DE69738690D1 - Verfahren und vorrichtung zur plasmabeschichtung eines dünnen filmes auf die innenseite eines behälters - Google Patents

Verfahren und vorrichtung zur plasmabeschichtung eines dünnen filmes auf die innenseite eines behälters

Info

Publication number
DE69738690D1
DE69738690D1 DE69738690T DE69738690T DE69738690D1 DE 69738690 D1 DE69738690 D1 DE 69738690D1 DE 69738690 T DE69738690 T DE 69738690T DE 69738690 T DE69738690 T DE 69738690T DE 69738690 D1 DE69738690 D1 DE 69738690D1
Authority
DE
Germany
Prior art keywords
container
thin film
plasma coating
plasma
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
DE69738690T
Other languages
English (en)
Inventor
John T Felts
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nano Scale Surface Systems Inc
Original Assignee
Nano Scale Surface Systems Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nano Scale Surface Systems Inc filed Critical Nano Scale Surface Systems Inc
Application granted granted Critical
Publication of DE69738690D1 publication Critical patent/DE69738690D1/de
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/04—Coating on selected surface areas, e.g. using masks
    • C23C16/045—Coating cavities or hollow spaces, e.g. interior of tubes; Infiltration of porous substrates
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Vapour Deposition (AREA)
DE69738690T 1996-10-08 1997-10-02 Verfahren und vorrichtung zur plasmabeschichtung eines dünnen filmes auf die innenseite eines behälters Expired - Lifetime DE69738690D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US08/728,283 US6112695A (en) 1996-10-08 1996-10-08 Apparatus for plasma deposition of a thin film onto the interior surface of a container
PCT/US1997/017123 WO1998015669A1 (en) 1996-10-08 1997-10-02 Method and apparatus for plasma deposition of a thin film onto the interior surface of a container

Publications (1)

Publication Number Publication Date
DE69738690D1 true DE69738690D1 (de) 2008-06-26

Family

ID=24926195

Family Applications (1)

Application Number Title Priority Date Filing Date
DE69738690T Expired - Lifetime DE69738690D1 (de) 1996-10-08 1997-10-02 Verfahren und vorrichtung zur plasmabeschichtung eines dünnen filmes auf die innenseite eines behälters

Country Status (5)

Country Link
US (2) US6112695A (de)
EP (1) EP0958400B1 (de)
AU (1) AU4498897A (de)
DE (1) DE69738690D1 (de)
WO (1) WO1998015669A1 (de)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU222169U1 (ru) * 2023-11-06 2023-12-13 Алиса Дмитриевна Будная Натекатель газа для установки вакуумного напыления

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* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
RU222169U1 (ru) * 2023-11-06 2023-12-13 Алиса Дмитриевна Будная Натекатель газа для установки вакуумного напыления

Also Published As

Publication number Publication date
WO1998015669A1 (en) 1998-04-16
US6180191B1 (en) 2001-01-30
EP0958400B1 (de) 2008-05-14
EP0958400A4 (de) 2002-08-14
AU4498897A (en) 1998-05-05
EP0958400A1 (de) 1999-11-24
US6112695A (en) 2000-09-05

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