DE69815639T2 - Lichtempfindliche Bildaufzeichnungszusammensetzung mit verbesserter Flexibilität, Haftung und Entschichtung - Google Patents

Lichtempfindliche Bildaufzeichnungszusammensetzung mit verbesserter Flexibilität, Haftung und Entschichtung Download PDF

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Publication number
DE69815639T2
DE69815639T2 DE69815639T DE69815639T DE69815639T2 DE 69815639 T2 DE69815639 T2 DE 69815639T2 DE 69815639 T DE69815639 T DE 69815639T DE 69815639 T DE69815639 T DE 69815639T DE 69815639 T2 DE69815639 T2 DE 69815639T2
Authority
DE
Germany
Prior art keywords
delamination
adhesion
improved flexibility
imaging composition
photosensitive imaging
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
DE69815639T
Other languages
English (en)
Other versions
DE69815639D1 (de
Inventor
Daniel E Lundy
Robert Barr
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nichigo Morton Co Ltd
Original Assignee
Nichigo Morton Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nichigo Morton Co Ltd filed Critical Nichigo Morton Co Ltd
Publication of DE69815639D1 publication Critical patent/DE69815639D1/de
Application granted granted Critical
Publication of DE69815639T2 publication Critical patent/DE69815639T2/de
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
    • C08L33/00—Compositions of homopolymers or copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and only one being terminated by only one carboxyl radical, or of salts, anhydrides, esters, amides, imides or nitriles thereof; Compositions of derivatives of such polymers
    • C08L33/04—Homopolymers or copolymers of esters
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/029—Inorganic compounds; Onium compounds; Organic compounds having hetero atoms other than oxygen, nitrogen or sulfur
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y10S430/121—Nitrogen in heterocyclic ring

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Organic Chemistry (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Polymerisation Methods In General (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Adhesives Or Adhesive Processes (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
DE69815639T 1997-12-01 1998-11-27 Lichtempfindliche Bildaufzeichnungszusammensetzung mit verbesserter Flexibilität, Haftung und Entschichtung Expired - Fee Related DE69815639T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US08/980,903 US5952153A (en) 1997-12-01 1997-12-01 Photoimageable composition having improved flexibility, adhesion and stripping characteristics

Publications (2)

Publication Number Publication Date
DE69815639D1 DE69815639D1 (de) 2003-07-24
DE69815639T2 true DE69815639T2 (de) 2004-01-29

Family

ID=25527949

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69815639T Expired - Fee Related DE69815639T2 (de) 1997-12-01 1998-11-27 Lichtempfindliche Bildaufzeichnungszusammensetzung mit verbesserter Flexibilität, Haftung und Entschichtung

Country Status (12)

Country Link
US (1) US5952153A (de)
EP (1) EP0919871B1 (de)
JP (1) JPH11231534A (de)
KR (1) KR100298374B1 (de)
CN (1) CN1103066C (de)
AT (1) ATE243330T1 (de)
AU (1) AU705608B1 (de)
CA (1) CA2249527A1 (de)
DE (1) DE69815639T2 (de)
IL (1) IL126888A0 (de)
SG (1) SG77202A1 (de)
TW (1) TW514765B (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP1209528B1 (de) 2000-11-28 2015-07-22 Eternal Technology Corporation Photoresistzusammensetzung
US7323290B2 (en) * 2002-09-30 2008-01-29 Eternal Technology Corporation Dry film photoresist
JP2004151691A (ja) * 2002-09-30 2004-05-27 Rohm & Haas Electronic Materials Llc 改良フォトレジスト
JP2004163904A (ja) * 2002-09-30 2004-06-10 Rohm & Haas Electronic Materials Llc 改善された光開始剤
US7378225B2 (en) * 2004-04-06 2008-05-27 Kyle Baldwin Method of forming a metal pattern on a substrate
JP4645776B2 (ja) * 2008-06-18 2011-03-09 日立化成工業株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造法
JP5344034B2 (ja) * 2009-03-13 2013-11-20 日立化成株式会社 感光性樹脂組成物、並びにこれを用いた感光性エレメント、レジストパターンの形成方法及びプリント配線板の製造方法
CN103064253B (zh) * 2012-12-05 2015-04-08 北京化工大学常州先进材料研究院 一种含有吖啶类氧化物的感光性组合物

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3953309A (en) * 1972-12-14 1976-04-27 Dynachem Corporation Polymerization compositions and processes having polymeric binding agents
US4003877A (en) * 1974-05-24 1977-01-18 Dynachem Corporation Photopolymerizable screen printing inks for permanent coatings prepared from aryloxyalkyl compositions
DE3136818C2 (de) * 1980-09-19 1990-08-02 Hitachi Chemical Co., Ltd., Tokio/Tokyo Verwendung eines lichtempfindlichen Gemisches und eines lichtempfindlichen Aufzeichnungsmaterials zur Bildung einer Lötmaske
US4610951A (en) * 1983-06-06 1986-09-09 Dynachem Corporation Process of using a flexible, fast processing photopolymerizable composition
DE3412992A1 (de) * 1984-04-06 1985-10-24 Hoechst Ag, 6230 Frankfurt Durch strahlung polymerisierbares gemisch und verfahren zum aufbringen von markierungen auf eine loetstopresistschicht
CA1282272C (en) * 1985-06-07 1991-04-02 Shigeru Danjo Photocurable composition
US4952482A (en) * 1987-08-03 1990-08-28 Hoechst Calanese Corporation Method of imaging oxygen resistant radiation polymerizable composition and element containing a photopolymer composition
US5217845A (en) * 1988-12-22 1993-06-08 Hoechst Aktiengesellschaft Photopolymerizable mixture and photopolymerizable copying material containing same
TW424172B (en) * 1995-04-19 2001-03-01 Hitachi Chemical Co Ltd Photosensitive resin composition and photosensitive element using the same
WO1997026586A1 (en) * 1996-01-12 1997-07-24 M.A. Hanna Company Composition for the manufacture of flexographic printing plates
EP0801328A1 (de) * 1996-04-09 1997-10-15 Morton International, Inc. Lichtempfindliche Bildaufzeichnungszusammensetzung mit Acryl-enthaltendem U.V. Stabilisator

Also Published As

Publication number Publication date
IL126888A0 (en) 1999-09-22
TW514765B (en) 2002-12-21
ATE243330T1 (de) 2003-07-15
EP0919871B1 (de) 2003-06-18
JPH11231534A (ja) 1999-08-27
CN1222689A (zh) 1999-07-14
CN1103066C (zh) 2003-03-12
EP0919871A1 (de) 1999-06-02
CA2249527A1 (en) 1999-06-01
SG77202A1 (en) 2000-12-19
US5952153A (en) 1999-09-14
AU705608B1 (en) 1999-05-27
KR19990062603A (ko) 1999-07-26
KR100298374B1 (ko) 2001-09-22
DE69815639D1 (de) 2003-07-24

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Legal Events

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8364 No opposition during term of opposition
8339 Ceased/non-payment of the annual fee