DE69921603D1 - Antireflexionsbeschichtungszusammensetzung - Google Patents
AntireflexionsbeschichtungszusammensetzungInfo
- Publication number
- DE69921603D1 DE69921603D1 DE69921603T DE69921603T DE69921603D1 DE 69921603 D1 DE69921603 D1 DE 69921603D1 DE 69921603 T DE69921603 T DE 69921603T DE 69921603 T DE69921603 T DE 69921603T DE 69921603 D1 DE69921603 D1 DE 69921603D1
- Authority
- DE
- Germany
- Prior art keywords
- coating composition
- reflection coating
- anti reflection
- composition
- reflection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
- 239000008199 coating composition Substances 0.000 title 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
- C09D5/006—Anti-reflective coatings
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D5/00—Coating compositions, e.g. paints, varnishes or lacquers, characterised by their physical nature or the effects produced; Filling pastes
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/60—Additives non-macromolecular
- C09D7/63—Additives non-macromolecular organic
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
- C09D7/65—Additives macromolecular
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/091—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by antireflection means or light filtering or absorbing means, e.g. anti-halation, contrast enhancement
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Life Sciences & Earth Sciences (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Organic Chemistry (AREA)
- Architecture (AREA)
- Structural Engineering (AREA)
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Materials For Photolithography (AREA)
- Paints Or Removers (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15434498A JP3673399B2 (ja) | 1998-06-03 | 1998-06-03 | 反射防止コーティング用組成物 |
JP15434498 | 1998-06-03 | ||
PCT/JP1999/002803 WO1999063010A1 (fr) | 1998-06-03 | 1999-05-27 | Composition pour revetement reduisant la reflexion |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69921603D1 true DE69921603D1 (de) | 2004-12-09 |
DE69921603T2 DE69921603T2 (de) | 2005-11-03 |
Family
ID=15582114
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69921603T Expired - Lifetime DE69921603T2 (de) | 1998-06-03 | 1999-05-27 | Antireflexionsbeschichtungszusammensetzung |
Country Status (9)
Country | Link |
---|---|
US (1) | US6309789B1 (de) |
EP (1) | EP1026208B1 (de) |
JP (1) | JP3673399B2 (de) |
KR (1) | KR100594708B1 (de) |
CN (1) | CN1169884C (de) |
DE (1) | DE69921603T2 (de) |
MY (1) | MY117818A (de) |
TW (1) | TW556048B (de) |
WO (1) | WO1999063010A1 (de) |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4556251B2 (ja) * | 1998-04-17 | 2010-10-06 | Dic株式会社 | 被覆用組成物 |
US6984482B2 (en) * | 1999-06-03 | 2006-01-10 | Hynix Semiconductor Inc. | Top-coating composition for photoresist and process for forming fine pattern using the same |
JP2001142221A (ja) * | 1999-11-10 | 2001-05-25 | Clariant (Japan) Kk | 反射防止コーティング用組成物 |
KR100400331B1 (ko) * | 1999-12-02 | 2003-10-01 | 주식회사 하이닉스반도체 | 포토레지스트 오버코팅용 조성물 및 이를 이용한포토레지스트 패턴 형성방법 |
JP3320402B2 (ja) * | 2000-06-26 | 2002-09-03 | クラリアント ジャパン 株式会社 | 現像欠陥防止プロセス及び材料 |
JP2002148820A (ja) * | 2000-11-15 | 2002-05-22 | Clariant (Japan) Kk | パターン形成方法及びこの方法に使用される処理剤 |
JP3509760B2 (ja) * | 2001-02-08 | 2004-03-22 | 株式会社半導体先端テクノロジーズ | 半導体装置の製造方法 |
US7265431B2 (en) * | 2002-05-17 | 2007-09-04 | Intel Corporation | Imageable bottom anti-reflective coating for high resolution lithography |
JP2003345026A (ja) | 2002-05-24 | 2003-12-03 | Tokyo Ohka Kogyo Co Ltd | 反射防止膜形成用塗布液組成物およびこれを用いたホトレジスト積層体、並びにホトレジストパターンの形成方法 |
US6740469B2 (en) * | 2002-06-25 | 2004-05-25 | Brewer Science Inc. | Developer-soluble metal alkoxide coatings for microelectronic applications |
US6872506B2 (en) * | 2002-06-25 | 2005-03-29 | Brewer Science Inc. | Wet-developable anti-reflective compositions |
JP3851594B2 (ja) * | 2002-07-04 | 2006-11-29 | Azエレクトロニックマテリアルズ株式会社 | 反射防止コーティング用組成物およびパターン形成方法 |
TWI442694B (zh) | 2003-05-30 | 2014-06-21 | Asml Netherlands Bv | 微影裝置及元件製造方法 |
DE10343351B4 (de) * | 2003-09-12 | 2017-01-05 | Samsung Display Co., Ltd. | Substrat zum Tintenstrahldrucken und Verfahren zu dessen Herstellung |
US7833612B2 (en) * | 2003-09-12 | 2010-11-16 | Samsung Mobile Display Co., Ltd. | Substrate for inkjet printing and method of manufacturing the same |
KR101189397B1 (ko) * | 2003-10-15 | 2012-10-11 | 브레우어 사이언스 인코포레이션 | 비아-퍼스트 듀얼 다마신 적용예에서 사용되는 현상제에 용해성인 물질 및 상기 물질 사용 방법 |
US20050255410A1 (en) | 2004-04-29 | 2005-11-17 | Guerrero Douglas J | Anti-reflective coatings using vinyl ether crosslinkers |
TWI362566B (en) | 2004-06-30 | 2012-04-21 | Dainippon Ink & Chemicals | Composition for antireflection coating and pattern forming method |
CN101080674B (zh) * | 2004-12-03 | 2013-09-18 | 捷时雅株式会社 | 形成抗反射薄膜的组合物,层状产品,和抗蚀剂图案的形成方法 |
US7205093B2 (en) * | 2005-06-03 | 2007-04-17 | International Business Machines Corporation | Topcoats for use in immersion lithography |
US7544750B2 (en) * | 2005-10-13 | 2009-06-09 | International Business Machines Corporation | Top antireflective coating composition with low refractive index at 193nm radiation wavelength |
US7759047B2 (en) * | 2006-05-26 | 2010-07-20 | Shin-Etsu Chemical Co., Ltd. | Resist protective film composition and patterning process |
US7635552B2 (en) * | 2006-07-25 | 2009-12-22 | Endicott Interconnect Technologies, Inc. | Photoresist composition with antibacterial agent |
US7914974B2 (en) | 2006-08-18 | 2011-03-29 | Brewer Science Inc. | Anti-reflective imaging layer for multiple patterning process |
KR101647158B1 (ko) | 2008-01-29 | 2016-08-09 | 브레우어 사이언스 인코포레이션 | 다중 다크 필드 노출에 의한, 하드마스크 패턴화를 위한 온-트랙 공정 |
US9640396B2 (en) | 2009-01-07 | 2017-05-02 | Brewer Science Inc. | Spin-on spacer materials for double- and triple-patterning lithography |
US8273997B2 (en) | 2009-01-16 | 2012-09-25 | The Boeing Company | Antireflective apparatus with anisotropic capacitive circuit analog sheets |
JP5697523B2 (ja) | 2011-04-12 | 2015-04-08 | メルクパフォーマンスマテリアルズIp合同会社 | 上面反射防止膜形成用組成物およびそれを用いたパターン形成方法 |
CN114806394A (zh) * | 2022-04-28 | 2022-07-29 | 武汉工程大学 | 一种抗反射层涂料、抗反射层及其制备方法和应用 |
CN116875159B (zh) * | 2023-09-05 | 2023-11-21 | 甘肃华隆芯材料科技有限公司 | 顶部抗反射涂层材料及其制备方法和应用 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
SG43691A1 (en) | 1991-06-28 | 1997-11-14 | Ibm | Top antireflective coating films |
KR100258494B1 (ko) * | 1992-06-02 | 2000-06-15 | 미우라 아끼라 | 레지스트 표면 반사 방지막 형성 조성물 및 패턴 형성방법 |
JP3767714B2 (ja) * | 1996-04-19 | 2006-04-19 | 大日本インキ化学工業株式会社 | 反射防止膜用組成物 |
JP3694703B2 (ja) * | 1996-04-25 | 2005-09-14 | Azエレクトロニックマテリアルズ株式会社 | 反射防止コーティング用組成物 |
-
1998
- 1998-06-03 JP JP15434498A patent/JP3673399B2/ja not_active Expired - Fee Related
-
1999
- 1999-05-25 TW TW088108546A patent/TW556048B/zh not_active IP Right Cessation
- 1999-05-27 US US09/485,087 patent/US6309789B1/en not_active Expired - Lifetime
- 1999-05-27 CN CNB998008818A patent/CN1169884C/zh not_active Expired - Fee Related
- 1999-05-27 EP EP99922524A patent/EP1026208B1/de not_active Expired - Lifetime
- 1999-05-27 DE DE69921603T patent/DE69921603T2/de not_active Expired - Lifetime
- 1999-05-27 WO PCT/JP1999/002803 patent/WO1999063010A1/ja active IP Right Grant
- 1999-05-27 KR KR1020007001148A patent/KR100594708B1/ko not_active IP Right Cessation
- 1999-05-28 MY MYPI99002142A patent/MY117818A/en unknown
Also Published As
Publication number | Publication date |
---|---|
KR20010022557A (ko) | 2001-03-26 |
CN1272864A (zh) | 2000-11-08 |
KR100594708B1 (ko) | 2006-07-03 |
JPH11349857A (ja) | 1999-12-21 |
EP1026208B1 (de) | 2004-11-03 |
WO1999063010A1 (fr) | 1999-12-09 |
US6309789B1 (en) | 2001-10-30 |
DE69921603T2 (de) | 2005-11-03 |
MY117818A (en) | 2004-08-30 |
JP3673399B2 (ja) | 2005-07-20 |
EP1026208A4 (de) | 2003-04-16 |
EP1026208A1 (de) | 2000-08-09 |
CN1169884C (zh) | 2004-10-06 |
TW556048B (en) | 2003-10-01 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition | ||
8327 | Change in the person/name/address of the patent owner |
Owner name: AZ ELECTRONIC MATERIALS (JAPAN) K.K., TOKIO/TOKYO, Owner name: DAINIPPON INK AND CHEMICALS, INC., TOKIO/TOKYO, JP |
|
8328 | Change in the person/name/address of the agent |
Representative=s name: PATENTANWAELTE ISENBRUCK BOESL HOERSCHLER WICHMANN HU |