DK0758818T3 - Overfladeskimmende massebølgesubstat og anordning indeholdende samme - Google Patents
Overfladeskimmende massebølgesubstat og anordning indeholdende sammeInfo
- Publication number
- DK0758818T3 DK0758818T3 DK96111994T DK96111994T DK0758818T3 DK 0758818 T3 DK0758818 T3 DK 0758818T3 DK 96111994 T DK96111994 T DK 96111994T DK 96111994 T DK96111994 T DK 96111994T DK 0758818 T3 DK0758818 T3 DK 0758818T3
- Authority
- DK
- Denmark
- Prior art keywords
- shimmering
- same
- device containing
- wave substrate
- mass wave
- Prior art date
Links
- 239000000758 substrate Substances 0.000 title 1
Classifications
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H9/00—Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
- H03H9/02—Details
- H03H9/02535—Details of surface acoustic wave devices
- H03H9/02543—Characteristics of substrate, e.g. cutting angles
- H03H9/02559—Characteristics of substrate, e.g. cutting angles of lithium niobate or lithium-tantalate substrates
-
- H—ELECTRICITY
- H03—ELECTRONIC CIRCUITRY
- H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
- H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
- H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
- H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/42—Piezoelectric device making
Landscapes
- Physics & Mathematics (AREA)
- Acoustics & Sound (AREA)
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Materials Engineering (AREA)
- Manufacturing & Machinery (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Piezo-Electric Or Mechanical Vibrators, Or Delay Or Filter Circuits (AREA)
- Piezo-Electric Transducers For Audible Bands (AREA)
- Transducers For Ultrasonic Waves (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US51539995A | 1995-08-15 | 1995-08-15 |
Publications (1)
Publication Number | Publication Date |
---|---|
DK0758818T3 true DK0758818T3 (da) | 2000-07-24 |
Family
ID=24051201
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DK96111994T DK0758818T3 (da) | 1995-08-15 | 1996-07-25 | Overfladeskimmende massebølgesubstat og anordning indeholdende samme |
Country Status (5)
Country | Link |
---|---|
US (2) | US5777419A (da) |
EP (1) | EP0758818B1 (da) |
JP (1) | JPH09238039A (da) |
DE (1) | DE69607264T2 (da) |
DK (1) | DK0758818T3 (da) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3358688B2 (ja) * | 1995-04-10 | 2002-12-24 | 三洋電機株式会社 | 弾性表面波素子 |
DE19638398C2 (de) * | 1996-09-19 | 1999-12-30 | Siemens Matsushita Components | Oberflächenwellen-Bauelement |
US6937283B1 (en) * | 1996-12-03 | 2005-08-30 | Eastman Kodak Company | Anti-aliasing low-pass blur filter for reducing artifacts in imaging apparatus |
US6495398B1 (en) * | 2001-01-05 | 2002-12-17 | Clarisay, Incorporated | Wafer-scale package for surface acoustic wave circuit and method of manufacturing the same |
US6621379B1 (en) | 2001-11-29 | 2003-09-16 | Clarisay, Incorporated | Hermetic package for surface acoustic wave device and method of manufacturing the same |
US6507097B1 (en) | 2001-11-29 | 2003-01-14 | Clarisay, Inc. | Hermetic package for pyroelectric-sensitive electronic device and method of manufacturing the same |
US6649446B1 (en) | 2001-11-29 | 2003-11-18 | Clarisay, Inc. | Hermetic package for multiple contact-sensitive electronic devices and methods of manufacturing thereof |
US6639150B1 (en) | 2002-04-23 | 2003-10-28 | Clarisay, Inc. | Hermetic package for surface acoustic wave device having exposed device substrate contacts and method of manufacturing the same |
US7105980B2 (en) * | 2002-07-03 | 2006-09-12 | Sawtek, Inc. | Saw filter device and method employing normal temperature bonding for producing desirable filter production and performance characteristics |
US10868576B2 (en) | 2018-04-27 | 2020-12-15 | Board Of Trustees Of The University Of Illinois | Frequency independence for synthesis within programmable non-reciprocal network circuit |
Family Cites Families (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US3699364A (en) * | 1971-06-04 | 1972-10-17 | Hughes Aircraft Co | Acoustic surface wave device having improved transducer structure |
US3725827A (en) * | 1972-05-17 | 1973-04-03 | Us Air Force | High coupling low diffraction acoustic surface wave delay line |
US3771072A (en) * | 1972-12-15 | 1973-11-06 | Us Air Force | Low velocity zero temperature coefficient acoustic surface wave delay line having group and phase velocity vector coincidence |
GB1474180A (en) * | 1973-10-12 | 1977-05-18 | Mullard Ltd | Acoustic surface wave devices |
US3867012A (en) * | 1974-04-29 | 1975-02-18 | Rca Corp | Novel lithium niobate single crystal film structure |
US4006435A (en) * | 1974-12-23 | 1977-02-01 | Hazeltine Corporation | Method for fabricating a temperature compensated surface wave device |
US4001767A (en) * | 1975-11-18 | 1977-01-04 | The United States Of America As Represented By The Secretary Of The Air Force | Low diffraction loss-low spurious response LiTaO3 substrate for surface acoustic wave devices |
GB1591624A (en) * | 1977-01-24 | 1981-06-24 | Secr Defence | Acoustic wave devices |
US4130813A (en) * | 1977-05-23 | 1978-12-19 | Raytheon Company | Surface wave device having enhanced reflectivity gratings |
JPS55115711A (en) * | 1979-03-01 | 1980-09-05 | Seiko Instr & Electronics Ltd | Bending vibrator |
US4523119A (en) * | 1980-06-11 | 1985-06-11 | Plessey Overseas Limited | Application of lithium tetraborate to saw devices |
US4634913B1 (en) * | 1980-06-11 | 1997-05-13 | Plessey Co Ltd | Application of lithium tetraborate to electronic devices |
JPS594310A (ja) * | 1982-06-30 | 1984-01-11 | Toshiba Corp | 弾性表面波装置 |
FR2534243B1 (fr) * | 1982-10-11 | 1986-02-14 | Saint Gobain Vitrage | Procede pour le transport de feuilles de verre portees a leur temperature de deformation, son application au bombage et dispositif pour sa mise en oeuvre |
JPS59156013A (ja) * | 1983-02-25 | 1984-09-05 | Hiroshi Shimizu | 高結合弾性表面波圧電基板 |
US4525643A (en) * | 1983-10-28 | 1985-06-25 | Allied Corporation | Temperature compensated orientations of berlinite for surface acoustic wave devices |
US4511817A (en) * | 1983-10-28 | 1985-04-16 | Allied Corporation | Temperature compensated orientation of berlinite for surface acoustic wave devices |
JPS6182513A (ja) * | 1984-05-18 | 1986-04-26 | Hitachi Ltd | 弾性表面波装置 |
EP0166880B1 (en) * | 1984-06-05 | 1990-01-03 | Kabushiki Kaisha Toshiba | Surface acoustic wave device |
JPS6153200A (ja) * | 1984-08-21 | 1986-03-17 | Hamamatsu Photonics Kk | ニオブ酸リチウム単結晶板の製造方法 |
JPS6173409A (ja) * | 1984-09-18 | 1986-04-15 | Nec Kansai Ltd | 弾性表面波装置 |
US4910839A (en) * | 1984-12-03 | 1990-03-27 | R.F. Monolithics, Inc. | Method of making a single phase unidirectional surface acoustic wave transducer |
US4670680A (en) * | 1986-07-29 | 1987-06-02 | R. F. Monolithics, Inc. | Doubly rotated orientations of cut angles for quartz crystal for novel surface acoustic wave devices |
US5081389A (en) * | 1990-11-30 | 1992-01-14 | Ascom Zelcom Ag. | Crystal cut angles for lithium tantalate crystal for novel surface acoustic wave devices |
US5270606A (en) * | 1991-07-22 | 1993-12-14 | Motorola, Inc. | Processing robust acoustic reflectors |
JP3244094B2 (ja) * | 1992-03-13 | 2002-01-07 | キンセキ株式会社 | 弾性表面波装置 |
JPH0685597A (ja) * | 1992-09-02 | 1994-03-25 | Mitsubishi Electric Corp | 弾性表面波装置 |
JP3016664B2 (ja) * | 1992-09-24 | 2000-03-06 | 富士通テン株式会社 | 映像表示装置の同期信号処理回路 |
JPH06164287A (ja) * | 1992-09-25 | 1994-06-10 | Seiko Epson Corp | 弾性表面波素子の周波数調整方法および弾性表面波素子の電極パターン |
US5434466A (en) * | 1994-05-31 | 1995-07-18 | Motorola, Inc. | Acoustic wave filter with reduced bulk-wave scattering loss and method |
-
1996
- 1996-07-25 EP EP96111994A patent/EP0758818B1/en not_active Revoked
- 1996-07-25 DK DK96111994T patent/DK0758818T3/da active
- 1996-07-25 DE DE69607264T patent/DE69607264T2/de not_active Revoked
- 1996-08-06 JP JP22438096A patent/JPH09238039A/ja active Pending
-
1997
- 1997-01-15 US US08/783,962 patent/US5777419A/en not_active Expired - Fee Related
- 1997-01-22 US US08/787,059 patent/US5896636A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
DE69607264D1 (de) | 2000-04-27 |
US5896636A (en) | 1999-04-27 |
EP0758818A1 (en) | 1997-02-19 |
US5777419A (en) | 1998-07-07 |
JPH09238039A (ja) | 1997-09-09 |
DE69607264T2 (de) | 2000-10-26 |
EP0758818B1 (en) | 2000-03-22 |
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