DK173784D0 - Vandbaseret,fotopolymeriserbart materiale og dets anvendelse - Google Patents

Vandbaseret,fotopolymeriserbart materiale og dets anvendelse

Info

Publication number
DK173784D0
DK173784D0 DK1737/84A DK173784A DK173784D0 DK 173784 D0 DK173784 D0 DK 173784D0 DK 1737/84 A DK1737/84 A DK 1737/84A DK 173784 A DK173784 A DK 173784A DK 173784 D0 DK173784 D0 DK 173784D0
Authority
DK
Denmark
Prior art keywords
water
water based
photopolymerizable material
sensitizers
plasticizers
Prior art date
Application number
DK1737/84A
Other languages
English (en)
Other versions
DK173784A (da
Inventor
Peter Dickinson
Michael Ellwood
Original Assignee
Sericol Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sericol Group Ltd filed Critical Sericol Group Ltd
Publication of DK173784D0 publication Critical patent/DK173784D0/da
Publication of DK173784A publication Critical patent/DK173784A/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00—Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00—General processes for preparing compounds provided for in this subclass
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/11—Vinyl alcohol polymer or derivative
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/113—Binder containing with plasticizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/115—Cationic or anionic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/122—Sulfur compound containing
    • Y10S430/123—Sulfur in heterocyclic ring
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/126—Halogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
  • Paints Or Removers (AREA)
DK173784A 1983-03-31 1984-03-30 Vandbaseret, fotopolymeriserbart materiale og dets anvendelse DK173784A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08309019A GB2137626B (en) 1983-03-31 1983-03-31 Water based photopolymerisable compositions and their use

Publications (2)

Publication Number Publication Date
DK173784D0 true DK173784D0 (da) 1984-03-30
DK173784A DK173784A (da) 1984-10-01

Family

ID=10540571

Family Applications (1)

Application Number Title Priority Date Filing Date
DK173784A DK173784A (da) 1983-03-31 1984-03-30 Vandbaseret, fotopolymeriserbart materiale og dets anvendelse

Country Status (9)

Country Link
US (1) US4548890A (da)
EP (1) EP0124292B1 (da)
JP (1) JPS59184220A (da)
AT (1) ATE40757T1 (da)
AU (1) AU574672B2 (da)
CA (1) CA1264889A (da)
DE (1) DE3476706D1 (da)
DK (1) DK173784A (da)
GB (1) GB2137626B (da)

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DE3565013D1 (en) * 1984-02-10 1988-10-20 Ciba Geigy Ag Process for the preparation of a protection layer or a relief pattern
GB8405549D0 (en) * 1984-03-02 1984-04-04 Sericol Group Ltd Screen printing compositions
US4554342A (en) * 1984-07-30 1985-11-19 Shell Oil Company Heat-curable compositions comprising an epoxy resin, an amine and a sulfonium salt
JPS61252546A (ja) * 1985-05-01 1986-11-10 Ueno Kagaku Kogyo Kk 感光性レジストインク，それを用いたｐｓ板の製造方法およびそのｐｓ板の蝕刻方法
JPS62273226A (ja) * 1986-05-20 1987-11-27 Nippon Soda Co Ltd 無電解メッキ用光硬化性レジスト樹脂組成物
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
DE3766315D1 (de) * 1986-08-06 1991-01-03 Ciba Geigy Ag Negativ-photoresist auf basis von polyphenolen und epoxidverbindungen oder vinylethern.
EP0267554A3 (en) * 1986-11-12 1990-09-19 S.C. Johnson & Son, Inc. Aqueous polymer systems curable by cationic photo-initiation and methods of applying same to substrates
JPS63200339A (ja) * 1987-02-12 1988-08-18 Canon Inc 情報記録媒体
JPH0814695B2 (ja) * 1987-03-25 1996-02-14 富士写真フイルム株式会社 光可溶化組成物
US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
US4840977A (en) * 1987-10-01 1989-06-20 General Electric Company Polymeric iodonium salts, method for making, and heat curable compositions
JP2686283B2 (ja) * 1988-06-13 1997-12-08 関西ペイント株式会社 光重合性組成物
US6180317B1 (en) 1988-12-30 2001-01-30 International Business Machines Corporation Composition for photoimaging
US4940651A (en) * 1988-12-30 1990-07-10 International Business Machines Corporation Method for patterning cationic curable photoresist
US5026624A (en) * 1989-03-03 1991-06-25 International Business Machines Corporation Composition for photo imaging
US5439766A (en) * 1988-12-30 1995-08-08 International Business Machines Corporation Composition for photo imaging
US5747223A (en) * 1988-12-30 1998-05-05 International Business Machines Corporation Composition for photoimaging
US5264325A (en) * 1988-12-30 1993-11-23 International Business Machines Corporation Composition for photo imaging
US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
US5278010A (en) * 1989-03-03 1994-01-11 International Business Machines Corporation Composition for photo imaging
US5391465A (en) * 1989-06-20 1995-02-21 Rohm And Haas Company Method of using selected photoactive compounds in high resolution, acid hardening photoresists with near ultraviolet radiation wherein the photoresist comprise conventional deep UV photoacid generators
US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
US5059512A (en) * 1989-10-10 1991-10-22 International Business Machines Corporation Ultraviolet light sensitive photoinitiator compositions, use thereof and radiation sensitive compositions
US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
GB2269385A (en) * 1992-07-14 1994-02-09 Coates Brothers Plc Coating compositions
US5439779A (en) * 1993-02-22 1995-08-08 International Business Machines Corporation Aqueous soldermask
US6020436A (en) * 1993-03-09 2000-02-01 The Chromaline Corporation Photosensitive resin composition
TW460509B (en) * 1996-07-12 2001-10-21 Ciba Sc Holding Ag Curing process for cationically photocurable formulations
DE69731542T2 (de) * 1996-09-19 2005-05-19 Nippon Soda Co. Ltd. Photokatalytische zusammensetzung
JP3993691B2 (ja) * 1997-09-24 2007-10-17 関西ペイント株式会社 レジストパターン形成方法
US20030157414A1 (en) * 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
EP1106639B1 (en) * 1998-03-20 2007-08-29 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound
US6232361B1 (en) * 1998-12-11 2001-05-15 Sun Chemical Corporation Radiation curable water based cationic inks and coatings
JP3992550B2 (ja) 2002-07-04 2007-10-17 國宏 市村 感活性エネルギー線樹脂組成物、感活性エネルギー線樹脂フィルム及び該フィルムを用いるパターン形成方法
CA2532414C (en) 2003-07-12 2017-03-14 Accelr8 Technology Corporation Sensitive and rapid biodetection
US20120077206A1 (en) 2003-07-12 2012-03-29 Accelr8 Technology Corporation Rapid Microbial Detection and Antimicrobial Susceptibility Testing
JP2005162962A (ja) * 2003-12-05 2005-06-23 Konica Minolta Medical & Graphic Inc 活性光線硬化型組成物及び活性光線硬化型インク、それを用いた画像形成方法及びインクジェット記録装置
JP4522751B2 (ja) * 2004-06-08 2010-08-11 株式会社ムラカミ 感光性フィルム、スクリーン印刷版およびエッチング用感光フィルム
US20060189716A1 (en) * 2005-02-24 2006-08-24 Toru Ushirogouchi Dispersion, inkjet ink, method of manufacturing dispersion, method of manufacturing inkjet ink, and printed matter
US20060234159A1 (en) * 2005-04-19 2006-10-19 Nitto Denko Corporation Photosensitive epoxy resin adhesive composition and use thereof
US10254204B2 (en) 2011-03-07 2019-04-09 Accelerate Diagnostics, Inc. Membrane-assisted purification
US10023895B2 (en) 2015-03-30 2018-07-17 Accelerate Diagnostics, Inc. Instrument and system for rapid microogranism identification and antimicrobial agent susceptibility testing
CN110256993B (zh) * 2018-12-05 2021-04-06 广东嘉元科技股份有限公司 一种应用于制备覆铜箔板的胶体铜箔
WO2021153487A1 (ja) * 2020-01-30 2021-08-05 東レ株式会社 塗布剤、シート状中間基材、光硬化性の樹脂フィルム、繊維強化複合材料中間体、繊維強化複合材料ならびに繊維強化複合材料中間体および繊維強化複合材料の製造方法

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US3708296A (en) * 1968-08-20 1973-01-02 American Can Co Photopolymerization of epoxy monomers
US3782952A (en) * 1971-04-01 1974-01-01 Polychrome Corp Light-sensitive composition of a tetra (epoxy-propoxyphenyl)-lower alkane and an initiator
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US4418138A (en) * 1981-11-03 1983-11-29 Sericol Group Limited Photopolymerizable materials for use in producing stencils for screen printing

Also Published As

Publication number Publication date
DK173784A (da) 1984-10-01
ATE40757T1 (de) 1989-02-15
GB2137626B (en) 1986-10-15
AU2623884A (en) 1984-10-04
EP0124292B1 (en) 1989-02-08
GB2137626A (en) 1984-10-10
DE3476706D1 (en) 1989-03-16
CA1264889A (en) 1990-01-23
AU574672B2 (en) 1988-07-14
EP0124292A2 (en) 1984-11-07
EP0124292A3 (en) 1985-09-18
US4548890A (en) 1985-10-22
JPS59184220A (ja) 1984-10-19

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment
B1 Patent granted (law 1993)