DK173784A - Vandbaseret, fotopolymeriserbart materiale og dets anvendelse - Google Patents

Vandbaseret, fotopolymeriserbart materiale og dets anvendelse Download PDF

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Publication number
DK173784A
DK173784A DK173784A DK173784A DK173784A DK 173784 A DK173784 A DK 173784A DK 173784 A DK173784 A DK 173784A DK 173784 A DK173784 A DK 173784A DK 173784 A DK173784 A DK 173784A
Authority
DK
Denmark
Prior art keywords
water
water based
photopolymerizable material
sensitizers
plasticizers
Prior art date
Application number
DK173784A
Other languages
English (en)
Other versions
DK173784D0 (da
Inventor
Peter Dickinson
Michael Ellwood
Original Assignee
Sericol Group Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sericol Group Ltd filed Critical Sericol Group Ltd
Publication of DK173784D0 publication Critical patent/DK173784D0/da
Publication of DK173784A publication Critical patent/DK173784A/da

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Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08LCOMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L61/00Compositions of condensation polymers of aldehydes or ketones; Compositions of derivatives of such polymers
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G85/00General processes for preparing compounds provided for in this subclass
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/11Vinyl alcohol polymer or derivative
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/106Binder containing
    • Y10S430/113Binder containing with plasticizer
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/115Cationic or anionic
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/122Sulfur compound containing
    • Y10S430/123Sulfur in heterocyclic ring
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/114Initiator containing
    • Y10S430/126Halogen compound containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/127Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Medicinal Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Epoxy Resins (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Paints Or Removers (AREA)
DK173784A 1983-03-31 1984-03-30 Vandbaseret, fotopolymeriserbart materiale og dets anvendelse DK173784A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
GB08309019A GB2137626B (en) 1983-03-31 1983-03-31 Water based photopolymerisable compositions and their use

Publications (2)

Publication Number Publication Date
DK173784D0 DK173784D0 (da) 1984-03-30
DK173784A true DK173784A (da) 1984-10-01

Family

ID=10540571

Family Applications (1)

Application Number Title Priority Date Filing Date
DK173784A DK173784A (da) 1983-03-31 1984-03-30 Vandbaseret, fotopolymeriserbart materiale og dets anvendelse

Country Status (9)

Country Link
US (1) US4548890A (da)
EP (1) EP0124292B1 (da)
JP (1) JPS59184220A (da)
AT (1) ATE40757T1 (da)
AU (1) AU574672B2 (da)
CA (1) CA1264889A (da)
DE (1) DE3476706D1 (da)
DK (1) DK173784A (da)
GB (1) GB2137626B (da)

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GB8405549D0 (en) * 1984-03-02 1984-04-04 Sericol Group Ltd Screen printing compositions
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JPS62273226A (ja) * 1986-05-20 1987-11-27 Nippon Soda Co Ltd 無電解メッキ用光硬化性レジスト樹脂組成物
US5300380A (en) * 1986-08-06 1994-04-05 Ciba-Geigy Corporation Process for the production of relief structures using a negative photoresist based on polyphenols and epoxy compounds or vinyl ethers
EP0255989B1 (de) * 1986-08-06 1990-11-22 Ciba-Geigy Ag Negativ-Photoresist auf Basis von Polyphenolen und Epoxidverbindungen oder Vinylethern
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US4994346A (en) * 1987-07-28 1991-02-19 Ciba-Geigy Corporation Negative photoresist based on polyphenols and selected epoxy or vinyl ether compounds
US4840977A (en) * 1987-10-01 1989-06-20 General Electric Company Polymeric iodonium salts, method for making, and heat curable compositions
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US5304457A (en) * 1989-03-03 1994-04-19 International Business Machines Corporation Composition for photo imaging
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US5110711A (en) * 1989-10-10 1992-05-05 International Business Machines Corporation Method for forming a pattern
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US5667934A (en) * 1990-10-09 1997-09-16 International Business Machines Corporation Thermally stable photoimaging composition
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DE69731542T2 (de) * 1996-09-19 2005-05-19 Nippon Soda Co. Ltd. Photokatalytische zusammensetzung
JP3993691B2 (ja) * 1997-09-24 2007-10-17 関西ペイント株式会社 レジストパターン形成方法
US20030157414A1 (en) * 1997-11-13 2003-08-21 Pradeep K. Dhal Holographic medium and process for use thereof
WO1999048945A1 (en) * 1998-03-20 1999-09-30 Nippon Soda Co., Ltd. Photocurable composition containing iodonium salt compound
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US20120077206A1 (en) 2003-07-12 2012-03-29 Accelr8 Technology Corporation Rapid Microbial Detection and Antimicrobial Susceptibility Testing
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JP2005162962A (ja) * 2003-12-05 2005-06-23 Konica Minolta Medical & Graphic Inc 活性光線硬化型組成物及び活性光線硬化型インク、それを用いた画像形成方法及びインクジェット記録装置
JP4522751B2 (ja) * 2004-06-08 2010-08-11 株式会社ムラカミ 感光性フィルム、スクリーン印刷版およびエッチング用感光フィルム
US20060189716A1 (en) * 2005-02-24 2006-08-24 Toru Ushirogouchi Dispersion, inkjet ink, method of manufacturing dispersion, method of manufacturing inkjet ink, and printed matter
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US10254204B2 (en) 2011-03-07 2019-04-09 Accelerate Diagnostics, Inc. Membrane-assisted purification
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CN109591426B (zh) * 2018-12-05 2019-09-13 广东嘉元科技股份有限公司 一种覆铜箔板的制备装置
EP4082677A4 (en) * 2020-01-30 2024-01-24 Toray Industries, Inc. COATING AGENT, SHEET-TYPE INTERMEDIATE BASE MATERIAL, PHOTOCURABLE RESIN FILM, FIBER-REINFORCED COMPOSITE MATERIAL INTERMEDIATE, FIBER-REINFORCED COMPOSITE MATERIAL, METHOD FOR PRODUCING FIBER-REINFORCED COMPOSITE MATERIAL INTERMEDIATE, AND METHOD FOR MATERIAL PRODUCTION FIBER REINFORCED COMPOSITE
JP7707559B2 (ja) * 2020-03-02 2025-07-15 東レ株式会社 塗布剤および中間基材
JP7739717B2 (ja) * 2020-03-03 2025-09-17 東レ株式会社 繊維強化複合材料中間体、繊維強化複合材料の製造方法
JP7739718B2 (ja) * 2020-04-28 2025-09-17 東レ株式会社 繊維強化複合材料中間体、繊維強化複合材料の製造方法
JP2022153282A (ja) * 2021-03-29 2022-10-12 東レ株式会社 エポキシ樹脂組成物、表面保護中間基材および繊維強化複合材料中間体

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Also Published As

Publication number Publication date
DK173784D0 (da) 1984-03-30
GB2137626A (en) 1984-10-10
US4548890A (en) 1985-10-22
EP0124292A2 (en) 1984-11-07
JPS59184220A (ja) 1984-10-19
CA1264889A (en) 1990-01-23
EP0124292A3 (en) 1985-09-18
DE3476706D1 (en) 1989-03-16
AU574672B2 (en) 1988-07-14
EP0124292B1 (en) 1989-02-08
ATE40757T1 (de) 1989-02-15
GB2137626B (en) 1986-10-15
AU2623884A (en) 1984-10-04

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Legal Events

Date Code Title Description
AHB Application shelved due to non-payment
B1 Patent granted (law 1993)