DE861219T1 - Whiskerarmiertes keramisches schneidwerkzeug und zusammensetzung davon - Google Patents
Whiskerarmiertes keramisches schneidwerkzeug und zusammensetzung davonInfo
- Publication number
- DE861219T1 DE861219T1 DE0861219T DE96935903T DE861219T1 DE 861219 T1 DE861219 T1 DE 861219T1 DE 0861219 T DE0861219 T DE 0861219T DE 96935903 T DE96935903 T DE 96935903T DE 861219 T1 DE861219 T1 DE 861219T1
- Authority
- DE
- Germany
- Prior art keywords
- composition
- ceramic
- matrix
- volume
- titanium
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000000203 mixture Substances 0.000 title claims 41
- 239000000919 ceramic Substances 0.000 title claims 39
- 239000011159 matrix material Substances 0.000 claims 34
- HBMJWWWQQXIZIP-UHFFFAOYSA-N silicon carbide Chemical compound [Si+]#[C-] HBMJWWWQQXIZIP-UHFFFAOYSA-N 0.000 claims 14
- 239000010936 titanium Substances 0.000 claims 14
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 claims 13
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 claims 11
- 238000005245 sintering Methods 0.000 claims 11
- 229910052719 titanium Inorganic materials 0.000 claims 11
- QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 claims 9
- 229910052726 zirconium Inorganic materials 0.000 claims 9
- 150000001247 metal acetylides Chemical class 0.000 claims 7
- 150000004767 nitrides Chemical class 0.000 claims 7
- 229910052735 hafnium Inorganic materials 0.000 claims 6
- VBJZVLUMGGDVMO-UHFFFAOYSA-N hafnium atom Chemical compound [Hf] VBJZVLUMGGDVMO-UHFFFAOYSA-N 0.000 claims 6
- 229910010271 silicon carbide Inorganic materials 0.000 claims 6
- RVTZCBVAJQQJTK-UHFFFAOYSA-N oxygen(2-);zirconium(4+) Chemical compound [O-2].[O-2].[Zr+4] RVTZCBVAJQQJTK-UHFFFAOYSA-N 0.000 claims 5
- 229910001928 zirconium oxide Inorganic materials 0.000 claims 5
- QYEXBYZXHDUPRC-UHFFFAOYSA-N B#[Ti]#B Chemical compound B#[Ti]#B QYEXBYZXHDUPRC-UHFFFAOYSA-N 0.000 claims 3
- 229910052580 B4C Inorganic materials 0.000 claims 3
- 229910039444 MoC Inorganic materials 0.000 claims 3
- ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 claims 3
- 229910052581 Si3N4 Inorganic materials 0.000 claims 3
- LRTTZMZPZHBOPO-UHFFFAOYSA-N [B].[B].[Hf] Chemical compound [B].[B].[Hf] LRTTZMZPZHBOPO-UHFFFAOYSA-N 0.000 claims 3
- INAHAJYZKVIDIZ-UHFFFAOYSA-N boron carbide Chemical compound B12B3B4C32B41 INAHAJYZKVIDIZ-UHFFFAOYSA-N 0.000 claims 3
- 229910000449 hafnium oxide Inorganic materials 0.000 claims 3
- WIHZLLGSGQNAGK-UHFFFAOYSA-N hafnium(4+);oxygen(2-) Chemical compound [O-2].[O-2].[Hf+4] WIHZLLGSGQNAGK-UHFFFAOYSA-N 0.000 claims 3
- 229910052750 molybdenum Inorganic materials 0.000 claims 3
- 239000011733 molybdenum Substances 0.000 claims 3
- ZPZCREMGFMRIRR-UHFFFAOYSA-N molybdenum titanium Chemical compound [Ti].[Mo] ZPZCREMGFMRIRR-UHFFFAOYSA-N 0.000 claims 3
- 229910052758 niobium Inorganic materials 0.000 claims 3
- 239000010955 niobium Substances 0.000 claims 3
- GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 claims 3
- 239000002245 particle Substances 0.000 claims 3
- HQVNEWCFYHHQES-UHFFFAOYSA-N silicon nitride Chemical compound N12[Si]34N5[Si]62N3[Si]51N64 HQVNEWCFYHHQES-UHFFFAOYSA-N 0.000 claims 3
- 239000006104 solid solution Substances 0.000 claims 3
- 229910052715 tantalum Inorganic materials 0.000 claims 3
- GUVRBAGPIYLISA-UHFFFAOYSA-N tantalum atom Chemical compound [Ta] GUVRBAGPIYLISA-UHFFFAOYSA-N 0.000 claims 3
- MTPVUVINMAGMJL-UHFFFAOYSA-N trimethyl(1,1,2,2,2-pentafluoroethyl)silane Chemical compound C[Si](C)(C)C(F)(F)C(F)(F)F MTPVUVINMAGMJL-UHFFFAOYSA-N 0.000 claims 3
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 claims 3
- 229910052721 tungsten Inorganic materials 0.000 claims 3
- 239000010937 tungsten Substances 0.000 claims 3
- 229910052720 vanadium Inorganic materials 0.000 claims 3
- LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 claims 3
- 239000011248 coating agent Substances 0.000 claims 2
- 238000000576 coating method Methods 0.000 claims 2
- CPLXHLVBOLITMK-UHFFFAOYSA-N magnesium oxide Inorganic materials [Mg]=O CPLXHLVBOLITMK-UHFFFAOYSA-N 0.000 claims 2
- 239000000395 magnesium oxide Substances 0.000 claims 2
- AXZKOIWUVFPNLO-UHFFFAOYSA-N magnesium;oxygen(2-) Chemical compound [O-2].[Mg+2] AXZKOIWUVFPNLO-UHFFFAOYSA-N 0.000 claims 2
- TWNQGVIAIRXVLR-UHFFFAOYSA-N oxo(oxoalumanyloxy)alumane Chemical compound O=[Al]O[Al]=O TWNQGVIAIRXVLR-UHFFFAOYSA-N 0.000 claims 2
- SIWVEOZUMHYXCS-UHFFFAOYSA-N oxo(oxoyttriooxy)yttrium Chemical compound O=[Y]O[Y]=O SIWVEOZUMHYXCS-UHFFFAOYSA-N 0.000 claims 2
- VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims 1
- 229910010037 TiAlN Inorganic materials 0.000 claims 1
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims 1
- NRTOMJZYCJJWKI-UHFFFAOYSA-N Titanium nitride Chemical compound [Ti]#N NRTOMJZYCJJWKI-UHFFFAOYSA-N 0.000 claims 1
- 238000005229 chemical vapour deposition Methods 0.000 claims 1
- 229910052804 chromium Inorganic materials 0.000 claims 1
- 239000011651 chromium Substances 0.000 claims 1
- 238000005240 physical vapour deposition Methods 0.000 claims 1
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- C04B41/00—After-treatment of mortars, concrete, artificial stone or ceramics; Treatment of natural stone
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- C04B35/80—Fibres, filaments, whiskers, platelets, or the like
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Claims (1)
- PRINZ & PARTNERPATENTANWÄLTE Manzingenveg 7EUROPEAN PATENT ATTORNEYS D-81241 München12. Oktober 199896935903.3-1218
Kennametal Ine.Our File; K 1593 DEPatentansprüche1. Durch Verdichtung einer Mischung aus Startkomponenten hergestellte Zusammensetzung, wobei die Zusammensetzung folgendes umfaßt:eine Matrix mit einem oder mehreren der Karbide, Nitride und Karbonitride von Hafnium, Molybdän, Wolfram, Zirkonium, Tantal, Niob, Vanadium, Titan und deren festen Lösungen in einer Menge von über 50 Vol.-% der Matrix, wobei die Matrix weiter Rückstände von Sinterhilfsmitteln beinhaltet, die aufgrund der Verwendung eines Sinterhilfsmittels oder mehrerer Sinterhilfsmittel als Startkomponente in einer Menge von weniger als 0,5 Gew.-% der Startkomponenten vorhanden sind, wobei das Sinterhilfsmittel Yttriumoxid, Magnesiumoxid und/oder Zirkoniumoxid umfaßt, und wobei die Matrix zwischen 60 und 99,8 Vol.-% der Zusammensetzung umfaßt; undKeramikwhisker, die gleichförmig über die Matrix verteilt sind, wobei die Keramikwhisker zwischen 0,2 und 40 Vol.-% der Zusammensetzung umfassen.2. Zusammensetzung nach Anspruch 1, bei der die Keramikwhisker aus einem oder mehreren Stoffen der folgenden Gruppe ausgewählt sind: Aluminiumoxid, Siliciumkarbid, Borkarbid, Siliciumnitrid und die Karbide, Nitride, Boride und Karbonitride von Titan, Zirkonium und Hafnium.3. Zusammensetzung nach Anspruch 1, bei der die Matrix weiter Keramikpartikel beinhaltet, die aus der wenigstens einem Stoff der aus Siliciumkarbid, Titanborid, Zirkoniumborid, Hafniumborid, Aluminiumoxid, Zirkoniumoxid und Hafniumoxid bestehenden Gruppe ausgewählt sind.4. Zusammensetzung nach Anspruch 1, bei der die Matrix mehr als 50 Vol.-% Titankarbonitrid und der Rest der Matrix wenigstens 40 Vol.-% Aluminiumoxid aufweist.5. Zusammensetzung nach Anspruch 5, bei der die Keramikwhisker Siliciumkarbidwhisker umfassen und die Siliciumkarbidwhisker zwischen etwa 2 Vol.-% und etwa 35 Vol.-% der Zusammensetzung umfassen.6. Zusammensetzung nach Anspruch 5, bei der die Keramikwhisker Siliciumkarbidwhisker umfassen und die Siliciumkarbidwhisker zwischen 10 Vol.-% und 30 Vol.-% der Zusammensetzung umfassen.7. Zusammensetzung nach Anspruch 1, bei der die Matrix mehr als 50 Vol.-% Titankarbonitrid und der Rest der Matrix weniger als 50 Vol.-% Aluminiumoxid aufweist.8. Zusammensetzung nach Anspruch 1, bei der die Matrix mehr als 50 Vol.-% Titanmolybdänkarbid und der Rest der Matrix wenigstens 40 Vol.-% Aluminiumoxid aufweist.9. Zusammensetzung nach Anspruch 8, worin die Keramikwhisker Siliciumkarbidwhisker umfassen und die Siliciumkarbidwhisker zwischen etwa 2 Vol.-% und etwa 35 Vol.-% der Zusammensetzung umfassen.H 61 ZI 9 T10. Zusammensetzung nach Anspruch 1, bei der die Matrix mehr als 50 Vol.-% Titanmolybdänkarbid aufweist und der Rest der Matrix weniger als 50 Vol.-% Aluminiumoxid aufweist.11. Keramisches Schneidwerkzeug mit:einer Spanfläche, einer Freifläche und einer Schneidkante am Zusammentreffen der Spanfläche und der Freifläche,einer keramischen Zusammensetzung mit einer Matrix, die wenigstens 50 Vol.-% von einem oder mehreren der Karbide, Nitride und Karbonitride von Hafnium, Molybdän, Zirkonium, Tantal, Niob, Vanadium, Wolfram, Titan und deren festen Lösungen umfaßt, wobei die Matrix weiter Rückstände von Sinterhilfsmitteln beinhaltet, die aufgrund der Verwendung eines Sinterhilfsmittels oder mehrerer Sinterhilfsmittel als Startkomponente in einer Menge von weniger als 0,5 Gew.-% der Startkomponenten vorhanden sind, wobei das Sinterhilfsmittel Yttriumoxid, Magnesiumoxid und/oder Zirkoniumoxid umfaßt, und wobei die Matrix zwischen 60 und 99,8 Vol.-% der keramischen Zusammensetzung umfaßt; undKeramikwhiskern, die gleichförmig über die Matrix verteilt sind, wobei die Keramikwhisker zwischen 0,2 und 40 Vol.-% der keramischen Zusammensetzung umfassen.12. Keramisches Schneidwerkzeug nach Anspruch 12, bei dem die Keramikwhisker aus einem oder mehreren Stoffen der aus Aluminiumoxid, Siliciumkarbid, Siliciumnitrid, Borkarbid und den Karbiden, Nitriden, Boriden oder Karbonitriden von Titan, Zirkon oder Hafnium bestehenden Gruppe ausgewählt sind.13. Keramisches Schneidwerkzeug nach Anspruch 12, bei dem die Matrix weiter Keramikpartikel aufweist, die aus einem oder mehreren Stoffen der aus Siliciumkarbid, Titanborid, Zirkoniumborid, Hafniumborid, Aluminiumoxid, Zirkoniumoxid und Hafniumoxid bestehenden Gruppe ausgewählt sind.14. Keramisches Schneidwerkzeug nach Anspruch 12, das ferner eine Beschichtung auf der Spanfläche und der Freifläche aufweist.15. Keramisches Schneidwerkzeug nach Anspruch 15, bei dem die Beschichtung eine Schicht aufweist, die aus der aus Aluminiumoxid, TiC, TiN, TiCN und TiAlN bestehenden Gruppe ausgewählt ist.16. Keramisches Schneidwerkzeug nach Anspruch 16, bei dem die Schicht durch chemisches Aufdampfen aufgebracht ist.17. Keramisches Schneidwerkzeug nach Anspruch 16, bei dem die Schicht durch physikalisches Aufdampfen aufgebracht ist.18. Durch Verdichtung einer Mischung aus Startkomponenten hergestellte keramische Zusammensetzung, wobei die keramische Zusammensetzung folgendes umfaßt:eine Matrix mit einem oder mehreren der Stoffe Titannitrid, Titankarbonitrid, den Karbiden, Nitriden und Karbonitriden von Hafnium, Molybdän, Niob und Wolfram und deren festen Lösungen in einer Menge von über 50 Vol.-% der Matrix, wobei die Matrix zwischen 60 und 99,8 Vol.-% der Zusammensetzung umfaßt; undKeramikwhisker, die gleichförmig über die Matrix verteilt sind, wobei die Keramikwhisker zwischen 0,2 und 40 Vol.-% der Zusammensetzung umfassen.19. Zusammensetzung nach Anspruch 19, bei der die Keramikwhisker einem oder mehreren Stoffen der aus Aluminiumoxid, Siliciumkarbid, Siliciumnitrid, Borkarbid und den Karbiden, Nitriden, Boriden und Karbonitriden von Titan, Zirkonium und Hafnium bestehenden Gruppe ausgewählt sind./EP O ®ß191&ogr; &tgr;20. Zusammensetzung nach Anspruch 19, bei der die Matrix weiter Keramikpartikel beinhaltet, die aus einem oder mehreren Stoffen der aus Siliciumkarbid, Titanborid, Zirkoniumborid, Hafniumborid, Chromborid, Aluminiumoxid, Zirkoniumoxid und Hafniumoxid bestehenden Gruppe ausgewählt sind.21. Zusammensetzung nach Anspruch 19, bei der die Matrix weiter Titankarbid und die Karbide, Karbonitride und Nitride von Zirkonium, Tantal und Vanadium umfaßt, und bei der die Matrix weiter Rückstände von Sinterhilfsmitteln aufweist, die aufgrund der Verwendung eines Sinterhilfsmittels oder mehrerer Sinterhilfsmittel als Startkomponente in einer Menge von höchstens 1 Gew.-% der Startkomponenten vorhanden sind.22. Zusammensetzung nach Anspruch 22, bei der die Matrix mehr als 50 Vol.-% Titankarbid und der Rest der Matrix wenigstens 40 Vol.-% Aluminiumoxid und Rückstände von Sinterhilfsmitteln aufweist.23. Zusammensetzung nach Anspruch 23, bei der die Keramikwhisker Siliciumkarbidwhisker umfassen und die Siliciumkarbidwhisker zwischen etwa 10 Vol.-% und etwa 40 Vol.-% der Zusammensetzung umfassen.24. Zusammensetzung nach Anspruch 22, bei der die Matrix mehr als 50 Vol.-% Titankarbid, und der Rest der Matrix weniger als 50 Vol.-% Aluminiumoxid und Rückstände von Sinterhilfsmitteln aufweist.25. Keramisches Schneidwerkzeug mit:einer Spanfläche, einer Freifläche und einer Schneidkante am Zusammentreffen der Spanfläche und der Freifläche;einer keramischen Zusammensetzung mit einer Matrix, die zwischen etwa 45 Vol.-% und weniger als 50 Vol.-% Titanmolybdänkarbid und weniger als etwa 55 Vol.-% Aluminiumoxid auf-weist, wobei die Matrix zwischen etwa 60 Vol.-% und etwa 90 Vol.-% der keramischen Zusammensetzung umfaßt; undKeramikwhiskern, die gleichförmig über die Matrix verteilt sind, wobei die Keramikwhisker etwa 2 Vol.-% bis etwa 35 VoL-% der keramischen Zusammensetzung umfassen.26. Keramisches Schneidwerkzeug nach Anspruch 26, bei dem die Matrix zwischen etwa 55 Vol.-% und mehr als etwa 50 Vol.-% Aluminiumoxid aufweist.27. Keramisches Schneidwerkzeug nach Anspruch 26, bei dem die Keramikwhisker etwa 10 Vol.-% bis etwa 30 Vol.-% der keramischen Zusammensetzung umfassen.28. Zusammensetzung nach Anspruch 1, bei der das oder die Sinterhilfsmittel eine Menge von höchstens 0,3 Gew.-% der Startkomponenten umfassen.29. Zusammensetzung nach Anspruch 5, bei der das Titankarbonitrid die Formel Ti(CxNy) aufweist, wobei y kleiner als 0,95 und größer als 0,5 ist und &khgr; + y = 1 ist.30. Zusammensetzung nach Anspruch 5, bei der das Titankarbonitrid die Formel Ti(CxNy) aufweist, wobei y kleiner als 0,9 und größer oder gleich 0,55 ist und &khgr; + y = 1 ist.31. Zusammensetzung nach Anspruch 5, bei der das Titankarbonitrid die Formel Ti(CxNy) aufweist, wobei y kleiner als 0,75 und größer oder gleich 0,6 ist und &khgr; + y = 1 ist.
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US55775195A | 1995-11-13 | 1995-11-13 | |
PCT/US1996/015192 WO1997018177A1 (en) | 1995-11-13 | 1996-09-20 | Whisker reinforced ceramic cutting tool and composition thereof |
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DE861219T1 true DE861219T1 (de) | 1999-03-04 |
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DE0861219T Pending DE861219T1 (de) | 1995-11-13 | 1996-09-20 | Whiskerarmiertes keramisches schneidwerkzeug und zusammensetzung davon |
DE69620215T Revoked DE69620215T2 (de) | 1995-11-13 | 1996-09-20 | Whiskerarmiertes keramisches schneidwerkzeug und zusammensetzung davon |
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DE69620215T Revoked DE69620215T2 (de) | 1995-11-13 | 1996-09-20 | Whiskerarmiertes keramisches schneidwerkzeug und zusammensetzung davon |
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EP (1) | EP0861219B1 (de) |
JP (1) | JP2000500426A (de) |
KR (1) | KR100284058B1 (de) |
CN (1) | CN1088689C (de) |
BR (1) | BR9611449A (de) |
DE (2) | DE861219T1 (de) |
ES (1) | ES2121714T3 (de) |
WO (1) | WO1997018177A1 (de) |
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DE10320652A1 (de) * | 2003-05-07 | 2004-12-02 | Kennametal Widia Gmbh & Co.Kg | Werkzeug, insbesondere Schneidwerkzeug und Verfahren zur CVD-Abscheidung einer zweiphasigen Schicht auf einem Substratkörper |
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US8097548B2 (en) * | 2006-05-22 | 2012-01-17 | Zhang Shi C | High-density pressurelessly sintered zirconium diboride/silicon carbide composite bodies and a method for producing the same |
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KR101661831B1 (ko) * | 2013-08-08 | 2016-09-30 | 니뽄 도쿠슈 도교 가부시키가이샤 | 세라믹 조성물 및 절삭 공구 |
CN104387101A (zh) * | 2014-11-07 | 2015-03-04 | 合肥大安印刷有限责任公司 | 一种切削刀具用碳化硅晶须增强陶瓷及其制备方法 |
CN104446456A (zh) * | 2014-11-11 | 2015-03-25 | 合肥皖为电气设备工程有限责任公司 | 一种高抗弯强度切削刀具用陶瓷及其制备方法 |
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-
1996
- 1996-09-20 WO PCT/US1996/015192 patent/WO1997018177A1/en not_active Application Discontinuation
- 1996-09-20 KR KR1019980703520A patent/KR100284058B1/ko not_active IP Right Cessation
- 1996-09-20 DE DE0861219T patent/DE861219T1/de active Pending
- 1996-09-20 CN CN96198917A patent/CN1088689C/zh not_active Expired - Fee Related
- 1996-09-20 JP JP9518828A patent/JP2000500426A/ja not_active Ceased
- 1996-09-20 DE DE69620215T patent/DE69620215T2/de not_active Revoked
- 1996-09-20 BR BR9611449A patent/BR9611449A/pt active Search and Examination
- 1996-09-20 ES ES96935903T patent/ES2121714T3/es not_active Expired - Lifetime
- 1996-09-20 EP EP96935903A patent/EP0861219B1/de not_active Revoked
-
1997
- 1997-06-13 US US08/874,146 patent/US5955390A/en not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
CN1088689C (zh) | 2002-08-07 |
KR100284058B1 (ko) | 2001-03-02 |
JP2000500426A (ja) | 2000-01-18 |
WO1997018177A1 (en) | 1997-05-22 |
AU699964B2 (en) | 1998-12-17 |
KR19990067499A (ko) | 1999-08-25 |
BR9611449A (pt) | 1999-03-30 |
ES2121714T3 (es) | 2002-09-16 |
ES2121714T1 (es) | 1998-12-16 |
EP0861219B1 (de) | 2002-03-27 |
US5955390A (en) | 1999-09-21 |
EP0861219A1 (de) | 1998-09-02 |
DE69620215T2 (de) | 2002-09-19 |
DE69620215D1 (de) | 2002-05-02 |
CN1204308A (zh) | 1999-01-06 |
AU7368196A (en) | 1997-06-05 |
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