DE69809604D1 - Durch einen sättigbaren Absorber passiv geschalteter Festkörpermikrolaser und dessen Herstellungsverfahren - Google Patents

Durch einen sättigbaren Absorber passiv geschalteter Festkörpermikrolaser und dessen Herstellungsverfahren

Info

Publication number
DE69809604D1
DE69809604D1 DE69809604T DE69809604T DE69809604D1 DE 69809604 D1 DE69809604 D1 DE 69809604D1 DE 69809604 T DE69809604 T DE 69809604T DE 69809604 T DE69809604 T DE 69809604T DE 69809604 D1 DE69809604 D1 DE 69809604D1
Authority
DE
Germany
Prior art keywords
manufacturing process
saturable absorber
micro laser
state micro
switched solid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69809604T
Other languages
English (en)
Other versions
DE69809604T2 (de
Inventor
Philippe Thony
Engin Molva
Bernard Ferrand
Corinne Borel
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Commissariat a lEnergie Atomique et aux Energies Alternatives CEA
Original Assignee
Commissariat a lEnergie Atomique CEA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Commissariat a lEnergie Atomique CEA filed Critical Commissariat a lEnergie Atomique CEA
Application granted granted Critical
Publication of DE69809604D1 publication Critical patent/DE69809604D1/de
Publication of DE69809604T2 publication Critical patent/DE69809604T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0627Construction or shape of active medium the resonator being monolithic, e.g. microlaser
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/10Controlling the intensity, frequency, phase, polarisation or direction of the emitted radiation, e.g. switching, gating, modulating or demodulating
    • H01S3/11Mode locking; Q-switching; Other giant-pulse techniques, e.g. cavity dumping
    • H01S3/1123Q-switching
    • H01S3/113Q-switching using intracavity saturable absorbers
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01SDEVICES USING THE PROCESS OF LIGHT AMPLIFICATION BY STIMULATED EMISSION OF RADIATION [LASER] TO AMPLIFY OR GENERATE LIGHT; DEVICES USING STIMULATED EMISSION OF ELECTROMAGNETIC RADIATION IN WAVE RANGES OTHER THAN OPTICAL
    • H01S3/00Lasers, i.e. devices using stimulated emission of electromagnetic radiation in the infrared, visible or ultraviolet wave range
    • H01S3/05Construction or shape of optical resonators; Accommodation of active medium therein; Shape of active medium
    • H01S3/06Construction or shape of active medium
    • H01S3/0602Crystal lasers or glass lasers
    • H01S3/0604Crystal lasers or glass lasers in the form of a plate or disc

Landscapes

  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Optics & Photonics (AREA)
  • Lasers (AREA)
DE69809604T 1997-01-30 1998-01-27 Durch einen sättigbaren Absorber passiv geschalteter Festkörpermikrolaser und dessen Herstellungsverfahren Expired - Lifetime DE69809604T2 (de)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9701010A FR2758915B1 (fr) 1997-01-30 1997-01-30 Microlaser solide declenche passivement par absorbant saturable et son procede de fabrication

Publications (2)

Publication Number Publication Date
DE69809604D1 true DE69809604D1 (de) 2003-01-09
DE69809604T2 DE69809604T2 (de) 2003-07-24

Family

ID=9503127

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69809604T Expired - Lifetime DE69809604T2 (de) 1997-01-30 1998-01-27 Durch einen sättigbaren Absorber passiv geschalteter Festkörpermikrolaser und dessen Herstellungsverfahren

Country Status (5)

Country Link
US (1) US6023479A (de)
EP (1) EP0856924B1 (de)
JP (1) JP4077546B2 (de)
DE (1) DE69809604T2 (de)
FR (1) FR2758915B1 (de)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
USRE38489E1 (en) * 1997-01-30 2004-04-06 Commissariat A L'energie Atomique Solid microlaser passively switched by a saturable absorber and its production process
FR2785099B1 (fr) * 1998-10-27 2001-03-09 Commissariat Energie Atomique Laser a l'etat solide, notamment microlaser, capable d'emettre des impulsions longues
US6834063B2 (en) * 2000-01-06 2004-12-21 Raytheon Company Efficient angle tunable output from a monolithic serial KTA optical parametric oscillator
US6373865B1 (en) * 2000-02-01 2002-04-16 John E. Nettleton Pseudo-monolithic laser with an intracavity optical parametric oscillator
US20030039274A1 (en) * 2000-06-08 2003-02-27 Joseph Neev Method and apparatus for tissue treatment and modification
DE10029381A1 (de) * 2000-06-21 2002-01-03 Bosch Gmbh Robert Optischer Wellenleiter
CA2314316A1 (en) * 2000-07-21 2002-01-21 Utar Laboratories Canada Inc. An upconversion active gain medium and a micro-laser on the basis thereof
US6490081B1 (en) 2000-07-28 2002-12-03 The Board Of Trustees Of The Leland Stanford Junior University Method of amplifying optical signals using doped materials with extremely broad bandwidths
US6839362B2 (en) * 2001-05-22 2005-01-04 Saint-Gobain Ceramics & Plastics, Inc. Cobalt-doped saturable absorber Q-switches and laser systems
US6778563B2 (en) * 2001-06-05 2004-08-17 Cobolt Ab Q-switched laser
US6844084B2 (en) 2002-04-03 2005-01-18 Saint-Gobain Ceramics & Plastics, Inc. Spinel substrate and heteroepitaxial growth of III-V materials thereon
AU2003299854A1 (en) * 2002-12-20 2004-07-22 Alnaire Laboratories Corporation Optical pulse lasers
US6940877B2 (en) * 2003-05-30 2005-09-06 Np Photonics, Inc. High-power narrow-linewidth single-frequency laser
US20050058165A1 (en) * 2003-09-12 2005-03-17 Lightwave Electronics Corporation Laser having <100>-oriented crystal gain medium
US20070166852A1 (en) * 2003-09-22 2007-07-19 Snake Creek Lasers Llc Diode-pumped microlasers including resonator microchips and methods for producing the same
US20070121689A1 (en) * 2003-09-22 2007-05-31 Snake Creek Lasers Llc Methods for Producing Diode-Pumped Micro Lasers
US20050061230A1 (en) * 2003-09-23 2005-03-24 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same
US7045223B2 (en) * 2003-09-23 2006-05-16 Saint-Gobain Ceramics & Plastics, Inc. Spinel articles and methods for forming same
US7326477B2 (en) * 2003-09-23 2008-02-05 Saint-Gobain Ceramics & Plastics, Inc. Spinel boules, wafers, and methods for fabricating same
US7251265B2 (en) * 2004-03-10 2007-07-31 Tektronix, Inc. Micro-cavity laser having increased sensitivity
US7324568B2 (en) * 2004-04-08 2008-01-29 Raytheon Company Modulated saturable absorber controlled laser
US20060083276A1 (en) * 2004-09-28 2006-04-20 Snake Creek Lasers, Llc. Cryogenically cooled solid state lasers
US7203209B2 (en) * 2005-01-19 2007-04-10 Bae Systems Information And Electronic Systems Integration Inc. System and method for a passively Q-switched, resonantly pumped, erbium-doped crystalline laser
US7919815B1 (en) 2005-02-24 2011-04-05 Saint-Gobain Ceramics & Plastics, Inc. Spinel wafers and methods of preparation
US7649920B2 (en) * 2007-04-03 2010-01-19 Topcon Corporation Q-switched microlaser apparatus and method for use
US20110253909A1 (en) * 2008-11-07 2011-10-20 Fujirebio Inc. Optical sensing via cavity mode excitations in the stimulated emission regime
CN202111365U (zh) * 2011-04-22 2012-01-11 上海高意激光技术有限公司 一种被动调q微片激光器
US9515448B2 (en) * 2012-09-26 2016-12-06 Raytheon Company Microchip laser with single solid etalon and interfacial coating
US20170082873A1 (en) * 2014-03-25 2017-03-23 Brown University High frequency light emission device
US10622780B2 (en) * 2018-06-22 2020-04-14 Candela Corporation Handpiece with a microchip laser
CN109096796B (zh) * 2018-08-23 2020-10-13 华北水利水电大学 一种YAl1-x Fe xO3纳米颜料的制备方法
US20230187890A1 (en) * 2020-09-08 2023-06-15 Trieye Ltd. Novel passively q-switched laser

Family Cites Families (11)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR1448892A (fr) * 1965-06-15 1966-08-12 American Optical Corp Matériau absorbeur d'énergie
FR2712742B1 (fr) * 1993-11-15 1995-12-15 Commissariat Energie Atomique Microlaser solide, monolithique, autoaligné, à déclenchement passif par absorbant saturable et son procédé de fabrication.
FR2712743B1 (fr) * 1993-11-15 1995-12-15 Commissariat Energie Atomique Cavité laser à déclenchement passif par absorbant saturable et laser incorporant cette cavité.
US5557624A (en) * 1995-01-20 1996-09-17 Hughes Aircraft Company Laser system using U-doped crystal Q-switch
FR2729796A1 (fr) * 1995-01-24 1996-07-26 Commissariat Energie Atomique Microlaser solide monolithique a declenchement actif par tension de commande faible
FR2729797A1 (fr) * 1995-01-24 1996-07-26 Commissariat Energie Atomique Laser et microlaser a declenchement actif
US5654973A (en) * 1995-05-05 1997-08-05 Hughes Electronics Laser system using Co2+ -doped crystal Q-switch
FR2734096B1 (fr) * 1995-05-12 1997-06-06 Commissariat Energie Atomique Cavite microlaser et microlaser solide impulsionnel a declenchement passif et a commande externe
FR2734093B1 (fr) * 1995-05-12 1997-06-06 Commissariat Energie Atomique Oscillateur parametrique optique monolithique pompe par un microlaser
FR2734092B1 (fr) * 1995-05-12 1997-06-06 Commissariat Energie Atomique Microlaser monolithique declenche et materiau non lineaire intracavite
FR2745668B1 (fr) * 1996-03-01 1998-04-17 Commissariat Energie Atomique Dispositif de mesure precise de la duree d'un intervalle de temps

Also Published As

Publication number Publication date
DE69809604T2 (de) 2003-07-24
EP0856924A1 (de) 1998-08-05
FR2758915A1 (fr) 1998-07-31
US6023479A (en) 2000-02-08
JP4077546B2 (ja) 2008-04-16
JPH10223965A (ja) 1998-08-21
FR2758915B1 (fr) 1999-03-05
EP0856924B1 (de) 2002-11-27

Similar Documents

Publication Publication Date Title
DE69809604D1 (de) Durch einen sättigbaren Absorber passiv geschalteter Festkörpermikrolaser und dessen Herstellungsverfahren
DE69504475D1 (de) Passiv guetegeschalteter pikosekunden-mikrolaser
DE60121849D1 (de) Piezoelektrische/elektrostriktive Film-Bauelemente sowie deren Herstellungsverfahren
DE69517614T2 (de) Halbleiterdiodenlaser und dessen Herstellungsverfahren
DE69635410D1 (de) Halbleiterlaser und dessen herstellungsverfahren
DE19680463T1 (de) Diodengepumpter, resonatorintern verdoppelnder Multiaxialmodenlaser
DE60032699D1 (de) Piezoelektrisches/elektrostriktives Bauelement und dessen Herstellungsverfahren
IT1278508B1 (it) Composito idraulico e procedimento di fabbricazione.
DE69410214D1 (de) Monolithische integrierter Laser und Modulator und Herstellungsverfahren
DE60035244D1 (de) Piezoelektrisches/elektrostriktives Bauelement und dessen Herstellungsverfahren
DE60035009D1 (de) Piezoelektrisches/elektrostriktives Bauelement und dessen Herstellungsverfahren
DE69504262T2 (de) Halbleiterlaser und dessen Herstellungsverfahren
DK1033990T3 (da) 21-Hydroxy-6,19-oxidoprogesteron (21OH-6OP) dets anvendelse som medikament i behandling af glucocorticoidoverskud
DE69801342D1 (de) Halbleiterlaser und dazugehöriges Herstellungsverfahren
DE69600544T2 (de) Mikorlaserkavität und ihr Herstellungsverfahren
DE59301024D1 (de) Frequenzverdoppelter Festkörperlaser.
DE69909548D1 (de) Modifiziertes Polyisocyanat und dessen Herstellungsverfahren
GB2403339B (en) Cobalt-doped saturable absorber q-switches and laser systems
DE69401733D1 (de) Halbleiterlaser und dessen Herstellungsverfahren
SG104264A1 (en) Lens, manufacturing method thereof, and optical device using the same lens
ES1033775Y (es) Elemento prostetico parietal.
DE60037962D1 (de) Aktives Element für eine Laser-Quelle und Anwendung in einer Laser-Quelle
DE69829552D1 (de) Oberflächenemittierender laser und dessen herstellungsverfahren
DE60004259D1 (de) Optisches schaltkreiselement und dessen herstellungsverfahren
NO980304D0 (no) Lasersystem med en passiv mettbar absorberer

Legal Events

Date Code Title Description
8364 No opposition during term of opposition