DE69935390D1 - Akustisches Oberflächenwellensubstrat mit hartem Kohlenstoff-Film - Google Patents

Akustisches Oberflächenwellensubstrat mit hartem Kohlenstoff-Film

Info

Publication number
DE69935390D1
DE69935390D1 DE69935390T DE69935390T DE69935390D1 DE 69935390 D1 DE69935390 D1 DE 69935390D1 DE 69935390 T DE69935390 T DE 69935390T DE 69935390 T DE69935390 T DE 69935390T DE 69935390 D1 DE69935390 D1 DE 69935390D1
Authority
DE
Germany
Prior art keywords
carbon film
surface wave
hard carbon
acoustic surface
wave substrate
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69935390T
Other languages
English (en)
Other versions
DE69935390T2 (de
Inventor
Satoshi Fujii
Tomoki Uemura
Yuichiro Seki
Hideaki Nakahata
Shinichi Shikata
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Sumitomo Electric Industries Ltd
Original Assignee
Sumitomo Electric Industries Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Sumitomo Electric Industries Ltd filed Critical Sumitomo Electric Industries Ltd
Application granted granted Critical
Publication of DE69935390D1 publication Critical patent/DE69935390D1/de
Publication of DE69935390T2 publication Critical patent/DE69935390T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C01INORGANIC CHEMISTRY
    • C01BNON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B32/00Carbon; Compounds thereof
    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26Deposition of carbon only
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • HELECTRICITY
    • H03ELECTRONIC CIRCUITRY
    • H03HIMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00Networks comprising electromechanical or electro-acoustic devices; Electromechanical resonators
    • H03H9/02Details
    • H03H9/02535Details of surface acoustic wave devices
    • H03H9/02543Characteristics of substrate, e.g. cutting angles
    • H03H9/02582Characteristics of substrate, e.g. cutting angles of diamond substrates
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10TTECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00Stock material or miscellaneous articles
    • Y10T428/30Self-sustaining carbon mass or layer with impregnant or other layer
DE69935390T 1998-10-30 1999-10-20 Akustisches Oberflächenwellensubstrat mit hartem Kohlenstoff-Film Expired - Lifetime DE69935390T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP32611098 1998-10-30
JP32611098 1998-10-30

Publications (2)

Publication Number Publication Date
DE69935390D1 true DE69935390D1 (de) 2007-04-19
DE69935390T2 DE69935390T2 (de) 2007-07-05

Family

ID=18184209

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69935390T Expired - Lifetime DE69935390T2 (de) 1998-10-30 1999-10-20 Akustisches Oberflächenwellensubstrat mit hartem Kohlenstoff-Film

Country Status (5)

Country Link
US (2) US6416865B1 (de)
EP (1) EP1001048B1 (de)
KR (1) KR100358314B1 (de)
CA (1) CA2285125C (de)
DE (1) DE69935390T2 (de)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7132309B2 (en) 2003-04-22 2006-11-07 Chien-Min Sung Semiconductor-on-diamond devices and methods of forming
US7011134B2 (en) * 2000-10-13 2006-03-14 Chien-Min Sung Casting method for producing surface acoustic wave devices
US6814130B2 (en) * 2000-10-13 2004-11-09 Chien-Min Sung Methods of making diamond tools using reverse casting of chemical vapor deposition
JP2002338388A (ja) * 2001-02-15 2002-11-27 Ngk Insulators Ltd ダイヤモンドコート部材
KR100858600B1 (ko) * 2001-10-05 2008-09-17 스미토모덴키고교가부시키가이샤 표면 탄성파 소자용 다이아몬드 기판 및 표면 탄성파 소자
US6903862B2 (en) * 2002-11-05 2005-06-07 Matsushita Electric Industrial Co., Ltd. Ultraviolet acoustooptic device and optical imaging apparatus using the same
DE10252828B4 (de) 2002-11-13 2018-07-05 Epcos Ag Mit akustischen Wellen arbeitendes Bauelement und Verfahren zur Herstellung eines Bauelements
DE10259174B4 (de) * 2002-12-18 2006-10-12 Robert Bosch Gmbh Verwendung eines tribologisch beanspruchten Bauelements
KR100513734B1 (ko) * 2003-11-04 2005-09-08 삼성전자주식회사 박형 광픽업
WO2008059674A1 (fr) * 2006-11-13 2008-05-22 Murata Manufacturing Co., Ltd. Elément d'onde interne acoustique, dispositif d'onde interne acoustique et leur procédé de fabrication
US7846767B1 (en) 2007-09-06 2010-12-07 Chien-Min Sung Semiconductor-on-diamond devices and associated methods
US8115365B2 (en) * 2008-04-15 2012-02-14 Ngk Insulators, Ltd. Surface acoustic wave devices
US7911111B2 (en) * 2008-04-15 2011-03-22 Ngk Insulators, Ltd. Surface acoustic wave devices
CN101630947B (zh) * 2008-07-15 2012-04-18 大同股份有限公司 高频表面声波元件
US8183086B2 (en) * 2009-06-16 2012-05-22 Chien-Min Sung Diamond GaN devices and associated methods
KR101347892B1 (ko) * 2010-07-05 2014-01-08 울산대학교 산학협력단 다결정 3C-SiC 버퍼층을 포함하는 표면 탄성파 소자
JP2012065304A (ja) * 2010-08-16 2012-03-29 Seiko Epson Corp 圧電振動デバイス及びその製造方法、共振周波数の調整方法
CN107108229B (zh) * 2015-10-30 2021-11-19 住友电气工业株式会社 复合多晶体

Family Cites Families (22)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4725345A (en) * 1985-04-22 1988-02-16 Kabushiki Kaisha Kenwood Method for forming a hard carbon thin film on article and applications thereof
US5126206A (en) * 1990-03-20 1992-06-30 Diamonex, Incorporated Diamond-on-a-substrate for electronic applications
JP2813077B2 (ja) 1991-05-30 1998-10-22 京セラ株式会社 摺動部材
JPH04358410A (ja) * 1991-06-05 1992-12-11 Sumitomo Electric Ind Ltd 表面弾性波素子及びその製造方法
JPH0590874A (ja) 1991-09-26 1993-04-09 Sumitomo Electric Ind Ltd 表面弾性波素子
JPH05320911A (ja) 1992-05-20 1993-12-07 Hitachi Metals Ltd ダイヤモンド被覆超硬工具の製造方法
JP3163606B2 (ja) * 1993-01-29 2001-05-08 住友電気工業株式会社 表面弾性波素子
EP0616047B1 (de) * 1993-02-16 1997-07-23 Sumitomo Electric Industries, Limited Polykristallines Substrat aus Diamant sowie Verfahren zur dessen Herstellung
JP3243878B2 (ja) 1993-03-30 2002-01-07 三菱マテリアル株式会社 気相合成ダイヤモンド膜およびこの気相合成ダイヤモンド膜からなるx線露光用マスク
JPH06316942A (ja) 1993-05-07 1994-11-15 Nippon Hume Pipe Co Ltd 鉄塔基礎用プレキャスト製品及び鉄塔基礎の施工方法
KR0134942B1 (ko) * 1993-06-11 1998-06-15 이다가끼 유끼오 비정질 경질 탄소막 및 그 제조 방법
JP3368624B2 (ja) 1993-08-03 2003-01-20 住友電気工業株式会社 半導体装置用基板
JP3774904B2 (ja) 1994-01-27 2006-05-17 住友電気工業株式会社 平坦なダイヤモンド膜の合成法とダイヤモンド自立膜及びダイヤモンド膜の研磨方法
JP3291105B2 (ja) 1994-01-31 2002-06-10 京セラ株式会社 硬質炭素膜及び硬質炭素膜被覆部材
EP0674384B1 (de) * 1994-03-25 1999-08-11 Sumitomo Electric Industries, Ltd Orientierbares Material und Oberflächenwellenanordnung
JP3344441B2 (ja) * 1994-03-25 2002-11-11 住友電気工業株式会社 表面弾性波素子
DE69503285T2 (de) 1994-04-07 1998-11-05 Sumitomo Electric Industries Diamantwafer und Verfahren zur Herstellung eines Diamantwafers
DE69526129T2 (de) 1994-05-23 2002-08-22 Sumitomo Electric Industries Verfahren und Vorrichtung zum Herstellen eines mit hartem Material bedeckten Halbleiters durch Polieren
EP0699776B1 (de) 1994-06-09 1999-03-31 Sumitomo Electric Industries, Limited Wafer und Verfahren zur Herstellung eines Wafers
JP3282645B2 (ja) * 1994-06-16 2002-05-20 住友電気工業株式会社 表面弾性波素子
EP0752293B1 (de) 1995-07-05 1999-10-20 Ngk Spark Plug Co., Ltd Diamantbeschichteter Gegenstand und Verfahren zu seiner Herstellung
JP3826453B2 (ja) 1996-09-10 2006-09-27 住友電気工業株式会社 硬質炭素膜

Also Published As

Publication number Publication date
KR20000029431A (ko) 2000-05-25
EP1001048A3 (de) 2003-09-17
US6416865B1 (en) 2002-07-09
DE69935390T2 (de) 2007-07-05
US20010030795A1 (en) 2001-10-18
KR100358314B1 (ko) 2002-10-25
US6448688B2 (en) 2002-09-10
CA2285125A1 (en) 2000-04-30
EP1001048B1 (de) 2007-03-07
CA2285125C (en) 2008-02-12
EP1001048A2 (de) 2000-05-17

Similar Documents

Publication Publication Date Title
DE69935390D1 (de) Akustisches Oberflächenwellensubstrat mit hartem Kohlenstoff-Film
DE69836011D1 (de) Piezoelektrische dünnschichtanordnung
DE69926672D1 (de) Akustische Oberflächenwellenanordnung
NO970220D0 (no) Transduktor med tynnfilmsjikt av metall, for akustiske overflatebölger
DE69632929D1 (de) Akustische Oberflächenwellenvorrichtung mit zwei Moden
DE69415235D1 (de) Schaltungsbaustein mit akustischer Oberflächenwellenanordnung
DE69814205D1 (de) Akustische Oberflächenwellenanordnung
DE69918502D1 (de) Elektroakustischer Wandler mit Wellenleiter
DE69727480D1 (de) Schallisolierungsschicht mit integriertem schutzbalg
DE69841878D1 (de) Akustische Oberflächenwellenanordnung
NL1009560A1 (nl) Oppervlaktegeluidsgolfinrichting.
DE69905734D1 (de) Oberflächenwellenanordnung
DE69716238T2 (de) Akustische oberflächenwellenanordnung
DE69901426D1 (de) Resonatorfilter mit akustischen oberflächenwellen
DE69842149D1 (de) Akustische Oberflächenwellenanordnung
DE69934765D1 (de) Akustisches Oberflächenwellenfilter
NO995827D0 (no) Mönsterlegging med tynnfilm- og laminatteknikk
DE59913935D1 (de) Akustisches oberflächenwellenfilter
DE69723957D1 (de) Akustische oberflächenwellenanordnung
DE69920992D1 (de) Akustische Oberflächenwellenanordnung
DE19983034T1 (de) Akustisches Oberflächenwellenfilter
DE60016964D1 (de) Akustische oberflächenwellenanordnung
DE69734285D1 (de) Funktionsvorrichtung mit akustischen oberflächenwellen
DE69733237D1 (de) Akustische Oberflächenwellenanordnung
DE69901032T2 (de) Engspaltiger akustischer oberflächenwellenwandler

Legal Events

Date Code Title Description
8364 No opposition during term of opposition