硬化型インク、それを用いた画像形成方法及びインクジェット記録装置 |
JP4522751B2 (ja) * | 2004-06-08 | 2010-08-11 | 株式会社ムラカミ | 感光性フィルム、スクリーン印刷版およびエッチング用感光フィルム |
US20060189716A1 (en) * | 2005-02-24 | 2006-08-24 | Toru Ushirogouchi | Dispersion, inkjet ink, method of manufacturing dispersion, method of manufacturing inkjet ink, and printed matter |
US20060234159A1 (en) * | 2005-04-19 | 2006-10-19 | Nitto Denko Corporation | Photosensitive epoxy resin adhesive composition and use thereof |
US10254204B2 (en) | 2011-03-07 | 2019-04-09 | Accelerate Diagnostics, Inc. | Membrane-assisted purification |
US10023895B2 (en) | 2015-03-30 | 2018-07-17 | Accelerate Diagnostics, Inc. | Instrument and system for rapid microogranism identification and antimicrobial agent susceptibility testing |
CN110256993B (zh) * | 2018-12-05 | 2021-04-06 | 广东嘉元科技股份有限公司 | 一种应用于制备覆铜箔板的胶体铜箔 |
WO2021153487A1 (ja) * | 2020-01-30 | 2021-08-05 | 東レ株式会社 | 塗布剤、シート状中間基材、光硬化性の樹脂フィルム、繊維強化複合材料中間体、繊維強化複合材料ならびに繊維強化複合材料中間体および繊維強化複合材料の製造方法 |
Family Cites Families (14)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1669723A1 (de) * | 1967-09-22 | 1971-06-09 | Basf Ag | Indigoide Farbstoffe enthaltende Platten,Folien oder Filme aus photopolymerisierbaren Massen |
US3708296A (en) * | 1968-08-20 | 1973-01-02 | American Can Co | Photopolymerization of epoxy monomers |
US3782952A (en) * | 1971-04-01 | 1974-01-01 | Polychrome Corp | Light-sensitive composition of a tetra (epoxy-propoxyphenyl)-lower alkane and an initiator |
US4136102A (en) * | 1974-05-02 | 1979-01-23 | General Electric Company | Photoinitiators |
US4175972A (en) * | 1974-05-02 | 1979-11-27 | General Electric Company | Curable epoxy compositions containing aromatic onium salts and hydroxy compounds |
US4378277A (en) * | 1974-05-08 | 1983-03-29 | Minnesota Mining & Manufacturing Company | Photopolymerizable epoxy-containing compositions |
US4069054A (en) * | 1975-09-02 | 1978-01-17 | Minnesota Mining And Manufacturing Company | Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer |
US4090936A (en) * | 1976-10-28 | 1978-05-23 | Minnesota Mining And Manufacturing Company | Photohardenable compositions |
US4102687A (en) * | 1977-02-14 | 1978-07-25 | General Electric Company | UV Curable composition of a thermosetting condensation resin and Group VIa onium salt |
US4173476A (en) * | 1978-02-08 | 1979-11-06 | Minnesota Mining And Manufacturing Company | Complex salt photoinitiator |
US4286047A (en) * | 1979-07-25 | 1981-08-25 | Minnesota Mining And Manufacturing Company | Pressure-sensitive adhesive susceptible to ultraviolet light-induced detackification |
US4341859A (en) * | 1980-09-23 | 1982-07-27 | General Electric Company | Emulsion for making dry film resists |
GB2100874B (en) * | 1981-06-19 | 1985-05-01 | Sericol Group Ltd | Photosensitive compositions and their use |
US4418138A (en) * | 1981-11-03 | 1983-11-29 | Sericol Group Limited | Photopolymerizable materials for use in producing stencils for screen printing |
-
1983
- 1983-03-31 GB GB08309019A patent/GB2137626B/en not_active Expired
-
1984
- 1984-03-29 CA CA000450900A patent/CA1264889A/en not_active Expired - Fee Related
- 1984-03-29 AU AU26238/84A patent/AU574672B2/en not_active Ceased
- 1984-03-30 US US06/595,448 patent/US4548890A/en not_active Expired - Fee Related
- 1984-03-30 JP JP59063114A patent/JPS59184220A/ja active Pending
- 1984-03-30 EP EP84302232A patent/EP0124292B1/en not_active Expired
- 1984-03-30 DK DK173784A patent/DK173784A/da active IP Right Grant
- 1984-03-30 AT AT84302232T patent/ATE40757T1/de not_active IP Right Cessation
- 1984-03-30 DE DE8484302232T patent/DE3476706D1/de not_active Expired
Also Published As
Publication number | Publication date |
---|---|
DK173784A (da) | 1984-10-01 |
ATE40757T1 (de) | 1989-02-15 |
GB2137626B (en) | 1986-10-15 |
AU2623884A (en) | 1984-10-04 |
EP0124292B1 (en) | 1989-02-08 |
GB2137626A (en) | 1984-10-10 |
DE3476706D1 (en) | 1989-03-16 |
CA1264889A (en) | 1990-01-23 |
AU574672B2 (en) | 1988-07-14 |
EP0124292A2 (en) | 1984-11-07 |
EP0124292A3 (en) | 1985-09-18 |
US4548890A (en) | 1985-10-22 |
JPS59184220A (ja) | 1984-10-19 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
AHB | Application shelved due to non-payment | ||
B1 | Patent granted (law 1993) |