DE69909983D1 - Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben - Google Patents
Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselbenInfo
- Publication number
- DE69909983D1 DE69909983D1 DE69909983T DE69909983T DE69909983D1 DE 69909983 D1 DE69909983 D1 DE 69909983D1 DE 69909983 T DE69909983 T DE 69909983T DE 69909983 T DE69909983 T DE 69909983T DE 69909983 D1 DE69909983 D1 DE 69909983D1
- Authority
- DE
- Germany
- Prior art keywords
- synthetic
- production
- quartz glass
- glass elements
- optical quartz
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Revoked
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C3/00—Glass compositions
- C03C3/04—Glass compositions containing silica
- C03C3/06—Glass compositions containing silica with more than 90% silica by weight, e.g. quartz
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B19/00—Other methods of shaping glass
- C03B19/14—Other methods of shaping glass by gas- or vapour- phase reaction processes
- C03B19/1453—Thermal after-treatment of the shaped article, e.g. dehydrating, consolidating, sintering
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B32/00—Thermal after-treatment of glass products not provided for in groups C03B19/00, C03B25/00 - C03B31/00 or C03B37/00, e.g. crystallisation, eliminating gas inclusions or other impurities; Hot-pressing vitrified, non-porous, shaped glass products
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C23/00—Other surface treatment of glass not in the form of fibres or filaments
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/21—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
- C03B2201/00—Type of glass produced
- C03B2201/06—Doped silica-based glasses
- C03B2201/20—Doped silica-based glasses doped with non-metals other than boron or fluorine
- C03B2201/23—Doped silica-based glasses doped with non-metals other than boron or fluorine doped with hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/21—Doped silica-based glasses containing non-metals other than boron or halide containing molecular hydrogen
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2201/00—Glass compositions
- C03C2201/06—Doped silica-based glasses
- C03C2201/20—Doped silica-based glasses containing non-metals other than boron or halide
- C03C2201/23—Doped silica-based glasses containing non-metals other than boron or halide containing hydroxyl groups
-
- C—CHEMISTRY; METALLURGY
- C03—GLASS; MINERAL OR SLAG WOOL
- C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
- C03C2203/00—Production processes
- C03C2203/50—After-treatment
- C03C2203/52—Heat-treatment
- C03C2203/54—Heat-treatment in a dopant containing atmosphere
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
- Y02P40/00—Technologies relating to the processing of minerals
- Y02P40/50—Glass production, e.g. reusing waste heat during processing or shaping
- Y02P40/57—Improving the yield, e-g- reduction of reject rates
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Geochemistry & Mineralogy (AREA)
- General Chemical & Material Sciences (AREA)
- Life Sciences & Earth Sciences (AREA)
- Physics & Mathematics (AREA)
- Thermal Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Glass Compositions (AREA)
- Re-Forming, After-Treatment, Cutting And Transporting Of Glass Products (AREA)
- Silicon Compounds (AREA)
- Polarising Elements (AREA)
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1975198 | 1998-01-30 | ||
JP1975198 | 1998-01-30 | ||
PCT/JP1999/000383 WO1999038814A1 (fr) | 1998-01-30 | 1999-01-29 | Elements optiques en verre de silice synthetique et leur procede de production |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69909983D1 true DE69909983D1 (de) | 2003-09-04 |
DE69909983T2 DE69909983T2 (de) | 2004-04-15 |
Family
ID=12008054
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69909983T Revoked DE69909983T2 (de) | 1998-01-30 | 1999-01-29 | Synthetische, optische quarzglas-elemente und verfahren zur herstellung derselben |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1061052B1 (de) |
JP (1) | JP4193358B2 (de) |
AT (1) | ATE246154T1 (de) |
DE (1) | DE69909983T2 (de) |
WO (1) | WO1999038814A1 (de) |
Families Citing this family (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6576578B1 (en) * | 1999-06-10 | 2003-06-10 | Asahi Glass Company, Limited | Synthetic quartz glass and method for preparing the same |
EP1288169A1 (de) * | 2001-08-30 | 2003-03-05 | Schott Glas | Verfahren zur Wasserstoffbeladung von Quarzglaskörpern zur Verbesserung der Brechzahlhomogenität und der Laserfestigkeit bei gleichzeitiger Einhaltung einer vorgegebenen Spannungsdoppelbrechung und danach hergestellte Quarzglaskörper |
DE10159959A1 (de) | 2001-12-06 | 2003-06-26 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil und Verwendung desselben |
DE10159961C2 (de) * | 2001-12-06 | 2003-12-24 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
DE10159962A1 (de) * | 2001-12-06 | 2003-07-03 | Heraeus Quarzglas | Quarzglasrohling für ein optisches Bauteil sowie Verfahren zur Herstellung und Verwendung desselben |
JP4104338B2 (ja) * | 2002-01-31 | 2008-06-18 | 信越石英株式会社 | ArF露光装置用合成石英ガラス素材 |
JP4107905B2 (ja) | 2002-07-31 | 2008-06-25 | 信越石英株式会社 | Yagレーザー高調波用合成石英ガラス光学材料 |
US7534733B2 (en) * | 2004-02-23 | 2009-05-19 | Corning Incorporated | Synthetic silica glass optical material having high resistance to laser induced damage |
JP5538679B2 (ja) * | 2004-12-30 | 2014-07-02 | コーニング インコーポレイテッド | 低い偏光誘起複屈折を有する合成シリカ、同シリカの製造方法および同シリカを含むリソグラフィデバイス |
US7928026B2 (en) * | 2005-06-30 | 2011-04-19 | Corning Incorporated | Synthetic silica material with low fluence-dependent-transmission and method of making the same |
DE102006043368B4 (de) | 2005-09-16 | 2019-01-10 | Corning Inc. | Synthetisches Kieselsäureglas und Verfahren zur Herstellung desselben |
JP2008063181A (ja) * | 2006-09-07 | 2008-03-21 | Shin Etsu Chem Co Ltd | エキシマレーザー用合成石英ガラス基板及びその製造方法 |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPH0825764B2 (ja) * | 1990-10-30 | 1996-03-13 | 信越石英株式会社 | 水素分子含有シリカガラス体の製造方法 |
JPH0742134B2 (ja) * | 1991-07-31 | 1995-05-10 | 信越石英株式会社 | 光学部材 |
JP2821074B2 (ja) * | 1992-11-30 | 1998-11-05 | 信越石英株式会社 | 耐紫外線レーザー用光学部材の製造方法 |
JPH0959034A (ja) * | 1995-08-22 | 1997-03-04 | Sumitomo Metal Ind Ltd | 合成石英ガラス材及びその製造方法 |
-
1999
- 1999-01-29 AT AT99901911T patent/ATE246154T1/de not_active IP Right Cessation
- 1999-01-29 WO PCT/JP1999/000383 patent/WO1999038814A1/ja not_active Application Discontinuation
- 1999-01-29 JP JP2000530054A patent/JP4193358B2/ja not_active Expired - Lifetime
- 1999-01-29 DE DE69909983T patent/DE69909983T2/de not_active Revoked
- 1999-01-29 EP EP99901911A patent/EP1061052B1/de not_active Revoked
Also Published As
Publication number | Publication date |
---|---|
WO1999038814A1 (fr) | 1999-08-05 |
EP1061052A4 (de) | 2001-04-11 |
DE69909983T2 (de) | 2004-04-15 |
JP4193358B2 (ja) | 2008-12-10 |
ATE246154T1 (de) | 2003-08-15 |
EP1061052B1 (de) | 2003-07-30 |
EP1061052A1 (de) | 2000-12-20 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8363 | Opposition against the patent | ||
8331 | Complete revocation |