DE69732055D1 - Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch neutralen Linie - Google Patents
Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch neutralen LinieInfo
- Publication number
- DE69732055D1 DE69732055D1 DE69732055T DE69732055T DE69732055D1 DE 69732055 D1 DE69732055 D1 DE 69732055D1 DE 69732055 T DE69732055 T DE 69732055T DE 69732055 T DE69732055 T DE 69732055T DE 69732055 D1 DE69732055 D1 DE 69732055D1
- Authority
- DE
- Germany
- Prior art keywords
- plasma
- generating
- neutral line
- discharge along
- magnetically neutral
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32357—Generation remote from the workpiece, e.g. down-stream
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
- H01J37/32082—Radio frequency generated discharge
- H01J37/321—Radio frequency generated discharge the radio frequency energy being inductively coupled to the plasma
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/32—Gas-filled discharge tubes
- H01J37/32431—Constructional details of the reactor
- H01J37/3266—Magnetic control means
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
- H05H1/00—Generating plasma; Handling plasma
- H05H1/24—Generating plasma
- H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy
Landscapes
- Physics & Mathematics (AREA)
- Engineering & Computer Science (AREA)
- Plasma & Fusion (AREA)
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electromagnetism (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Drying Of Semiconductors (AREA)
- Plasma Technology (AREA)
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2383596 | 1996-02-09 | ||
JP8023835A JPH09219296A (ja) | 1996-02-09 | 1996-02-09 | 磁気中性線放電型プラズマ源 |
JP3344196 | 1996-02-21 | ||
JP8033441A JPH09232097A (ja) | 1996-02-21 | 1996-02-21 | 磁気中性線放電型プラズマ利用装置 |
Publications (2)
Publication Number | Publication Date |
---|---|
DE69732055D1 true DE69732055D1 (de) | 2005-02-03 |
DE69732055T2 DE69732055T2 (de) | 2005-06-02 |
Family
ID=26361255
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69732055T Expired - Lifetime DE69732055T2 (de) | 1996-02-09 | 1997-02-06 | Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch neutralen Linie |
DE69737311T Expired - Lifetime DE69737311T2 (de) | 1996-02-09 | 1997-02-06 | Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch-neutralen Linie |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE69737311T Expired - Lifetime DE69737311T2 (de) | 1996-02-09 | 1997-02-06 | Vorrichtung zur Erzeugung eines Plasmas mit Entladung entlang einer magnetisch-neutralen Linie |
Country Status (3)
Country | Link |
---|---|
US (1) | US5804027A (de) |
EP (2) | EP1006557B1 (de) |
DE (2) | DE69732055T2 (de) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US5653811A (en) | 1995-07-19 | 1997-08-05 | Chan; Chung | System for the plasma treatment of large area substrates |
GB9722649D0 (en) * | 1997-10-24 | 1997-12-24 | Univ Nanyang | Cathode ARC source for metallic and dielectric coatings |
US6274459B1 (en) | 1998-02-17 | 2001-08-14 | Silicon Genesis Corporation | Method for non mass selected ion implant profile control |
JP2000331993A (ja) * | 1999-05-19 | 2000-11-30 | Mitsubishi Electric Corp | プラズマ処理装置 |
US6458723B1 (en) | 1999-06-24 | 2002-10-01 | Silicon Genesis Corporation | High temperature implant apparatus |
WO2002033728A1 (de) * | 2000-10-19 | 2002-04-25 | Robert Bosch Gmbh | Vorrichtung und verfahren zum ätzen eines substrates mittels eines induktiv gekoppelten plasmas |
US20030082920A1 (en) * | 2001-11-01 | 2003-05-01 | Taiwan Semiconductor Manufacturing Co., Ltd. | Chamber-reversed dry etching |
DE10215660B4 (de) * | 2002-04-09 | 2008-01-17 | Eads Space Transportation Gmbh | Hochfrequenz-Elektronenquelle, insbesondere Neutralisator |
CN101785088B (zh) * | 2007-08-08 | 2013-06-05 | 株式会社爱发科 | 等离子处理方法和等离子处理装置 |
CN111192812B (zh) * | 2020-01-07 | 2022-11-25 | 北京北方华创微电子装备有限公司 | 电感耦合装置和半导体处理设备 |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR910016054A (ko) * | 1990-02-23 | 1991-09-30 | 미다 가쓰시게 | 마이크로 전자 장치용 표면 처리 장치 및 그 방법 |
JP3438785B2 (ja) * | 1991-12-03 | 2003-08-18 | 東京応化工業株式会社 | プラズマ処理装置及び方法 |
US6475333B1 (en) * | 1993-07-26 | 2002-11-05 | Nihon Shinku Gijutsu Kabushiki Kaisha | Discharge plasma processing device |
JPH07263189A (ja) * | 1994-03-24 | 1995-10-13 | Ulvac Japan Ltd | 放電プラズマ処理装置 |
JPH07263192A (ja) * | 1994-03-24 | 1995-10-13 | Ulvac Japan Ltd | エッチング装置 |
-
1997
- 1997-02-06 EP EP00103256A patent/EP1006557B1/de not_active Expired - Lifetime
- 1997-02-06 DE DE69732055T patent/DE69732055T2/de not_active Expired - Lifetime
- 1997-02-06 EP EP97101903A patent/EP0789506B1/de not_active Expired - Lifetime
- 1997-02-06 DE DE69737311T patent/DE69737311T2/de not_active Expired - Lifetime
- 1997-02-06 US US08/796,568 patent/US5804027A/en not_active Expired - Lifetime
Also Published As
Publication number | Publication date |
---|---|
US5804027A (en) | 1998-09-08 |
DE69737311D1 (de) | 2007-03-22 |
EP0789506A1 (de) | 1997-08-13 |
DE69737311T2 (de) | 2007-06-28 |
EP1006557A3 (de) | 2003-07-30 |
EP1006557A2 (de) | 2000-06-07 |
DE69732055T2 (de) | 2005-06-02 |
EP1006557B1 (de) | 2007-01-31 |
EP0789506B1 (de) | 2004-12-29 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
8364 | No opposition during term of opposition |