DE69822139D1 - Korrekturvorrichtung zur linsenfehlerkorrektur in ladungsträger-optischen geräten - Google Patents

Korrekturvorrichtung zur linsenfehlerkorrektur in ladungsträger-optischen geräten

Info

Publication number
DE69822139D1
DE69822139D1 DE69822139T DE69822139T DE69822139D1 DE 69822139 D1 DE69822139 D1 DE 69822139D1 DE 69822139 T DE69822139 T DE 69822139T DE 69822139 T DE69822139 T DE 69822139T DE 69822139 D1 DE69822139 D1 DE 69822139D1
Authority
DE
Germany
Prior art keywords
optical devices
correction
carrier optical
lens error
error correction
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69822139T
Other languages
English (en)
Other versions
DE69822139T2 (de
Inventor
Petrus Krijn
Antonius Mentink
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
FEI Co
Original Assignee
FEI Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by FEI Co filed Critical FEI Co
Application granted granted Critical
Publication of DE69822139D1 publication Critical patent/DE69822139D1/de
Publication of DE69822139T2 publication Critical patent/DE69822139T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement, ion-optical arrangement
    • H01J37/153—Electron-optical or ion-optical arrangements for the correction of image defects, e.g. stigmators
DE69822139T 1997-12-11 1998-12-10 Korrekturvorrichtung zur linsenfehlerkorrektur in ladungsträger-optischen geräten Expired - Lifetime DE69822139T2 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP97203891 1997-12-11
EP97203891 1997-12-11
PCT/IB1998/001977 WO1999030343A1 (en) 1997-12-11 1998-12-10 Correction device for correcting the lens defects in particle-optical apparatus

Publications (2)

Publication Number Publication Date
DE69822139D1 true DE69822139D1 (de) 2004-04-08
DE69822139T2 DE69822139T2 (de) 2004-07-29

Family

ID=8229043

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69822139T Expired - Lifetime DE69822139T2 (de) 1997-12-11 1998-12-10 Korrekturvorrichtung zur linsenfehlerkorrektur in ladungsträger-optischen geräten

Country Status (5)

Country Link
US (2) US6329659B1 (de)
EP (2) EP0960429A1 (de)
JP (2) JP2001511303A (de)
DE (1) DE69822139T2 (de)
WO (2) WO1999030342A1 (de)

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DE19739290A1 (de) * 1997-09-08 1999-03-11 Ceos Gmbh Verfahren zur Beseitigung axialer Bildfehler erster, zweiter und dritter Ordnung bei Korrektur des Öffnungsfehlers dritter Ordnung in elektronen-optischen Systemen
JP2001511303A (ja) 1997-12-11 2001-08-07 フィリップス エレクトロン オプティクス ビー ヴィ 粒子−光学装置における球面収差補正用の補正デバイス
US6555818B1 (en) * 1999-06-16 2003-04-29 Jeol Ltd. Transmission electron microscope
JP4441831B2 (ja) * 1999-09-16 2010-03-31 株式会社ニコン 顕微鏡装置
DE10001277A1 (de) * 2000-01-14 2001-07-19 Harald Rose Elektronenoptischer Korrektor zur Beseitigung der Bildfehler dritter Ordnung
US6836373B2 (en) * 2000-11-16 2004-12-28 Jeol Ltd. Spherical aberration corrector for electron microscope
DE10102527A1 (de) * 2001-01-20 2002-07-25 Ceos Gmbh Elektrostatischer Korrektor
DE10262340B4 (de) * 2001-07-13 2012-02-02 Jeol Ltd. Korrektureinrichtung zur Korrektur der sphärischen Aberration
DE10159454B4 (de) * 2001-12-04 2012-08-02 Carl Zeiss Nts Gmbh Korrektor zur Korrektion von Farbfehlern erster Ordnung, ersten Grades
DE10159308A1 (de) * 2001-12-04 2003-06-12 Ceos Gmbh Teilchenoptischer Korrektor
US6924488B2 (en) * 2002-06-28 2005-08-02 Jeol Ltd. Charged-particle beam apparatus equipped with aberration corrector
US6770887B2 (en) * 2002-07-08 2004-08-03 Ondrej L. Krivanek Aberration-corrected charged-particle optical apparatus
DE10237141A1 (de) * 2002-08-13 2004-02-26 Leo Elektronenmikroskopie Gmbh Strahlführungssystem, Abbildungsverfahren und Elektronenmikroskopiesystem
US6954862B2 (en) * 2002-08-27 2005-10-11 Michael Lawrence Serpa System and method for user authentication with enhanced passwords
EP1577926A1 (de) * 2004-03-19 2005-09-21 ICT, Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik Mbh Teilchenstrahlsystem mit hoher Stromdichte
US20090212213A1 (en) * 2005-03-03 2009-08-27 Ebara Corporation Projection electron beam apparatus and defect inspection system using the apparatus
KR20070116260A (ko) * 2005-03-22 2007-12-07 가부시키가이샤 에바라 세이사꾸쇼 전자선장치
JP4895525B2 (ja) * 2005-04-11 2012-03-14 株式会社日立ハイテクノロジーズ 走査透過電子顕微鏡装置
JP4721798B2 (ja) * 2005-07-21 2011-07-13 日本電子株式会社 電子線装置
WO2007013398A1 (ja) * 2005-07-26 2007-02-01 Ebara Corporation 電子線装置
JP4851148B2 (ja) * 2005-09-27 2012-01-11 日本電子株式会社 電子顕微鏡
EP1783811A3 (de) * 2005-11-02 2008-02-27 FEI Company Korrektor zur Korrektion von chromatischen Aberrationen in einem korpuskularoptiachen Apparat
JP2007242514A (ja) * 2006-03-10 2007-09-20 Univ Of Tokyo 透過型電子顕微鏡及びその制御方法
JP2007335125A (ja) * 2006-06-13 2007-12-27 Ebara Corp 電子線装置
WO2008100695A2 (en) * 2007-02-09 2008-08-21 Ge Healthcare Bio-Sciences Corp. System and method for adjusting the spherical aberration of objective lenses
EP2091062A1 (de) * 2008-02-13 2009-08-19 FEI Company TEM mit Aberrationskorrektor und Phasenplatte
EP2131385A1 (de) * 2008-06-05 2009-12-09 FEI Company Hybridphasenplatte
EP2166557A1 (de) * 2008-09-22 2010-03-24 FEI Company Verfahren zur Berichtigung von Verzerrungen in einer teilchenoptischen Vorrichtung
EP2197018A1 (de) * 2008-12-12 2010-06-16 FEI Company Verfahren zur Bestimmung von Verzeichnungen in einer teilchenoptischen Vorrichtung
US8053725B2 (en) * 2009-06-29 2011-11-08 Fei Company Beam quality in FIB systems
EP2325862A1 (de) * 2009-11-18 2011-05-25 Fei Company Korrektor für axiale Aberrationen einer teilchenoptischen Linse
US20110142362A1 (en) * 2009-12-11 2011-06-16 Marimon Sanjuan David Method for filtering data with symmetric weighted integral images
US8760563B2 (en) 2010-10-19 2014-06-24 Hand Held Products, Inc. Autofocusing optical imaging device
US8692927B2 (en) 2011-01-19 2014-04-08 Hand Held Products, Inc. Imaging terminal having focus control
DE102011009954A1 (de) * 2011-02-01 2012-08-02 Ceos Corrected Electron Optical Systems Gmbh Korrektor
EP2511936B1 (de) 2011-04-13 2013-10-02 Fei Company Verzerrungsfreie Stigmation eines TEM
EP2584584A1 (de) 2011-10-19 2013-04-24 FEI Company Verfahren zur Einstellung eines STEM mit Aberrationskorrektor
US8541755B1 (en) * 2012-05-09 2013-09-24 Jeol Ltd. Electron microscope
EP2704177B1 (de) 2012-09-04 2014-11-26 Fei Company Verfahren zur Untersuchung und Korrektur von Aberrationen in einem Linsensystem mit geladenen Teilchen
RU2551651C2 (ru) * 2013-04-05 2015-05-27 Федеральное государственное бюджетное образовательное учреждение высшего профессионального образования Ижевский государственный технический университет имени М.Т. Калашникова Высокочастотный электронно-ионный микроскоп
JP6077960B2 (ja) * 2013-07-24 2017-02-08 日本電子株式会社 球面収差補正装置、球面収差補正方法、および荷電粒子線装置
US9933607B2 (en) 2014-08-06 2018-04-03 General Electric Company Microscope objective

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US4303864A (en) * 1979-10-25 1981-12-01 The United States Of America As Represented By The United States Department Of Energy Sextupole system for the correction of spherical aberration
US4590379A (en) 1980-09-16 1986-05-20 Martin Frederick W Achromatic deflector and quadrupole lens
US4389571A (en) * 1981-04-01 1983-06-21 The United States Of America As Represented By The United States Department Of Energy Multiple sextupole system for the correction of third and higher order aberration
US4414474A (en) * 1982-02-17 1983-11-08 University Patents, Inc. Corrector for axial aberrations in electron optic instruments
DE3841715A1 (de) 1988-12-10 1990-06-13 Zeiss Carl Fa Abbildender korrektor vom wien-typ fuer elektronenmikroskope
EP0451370B1 (de) * 1990-04-12 1996-03-27 Koninklijke Philips Electronics N.V. Korrekturvorrichtung für ein teilchengeladenes Strahlgerät
DE4204512A1 (de) * 1992-02-15 1993-08-19 Haider Maximilian Dipl Phys Dr Elektronenoptisches korrektiv
KR19990028770A (ko) 1996-05-21 1999-04-15 엠. 제이. 엠. 반캄 입자-광학 장치에서 렌즈 수차를 교정하기 위한 교정장치
WO1998012732A1 (en) 1996-09-20 1998-03-26 Philips Electronics N.V. Correction device for correcting chromatic aberration in particle-optical apparatus
JP2001511303A (ja) 1997-12-11 2001-08-07 フィリップス エレクトロン オプティクス ビー ヴィ 粒子−光学装置における球面収差補正用の補正デバイス
DE69822802T2 (de) 1997-12-22 2004-08-05 Fei Co., Hillsboro Korrigiervorrichtung zur behebung des chromatischen fehlers in korpuskularoptischen geräten
JP2002524870A (ja) 1998-09-09 2002-08-06 コーニンクレッカ フィリップス エレクトロニクス エヌ ヴィ 荷電粒子による投射リソグラフィ用の四極子型装置

Also Published As

Publication number Publication date
WO1999030342A1 (en) 1999-06-17
EP0960429A1 (de) 1999-12-01
DE69822139T2 (de) 2004-07-29
JP2002516026A (ja) 2002-05-28
US6329659B1 (en) 2001-12-11
US6191423B1 (en) 2001-02-20
EP0966752A1 (de) 1999-12-29
EP0966752B1 (de) 2004-03-03
JP2001511303A (ja) 2001-08-07
WO1999030343A1 (en) 1999-06-17

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