DE69923924D1 - Optischer Dünnfilm, Herstellungsverfahren und optische Vorrichtung die diesen Film verwendet - Google Patents

Optischer Dünnfilm, Herstellungsverfahren und optische Vorrichtung die diesen Film verwendet

Info

Publication number
DE69923924D1
DE69923924D1 DE69923924T DE69923924T DE69923924D1 DE 69923924 D1 DE69923924 D1 DE 69923924D1 DE 69923924 T DE69923924 T DE 69923924T DE 69923924 T DE69923924 T DE 69923924T DE 69923924 D1 DE69923924 D1 DE 69923924D1
Authority
DE
Germany
Prior art keywords
film
manufacturing
optical
thin film
optical device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69923924T
Other languages
English (en)
Other versions
DE69923924T2 (de
Inventor
Tokiko Hashimoto
Takahiro Kato
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from JP36849898A external-priority patent/JP3472169B2/ja
Priority claimed from JP10375729A external-priority patent/JP2000180604A/ja
Application filed by Canon Inc filed Critical Canon Inc
Publication of DE69923924D1 publication Critical patent/DE69923924D1/de
Application granted granted Critical
Publication of DE69923924T2 publication Critical patent/DE69923924T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/10—Optical coatings produced by application to, or surface treatment of, optical elements
    • G02B1/11—Anti-reflection coatings
    • G02B1/113—Anti-reflection coatings using inorganic layer materials only
    • G02B1/115—Multilayers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C03C17/2456—Coating containing TiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3417—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials all coatings being oxide coatings
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/08—Oxides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/23—Mixtures
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/151—Deposition methods from the vapour phase by vacuum evaporation

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Mechanical Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Surface Treatment Of Optical Elements (AREA)
  • Physical Vapour Deposition (AREA)
DE69923924T 1998-12-09 1999-12-08 Optischer Dünnfilm, Herstellungsverfahren und optische Vorrichtung die diesen Film verwendet Expired - Lifetime DE69923924T2 (de)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
JP36849898 1998-12-09
JP36849898A JP3472169B2 (ja) 1998-12-09 1998-12-09 中間屈折率の光学薄膜用蒸着材料および該蒸着材料を用いた光学薄膜
JP37572998 1998-12-17
JP10375729A JP2000180604A (ja) 1998-12-17 1998-12-17 高屈折率の光学薄膜材料および該材料を用いた光学薄膜

Publications (2)

Publication Number Publication Date
DE69923924D1 true DE69923924D1 (de) 2005-04-07
DE69923924T2 DE69923924T2 (de) 2006-03-02

Family

ID=26582009

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69923924T Expired - Lifetime DE69923924T2 (de) 1998-12-09 1999-12-08 Optischer Dünnfilm, Herstellungsverfahren und optische Vorrichtung die diesen Film verwendet

Country Status (3)

Country Link
US (1) US6327087B1 (de)
EP (1) EP1008868B1 (de)
DE (1) DE69923924T2 (de)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2004501857A (ja) * 2000-06-26 2004-01-22 ノース・キャロライナ・ステイト・ユニヴァーシティ マイクロエレクトロニクス、光学及び他の適用に使用するための新規な非晶質酸化物
DE10065647A1 (de) * 2000-12-29 2002-07-04 Merck Patent Gmbh Aufdapfmaterial zur Herstellung hochbrechender optischer Schichten und Verfahren zur Herstellung des Aufdampfmaterials
US20050040478A1 (en) * 2001-06-25 2005-02-24 Gerald Lucovsky Novel non-crystalline oxides for use in microelectronic, optical, and other applications
US7014317B2 (en) * 2001-11-02 2006-03-21 Essilor International (Compagnie Generale D'optique) Method for manufacturing multifocal lenses
JP3862623B2 (ja) * 2002-07-05 2006-12-27 キヤノン株式会社 光偏向器及びその製造方法
DE10307096A1 (de) * 2003-02-19 2004-09-02 Merck Patent Gmbh Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten
JP2005173411A (ja) * 2003-12-12 2005-06-30 Canon Inc 光偏向器
JP4574396B2 (ja) * 2005-03-02 2010-11-04 キヤノン株式会社 光偏向器
ES2299335B2 (es) * 2006-03-09 2010-10-13 Universidad De Cadiz Metodo para la fabricacion de estructuras opticas con funcionalidad puramente refractivas.
JP4881073B2 (ja) * 2006-05-30 2012-02-22 キヤノン株式会社 光偏向器、及びそれを用いた光学機器
JP5170983B2 (ja) * 2006-05-30 2013-03-27 キヤノン株式会社 光偏向器、及びそれを用いた光学機器
US7593934B2 (en) * 2006-07-28 2009-09-22 Microsoft Corporation Learning a document ranking using a loss function with a rank pair or a query parameter
JP2008191537A (ja) * 2007-02-07 2008-08-21 Canon Inc 振動素子、及び振動素子を備える光偏向器
JP5358430B2 (ja) * 2007-03-30 2013-12-04 富士チタン工業株式会社 蒸着材料及びそれより得られる光学薄膜
JP2009025617A (ja) * 2007-07-20 2009-02-05 Canon Inc 揺動体装置、光偏向器およびそれを用いた光学機器
JP2009122383A (ja) * 2007-11-14 2009-06-04 Canon Inc 揺動体装置の製造方法、該製造方法により製造された揺動体装置によって構成される光偏向器及び光学機器
JP2009128463A (ja) 2007-11-21 2009-06-11 Canon Inc 揺動体装置の製造方法、該製造方法により製造された揺動体装置によって構成される光偏向器及び光学機器
JP2009163198A (ja) * 2007-12-10 2009-07-23 Canon Inc 揺動体装置の製造方法、光偏向器、画像形成装置
JP5335654B2 (ja) 2009-12-04 2013-11-06 キヤノン株式会社 モード変換素子
US8342679B2 (en) 2010-04-21 2013-01-01 3M Innovative Properties Company Metal detectable lens carrier
US7967435B1 (en) 2010-04-21 2011-06-28 3M Innovative Properties Company Metal detectable lens
JP2013102060A (ja) 2011-11-09 2013-05-23 Canon Inc 荷電粒子光学系、及びそれを用いた描画装置
CN114133226B (zh) * 2021-12-30 2022-11-08 苏州晶生新材料有限公司 一种光学镀层基材及使用方法

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3934961A (en) 1970-10-29 1976-01-27 Canon Kabushiki Kaisha Three layer anti-reflection film
US4173778A (en) 1976-07-28 1979-11-06 Optical Coating Laboratory, Inc. Lighting fixtures and glass enclosure having high angle anti-reflection coating
DE3332872A1 (de) 1983-09-12 1985-04-04 Optische Werke G. Rodenstock, 8000 München Reflexionsvermindernder belag fuer ein optisches element aus organischem material
DE4208811A1 (de) 1992-03-19 1993-09-23 Merck Patent Gmbh Aufdampfmaterial zur herstellung hochbrechender optischer schichten
DE4219817A1 (de) 1992-06-17 1993-12-23 Merck Patent Gmbh Aufdampfmaterial zur Herstellung mittelbrechender optischer Schichten
US5641719A (en) 1995-05-09 1997-06-24 Flex Products, Inc. Mixed oxide high index optical coating material and method
US5850309A (en) * 1996-03-27 1998-12-15 Nikon Corporation Mirror for high-intensity ultraviolet light beam

Also Published As

Publication number Publication date
DE69923924T2 (de) 2006-03-02
EP1008868B1 (de) 2005-03-02
EP1008868A1 (de) 2000-06-14
US6327087B1 (en) 2001-12-04

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