DE69805618D1 - Verfahren zur herstellung von nichthaftendem diamantartigem nanokomposit - Google Patents

Verfahren zur herstellung von nichthaftendem diamantartigem nanokomposit

Info

Publication number
DE69805618D1
DE69805618D1 DE69805618T DE69805618T DE69805618D1 DE 69805618 D1 DE69805618 D1 DE 69805618D1 DE 69805618 T DE69805618 T DE 69805618T DE 69805618 T DE69805618 T DE 69805618T DE 69805618 D1 DE69805618 D1 DE 69805618D1
Authority
DE
Germany
Prior art keywords
substrate
plasma
negative
filament
bias
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69805618T
Other languages
English (en)
Other versions
DE69805618T2 (de
Inventor
Dominique Neerinck
Peter Persoone
Marc Sercu
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Bekaert NV SA
Original Assignee
Bekaert NV SA
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Bekaert NV SA filed Critical Bekaert NV SA
Application granted granted Critical
Publication of DE69805618D1 publication Critical patent/DE69805618D1/de
Publication of DE69805618T2 publication Critical patent/DE69805618T2/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/26—Deposition of carbon only
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0236—Pretreatment of the material to be coated by cleaning or etching by etching with a reactive gas
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
    • C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
    • A61B18/08—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating by means of electrically-heated probes
    • A61B18/082—Probes or electrodes therefor
    • A61B18/085—Forceps, scissors
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
    • A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
    • A61B18/12—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating by passing a current through the tissue to be heated, e.g. high-frequency current
    • A61B18/14—Probes or electrodes therefor
    • A61B18/1442—Probes having pivoting end effectors, e.g. forceps
    • A—HUMAN NECESSITIES
    • A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
    • A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
    • A61B17/00—Surgical instruments, devices or methods, e.g. tourniquets
    • A61B2017/00831—Material properties
    • A61B2017/0084—Material properties low friction
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Metallurgy (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • General Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical Vapour Deposition (AREA)
  • Carbon And Carbon Compounds (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
DE69805618T 1997-06-19 1998-06-15 Verfahren zur herstellung von nichthaftendem diamantartigem nanokomposit Expired - Lifetime DE69805618T2 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP97201867A EP0885983A1 (de) 1997-06-19 1997-06-19 Verfahren zur Beschichtung eines Substrates mit einer diamantartigen Nanocomposit-Zusammensetzung
PCT/EP1998/003726 WO1998059089A1 (en) 1997-06-19 1998-06-15 Method for making a non-sticking diamond-like nanocomposite

Publications (2)

Publication Number Publication Date
DE69805618D1 true DE69805618D1 (de) 2002-07-04
DE69805618T2 DE69805618T2 (de) 2002-09-12

Family

ID=8228458

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69805618T Expired - Lifetime DE69805618T2 (de) 1997-06-19 1998-06-15 Verfahren zur herstellung von nichthaftendem diamantartigem nanokomposit

Country Status (7)

Country Link
US (1) US6472062B1 (de)
EP (2) EP0885983A1 (de)
JP (1) JP4695233B2 (de)
AT (1) ATE218170T1 (de)
CA (1) CA2294420C (de)
DE (1) DE69805618T2 (de)
WO (1) WO1998059089A1 (de)

Families Citing this family (36)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6660656B2 (en) 1998-02-11 2003-12-09 Applied Materials Inc. Plasma processes for depositing low dielectric constant films
US6413583B1 (en) 1998-02-11 2002-07-02 Applied Materials, Inc. Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound
US6627532B1 (en) 1998-02-11 2003-09-30 Applied Materials, Inc. Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition
US6303523B2 (en) 1998-02-11 2001-10-16 Applied Materials, Inc. Plasma processes for depositing low dielectric constant films
US6593247B1 (en) 1998-02-11 2003-07-15 Applied Materials, Inc. Method of depositing low k films using an oxidizing plasma
US6287990B1 (en) 1998-02-11 2001-09-11 Applied Materials, Inc. CVD plasma assisted low dielectric constant films
US6054379A (en) 1998-02-11 2000-04-25 Applied Materials, Inc. Method of depositing a low k dielectric with organo silane
US6340435B1 (en) 1998-02-11 2002-01-22 Applied Materials, Inc. Integrated low K dielectrics and etch stops
WO1999047346A1 (de) * 1998-03-13 1999-09-23 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Vorrichtung zum verpressen von fliessförmigen feststoffen
US6800571B2 (en) 1998-09-29 2004-10-05 Applied Materials Inc. CVD plasma assisted low dielectric constant films
US6399489B1 (en) 1999-11-01 2002-06-04 Applied Materials, Inc. Barrier layer deposition using HDP-CVD
US6749813B1 (en) 2000-03-05 2004-06-15 3M Innovative Properties Company Fluid handling devices with diamond-like films
US6531398B1 (en) 2000-10-30 2003-03-11 Applied Materials, Inc. Method of depositing organosillicate layers
US6709721B2 (en) 2001-03-28 2004-03-23 Applied Materials Inc. Purge heater design and process development for the improvement of low k film properties
US6486082B1 (en) 2001-06-18 2002-11-26 Applied Materials, Inc. CVD plasma assisted lower dielectric constant sicoh film
US6926926B2 (en) 2001-09-10 2005-08-09 Applied Materials, Inc. Silicon carbide deposited by high density plasma chemical-vapor deposition with bias
US6936309B2 (en) 2002-04-02 2005-08-30 Applied Materials, Inc. Hardness improvement of silicon carboxy films
US6815373B2 (en) 2002-04-16 2004-11-09 Applied Materials Inc. Use of cyclic siloxanes for hardness improvement of low k dielectric films
US7824498B2 (en) * 2004-02-24 2010-11-02 Applied Materials, Inc. Coating for reducing contamination of substrates during processing
US8033550B2 (en) 2005-05-26 2011-10-11 Sulzer Metaplas Gmbh Piston ring having hard multi-layer coating
US7879437B2 (en) * 2007-07-06 2011-02-01 Aculon, Inc. Silicon-transition metal reaction products for coating substrates
EP2243056A1 (de) * 2007-10-05 2010-10-27 Creepservice S.à.r.l. Tonnenfeder mit hoher energiespeicherkapazität und herstellungsverfahren dafür
CH704640B1 (fr) * 2008-03-18 2012-09-28 Complitime Sa Organe de pivotement.
US8303582B2 (en) 2008-09-15 2012-11-06 Tyco Healthcare Group Lp Electrosurgical instrument having a coated electrode utilizing an atomic layer deposition technique
CH700154B1 (fr) * 2008-12-24 2014-03-14 Complitime Sa Pièce d'horlogerie comprenant un organe de pivotement.
JP5526870B2 (ja) * 2009-04-06 2014-06-18 セイコーエプソン株式会社 時計輪列、および時計
DE102009002780A1 (de) 2009-04-30 2010-11-11 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Metallsubstrate mit kratzfester und dehnbarer Korrosionsschutzschicht und Verfahren zu deren Herstellung
US8516706B2 (en) * 2010-01-08 2013-08-27 Syneron Medical Ltd Skin-heating shaving apparatus and method
GB201003275D0 (en) * 2010-02-26 2010-04-14 Portal Medical Ltd Method of manufacturing a medicament dispenser device
DE102010002687C5 (de) * 2010-03-09 2015-09-10 Federal-Mogul Burscheid Gmbh Verfahren zur Beschichtung zumindest der Innenfläche eines Kolbenrings sowie Kolbenring
DE102010052971A1 (de) 2010-11-30 2012-05-31 Amg Coating Technologies Gmbh Werkstück mit Si-DLC Beschichtung und Verfahren zur Herstellung von Beschichtungen
EP2734897B1 (de) * 2011-07-21 2024-06-12 The Swatch Group Research and Development Ltd. Mikromechanische funktionsanordnung
DE102012007763A1 (de) 2012-04-20 2013-10-24 Ulrich Schmidt Modularer Rahmen für Steckdosen und Schalter
DE102012007796A1 (de) 2012-04-20 2013-10-24 Amg Coating Technologies Gmbh Beschichtung enthaltend Si-DLC, DLC und Me-DLC und Verfahren zur Herstellung von Beschichtungen
EP3171230B1 (de) * 2015-11-19 2019-02-27 Nivarox-FAR S.A. Uhrwerkkomponente mit verbesserter tribologie
US11639543B2 (en) 2019-05-22 2023-05-02 Thin Film Service, Inc. Tetrahedral amorphous hydrogenated carbon and amorphous siloxane diamond-like nanocomposite

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5112025A (en) * 1990-02-22 1992-05-12 Tdk Corporation Molds having wear resistant release coatings
US5352493A (en) * 1991-05-03 1994-10-04 Veniamin Dorfman Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films
US5579583A (en) * 1992-09-22 1996-12-03 Micromed, Incorporated Microfabricated blades
US5618619A (en) * 1994-03-03 1997-04-08 Monsanto Company Highly abrasion-resistant, flexible coatings for soft substrates
US5795648A (en) * 1995-10-03 1998-08-18 Advanced Refractory Technologies, Inc. Method for preserving precision edges using diamond-like nanocomposite film coatings
US5638251A (en) * 1995-10-03 1997-06-10 Advanced Refractory Technologies, Inc. Capacitive thin films using diamond-like nanocomposite materials
DE69710324T2 (de) 1996-04-22 2002-08-29 Bekaert Sa Nv Diamantaehnliche nanokomposit-zusammensetzungen
EP0856592A1 (de) 1997-02-04 1998-08-05 N.V. Bekaert S.A. Beschichtung enthaltende Filme aus diamantartigem Kohlenstoff und diamantartigem Nanokomposit

Also Published As

Publication number Publication date
CA2294420A1 (en) 1998-12-30
DE69805618T2 (de) 2002-09-12
JP4695233B2 (ja) 2011-06-08
WO1998059089A1 (en) 1998-12-30
EP0885983A1 (de) 1998-12-23
EP0988406A1 (de) 2000-03-29
US6472062B1 (en) 2002-10-29
EP0988406B1 (de) 2002-05-29
JP2002504960A (ja) 2002-02-12
CA2294420C (en) 2007-03-13
ATE218170T1 (de) 2002-06-15

Similar Documents

Publication Publication Date Title
ATE218170T1 (de) Verfahren zur herstellung von nichthaftendem diamantartigem nanokomposit
US5454903A (en) Plasma cleaning of a CVD or etch reactor using helium for plasma stabilization
US5403459A (en) Cleaning of a PVD chamber containing a collimator
US5759360A (en) Wafer clean sputtering process
EP0838831A3 (de) Elektronenemittierende Beschichtung und Verfahren
US5939149A (en) Method of forming hydrogen-free diamond like carbon (DLC) films
US5211995A (en) Method of protecting an organic surface by deposition of an inorganic refractory coating thereon
ATE528421T1 (de) Verfahren zur herstellung von gruppe-iii- metallnitrid-materialien
JPH10500391A (ja) ダイヤモンド状炭素フィルムの大型で低圧力のプラズマイオン付着
DE60135014D1 (de) Verfahren und vorrichtung zum ecr plasma aufbringen von einwandigen kohlenstoffnanoröhren sowie erhaltene nanoröhren
EP1111664A3 (de) Apparat und Prozess, dielektrische Schichten abzuscheiden
ATE522637T1 (de) Verfahren zur herstellung eines sputtertargets
WO2000005745A8 (en) Physical vapor processing of a surface with non-uniformity compensation
US5366579A (en) Industrial diamond coating and method of manufacturing
EP1101834A3 (de) Verfahren zur Abscheidung von Materialen auf Substraten
EP0774772A1 (de) Verfahren zum physikalischen Ätzen von elektrisch leitenden Siliziumoberflächen
KR100250214B1 (ko) 칼라 스텐레스의 강판의 제조 방법
GB2227755A (en) Improving the wear resistance of metallic components by coating and diffusion treatment
JPS63458A (ja) 真空ア−ク蒸着装置
JP2002313736A (ja) プラズマ処理装置
RU2039846C1 (ru) Способ получения пленок в плазме
EP0989446A3 (de) Verfahren zur Herstellung einer nichtlinearen optischen Dünnschicht
JPS63195260A (ja) 被覆材料とその製造方法
JPS5992995A (ja) 高融点金属シリサイド膜の形成方法
JP4378022B2 (ja) アモルファス炭素成膜装置及び成膜方法

Legal Events

Date Code Title Description
8364 No opposition during term of opposition
R082 Change of representative

Ref document number: 988406

Country of ref document: EP

Representative=s name: MANITZ, FINSTERWALD & PARTNER GBR, 80336 MUENCHEN,