JP2002504960A - 非付着性ダイヤモンド状ナノ合成組成物 - Google Patents
非付着性ダイヤモンド状ナノ合成組成物Info
- Publication number
- JP2002504960A JP2002504960A JP50377099A JP50377099A JP2002504960A JP 2002504960 A JP2002504960 A JP 2002504960A JP 50377099 A JP50377099 A JP 50377099A JP 50377099 A JP50377099 A JP 50377099A JP 2002504960 A JP2002504960 A JP 2002504960A
- Authority
- JP
- Japan
- Prior art keywords
- composition
- substrate
- plasma
- coating
- diamond
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/26—Deposition of carbon only
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0236—Pretreatment of the material to be coated by cleaning or etching by etching with a reactive gas
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/40—Oxides
- C23C16/401—Oxides containing silicon
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/50—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges
- C23C16/505—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using electric discharges using radio frequency discharges
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/08—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating by means of electrically-heated probes
- A61B18/082—Probes or electrodes therefor
- A61B18/085—Forceps, scissors
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B18/00—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body
- A61B18/04—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating
- A61B18/12—Surgical instruments, devices or methods for transferring non-mechanical forms of energy to or from the body by heating by passing a current through the tissue to be heated, e.g. high-frequency current
- A61B18/14—Probes or electrodes therefor
- A61B18/1442—Probes having pivoting end effectors, e.g. forceps
-
- A—HUMAN NECESSITIES
- A61—MEDICAL OR VETERINARY SCIENCE; HYGIENE
- A61B—DIAGNOSIS; SURGERY; IDENTIFICATION
- A61B17/00—Surgical instruments, devices or methods, e.g. tourniquets
- A61B2017/00831—Material properties
- A61B2017/0084—Material properties low friction
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T428/00—Stock material or miscellaneous articles
- Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
- Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
- Y10T428/264—Up to 3 mils
- Y10T428/265—1 mil or less
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.a−C:Hおよびa−Si:Oの網状組織からなる改良された非付着性ダ イヤモンド状ナノ(10億分の1レベルの微小)組成物において、H濃度がC濃 度の85%から125%の範囲にあることを特徴とする組成物。 2.25〜35原子%のC、30〜40原子%のH、25〜30原子%のSi 、および10〜15原子%のOからなることを特徴とする請求項1に記載の組成 物。 3.少なくとも一種の遷移金属が不純物として添加されることを特徴とする請 求項1に記載の組成物。 4.前記遷移金属はZr、TiまたはWであることを特徴とする請求項3に記 載の組成物。 5.Ar、KrまたはNのような不活性ガスを0.5〜5原子%含むことを特 徴とする請求項1または3に記載の組成物。 6.ナノ(10億分の1レベルの微小)押し込み硬さ法によって測定された硬 さ10GPaであることを特徴とする請求項1または5に記載の組成物。 7.請求項1に記載の前記組成物からなる層によって少なくとも部分的に被覆 された基板において、前記層の厚みが0.01〜10μmの範囲にあることを特 徴とする基板。 8.真空室内において、基板の少なくとも一部を非付着性のダイヤモンド状ナ ノ合成組成物によって被覆する方法において、 (a)Arのような不活性ガスのイオンを前記基板に衝突させることによって 前記基板をプラズマエッチングする段階と、 (b)5×10-3〜5×10-2ミリバールの作動圧の下で、蒸着される元素C 、H、Si、およびOを適当な比率で含む液状有機前駆体を、前記比率が蒸着工 程中実質的に一定であるように、導入する段階と、 (c)50〜150Aのフィラメント電流、50〜300Vの負のフィラメン トバイアスDC電圧、および0.1〜20Aのプラズマ電流の条件下で行われる フィラメントを用いる電子援用DC放電によって前記導入前駆体からプラズマを 形成する段階と、 (d)プラズマ中に形成されたイオンを引き出すために、前記基板に350〜 700Vの負のDCバイアス電圧または負のRF自己バイアス電圧を付加し、ま た、前記RF電圧の周波数は30〜1000kHzとして、前記基板に前記組成 物を蒸着させる段階と、 からなることを特徴とする方法。 9.ヘキサメチルジシロキサンを前記有機前駆体として用いることを特徴とす る請求項8に記載の方法。 10.前記蒸着工程中に不活性ガスが前記真空室内に導入され、前記不活性ガス はイオン化され、そのイオンが成長するナノ合成層とイオン衝突して前記ナノ合 成層に混入されることを特徴とする請求項8に記載の方法。 11.前記前駆体は前記真空室内に導入されるキャリアガスと混合され、その混 合物が加熱されて前記前駆体を蒸発させることを特徴とする請求項8に記載の方 法。 12.前記キャリアガスは不活性ガスであることを特徴とする請求項11に記載 の方法。 13.少なくとも一種の遷移金属が、イオンスパッタリング法または熱蒸着法に よって、前記組成物層内に共蒸着されることを特徴とする請求項8に記載の方法 。 14.非付着性ダイヤモンド状ナノ合成組成物によって少なくとも部分的に被覆 された前記基板は、ポリマー材料の射出成形用金型に用いられることを特徴とす る請求項8に記載の方法。 15.非付着性ダイヤモンド状ナノ合成組成物によって少なくとも部分的に被覆 された前記基板は、プラスチックの融着用電極に用いられることを特徴とする請 求項8に記載の方法。 16.非付着性ダイヤモンド状ナノ合成組成物によって少なくとも部分的に被覆 された前記基板は、電気的外科手術の切刃に用いられることを特徴とする請求項 8に記載の方法。 17.表面の少なくとも一部が請求項1に記載の非付着性組成物によって被覆さ れることを特徴とする成形手段。
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
EP97201867.5 | 1997-06-19 | ||
EP97201867A EP0885983A1 (en) | 1997-06-19 | 1997-06-19 | Method for coating a substrate with a diamond like nanocomposite composition |
PCT/EP1998/003726 WO1998059089A1 (en) | 1997-06-19 | 1998-06-15 | Method for making a non-sticking diamond-like nanocomposite |
Publications (3)
Publication Number | Publication Date |
---|---|
JP2002504960A true JP2002504960A (ja) | 2002-02-12 |
JP2002504960A5 JP2002504960A5 (ja) | 2011-03-03 |
JP4695233B2 JP4695233B2 (ja) | 2011-06-08 |
Family
ID=8228458
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP50377099A Expired - Lifetime JP4695233B2 (ja) | 1997-06-19 | 1998-06-15 | 非付着性ダイヤモンド状ナノ合成組成物 |
Country Status (7)
Country | Link |
---|---|
US (1) | US6472062B1 (ja) |
EP (2) | EP0885983A1 (ja) |
JP (1) | JP4695233B2 (ja) |
AT (1) | ATE218170T1 (ja) |
CA (1) | CA2294420C (ja) |
DE (1) | DE69805618T2 (ja) |
WO (1) | WO1998059089A1 (ja) |
Families Citing this family (36)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6660656B2 (en) | 1998-02-11 | 2003-12-09 | Applied Materials Inc. | Plasma processes for depositing low dielectric constant films |
US6287990B1 (en) | 1998-02-11 | 2001-09-11 | Applied Materials, Inc. | CVD plasma assisted low dielectric constant films |
US6054379A (en) | 1998-02-11 | 2000-04-25 | Applied Materials, Inc. | Method of depositing a low k dielectric with organo silane |
US6340435B1 (en) | 1998-02-11 | 2002-01-22 | Applied Materials, Inc. | Integrated low K dielectrics and etch stops |
US6413583B1 (en) | 1998-02-11 | 2002-07-02 | Applied Materials, Inc. | Formation of a liquid-like silica layer by reaction of an organosilicon compound and a hydroxyl forming compound |
US6627532B1 (en) | 1998-02-11 | 2003-09-30 | Applied Materials, Inc. | Method of decreasing the K value in SiOC layer deposited by chemical vapor deposition |
US6303523B2 (en) | 1998-02-11 | 2001-10-16 | Applied Materials, Inc. | Plasma processes for depositing low dielectric constant films |
US6593247B1 (en) | 1998-02-11 | 2003-07-15 | Applied Materials, Inc. | Method of depositing low k films using an oxidizing plasma |
WO1999047346A1 (de) * | 1998-03-13 | 1999-09-23 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Vorrichtung zum verpressen von fliessförmigen feststoffen |
US6800571B2 (en) | 1998-09-29 | 2004-10-05 | Applied Materials Inc. | CVD plasma assisted low dielectric constant films |
US6399489B1 (en) | 1999-11-01 | 2002-06-04 | Applied Materials, Inc. | Barrier layer deposition using HDP-CVD |
US6749813B1 (en) | 2000-03-05 | 2004-06-15 | 3M Innovative Properties Company | Fluid handling devices with diamond-like films |
US6531398B1 (en) | 2000-10-30 | 2003-03-11 | Applied Materials, Inc. | Method of depositing organosillicate layers |
US6709721B2 (en) | 2001-03-28 | 2004-03-23 | Applied Materials Inc. | Purge heater design and process development for the improvement of low k film properties |
US6486082B1 (en) | 2001-06-18 | 2002-11-26 | Applied Materials, Inc. | CVD plasma assisted lower dielectric constant sicoh film |
US6926926B2 (en) | 2001-09-10 | 2005-08-09 | Applied Materials, Inc. | Silicon carbide deposited by high density plasma chemical-vapor deposition with bias |
US6936309B2 (en) | 2002-04-02 | 2005-08-30 | Applied Materials, Inc. | Hardness improvement of silicon carboxy films |
US6815373B2 (en) | 2002-04-16 | 2004-11-09 | Applied Materials Inc. | Use of cyclic siloxanes for hardness improvement of low k dielectric films |
US7824498B2 (en) | 2004-02-24 | 2010-11-02 | Applied Materials, Inc. | Coating for reducing contamination of substrates during processing |
EP1883717A1 (en) | 2005-05-26 | 2008-02-06 | NV Bekaert SA | Piston ring having hard multi-layer coating |
WO2009008993A2 (en) * | 2007-07-06 | 2009-01-15 | Aculon, Inc. | Silcon-transition metal reaction products for coating substrates |
EP2243056A1 (fr) * | 2007-10-05 | 2010-10-27 | Creepservice S.à.r.l. | Ressort de barillet a grande capacite de stockage d'energie et son procede de fabrication |
CH704640B1 (fr) * | 2008-03-18 | 2012-09-28 | Complitime Sa | Organe de pivotement. |
US8303582B2 (en) | 2008-09-15 | 2012-11-06 | Tyco Healthcare Group Lp | Electrosurgical instrument having a coated electrode utilizing an atomic layer deposition technique |
CH700154B1 (fr) * | 2008-12-24 | 2014-03-14 | Complitime Sa | Pièce d'horlogerie comprenant un organe de pivotement. |
JP5526870B2 (ja) * | 2009-04-06 | 2014-06-18 | セイコーエプソン株式会社 | 時計輪列、および時計 |
DE102009002780A1 (de) | 2009-04-30 | 2010-11-11 | Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. | Metallsubstrate mit kratzfester und dehnbarer Korrosionsschutzschicht und Verfahren zu deren Herstellung |
US8516706B2 (en) * | 2010-01-08 | 2013-08-27 | Syneron Medical Ltd | Skin-heating shaving apparatus and method |
GB201003275D0 (en) * | 2010-02-26 | 2010-04-14 | Portal Medical Ltd | Method of manufacturing a medicament dispenser device |
DE102010002687C5 (de) * | 2010-03-09 | 2015-09-10 | Federal-Mogul Burscheid Gmbh | Verfahren zur Beschichtung zumindest der Innenfläche eines Kolbenrings sowie Kolbenring |
DE102010052971A1 (de) | 2010-11-30 | 2012-05-31 | Amg Coating Technologies Gmbh | Werkstück mit Si-DLC Beschichtung und Verfahren zur Herstellung von Beschichtungen |
US9958830B2 (en) * | 2011-07-21 | 2018-05-01 | The Swatch Group Research And Development Ltd | Functional micromechanical assembly |
DE102012007796A1 (de) | 2012-04-20 | 2013-10-24 | Amg Coating Technologies Gmbh | Beschichtung enthaltend Si-DLC, DLC und Me-DLC und Verfahren zur Herstellung von Beschichtungen |
DE102012007763A1 (de) | 2012-04-20 | 2013-10-24 | Ulrich Schmidt | Modularer Rahmen für Steckdosen und Schalter |
EP3171230B1 (fr) * | 2015-11-19 | 2019-02-27 | Nivarox-FAR S.A. | Composant d'horlogerie a tribologie amelioree |
US11639543B2 (en) | 2019-05-22 | 2023-05-02 | Thin Film Service, Inc. | Tetrahedral amorphous hydrogenated carbon and amorphous siloxane diamond-like nanocomposite |
Family Cites Families (8)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5112025A (en) * | 1990-02-22 | 1992-05-12 | Tdk Corporation | Molds having wear resistant release coatings |
US5352493A (en) * | 1991-05-03 | 1994-10-04 | Veniamin Dorfman | Method for forming diamond-like nanocomposite or doped-diamond-like nanocomposite films |
US5579583A (en) * | 1992-09-22 | 1996-12-03 | Micromed, Incorporated | Microfabricated blades |
US5618619A (en) * | 1994-03-03 | 1997-04-08 | Monsanto Company | Highly abrasion-resistant, flexible coatings for soft substrates |
US5638251A (en) * | 1995-10-03 | 1997-06-10 | Advanced Refractory Technologies, Inc. | Capacitive thin films using diamond-like nanocomposite materials |
US5795648A (en) * | 1995-10-03 | 1998-08-18 | Advanced Refractory Technologies, Inc. | Method for preserving precision edges using diamond-like nanocomposite film coatings |
DE69710324T2 (de) | 1996-04-22 | 2002-08-29 | Bekaert Sa Nv | Diamantaehnliche nanokomposit-zusammensetzungen |
EP0856592A1 (en) | 1997-02-04 | 1998-08-05 | N.V. Bekaert S.A. | A coating comprising layers of diamond like carbon and diamond like nanocomposite compositions |
-
1997
- 1997-06-19 EP EP97201867A patent/EP0885983A1/en not_active Withdrawn
-
1998
- 1998-06-15 DE DE69805618T patent/DE69805618T2/de not_active Expired - Lifetime
- 1998-06-15 CA CA002294420A patent/CA2294420C/en not_active Expired - Lifetime
- 1998-06-15 WO PCT/EP1998/003726 patent/WO1998059089A1/en active IP Right Grant
- 1998-06-15 EP EP98933636A patent/EP0988406B1/en not_active Expired - Lifetime
- 1998-06-15 JP JP50377099A patent/JP4695233B2/ja not_active Expired - Lifetime
- 1998-06-15 AT AT98933636T patent/ATE218170T1/de not_active IP Right Cessation
-
1999
- 1999-06-15 US US09/446,308 patent/US6472062B1/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
EP0988406A1 (en) | 2000-03-29 |
EP0885983A1 (en) | 1998-12-23 |
CA2294420C (en) | 2007-03-13 |
EP0988406B1 (en) | 2002-05-29 |
US6472062B1 (en) | 2002-10-29 |
DE69805618T2 (de) | 2002-09-12 |
ATE218170T1 (de) | 2002-06-15 |
WO1998059089A1 (en) | 1998-12-30 |
CA2294420A1 (en) | 1998-12-30 |
JP4695233B2 (ja) | 2011-06-08 |
DE69805618D1 (de) | 2002-07-04 |
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