DE69842050D1 - Verfahren zur herstellung einer leitfähigen multi-level-matrix - Google Patents

Verfahren zur herstellung einer leitfähigen multi-level-matrix

Info

Publication number
DE69842050D1
DE69842050D1 DE69842050T DE69842050T DE69842050D1 DE 69842050 D1 DE69842050 D1 DE 69842050D1 DE 69842050 T DE69842050 T DE 69842050T DE 69842050 T DE69842050 T DE 69842050T DE 69842050 D1 DE69842050 D1 DE 69842050D1
Authority
DE
Germany
Prior art keywords
producing
level matrix
conductive multi
conductive
matrix
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69842050T
Other languages
English (en)
Inventor
David C Chang
Arthur J Learn
Bob L Mackey
Paul M Drumm
David L Morris
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Canon Inc
Original Assignee
Canon Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Canon Inc filed Critical Canon Inc
Application granted granted Critical
Publication of DE69842050D1 publication Critical patent/DE69842050D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C5/00Photographic processes or agents therefor; Regeneration of such processing agents
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0035Multiple processes, e.g. applying a further resist layer on an already in a previously step, processed pattern or textured surface
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/02Manufacture of electrodes or electrode systems
    • H01J9/18Assembling together the component parts of electrode systems
    • H01J9/185Assembling together the component parts of electrode systems of flat panel display devices, e.g. by using spacers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J9/00Apparatus or processes specially adapted for the manufacture, installation, removal, maintenance of electric discharge tubes, discharge lamps, or parts thereof; Recovery of material from discharge tubes or lamps
    • H01J9/24Manufacture or joining of vessels, leading-in conductors or bases
    • H01J9/241Manufacture or joining of vessels, leading-in conductors or bases the vessel being for a flat panel display
    • H01J9/242Spacers between faceplate and backplate
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2329/00Electron emission display panels, e.g. field emission display panels
    • H01J2329/86Vessels
    • H01J2329/8625Spacing members
    • H01J2329/863Spacing members characterised by the form or structure
DE69842050T 1997-09-30 1998-07-24 Verfahren zur herstellung einer leitfähigen multi-level-matrix Expired - Lifetime DE69842050D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/940,819 US5858619A (en) 1997-09-30 1997-09-30 Multi-level conductive matrix formation method
PCT/US1998/015465 WO1999017162A1 (en) 1997-09-30 1998-07-24 Multi-level conductive matrix formation method

Publications (1)

Publication Number Publication Date
DE69842050D1 true DE69842050D1 (de) 2011-01-27

Family

ID=25475477

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69842050T Expired - Lifetime DE69842050D1 (de) 1997-09-30 1998-07-24 Verfahren zur herstellung einer leitfähigen multi-level-matrix

Country Status (6)

Country Link
US (1) US5858619A (de)
EP (1) EP1023635B1 (de)
JP (1) JP3961218B2 (de)
KR (1) KR100393420B1 (de)
DE (1) DE69842050D1 (de)
WO (1) WO1999017162A1 (de)

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5818162A (en) * 1997-03-31 1998-10-06 Candescent Technologies Corporation Multi-level conductive black matrix
US6545425B2 (en) 2000-05-26 2003-04-08 Exaconnect Corp. Use of a free space electron switch in a telecommunications network
US6800877B2 (en) * 2000-05-26 2004-10-05 Exaconnect Corp. Semi-conductor interconnect using free space electron switch
US7064500B2 (en) * 2000-05-26 2006-06-20 Exaconnect Corp. Semi-conductor interconnect using free space electron switch
US6801002B2 (en) * 2000-05-26 2004-10-05 Exaconnect Corp. Use of a free space electron switch in a telecommunications network
US6407516B1 (en) 2000-05-26 2002-06-18 Exaconnect Inc. Free space electron switch
US6432593B1 (en) 2000-05-31 2002-08-13 Candescent Technologies Corporation Gripping multi-level structure
US6562551B1 (en) * 2000-05-31 2003-05-13 Candescent Technologies Corporation Gripping multi-level black matrix
US6716078B1 (en) 2000-07-27 2004-04-06 Motorola Inc. Field emission display and method of manufacture
US7315115B1 (en) 2000-10-27 2008-01-01 Canon Kabushiki Kaisha Light-emitting and electron-emitting devices having getter regions
US7448946B2 (en) * 2001-03-26 2008-11-11 Anthony P Celona Video poker game and method
US6630786B2 (en) 2001-03-30 2003-10-07 Candescent Technologies Corporation Light-emitting device having light-reflective layer formed with, or/and adjacent to, material that enhances device performance
DE112016001982T5 (de) * 2015-04-28 2018-02-15 Kla-Tencor Corporation Recheneffiziente auf röntgenstrahlgestützte messung des overlays

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3779760A (en) * 1972-10-02 1973-12-18 Sony Corp Method of producing a striped cathode ray tube screen
KR910003690B1 (en) * 1988-09-14 1991-06-08 Samsung Electronic Devices Pdp manufacturing method
US5209688A (en) 1988-12-19 1993-05-11 Narumi China Corporation Plasma display panel
JP2800446B2 (ja) * 1991-03-12 1998-09-21 日本電気株式会社 セラミックグリーンシート上での微細配線パターンの形成方法
US5512131A (en) * 1993-10-04 1996-04-30 President And Fellows Of Harvard College Formation of microstamped patterns on surfaces and derivative articles
JP3709453B2 (ja) * 1994-07-22 2005-10-26 株式会社村田製作所 セラミックス多層配線基板の製造方法
US5543683A (en) * 1994-11-21 1996-08-06 Silicon Video Corporation Faceplate for field emission display including wall gripper structures
US5670296A (en) * 1995-07-03 1997-09-23 Industrial Technology Research Institute Method of manufacturing a high efficiency field emission display

Also Published As

Publication number Publication date
JP2001518679A (ja) 2001-10-16
EP1023635A1 (de) 2000-08-02
KR20010015581A (ko) 2001-02-26
JP3961218B2 (ja) 2007-08-22
KR100393420B1 (ko) 2003-08-02
EP1023635B1 (de) 2010-12-15
US5858619A (en) 1999-01-12
WO1999017162A1 (en) 1999-04-08
EP1023635A4 (de) 2005-11-23

Similar Documents

Publication Publication Date Title
DE69840399D1 (de) Verfahren zur Herstellung einer Gate-Elektrode
DE69906491D1 (de) VERFAHREN ZUR HERSTELLUNG EINER SiCOI-STRUKTUR
DE69619691T2 (de) Verfahren zur herstellung einer beugungsstruktur
DE69819020D1 (de) Verfahren zur herstellung einer polytetrafluoräthylen-dispersion
DE69730940D1 (de) Verfahren zur herstellung einer halbleiteranordnung
DE69828198D1 (de) Verfahren zur herstellung einer thermoplastischen beschichtung
ATE259315T1 (de) Verfahren zur herstellung einer stossanfängeranordnung
DE69733057D1 (de) Verfahren zur herstellung einer matrixanzeigevorrichtung
DE59607727D1 (de) Verfahren zur herstellung einer festwertspeicherzellenanordnung
DE69823027D1 (de) Verfahren zur herstellung einer waschmittelzusammensetzung
DE69836401D1 (de) Verfahren zur Herstellung einer Halbleiteranordnung
DE59813564D1 (de) Verfahren zur Herstellung einer Chipkarte
DE69932665D1 (de) Verfahren zur Herstellung einer Verbindungsstruktur
DE69801560T2 (de) Verfahren zur herstellung einer katalysatorzusammenstellung
DE69607546T2 (de) Verfahren zur Herstellung einer Schaltungsanordnung
DE69701890T2 (de) Verfahren zur herstellung einer abbindenden zusammensetzung
DE69827966D1 (de) Verfahren zur herstellung einer querfaserbahn
DE69840320D1 (de) Verfahren zur Herstellung einer Gateelektrode
DE69626526T2 (de) Verfahren zur herstellung einer kautschukzusammensetzung
DE69842050D1 (de) Verfahren zur herstellung einer leitfähigen multi-level-matrix
DE69830123D1 (de) Verfahren zur herstellung von einem etikettierten formteil
DE69738198D1 (de) Verfahren zur herstellung einer kugelkeilwellenverbindung
DE59808395D1 (de) Verfahren zur herstellung einer gebauten nockenwelle
DE60020497D1 (de) Verfahren zur Herstellung einer Matrize
DE59703321D1 (de) Verfahren zur Herstellung einer Beschichtung