DE69834096D1 - Verfahren zur herstellung einer halbleiteranordnung mit schottky-übergang - Google Patents

Verfahren zur herstellung einer halbleiteranordnung mit schottky-übergang

Info

Publication number
DE69834096D1
DE69834096D1 DE69834096T DE69834096T DE69834096D1 DE 69834096 D1 DE69834096 D1 DE 69834096D1 DE 69834096 T DE69834096 T DE 69834096T DE 69834096 T DE69834096 T DE 69834096T DE 69834096 D1 DE69834096 D1 DE 69834096D1
Authority
DE
Germany
Prior art keywords
producing
semiconductor assembly
schottky transition
schottky
transition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69834096T
Other languages
English (en)
Other versions
DE69834096T2 (de
Inventor
Richard Brown
Boer Barteld De
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
NXP BV
Original Assignee
Koninklijke Philips Electronics NV
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Koninklijke Philips Electronics NV filed Critical Koninklijke Philips Electronics NV
Application granted granted Critical
Publication of DE69834096D1 publication Critical patent/DE69834096D1/de
Publication of DE69834096T2 publication Critical patent/DE69834096T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/66007Multistep manufacturing processes
    • H01L29/66075Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials
    • H01L29/66083Multistep manufacturing processes of devices having semiconductor bodies comprising group 14 or group 13/15 materials the devices being controllable only by variation of the electric current supplied or the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched, e.g. two-terminal devices
    • H01L29/6609Diodes
    • H01L29/66143Schottky diodes
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L29/00Semiconductor devices specially adapted for rectifying, amplifying, oscillating or switching and having potential barriers; Capacitors or resistors having potential barriers, e.g. a PN-junction depletion layer or carrier concentration layer; Details of semiconductor bodies or of electrodes thereof ; Multistep manufacturing processes therefor
    • H01L29/66Types of semiconductor device ; Multistep manufacturing processes therefor
    • H01L29/86Types of semiconductor device ; Multistep manufacturing processes therefor controllable only by variation of the electric current supplied, or only the electric potential applied, to one or more of the electrodes carrying the current to be rectified, amplified, oscillated or switched
    • H01L29/861Diodes
    • H01L29/872Schottky diodes

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Ceramic Engineering (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Computer Hardware Design (AREA)
  • Manufacturing & Machinery (AREA)
  • Electrodes Of Semiconductors (AREA)
DE69834096T 1997-09-03 1998-08-12 Verfahren zur herstellung einer halbleiteranordnung mit schottky-übergang Expired - Lifetime DE69834096T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97202711 1997-09-03
EP97202711 1997-09-03
PCT/IB1998/001240 WO1999012188A2 (en) 1997-09-03 1998-08-12 Method of manufacturing a semiconductor device with a schottky junction

Publications (2)

Publication Number Publication Date
DE69834096D1 true DE69834096D1 (de) 2006-05-18
DE69834096T2 DE69834096T2 (de) 2007-01-04

Family

ID=8228700

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69834096T Expired - Lifetime DE69834096T2 (de) 1997-09-03 1998-08-12 Verfahren zur herstellung einer halbleiteranordnung mit schottky-übergang

Country Status (5)

Country Link
US (1) US6218222B1 (de)
EP (1) EP0935816B1 (de)
JP (1) JP3983306B2 (de)
DE (1) DE69834096T2 (de)
WO (1) WO1999012188A2 (de)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE19930781B4 (de) * 1999-07-03 2006-10-12 Robert Bosch Gmbh Diode mit Metall-Halbleiterkontakt und Verfahren zu ihrer Herstellung
DE10015884A1 (de) * 2000-03-30 2001-10-11 Philips Corp Intellectual Pty Schottky-Diode
US8901699B2 (en) 2005-05-11 2014-12-02 Cree, Inc. Silicon carbide junction barrier Schottky diodes with suppressed minority carrier injection
US7466009B2 (en) * 2006-06-05 2008-12-16 Texas Instruments Incorporated Method for reducing dislocation threading using a suppression implant
US8324705B2 (en) * 2008-05-27 2012-12-04 Taiwan Semiconductor Manufacturing Company, Ltd. Schottky diodes having low-voltage and high-concentration rings
US8871600B2 (en) 2011-11-11 2014-10-28 International Business Machines Corporation Schottky barrier diodes with a guard ring formed by selective epitaxy
CN109326524B (zh) * 2018-12-04 2021-04-16 扬州扬杰电子科技股份有限公司 一种肖特基二极管的加工方法

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2044863A1 (de) * 1970-09-10 1972-03-23 Siemens Ag Verfahren zur Herstellung von Schottkydioden
JPS51120674A (en) * 1975-04-16 1976-10-22 Hitachi Ltd Semiconductor device
US4096622A (en) * 1975-07-31 1978-06-27 General Motors Corporation Ion implanted Schottky barrier diode
US4326211A (en) * 1977-09-01 1982-04-20 U.S. Philips Corporation N+PP-PP-P+ Avalanche photodiode
FR2460040A1 (fr) * 1979-06-22 1981-01-16 Thomson Csf Procede pour realiser une diode schottky a tenue en tension amelioree
US4260431A (en) * 1979-12-21 1981-04-07 Harris Corporation Method of making Schottky barrier diode by ion implantation and impurity diffusion
DE3124572A1 (de) * 1981-06-23 1982-12-30 Siemens AG, 1000 Berlin und 8000 München Verfahren zur herstellung von schottky-dioden
JP2808965B2 (ja) * 1992-02-19 1998-10-08 日本電気株式会社 半導体装置
JPH0817186B2 (ja) * 1992-03-18 1996-02-21 三星電子株式会社 電界効果トランジスタの製造方法
US5399883A (en) * 1994-05-04 1995-03-21 North Carolina State University At Raleigh High voltage silicon carbide MESFETs and methods of fabricating same
US5484740A (en) * 1994-06-06 1996-01-16 Motorola, Inc. Method of manufacturing a III-V semiconductor gate structure

Also Published As

Publication number Publication date
EP0935816A2 (de) 1999-08-18
US6218222B1 (en) 2001-04-17
DE69834096T2 (de) 2007-01-04
WO1999012188A3 (en) 1999-05-27
WO1999012188A2 (en) 1999-03-11
JP2001505368A (ja) 2001-04-17
EP0935816B1 (de) 2006-04-05
JP3983306B2 (ja) 2007-09-26

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Legal Events

Date Code Title Description
8320 Willingness to grant licences declared (paragraph 23)
8364 No opposition during term of opposition
8328 Change in the person/name/address of the agent

Representative=s name: EISENFUEHR, SPEISER & PARTNER, 10178 BERLIN

8327 Change in the person/name/address of the patent owner

Owner name: NXP B.V., EINDHOVEN, NL